• Nuclear Engineering and Technology
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• 제51권5호
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• pp.1428-1435
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• 2019

The total ionizing dose (TID) and non ionizing energy loss (NIEL) effects of 100 MeV phosphorous ($P^{7+}$) and 80 MeV nitrogen ($N^{6+}$) ions on 200 GHz silicon-germanium heterojunction bipolar transistors (SiGe HBTs) were examined in the total dose range from 1 to 100 Mrad(Si). The in-situ I-V characteristics like Gummel characteristics, excess base current (${\Delta}I_B$), net oxide trapped charge ($N_{OX}$), current gain ($h_{FE}$), avalanche multiplication (M-1), neutral base recombination (NBR) and output characteristics ($I_C-V_{CE}$) were analysed before and after irradiation. The significant degradation in device parameters was observed after $100MeV\;P^{7+}$ and $80MeV\;N^{6+}$ ion irradiation. The $100MeV\;P^{7+}$ ions create more damage in the SiGe HBT structure and in turn degrade the electrical characteristics of SiGe HBTs more when compared to $80MeV\;N^{6+}$. The SiGe HBTs irradiated up to 100 Mrad of total dose were annealed from $50^{\circ}C$ to $400^{\circ}C$ in different steps for 30 min duration in order to study the recovery of electrical characteristics. The recovery factors (RFs) are employed to analyse the contribution of room temperature and isochronal annealing in total recovery.

• 한국산학기술학회논문지
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• 제3권3호
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• pp.161-165
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• 2002

게르마늄첨가 다성분계 산화물 유리를 제조하여 자외선(UV) 조사에 따른 유리의 미세 구조변화를 PL(photo-luminescence)과 ESR(electron spin resonance)을 이용하여 관찰하였다. 게르마늄 첨가량이 증가함에 따라 PL방사량은 증가하였으며, UV 조사 후에는 처음과 반대되는 광혹화 현상으로 감소하는 현상을 나타냈다. UV조사로 변화된 특성은 열처리를 통하여 회복이 가능하였으며, ESR 측정에서도 PL결과와 같은 광혹화 현상(phodarkenine effect)과 열표백화 현상(thermal bleaching effect)이 확인되었다. 또한, XRD 분석을 통하여 이러한 현상이 비정질 상은 그대로 유지하는 미세구조 변화임을 알 수 있었다.

• Bulletin of the Korean Chemical Society
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• 제23권6호
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• pp.845-851
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• 2002

The synthesis of the intramolecular donor - stabilized silyl and germyl complexes of the type ($Cab^c.p) MMe_2X$ (2a:M=Si, X=Cl;2b;M= Ge, X=Cl;2e;M=Si,X=H) was achieved by the reaction of $LiCab^c,p$ (1) with $Me_2SiClX$ and $Me_2GeCl_2$ respectively. The intramolecular M←P interacion in 2a-2c is provided by $^1H$, $13^C.$, $31^P$ and $29^Si$ NMR spectroscopy. The salt elimination reactions of dichlorotetramethyldisilane and -digermane with 1 afforded the $bis(\sigma-carboranylphosphino)disilane$ and disgermane [$(Cab^C.P)MMe_2]_2(4a;M$ = Si;4b: M=Ge). The oxidative addition reaction of 4a-4b with $pd_2(dba)_3CHCl_3afforded$ the bis(silyl)-and bis(germyl)-palladium complexes. The chloro-bridged dipalladium complexes were obtained by the reaction of 2a-2b with $pd_2(dba)_3CHCl_3$ The crystal structures of 5a and 7b were determined by X-ray structural studies.

• 한국세라믹학회지
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• 제54권6호
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• pp.484-491
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• 2017

Chalcogenide glasses have been investigated in their thermodynamic, structural, and optical properties for application in various opto-electronic devices. In this study, the $Sb_{20}Se_{80-x}Ge_x$ with x = 10, 15, 20, and 25 were selected to investigate the glass stability according to germanium ratios. The thermal, structural, and optical properties of these glasses were measured by differential scanning calorimetry (DSC), X-ray diffraction (XRD), and UV-Vis-IR Spectrophotometry, respectively. The DSC results revealed that $Ge_{20}Sb_{20}Se_{60}$ composition showing the best glass stability theoretically results due to a lower glass transition activation energy of 230 kJ/mol and higher crystallization activation energy of 260 kJ/mol. The structural and optical analyses of annealed thin films were carried out. The XRD analysis reveals obvious results associated with glass stabilities. The values of slope U, derived from optical analysis, offered information on the atomic and electronic configuration in Urbach tails, associated with the glass stability.

• 한국전기전자재료학회논문지
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• 제30권4호
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• pp.204-209
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• 2017

Thermal and structural stability in the glass transition region of chalcogenide glasses has been investigated in terms of thermodynamics for application to various optoelectronic devices. In this study, the compositions of $Ge_xSb_{20}Se_{80-x}$ (x = 10, 15, 20, 25, and 30) were selected to investigate the glass stability according to germanium ratios. The chalcogenide bulks were fabricated by using a traditional melt-quenching method. Thin films were deposited by a thermal evaporation system, maintaining the deposition ratio of $3{\sim}5{\AA}$ in order to have uniformity. The thermal and structural properties were measured by a differential scanning calorimeter (DSC) and X-ray diffraction (XRD). The DSC analysis provided thermal parameters and theoretical glass region stabilities. The XRD analysis supported the theoretical stabilities because of where the crystallization peak data occurred.

• 한국재료학회지
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• 제34권6호
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• pp.267-274
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• 2024

In this study, four different samples of Se₆₀Ge_40-xBi_x chalcogenides glasses were synthesized by heating the melt for 18 h in vacuum Pyrex ampoules (under a 10^-4 Torre vacuum), each with a different concentration (x = 0, 10, 15, and 20) of high purity starting materials. The results of direct current (DC) electrical conductivity measurements against a 1,000/T plot for all chalcogenide samples revealed two linear areas at medium and high temperatures, each with a different slope and with different activation energies (E₁ and E₂). In other words, these samples contain two electrical conduction mechanisms: a localized conduction at middle temperatures and extended conduction at high temperatures. The results showed the local and extended state parameters changed due to the effective partial substitution of germanium by bismuth. The density of extended states N(E_ext) and localized states N(E_loc) as a function of bismuth concentration was used to gauge this effect. While the density of the localized states decreased from 1.6 × 10¹⁴ to 4.2 × 10¹² (ev^-1 cm^-3) as the bismuth concentration increased from 0 to 15, the density of the extended states generally increased from 3.552 × 10²¹ to 5.86 × 10²¹ (ev^-1 cm^-3), indicating a reduction in the mullet's randomness. This makes these alloys more widely useful in electronic applications due to the decrease in the cost of manufacturing.

• 대한전자공학회논문지SD
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• 제42권9호
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• pp.9-18
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• 2005

60 nm C-MOSFET 기술 분기점 이상의 고성능, 저전력 트랜지스터를 구현 시키기 위해 SiGe/SiO2/Si위에 성장된 strained Si의 두께가 전자 이동도에 미치는 영향을 두 가지 관점에서 조사 연구하였다. 첫째, inter-valley phonon 산란 모델의 매개변수들을 최적화하였고 둘째, strained Si 반전층의 2-fold와 4-fold의 전자상태, 에너지 밴드 다이어그램, 전자 점유도, 전자농도, phonon 산란율과 phonon-limited 전자이동도를 이론적으로 계산하였다. SGOI n-MOSFET의 전자이동도는 고찰된 SOI 구조의 Si 두께 모든 영역에서 일반적인 SOI n-MOSFET보다 $1.5\~1.7$배가 높음이 관찰 되었다. 이러한 경향은 실험 결과와 상당히 일치한다. 특히 strained Si의 두께가 10 nm 이하일 때 Si 채널 두께가 6 nm 보다 작은 SGOI n-MOSFET에서의 phonon-limited 전자 이동도는 일반 SOI n-MOSFET과 크게 달랐다. 우리는 이러한 차이가 전자들이 suained SGOI n-MOSFET의 반전층에서 SiGe층으로 터널링 했기 때문이고, 반면에 일반 SOI n-MOSFET에서는 캐리어 confinement 현상이 발생했기 때문인 것으로 해석하였다. 또한 우리는 10 nm와 3 nm 사이의 Si 두께에서는 SGOI n-MOSFET의 phonon-limited 전자 이동도가 inter-valley phonon 산란율에 영향을 받는 다는 것을 확인하였으며, 이러한 결과는 더욱 높은 드레인 전류를 얻기 위해서 15 nm 미만의 채널길이를 가진 완전공핍 C-MOSFET는 stained Si SGOI 구조로 제작하여야 함을 확인 했다

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.320-320
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• 2014

Amorphous silicon alloy (a-Si) solar cells and modules have been receiving a great deal of attention as a low-cost alternate energy source for large-scale terrestrial applications. Key to the achievement of high-efficiency solar cells using the multi-junction approach is the development of high quality, low band-gap materials which can capture the low-energy photons of the solar spectrum. Several cell designs have been reported in the past where grading or buffer layers have been incorporated at the junction interface to reduce carrier recombination near the junction. We have investigated profiling the composition of the a-SiGe alloy throughout the bulk of the intrinsic material so as to have a built-in electrical field in a substantial portion of the intrinsic material. As a result, the band gap mismatch between a-Si:H and $a-Si_{1-x}Ge_x:H$ creates a barrier for carrier transport. Previous reports have proposed a graded band gap structure in the absorber layer not only effectively increases the short wavelength absorption near the p/i interface, but also enhances the hole transport near the i-n interface. Here, we modulated the GeH4 flow rate to control the band gap to be graded from 1.75 eV (a-Si:H) to 1.55 eV ($a-Si_{1-x}Ge_x:H$). The band structure in the absorber layer thus became like a U-shape in which the lowest band gap was located in the middle of the i-layer. Incorporation of this structure in the middle and top cell of the triple-cell configuration is expected to increase the conversion efficiency further.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.617-620
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• 1999

In this study, the polarization e(fecal and the birefringence effect of amorphous germanium (a-Ge) thin films were investigated by using linearly polarized He-Ne laser beam. The a-7e thin films were deposited on the quarts substrate by plasma enhanced chemical vapor deposition (PECVD) and thermal vacuum evaporation In order to obtain the optimum grating arrays, inorganci resists such as Si$_3$N$_4$ and a-Se$_{75}$ Ge$_{25}$ , were prepared with the optimized thickness by Monte Carlo (MC) simulation. As the results of MC simulation, the thickness ofa-Se$_{75}$ Ge$_{25}$ resist was determined with Z$_{min}$ of 360$\AA$ . The resists were exposed to Ga$^{+}$-FIB with accelerating energies of 50 keV, developed by wet etching, and a-Ge thin film was etched by reactive ion-etching (RIE). Finally, we were obtained grating arrays which grating width and linewidth are 0.8${\mu}{\textrm}{m}$, respectively and we studied the polarization and birefringence effect in transmission grating array made of high refractive amorphous material, and the applicability as waveplates and polarizers in optical device.e.e.

• 한국식품영양과학회지
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• 제37권6호
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• pp.691-695
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• 2008

물 종류를 달리한 된장의 메탄올 추출물로 돌연변이유발 억제효과를 관찰한 결과 일반 수돗물로 담근 된장보다 게르마늄수와 고로쇠나무 수액으로 담근 된장이 Ames test와 SOS chromotest에서 높은 항돌연변이 효과를 나타내었다. 즉 Ames 실험에서 일반 재래식된장의 메탄올 추출물을 1 mg/plate 농도로 사용하였을 때 S. Typhimurium TA100에서 $AFB_1$의 돌연변이유발 억제작용을 나타내지 않았으나 게르마늄수 된장과 고로쇠나무 수액을 첨가한 된장의 메탄올 추출물은 $56{\sim}62%$ 억제되었으며 5 mg/plate 농도에서도 일반 된장보다 억제효과가 높았다. 또한 E. coli PQ37에서 MNNG의 돌연변이유발 억제효과도 일반 된장보다 게르마늄수 된장과 고로쇠나무 수액된장에서 더 높게 나타났다. S. Typhimurium TA100에서 MNNG를 돌연변이원으로 사용한 Ames test에서 천일염을 사용한 된장보다 구운 소금과 죽염을 사용한 것이 억제효과가 컸으며 1 mg/plate와 5 mg/plate 농도에서 1회 구운 죽염이 9회 구운 죽염을 첨가한 된장 추출물보다 항돌연변이 효과가 크게 나타났다. SOS chromotest에서도 1회 구운 죽염 된장은 다른 소금 된장 추출물에 비하여 MNNG의 돌연변이를 가장 크게 억제하였다. 이상의 결과에서 된장을 담글 때 사용하는 물과 소금의 종류에 따라 항돌연변이 효과는 차이가 있는 것을 알 수 있었으며 향후 된장에 물과 소금이 미치는 다양한 생리적 기능에 대한 더 많은 연구가 필요할 것으로 사료된다.