• 제목/요약/키워드: Ga source

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Hot Wall Epitaxy(HWE)법에 의한 $CdGa_2Se_4$ 단결정 박막 성장과 점결함 (Growth and point defect for $CdGa_2Se_4$single crystal thin film by hot wall epitaxy)

  • 홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.81-82
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    • 2007
  • The stochiometric mix of evaporating materials for the $CdGa_2Se_4$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CdGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $630^{\circ}C\;and\;420^{\circ}C$, respectively. After the as-grown single crystal $CdGa_2Se_4$ thin films were annealed in Cd-, Se-, and Ga -atmospheres, the origin of point defects of single crystal $CdGa_2Se_4$ thin films has been investigated by PL at 10 K. The native defects of $V_{Cd},\;V_{Se},\;Cd_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as donors or acceptors. And we concluded that the heat-treatment in the Cd-atmosphere converted single crystal $CdGa_2Se_4$ thin films to an optical p-type. Also, we confirmed that Ga in $CdGa_2Se_4$/GaAs did not form the native defects because Ga in single crystal $CdGa_2Se_4$ thin films existed in the form of stable bonds.

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Analysis of Influence of Environmental Conditions on Ganoderic Acid Content: in Ganoderma lucidum Using Orthogonal Design

  • Li Na;Liu Xiao Hua;Zhou Jie;Li Yu Xiang;Zhao Ming Wen
    • Journal of Microbiology and Biotechnology
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    • 제16권12호
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    • pp.1940-1946
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    • 2006
  • The influence of environmental conditions on the ganoderic acid (GA) content in the fungus Ganoderma lucidum was investigated using a one-factor-at-a-time design and orthogonal design. Among the various medium components examined, sucrose, soybean powder or peptone, ferrous sulfate, and pH 6.0 were the most suitable carbon source (factor A), nitrogen source (factor B), mineral source (factor C), and initial pH (factor D), respectively, for the GA content in the one-factor-at-a-time design. According to the orthogonal design, the order of effect for the four factors on the GA content was A>C>D>B. The best level of factor A was $A_2$ (sucrose) with a value of +0.34 mg/100 mg DW. The optimal treatment combination was $A_2B_1C_3D_1$ with which the GA content reached up to 2.63$\pm$0.011 mg/100 mg DW. The interactions between the mineral ion and the nitrogen source, and the mineral ion and the pH were both highly significant (P<0.01). The highest interaction effect was ($B_2{\times}D_2$) with a value of +0.19 mg/100 mg DW, which was higher than the level effect value for $B_2$ (peptone) and D$_2$ (pH 5.0). Therefore, the results proved that interactions between factors cannot be ignored. The results also indicated the importance of the interactions between the factors, which may help to understand the metabolic pathway leading to triterpene biosynthesis and the expression and regulation of the key enzymes involved.

AlGaAs/GaAs multiple-quantum well에 대한 상온에서의 photoreflectance 특성연구 (A study of room temperature PR(photoreflectance) charicteristics for AlGaAs/GaAs multiple-quantum well)

  • 김동렬;최현태;배인호;김말문;한병국;우덕하;김선호;최상삼
    • 한국진공학회지
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    • 제6권2호
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    • pp.109-113
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    • 1997
  • MBE로 성장한 AlGaAs/GaAs multiple-quantum well(MQW)에 대하여 pump source를 He-Ne laser와 Ar laser를 사용하여 상온에서 PR(photoreflectance)측정을 수행한 결과 여러 subband transition peak을 관찰하였다. PR결과를 standard analytic line shape으 로 fitting하여n=1의 conduction band와 heavy hole 그리고 light hole transition peak인 Cl-Hl, Cl-Ll에 대한 energy값들을 얻었다. 또한 상온에서의 PL(photoluminescence)측정에 서 Cl-Hl, Cl-Ll과 관련된 main peak와 shoulder를 관찰하였다. 이 값은 PR측정값과 잘 일 치함으로써 PL에서의 main peak와 should가 Cl-Hl, Cl-Ll과 관련된 peak임을 확인할 수 있 었다. 또한 envelope function approximation(EFA)을 이용하여 구한 이론값과 PR과 PL에서 측정된 실험값들을 비교하였다.

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Fabrication of the catalyst free GaN nanorods on Si grown by MOCVD

  • Ko, Suk-Min;Cho, Yong-Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.232-232
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    • 2010
  • Recently light emitting diodes (LEDs) have been expected as the new generation light sources because of their advantages such as small size, long lifetime and energy-saving. GaN, as a wide band gap material, is widely used as a material of LEDs and GaN nanorods are the one of the most widely investigated nanostructure which has advantages for the light extraction of LEDs and increasing the active area by making the cylindrical core-shell structure. Lately GaN nanorods are fabricated by various techniques, such as selective area growth, vapor-liquid-solid (VLS) technique. But these techniques have some disadvantages. Selective area growth technique is too complicated and expensive to grow the rods. And in the case of VLS technique, GaN nanorods are not vertically aligned well and the metal catalyst may act as the impurity. So we just tried to grow the GaN nanorods on Si substrate without catalyst to get the vertically well aligned nanorods without impurity. First we deposited the AlN buffer layer on Si substrate which shows more vertical growth mode than sapphire substrate. After the buffer growth, we flew trimethylgallium (TMGa) as the III group source and ammonia as the V group source. And during the GaN growth, we kept the ammonia flow stable and periodically changed the flow rate of TMGa to change the growth mode of the nanorods. Finally, as the optimization, we changed the various growth conditions such as the growth temperature, the working pressure, V/III ratio and the doping level. And we are still in the process to reduce the diameter of the nanorods and to extend the length of the nanorods simultaneously. In this study, we focused on the shape changing of GaN nanorods with different growth conditions. So we confirmed the shape of the nanorods by scanning electron microscope (SEM) and carried out the Photoluminescence (PL) measurement and x-ray diffraction (XRD) to examine the crystal quality difference between samples. Detailed results will be discussed.

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Hot Wall Epitaxy(HWE) 법에 의해 성장된 $CuGaSe_2$ 에피레이어의 광발광 특성 (Photoluminescience propeerties for $CuGaSe_2$ epilayers grown by hot wall epitaxy)

  • 김혜정;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.100-101
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    • 2008
  • To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively. After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU}$, $V_{Se}$, $Cu_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2$/GaAs did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

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수소 화물 기상 증착법을 이용한 InN 나노 알갱이 성장에 관한 연구 (Investigation of InN nanograins grown by hydride vapor phase epitaxy)

  • 전재원;이상화;김진교
    • 한국진공학회지
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    • 제16권6호
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    • pp.479-482
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    • 2007
  • 수소화물 기상 증착법을 이용하여 [0001] 방향에서 $0.3^{\circ}$ 기울어진 사파이어 기판 위에 InN 나노 알갱이를 성장 시켰고, 다양한 성장 조건에 따라 InN 나노 알갱이의 성장이 어떻게 영향 받는지 x-선 산란을 이용하여 연구 하였다. 모든 시료는 암모니아 사전 처리 작업을 한 사파이어 기판 위에 증착하였다. 염화수소 유량, 성장온도, 소스 영역온도에 따라 InN 나노 알갱이의 성장이 영향을 받음을 알 수 있었으며, 갈륨과 인듐을 혼합한 소스를 사용하였음에도 불구하고, 성장 조건에 따라 InN가 성장되지 않는 경우가 있었으며, 이 때는 특히 (001) 방향의 GaN 이외에 (100)및 (101) 방향의 GaN 나노알갱이들이 급격히 많이 생성됨을 확인하였다.

고농도로 탄소 도핑된 높은 밀러 지수 GaAs (Heavy Carbon Incorporation into High-Index GaAs)

  • 손창식
    • 한국재료학회지
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    • 제13권11호
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    • pp.717-720
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    • 2003
  • Heavily $p^{ +}$-typed ($10^{20}$ $cm^{-3}$ ) GaAs epilayers have been grown on high-index GaAs substrates with various crystallographic orientations from (100) to (111)A by a low-pressure metalorganic chemical vapor deposition. Carbon (C) tetrabromide (CBr$_4$) was used as a C source. At moderate growth temperatures and high V/III ratios, the hole concentration of C-doped GaAs epilayers shows the crystallographic orientation dependence. The bonding strength of As sites on a growing surface plays an important role in the C incorporation into the high-index GaAs substrates.

상온 강자성 (Ga,Mn)N 박막을 이용한 질화물계 스핀 발광소자의 스핀편극된 빛의 발광 (Emission of Spin-polarized Light in Nitride-based Spin LEDs with Room-temperature Ferromagnetic (Ga,Mn)N Layer)

  • 함문호;명재민
    • 한국전기전자재료학회논문지
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    • 제18권11호
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    • pp.1056-1060
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    • 2005
  • We investigated the fabrication and characteristics of the nitride-based spin-polarized LEDs with room-temperature ferromagnetic (Ga,Mn)N layer as a spin injection source. The (Ga,Mn)N thin films having room-temperature ferromagnetic ordering were found to exhibit the negative MR and anomalous Hall resistance up to room temperature, revealing the existence of spin-polarized electrons in (Ga,Mn)N films at room temperature. The electrical characteristics in the spin LEDs did not degraded in spite of the insertion of the (Ga,Mn)N layer into the LED structure. In EL spectra of the spin LEDs, it is confirmed that the devices produce intense EL emission at 7 K as well as room temperature. These results are expected to open up new opportunities to realize room-temperature operating semiconductor spintronic devices.

GaN계 스핀 발광소자의 스핀편극된 빛의 발광 (Emission of spin-polarized light in GaN-based spin LEDs)

  • 함문호;윤석호;박용조;명재민
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.150-152
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    • 2005
  • We investigated the fabrication and characteristics of spin-polarized LEDs based on GaN using (Ga,Mn)N as spin injection source. (Ga,Mn)N thin films were found to exhibit the ferromagnetic ordering above room temperature and the negative MR up to room temperature. The electrical characteristics in spin LEDs did not degraded in spite of the insertion of (Ga,Mn)N films. In EL spectra of spin LEDs, it is confirmed that spin LEDs emit the strong light at 7 K as well as room temperature. These results suggest that it is possible to emit spin-polarized light in our spin LEDs.

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Gallium nitride nanoparticle synthesis using nonthermal plasma with gallium vapor

  • You, K.H.;Kim, J.H.;You, S.J.;Lee, H.C.;Ruh, H.;Seong, D.J.
    • Current Applied Physics
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    • 제18권12호
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    • pp.1553-1557
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    • 2018
  • Gallium nitride (GaN) nanoparticles are synthesized by the gallium particle trapping effect in a $N_2$ nonthermal plasma with metallic Ga vapor. A proposed method has an advantage of synthesized GaN nanoparticle purity because the gallium vapor from the inductively heated tungsten boat does not contain any impurity source. The synthesized particle size can be controlled by the amount of Ga vapor, which is adjusted using the plasma emission ratio of nitrogen to gallium, owing to the particle trapping effect. The synthesized nanoparticles are investigated by electron microscopy studies. High-resolution transmission electron microscopy (HRTEM) studies confirm that the synthesized GaN nanoparticles (10-40 nm) crystallize in a single-phase wurtzite structure. Room-temperature photoluminescence (PL) measurements indicate the band-edge emission of GaN at around 378 nm without yellow emission, which implies that the synthesized GaN nanoparticles have high crystallinity.