• Title/Summary/Keyword: Flow Non-uniformity

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A Study on the Electrical Characteristic Analysis of c-Si Solar Cell Diodes

  • Choi, Pyung-Ho;Kim, Hyo-Jung;Baek, Do-Hyun;Choi, Byoung-Deog
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.12 no.1
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    • pp.59-65
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    • 2012
  • A study on the electrical characteristic analysis of solar cell diodes under experimental conditions of varying temperature and frequency has been conducted. From the current-voltage (I-V) measurements, at the room temperature, we obtained the ideality factor (n) for Space Charge Region (SCR) and Quasi-Neutral Region (QNR) of 3.02 and 1.76, respectively. Characteristics showed that the value of n (at SCR) decreases with rising temperature and n (at QNR) increases with the same conditions. These are due to not only the sharply increased SCR current flow but the activated carrier recombination in the bulk region caused by defects such as contamination, dangling bonds. In addition, from the I-V measurements implemented to confirm the junction uniformity of cells, the average current dispersion was 40.87% and 10.59% at the region of SCR and QNR, respectively. These phenomena were caused by the pyramidal textured junction structure formed to improve the light absorption on the device's front surface, and these affect to the total diode current flow. These defect and textured junction structure will be causes that solar cell diodes have non-ideal electrical characteristics compared with general p-n junction diodes. Also, through the capacitance-voltage (C-V) measurements under the frequency of 180 kHz, we confirmed that the value of built-in potential is 0.63 V.

Modeling of Injector Orifice for the Flow Analysis in LOX Manifold of Liquid Rocket (액체로켓의 산화제 매니폴드 내 유동해석을 위한 분사공 모델링)

  • Kim, Hak-Jong;Byun, Yung-Hwan;Cho, Won-Kook;Seol, Woo-Seok;Na, Yang
    • Journal of the Korean Society of Propulsion Engineers
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    • v.8 no.2
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    • pp.1-9
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    • 2004
  • The flow in the LOX manifold of liquid rocket (KSR-III) has been analyzed using a CAE technique with an objective of modeling injector orifices in order to reduce the computational cost for the flow analysis without much losing the accuracy of capturing the flow physics. The numerical result shows that the flow just above the injector orifices is not uniformly distributed in terms of pressure and mass flow rate in case pre-distributors are not equipped inside the manifold. This non-uniformity of mass flux is attributed to the presence of large-scale flow patterns. Several boundary conditions which were designed to effectively replace the presence of injector orifices have been tested and it was found that a simple modeling can be possible by mimicking the actual shape of the orifices.

Cavitating Flow in an Impinging-type Injector (충돌형 분사기 내의 캐비테이션 유동)

  • Jo, Won Guk;Ryu, Cheol Seong;Lee, Dae Seong
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.31 no.5
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    • pp.80-86
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    • 2003
  • An anaysis on the discharge performance of an impinging-type injector for cavitating flow has been conducted by both numerical and experimental method. The predicted discharge coefficient for cavitating flow agrees well with the measured data showing less than 1% discrepancy. For the case of non-cavitating flow analysis, the disagreement between CFD results and the experimental data is 8%. The discharge coefficient for the cavitating flow decreases with decrease in the Reynolds number. On the other hand, it increases slightly as the Reynolds number increases for the non-cavitating flow because of the reduced viscous effect. From the present study, it is confirmed that the fact that cavitation phenomena should be included to predict accurately the discharge performance of injectors for cavitating flow regime. The uniformity of density and velocity magnitude degraded at the injector exit, and the secondary flow strength through the injector orifice accentuated due to cavitation.

Numerical Study on Flow Distribution of Fuel Nozzles for a Combustor in a Micro Gas Turbine (마이크로 가스 터빈용 연소기의 연료 노즐의 유량 분배에 관한 수치 해석적 연구)

  • Kim, Taehoon;Do, Kyu Hyung;Han, Yong-Shik;Kim, Myungbae;Choi, Byung-Il
    • Journal of the Korean Society of Combustion
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    • v.19 no.4
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    • pp.8-13
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    • 2014
  • Flow distribution of fuel nozzles for a combustor in a micro gas turbine is numerically investigated. The fuel supply system for the present study has 12 single nozzles with a diameter of several hundred micrometers. A uniform temperature distribution of a combustor outlet should be achieved for maximizing the lives of the turbine blades and nozzle guide vanes. For this, it is very important to uniformly supply fuel to a combustor. In order to investigate flow distributions of fuel nozzles, numerical models for fuel nozzles are made and solved by a commercial code, ANSYS FLUENT. An effect of a fuel nozzle diameter and fuel flow rates on flow distribution of fuel nozzles is numerically investigated. As a result, non-uniformity is increasing as a diameter of a single fuel nozzle increases. Finally, an appropriate diameter of a single fuel nozzle is suggested.

An Optimal Die Design for the Coating Uniformity of Non-Newtonian Liquids in Slot Coating Process (Slot 코팅 공정에서 Non-Newtonian 유체의 코팅 균일성을 위한 최적 다이 설계)

  • Lee, Si-Hyung;Koh, Hyun-Jung;Shim, Seo-Hoon;Jung, Hyun-Wook;Hyun, Jae-Chun
    • Korean Chemical Engineering Research
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    • v.49 no.3
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    • pp.314-319
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    • 2011
  • In this study, the flow behavior of Newtonian and non-Newtonian coating liquids inside slot die has been scrutinized for the purpose of optimal internal die design in slot coating system from three-dimensional computations by CFD Fluent solver. A hybrid slot die could be optimally designed by changing the chamber or manifold structure to guarantee the uniform velocity distribution of coating liquids at die exit. Especially, for the non-Newtonian coating liquids, the length of coat-hanger for the uniform coating has been properly chosen, according to the degree of their shearthinning properties.

Measurement of the Slurry Flow-Field during Chemical Mechanical Polishing (Particle Image Velocimetry 기법을 이용하여, Chemical Mechanical Polishing 공정시 Slurry 유동장 측정)

  • Shin, Sang-Hee;Kim, Mun-Ki;Koh, Young-Ho;Kim, Ho-Young;Lee, Jae-Dong;Hong, Chang-Ki;Yoon, Young-Bin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.125-128
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    • 2004
  • Chemical Mechanical Polishing(CMP) in semiconductor production is characterized its output property by Removal Rate(RR) and Non-Uniformity(NU). Some Previous works shows that RR is determined by production of pressure and velocity and NC is also largely affected by velocity of flow-field during CMP. This study is about the direct measurement of velocity of slurry during CMP and reconstruction whole flow-field by Particle Image Velocimetry(PIV) Techniques. Typical PIV system is tuned adequately for inspecting CMP and Slurry Flow-field is measured by changing both Pad RPM and Carrier RPM. The results show that velocity is majorly determined not by Carrier RPM, but by Pad RPM.

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Flow Characteristics of a Water Supply System with Booster Pumps for an Apartment Complex (공동주택단지에 설치된 부스터펌프 급수설비계통의 유동 특성)

  • Oh, Yang-Gyun;Jeong, Jae-Bong;Park, Mi-Ra;Cha, Dong-Jin
    • Proceedings of the SAREK Conference
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    • 2008.11a
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    • pp.151-156
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    • 2008
  • Water flow characteristics of an apartment complex consisting of 12 buildings and 635 units in total have been investigated numerically. The complex incorporates two zone booster pump water supply system, and some units have pressure reducing valves in them. Input data to a commercial code Flowmaster7 include survey results on the water usage for the last three years, dimension of the water supply system and its operation condition, etc. Calculated static pressures at the inlet of all units are compared with their design and measured counterparts, and they agree quite well with each other. Then, the pressure distributions and volumetric flow rates at all 635 units are estimated. Flow balancing is also attempted by varying the ratio of angle valve of each unit to improve the non-uniformity of flows.

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The effect of hydrogen flow rate on defects and thickness uniformity in graphene (수소량에 따른 그라핀의 두께와 결함 변화)

  • An, Hyo-Sub;Kim, Eun-Ho;Jang, Hyun-Chul;Cho, Won-Ju;Lee, Wan-Kyu;Jung, Jong-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.262-262
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    • 2010
  • To investigate the effect of the amount of hydrogen on CVD grown-graphene, the flow rate of hydrogen was changed, while other process parameters were kept constant during CVD synthesis. Substrate which consists of 300nm-nickel/$SiO_2$/Si substrate, and methane gas mixed with hydrogen and argon were used for CVD growth. Graphene was synthesized at $950^{\circ}C$. The thickness and the defect of graphene were analyzed using raman spectroscopy. The synthesized graphene shows non-uniform and more defective below a certain amount of hydrogen.

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A Study on Various Parameters of the PE-CVD Chamber with Wafer Guide Ring (웨이퍼 가이드링 적용에 따른 PE-CVD 챔버 변수에 대한 연구)

  • Hyun-Chul Wang;Hwa-Il Seo
    • Journal of the Semiconductor & Display Technology
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    • v.23 no.2
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    • pp.55-59
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    • 2024
  • Plasma Enhanced Chemical Vapor Deposition (PE-CVD) is a widely used technology in semiconductor manufacturing for thin film deposition. The implementation of wafer guide rings in PE-CVD processes is crucial for enhancing efficiency and product quality by ensuring uniform deposition around wafer edges and reducing particle generation. On the other hand, to prevent overall temperature non-uniformity and degradation of thin film quality within the chamber, it is essential to consider various parameters comprehensively. In this study, after applying the wafer guide rings, temperature variations and fluid flow changes were simulated. Additionally, by simulating the temperature and flow changes when applied to the PE-CVD chamber, this paper discusses the importance of optimizing variables within the entire chamber.

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Ellipso-Microscopic Observation of Titanium Surface under UV-Light Irradiation

  • Fushimi, K.;Kurauchi, K.;Nakanishi, T.;Hasegawa, Y.;Ueda, M.;Ohtsuka, T.
    • Corrosion Science and Technology
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    • v.15 no.6
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    • pp.265-270
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    • 2016
  • The ellipso-microscopic observation of a titanium surface undergoing anodization in $0.05mol\;dm^{-3}$ of $H_2SO_4$ was conducted. During irradiation by ultra-violet (UV) light with a wavelength of 325 nm, the titanium surface allowed for the flow of a photo-induced current and showed up as a bright, patch-like image on an ellipso-microscopic view. The brightness and patch-pattern in the image changed with flowing photo-induced current. The changes in the brightness and the image corresponded to the formation and/or degradation of titanium oxide due to the photo-electrochemical reaction of the oxide. An in situ monitoring using the ellipso-microscope revealed that the film change was dependent on the irradiation light power, by UV-light increases the anodic current and results in the initiation of pitting at lower potentials as compared with the non-irradiated condition.