Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 29 Issue 6
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- Pages.648-653
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- 1996
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
OPTICAL EMISSION SPECTROSCOPY OF Ch$_4$ /Ar/H$_2$ GAS DISCHARGES IN RF PLASMA CVD OF HYDROGENATED AMORPHOUS CARBON FILMS
- Lee, Sung-Soo (Department of Materials Processing Engineering, School of Engineering, Nagoya University) ;
- Osamu Takai
- Published : 1996.12.01
Abstract
Hydrogenated amorphous carbon(a-C:H) films are prepared by rf plasma CVD in a
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