• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.253-253
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.252-252
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• 2009

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1351-1354
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• 2006

In this paper, we study the effect of substrate temperature on property of Ga doped ZnO (GZO) thin film for transparent conductive oxide (TCO).GZO thin films have been deposited on corning glass 1737 by D.C. magnetron sputtering. We investigated the structural and electrical properties of GZO films using the X-Ray Diffractometer(XRD), Field Emission Scanning Electron Microscopy(FESEM) and 4-points probe .

• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.2
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• pp.249-254
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• 2015

Solution-derived amorphous indium-gallium-zinc oxide (a-IGZO) thin-film-transistor (TFTs) were developed using a microwave irradiation treatment at low process temperature below $300^{\circ}C$. Compared to conventional furnace-annealing, the a-IGZO TFTs annealed by microwave irradiation exhibited better electrical characteristics in terms of field effect mobility, SS, and on/off current ratio, although the annealing temperature of microwave irradiation is much lower than that of furnace annealing. The microwave irradiated TFTs showed a smaller $V_{th}$ shift under the positive gate bias stress (PGBS) and negative gate bias stress (NGBS) tests owing to a lower ratio of oxygen vacancies, surface absorbed oxygen molecules, and reduced interface trapping in a-IGZO. Therefore, microwave irradiation is very promising to low-temperature process.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.66 no.4
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• pp.721-726
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• 2017

We fabricated stretchable thin-film transistors(TFTs) on a polydimethylsiloxane substrate with patterned polyimide island structures by using an amorphous InGaZnO semiconductor and parylene gate insulator. The TFTs exhibited a field- effect mobility of $5cm^2V^{-1}s^{-1}$ and a current on/off ratio of $10^5$ at a relatively low operating voltage. Furthermore, the fabricated transistors showed no noticeable changes in their electrical performance for large strains of up to 50 %.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.266.1-266.1
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• 2014

반도체 및 디스플레이 등의 산업 중 증착공정에서 TCO 등 산화막의(oxide thin film) 중요성은 날로 대두되고 있다. 특히 정밀한 막질을 원하는 공정에서 산소(Oxygen)유량의 차이로 인한 생성된 막질의 변화가 크다. 이로 인하여 여러 연구실에서 다양한 연구가 활발하게 진행중에 있다. 특히 최근 IGZO (In-Ga-ZnO)가 이슈가 되면서 더 다양하게 연구가 진행중이다. 그러나 공정 장비의 노화나 증착공정중장비(Chamber)내부의 미세한 변화가 많아 산소와 공정 기체의 비가 틀어지는 경우가 있고 이를 제어하기는 쉽지 않은 실정이다. 본 연구에서는 먼저 ITO (Indium Tin Oxide)타겟을 통해 스퍼터장비에서 일반적인 공정을 진행한 박막과, 제작된 유량 제어 시스템을 통하여 공정을 진행한 박막을 만들었다. 이를 통해 박막의 차이점을 분석하고 증착공정중 발생하는 플라즈마의 분석도 진행하여 공정의 제어가 가능함을 확인하였다.

• Journal of Information Display
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• v.11 no.3
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• pp.113-118
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• 2010

The effect of hydrogen in the alumina gate insulator on the bottom gate oxide thin film transistor (TFT) with an InGaZnO film as the active layer was investigated. TFT with more H-containing alumina films (TFT A) fabricated via atomic layer deposition using a water precursor showed higher stability under positive and negative bias stresses than that with less H-containing alumina deposited using ozone (TFT B). While TFT A was affected by the pre-vacuum annealing of GI, which resulted in $V_{th}$ instability under NBS, TFT B did not show a difference after the pre-vacuum annealing of GI. All the TFTs showed negative-bias-enhanced photo instability.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.206-206
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• 2011

투명 전도성 산화물 (TCO, Transparent Conductive Oxide) 박막을 태양전지에 적용하기 위해서는 우수한 전기 전도성 및 가시광 영역에서 높은 투과율을 가져야 한다. 대표적인 TCO 물질인 ITO (Indium tin oxide) 박막은 우수한 전기적, 광학적 특성을 가지고 있지만 $400^{\circ}C$ 이상의 고온에서는 전기저항이 급격히 증가하게 되어 실제 태양전지 패널에 적용했을 때 전기적 특성이 저하된다. 따라서 태양전지용 TCO 박막을 개발 시, 뛰어난 고온 안정성이 요구되고 있다. 본 연구에서는 고온 안정적 특성을 지니는 Ga3+를 도핑한 ZnO 계열 TCO인 GZO/ITO multi-layered 박막을 증착하였다. 또한 buffer layer의 두께 변화 및 구조 제어를 통한 최위층 박막의 전기적 특성 및 결정성을 조사하였으며 다층 박막의 계면 간 특성 및 굴절률 제어를 통한 광학적 물성을 연구하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1535-1537
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• 2009

High performance resistive type touch panel was fabricated on flexible polyethylene terephthalate (PET) substrates coated with Al- and Ga-codoped ZnO (AGZO) films. The AGZO films were deposited by roll-to-roll direct current magnetron sputter at room temperature. The AGZO thin films on PET substrates showed high transparency (> 85 % at 550 nm) and low sheet resistance (450 ${\Omega}$/sq.). These values were similar to those of commercial ITO films used for resistive type touch panel.

• Journal of the Semiconductor & Display Technology
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• v.19 no.2
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• pp.72-76
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• 2020

The author demonstrated organic ferroelectric thin-film transistors with ferroelectric materials of P(VDF-TrFE) and an amorphous oxide semiconducting In-Ga-Zn-O channel on the silicon substrates. The organic ferroelectric layers were deposited on an oxide semiconductor layer by Langmuir-Blodgett method and then annealed at 128℃ for 30min. The carrier mobility and current on/off ratio of the memory transistors showed 9 ㎠V^-1s^-1 and 6 orders of magnitude, respectively. We can conclude from the obtained results that proposed memory transistors were quite suitable to realize flexible and werable electronic applications.