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http://dx.doi.org/10.4313/JKEM.2009.22.5.448

Effect of CH4 addition to the H2 Plasma Excited by HF ICP for H2 Production  

Kim, Dae-Woon (군산대학교 신소재공학과)
Jung, Yong-Ho (국가핵융합연구소 응용기술연구실)
Choo, Won-Il (군산대학교 신소재공학과)
Jang, Soo-Ouk (국가핵융합연구소 응용기술연구실)
Lee, Bong-Ju (국가핵융합연구소 응용기술연구실)
Kim, Young-Ho (군산대학교 신소재공학과)
Lee, Seung-Heun (군산대학교 신소재공학과)
Kwon, Sung-Ku (군산대학교 신소재공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.22, no.5, 2009 , pp. 448-454 More about this Journal
Abstract
Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameters such as ICP power, $H_{2}O$ flow-rate and process pressure, Water dissociation percent in ICP reactor decrease with increase of chamber pressure, while increase with increase of ICP power and $H_{2}O$ flow rate. The effect of $CH_4$ gas addition to a water plasma on the hydrogen production has been studied in a HF ICP tubular reactor. The main roles of $CH_4$ additive gas in $H_{2}O$ plasma are to react with 0 radical for forming $CO_x$ and CHO and resulting additional $H_2$ production. Furthermore, $CH_4$ additives in $H_{2}O$ plasma is to suppress reverse-reaction by scavenging 0 radical. But, process optimization is needed because $CH_4$ addition has some negative effects such as cost increase and $CO_x$ emission.
Keywords
$H_{2}O$ Plasma; HF ICP; $H_2$ production; $CH_4$ addition;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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