• 제목/요약/키워드: Flexible Film

검색결과 886건 처리시간 0.03초

Resistive Switching Effect of the $In_2O_3$ Nanoparticles on Monolayered Graphene for Flexible Hybrid Memory Device

  • Lee, Dong Uk;Kim, Dongwook;Oh, Gyujin;Kim, Eun Kyu
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
    • /
    • pp.396-396
    • /
    • 2013
  • The resistive random access memory (ReRAM) has several advantages to apply next generation non-volatile memory device, because of fast switching time, long retentions, and large memory windows. The high mobility of monolayered graphene showed several possibilities for scale down and electrical property enhancement of memory device. In this study, the monolayered graphene grown by chemical vapor deposition was transferred to $SiO_2$ (100 nm)/Si substrate and glass by using PMMA coating method. For formation of metal-oxide nanoparticles, we used a chemical reaction between metal films and polyamic acid layer. The 50-nm thick BPDA-PDA polyamic acid layer was coated on the graphene layer. Through soft baking at $125^{\circ}C$ or 30 min, solvent in polyimide layer was removed. Then, 5-nm-thick indium layer was deposited by using thermal evaporator at room temperature. And then, the second polyimide layer was coated on the indium thin film. After remove solvent and open bottom graphene layer, the samples were annealed at $400^{\circ}C$ or 1 hr by using furnace in $N_2$ ambient. The average diameter and density of nanoparticle were depending on annealing temperature and times. During annealing process, the metal and oxygen ions combined to create $In_2O_3$ nanoparticle in the polyimide layer. The electrical properties of $In_2O_3$ nanoparticle ReRAM such as current-voltage curve, operation speed and retention discussed for applictions of transparent and flexible hybrid ReRAM device.

  • PDF

Flexible ITO/PEDOT:PSS Hybrid Transparent Conducting Electrode for Organic Photovoltaics

  • Lim, Kyounga;Jung, Sunghoon;Kang, Jae-Wook;Kim, Jong-Kuk;Kim, Do-Geun
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
    • /
    • pp.299-299
    • /
    • 2013
  • Indium Tin Oxide (ITO) has widely been used as a transparent conductive oxide (TCE) for photovoltaic devices. Lately, flexibility of ITO becomes an issue as demand of flexible device increases. Several scientists have tried to substitute ITO to different materials such as conductive polymer, graphene, CNT, and metal nanowire because of ITO brittleness. Among the substitute materials, PEDOT:PSS has mostly paid attention because PEDOT:PSS has excellent flexibility and good conductivity. The conductivity of PEDOT:PSS increases up to 1000 S/cm with additives such as DMSO, EG, sorbitol, and so on. In our research group, we introduce a conductive polymer PEDOT:PSS as a buffer layer to improve not only flexibility but also conductivity. As PEDOT:PSS layer forms beneath ITO thin film (20 nm), sheet resistance decreases from $230{\Omega}$/${\Box}$ to $85{\Omega}$/${\Box}$ and crack initiation decreases from 4.5 mm to 3.5 mm as well. We have fabricated organic photovoltaic device and power conversion efficiencies using conventional ITO electrode and ITO/PEDOT:PSS hybrid electrode. The photovoltaic property such as power conversion efficiency for ITO/PEDOT:PSS hybrid electrode is comparable to the value obtained using conventional ITO electrode on glass substrate.

  • PDF

플렉서블 디스플레이의 적용을 위한 저온 실리콘 질화물 박막성장의 특성 연구 (The Characteristics of Silicon Nitride Films Grown at Low Temperature for Flexible Display)

  • 임노민;김문근;권광호;김종관
    • 한국전기전자재료학회논문지
    • /
    • 제26권11호
    • /
    • pp.816-820
    • /
    • 2013
  • We investigated the characteristics of the silicon oxy-nitride and nitride films grown by plasma-enhanced chemical vapor deposition (PECVD) at the low temperature with a varying $NH_3/N_2O$ mixing ratio and a fixed $SiH_4$ flow rate. The deposition temperature was held at $150^{\circ}C$ which was the temperature compatible with the plastic substrate. The composition and bonding structure of the nitride films were investigated using Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Nitrogen richness was confirmed with increasing optical band gap and increasing dielectric constant with the higher $NH_3$ fraction. The leakage current density of the nitride films with a high NH3 fraction decreased from $8{\times}10^{-9}$ to $9{\times}10^{-11}(A/cm^2$ at 1.5 MV/cm). This results showed that the films had improved electrical properties and could be acceptable as a gate insulator for thin film transistors by deposited with variable $NH_3/N_2O$ mixing ratio.

기능성 실란커플링제가 2-FCCL의 접착특성에 미치는 영향 (The Effect of Functionalized Organosilane Coupling Agent on the Adhesion Properties of 2 Layer Flexible Copper Clad Laminate)

  • 박진영;임재필;김용석;정현민;이재흥;류종호;원종찬
    • 폴리머
    • /
    • 제33권6호
    • /
    • pp.525-529
    • /
    • 2009
  • 우수한 성능의 2층 연성동박적층판(이하 FCCL)을 제조하기 위해서는 동박과 폴리이미드 사이에서 높은 접착력이 요구된다. 이를 위해 이종 재료로 인한 두 계면 사이의 접착력을 향상시키기 위해서는 일반적으로 기능성 실란커플링제가 사용된다. 본 연구에서는 압연동박과 폴리이미드 사이의 접착력 향상과 이미드화를 위한 고온의 열처리 조건에서도 안정한 새로운 형태의 실란커플링제를 합성하였다. 또한, 합성된 실란커플링제를 압연동박에 처리하였을 때, 표면처리제의 농도에 따른 표면변화를 관찰하였으며, 이로 인해 발생되는 접착력 변화를 확인하기 위해서 2층 FCCL을 제조하여 $90^{\circ}$ peel test를 통해 관찰하였다. 그리고, 두 종류의 폴리이미드를 이용한 FCCL에서 실란 커플링제가 접착력에 미치는 영향을 확인하였다.

스펙트럼 배치방법에 의한 원형도관내의 비점성유동장에 놓인 유연성 실린더의 안정성 분석 (Dynamic Stability of a Flexible Cylinder Subjected to Inviscid Flow in a Coaxial Cylindrical Duct Based on Spectral Method)

  • Sim, Woo-Gun;Bae, Yoon-Yeong
    • Nuclear Engineering and Technology
    • /
    • 제26권2호
    • /
    • pp.212-224
    • /
    • 1994
  • 원형도관내의 비점성유동장에 놓인 동심인 유연성 실린더의 안정성을 분석하기 위하여 수치해석적방법이 개발되었다. 진동하는 실린더에 작용하는 비정상·비점성 유체유발력을 스펙트럼 배치방법을 사용하여 지배방정식을 단순화시키지 않음으로서 더 정밀하게 예측하였다. 본 수치해석이론은 기존의 퍼텐샬이론과 비해 비교적 넓은 환의 경우와 짧은 실린더의 경우에도 적용할 수 있다. 비점성유동의 지배방정식은 라플라스방정식으로부터 구하였다. 유체유동과 결부된 실린더의 유동방정식은 갤러킨의 방법에 의하여 불연속방정식으로 표시되며 이로부터 계의 운동특성을 검토하였다. 계가 좌굴현상에 의하여 안정성을 잃는 임계유속에 대한 환의 간격과 실린더의 길이의 영향이 검토되었다. 수치해석방법을 입증하기 위하여 얇은 막 근사이론에 근거를 두고 호프슨이 제안한 퍼텐샬이론을 개선하였다. 계의 안정성과 동적특성을 수치해석방법에 의하여 예시하였고 기존의 이론과 본 연구에서 제안된 근사법으로 구한 결과와 비교하여 잘 일치함을 보였다. 무차원화된 임계유속은 환의 간격이 넓을수록 실린더의 길이 가 짧을수록 증가함을 보였다.

  • PDF

폴리이미드와 Cu/Ni층과의 계면결합력에 미치는 플라즈마 처리 시간 효과 (Effect of Plasma Treatment Times on the Adhesion of Cu/Ni Thin Film to Polyimide)

  • 우태규;박일송;정광희;전우용;설경원
    • 대한금속재료학회지
    • /
    • 제49권8호
    • /
    • pp.657-663
    • /
    • 2011
  • This study represents the results of the peel strength and surface morphology according to the preprocessing times of polyimide (PI) in a Cu/Ni/PI structure flexible copper clad laminate production process based on the polyimide. Field emission scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy were used to analyze the surface morphology, crystal structure, and interface binding structure of sputtered Ni, Cu, and electrodeposited copper foil layers. The surface roughness of Ni, Cu deposition layers and the crystal structure of electrodeposited Cu layers were varied according to the preprocessing times. In the RF plasma times that were varied by 100-600 seconds in a preprocessing process, the preprocessing applied by about 300-400 seconds showed a homogeneous surface morphology in the metal layers and that also represented high peel strength for the polyimide. Considering the effect of peel strength on plastic deformation, preprocessing times can reasonably be at about 400 seconds.

Effects of Hole Transport Layer Using Au-ionic Doping SWNT on Efficiency of Organic Solar Cells

  • Min, Hyung-Seob;Jeong, Myung-Sun;Choi, Won-Kook;Kim, Sang-Sig;Lee, Jeon-Kook
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
    • /
    • pp.434-434
    • /
    • 2012
  • Despite recent efforts for fabricating flexible transparent conducting films (TCFs) with low resistance and high transmittance, several obstacles to meet the requirement of flexible displays still remain. Indium tin oxide (ITO) thin films, which have been traditionally used as the TCFs, have a serious obstacle in TCFs applications. SWNTs are the most appropriate materials for conductive films for displays due to their excellent high mechanical strength and electrical conductivity. Recently, it has been demonstrated that acid treatment is an efficient method for surfactant removal. However, the treatment has been reported to destroy most SWNT. In this work, the fabrication by the spraying process of transparent SWNT films and reduction of its sheet resistance by Au-ionic doping treatment on PET substrates is researched. Arc-discharge SWNTs were dispersed in deionized water by adding sodium dodecyl sulfate (SDS) as surfactant and sonicated, followed by the centrifugation. The dispersed SWNT was spray-coated on PET substrate and dried on a hotplate. When the spray process was terminated, the TCF was immersed into deionized water to remove the surfactant and then it was dried on hotplate. The TCF film was then was doped with Au-ionic doping treatment, rinsed with deionized water and dried. The surface morphology of TCF was characterized by field emission scanning electron microscopy. The sheet resistance and optical transmission properties of the TCF were measured with a four-point probe method and a UV-visible spectrometry, respectively. This was confirmed and discussed on the XPS and UPS studies. We show that 87 ${\Omega}/{\Box}$ sheet resistances with 81% transmittance at the wavelength of 550 nm. The changes in electrical and optical conductivity of SWNT film before and after Au-ionic doping treatments were discussed. The effects of hole transport interface layer using Au-ionic doping SWNT on the performance of organic solar cells were investigated.

  • PDF

플렉서블 실리콘 박막 태양전지용 Ag/ZnO 후면반사막의 광산란 특성 향상 (Improvement of light scattering properties of Ag/ZnO back-reflectors for flexible silicon thin film solar cells)

  • 백상훈;이정철;박상현;송진수;윤경훈;왕진석;조준식
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
    • /
    • pp.97.1-97.1
    • /
    • 2010
  • 유연금속기판위에 DC 마그네트론 스퍼터링을 이용하여 Ag/ZnO 이중구조의 후면반사막을 증착하고 Ag 표면조도 변화에 따른 후면반사막의 반사특성 변화와 플렉서블 비정질 실리콘 박막 태양전지의 셀 특성에 미치는 영향을 조사하였다. Substrate구조를 갖는 플렉서블 실리콘 박막 태양전지에서는 실리콘 박막 광흡수층의 상대적으로 낮은 광 흡수율로 인하여 입사광에 대한 태양전지 내에서의 광 산란 및 포획이 태양전지 효율을 증대시키는데 매우 중요한 역할을 하는 것으로 알려져 있다. 플렉서블 실리콘 박막 태양전지에서의 후면반사막은 광 흡수층에서 흡수되지 않는 입사광을 다시 반사시켜 광 흡수를 증대시키며 이때 후면반사막 표면에서 반사 빛을 효율적으로 산란시켜 이동경로를 증대시킴으로써 광 흡수율을 더욱 향상시킬 수 있다. 본 연구에서는 유연금속 기판위에 Ag와 ZnO:Al($Al_2O_3$ 2.5wt%) 타겟을 사용한 DC 마그네트론 스퍼터링법으로 Ag/AZO 이중구조의 후면반사막을 제조하고, Ag 박막의 표면형상 변화와 이에 따른 후면반사막의 반사도 변화를 비교, 분석하였다. 증착 조건 변화에 따른 표면 형상 및 반사 특성은 Atomic Force Mircroscope(AFM), Scanning electron miroscopy(SEM), UV-visible-nIR spectrometry를 통하여 분석하였다. 서로 다른 표면 거칠기를 갖는 후면반사막 위에 n-i-p구조의 a-Si:H 실리콘 박막 태양전지를 제조한 후 태양전지 동작 특성에 미치는 영향을 조사하였다. n,p층은 13.56MHz PECVD, i층은 60MHz VHF CVD를 사용하여 각각 제조 하였으며, Photo I-V, External Quantum Efficiency(EQE) 분석을 통하여 태양전지 특성을 조사 하였다. SEM 분석결과 공정 온도가 증가 할수록 Ag 박막의 표면 결정립 크기도 증가하였으며, AFM분석을 통한 Root-mean-square(Rms)값은 상온에서 $500^{\circ}C$로 증착온도가 증가함에 따라 6.62nm에서 46.64nm까지 증가하였다. Ag 박막의 표면 거칠기 증가에 따라 후면반 사막의 확산 반사도도 함께 증가하였다. 공정온도 $500^{\circ}C$에서 증착된 후면반사막을 사용하여 a-Si:H 태양전지를 제조하였을 때 상온에서 제조한 후면반사막에 비하여 단락전류밀도 (Jsc)값은 9.94mA/$cm^2$에서 13.36mA/$cm^2$로 증가하였으며, 7.6%의 가장 높은 태양전지 효율을 나타내었다.

  • PDF

InGaZnO active layer 두께에 따른 thin-film transistor 전기적인 영향

  • 우창호;김영이;안철현;김동찬;공보현;배영숙;서동규;조형균
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
    • /
    • pp.5-5
    • /
    • 2009
  • Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

  • PDF

광화학증착법에 의한 직접패턴 비정질 TiOx 박막의 제조 및 저항변화 특성 (Resistive Switching Characteristic of Direct-patternable Amorphous TiOx Film by Photochemical Metal-organic Deposition)

  • 황윤경;이우영;이세진;이홍섭
    • 마이크로전자및패키징학회지
    • /
    • 제27권1호
    • /
    • pp.25-29
    • /
    • 2020
  • 광화학증착법 (PMOD; photochemical metal-organic deposition)을 이용하여 photoresist 및 etching 공정없이 pattern 된 TiOx resistive switching (RS) 소자를 제작 및 그 특성을 평가하였다. Ti(IV) 2-ethylhexanoate를 출발물질로 사용하였으며 UV 노출시간 10 min에 광화학반응이 완료됨을 FTIR 분석을 통하여 확인하였다. 200 ℃ 이하 저온공정에서 직접패턴 된 20 nm 두께의 비정질 TiOx 박막의 균일한 두께의 패턴형성을 Atomic Force Microscopy를 통하여 확인하였다. 별도의 상형성을 위한 후 열처리 공정 없이 4 ㎛ 선폭의 전극위에 형성된 20 nm 두께의 비정질 TiOx RS 소자는 4V 동작전압에서 on/off ratio 20의 forming-less RS 특성을 나타내었다. Electrochemical migration에 영향을 미치는 grain boundary가 없어 소자간 신뢰성 향상이 기대되며, flexible 기판 또는 저온공정이 요구되는 메모리 소자 공정에서 PMOD 공정이 응용될 수 있음을 보여준다. Selector를 이용하여 crossbar array 구조를 도입할 경우 매우 간단한 구조의 저비용 메모리 소자를 구현할 수 있을 것으로 기대 된다.