• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.255-255
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• 2010

Recently, nonvolatile memories (NVM) of various types have been researched to improve the electrical performance such as program/erase voltages, speed and retention times. Also, the charge trap memory is a strong candidate to realize the ultra dense 20-nm scale NVM. Furthermore, the high charge efficiency and the thermal stability of SiC nanocrystals NVM with single $SiO_2$ tunnel barrier have been reported. [1-2] In this study, the SiC charge trap NVM was fabricated and electrical properties were characterized. The 100-nm thick Poly-Si layer was deposited to confined source/drain region by using low-pressure chemical vapor deposition (LP-CVD). After etching and lithography process for fabricate the gate region, the $Si_3N_4/SiO_2/Si_3N_4$ (NON) and $SiO_2/Si_3N_4/SiO_2$ (ONO) barrier engineered tunnel layer were deposited by using LP-CVD. The equivalent oxide thickness of NON and ONO tunnel layer are 5.2 nm and 5.6 nm, respectively. By using ultra-high vacuum magnetron sputtering with base pressure 3x10-10 Torr, the 2-nm SiC and 20-nm $SiO_2$ were successively deposited on ONO and NON tunnel layers. Finally, after deposited 200-nm thick Al layer, the source, drain and gate areas were defined by using reactive-ion etching and photolithography. The lengths of squire gate are $2\;{\mu}m$, $5\;{\mu}m$ and $10\;{\mu}m$. The electrical properties of devices were measured by using a HP 4156A precision semiconductor parameter analyzer, E4980A LCR capacitor meter and an Agilent 81104A pulse pattern generator system. The electrical characteristics such as the memory effect, program/erase speeds, operation voltages, and retention time of SiC charge trap memory device with barrier engineered tunnel layer will be discussed.

• Tribology and Lubricants
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• v.35 no.5
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• pp.274-285
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• 2019

Chemical mechanical polishing (CMP), which is a material removal process involving chemical surface reactions and mechanical abrasive action, is an essential manufacturing process for obtaining high-quality semiconductor surfaces with ultrahigh precision features. Recent rapid growth in the industries of digital devices and semiconductors has accelerated the demands for processing of various substrate and film materials. In addition, to solve many issues and challenges related to high integration such as micro-defects, non-uniformity, and post-process cleaning, it has become increasingly necessary to approach and understand the processing mechanisms for various substrate materials and abrasive particle behaviors from a tribological point of view. Based on these backgrounds, we review recent CMP R&D trends in this study. We examine experimental and analytical studies with a focus on substrate materials and abrasive particles. For the reduction of micro-scratch generation, understanding the correlation between friction and the generation mechanism by abrasive particle behaviors is critical. Furthermore, the contact stiffness at the wafer-particle (slurry)-pad interface should be carefully considered. Regarding substrate materials, recent research trends and technologies have been introduced that focus on sapphire (${\alpha}$-alumina, $Al_2O_3$), silicon carbide (SiC), and gallium nitride (GaN), which are used for organic light emitting devices. High-speed processing technology that does not generate surface defects should be developed for low-cost production of various substrates. For this purpose, effective methods for reducing and removing surface residues and deformed layers should be explored through tribological approaches. Finally, we present future challenges and issues related to the CMP process from a tribological perspective.

• Tribology and Lubricants
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• v.35 no.5
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• pp.286-293
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• 2019

In friction and wear tests that use friction force microscopy (FFM), the wear debris transfer to the tip apex that changes tip radius is a crucial issue that influences the friction and wear performances of films and coatings with nanoscale thicknesses. In this study, FFM tests are performed for bilayer $MoS_2$ film to obtain a better understanding of how geometrical and chemical changes of tip apex influence the friction and wear properties of nanoscale molecular layers. The critical load can be estimated from the test results based on the clear distinction of the failure area. Scanning electron microscopy and energy-dispersive spectroscopy are employed to measure and observe the geometrical and chemical changes of the tip apex. Under normal loads lower than 1000 nN, the reuse of tips enhances the friction and wear performance at the tip-sample interface as the contact pair changes with the increase of tip radius. Therefore, the reduction of contact pressure due to the increase of tip radius by the transfer of $MoS_2$ or Mo-dominant wear debris and the change of contact pairs from diamond/$MoS_2$ to partial $MoS_2$ or Mo/$MoS_2$ can explain the critical load increase that results from tip reuse. We suggest that the wear debris transfer to the tip apex should be considered when used tips are repeatedly employed to identify the tribological properties of ultra-thin films using FFM.

• Elastomers and Composites
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• v.39 no.3
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• pp.234-243
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• 2004

The elastomeric and conductive polyurethane (PU) films were prepared by poly(propylene glycol) (PPG), toluene 2,4-diisocyanate, 3-methylthiophene (3-MT) at various preparation conditions, such as the reaction time, the $FeCl_3$ concentration, the weight ratio of the 3-MT to PU and the reaction temperature for the diffusion-oxidative reaction. The conductive poly (3-methylthiophene) (PMT) layers via the diffusion-oxidative reaction of 3-MT and ferric chloride were formed by immersing the film in organic solution of $FeCl_3$/ethyl acetate. The preparation conditions greatly affected the electrical conductivity of the 3-MT/PU composite. The effects of the reaction time and temperature on morphology and surface free energy were investigated by scanning electron microscopy (SEM) analysis and contact angle measurement, respectively. The conductivity of the composite was as high as 42 S/cm.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.26 no.1
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• pp.93-106
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• 2000

One phase liquid crystal formula was developed by using of nonionic surfactants, polyols, water and oils and its physical property was investigated. At the system oft to 1 ratio of POE octyldodecyl ether series, which have Y type (branch type) hydrophobic group, and POE glyceryl monostearate series, Y type hydrophilic group, it was examined that the formula at 7:3, 6:4, and 5:5 ratio of nonionic surfactant : polyols, shows L$\alpha$ , a pattern which is a typical characteristic of liquid crystal structure under the cross microscope polarized film. As results of L$\alpha$ phase diagram study, the formula which had high hydrophilic nonionic surfactant and the 7:3 ratio of nonionic surfactant : polyol appeared to increase the amount of oil containment and to be capable of the lamella formation. Besides it was examined that lamellar liquid crystal formula could contain about 25-40% water between lamella layers and it was transformed into w/o emulsion following as water content increased. When the lamella gel was applied into a human skin, it was investigated that it had effectiveness in increasing transepidermal water content of the skin.

• Journal of the Korean Magnetics Society
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• v.9 no.3
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• pp.166-172
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• 1999

The magnetic properties between Mn-Ir antiferromagnetic layer and Ni-Fe ferromagnetic layer have been investigated in Mn-Ir/Ni-Fe/Zr on Si wafer formed by magnetron sputtering. Mn-Ir was sputtered from Ir chips and Mn target using D.C. power, Ni-Fe and Zr were deposited from Ni-Fe and Zr targets using D.C. power under Ar atmosphere. We studied the dependence of the magnetic properties on Ir content of Mn-Ir layer for Mn-Ir/Ni-Fe bilayer, and obtained the highest $H_ex$ of 219 Oe and the low $H_c$ of 30 Oe. And then focused on the effect of base pressure for Mn-Ir containing multilayers. Our experimental data showed that if the base pressure is higher than $3.0{\times}10^{-6}\;Torr$, the exchange anisotropy of Mn-Ir/Ni-Fe/Zr disappeared probably due to the grain refining of Mn-Ir film. In addition we have studied the dependence of Zr buffer on magnetic properties of Mn-Ir/Ni-Fe/Zr multilayers, and observed that Zr buffer about (111) texture and lower $H_c$ of Mn-Ir/Ni-Fe/Zr multilayer.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.19 no.4
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• pp.35-39
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• 2019

The shielding effectiveness (SE) of the EMI spray coating film was measured in a three-dimensional structure. The shielding effectiveness was measured by AST D4935 using coaxial type TEM cell. A standard sample of the cylindrical slab is fabricated to measure the shielding effectiveness using the ASTM D4935. At this time, spray coating was performed by bonding a three-dimensional structure with NAND flash memory to a standard sample. In the case of spray coating, it was uniformly coated not only on the horizontal plane but also on the vertical plane of the three-dimensional structure. As a result of measurement, shielding effectiveness of maximum 59 dB was measured in a three-dimensional structure similar to the case without three-dimensional structure. As a result, it was confirmed that the spray coating can be uniformed even in the three-dimensional structure.

• Corrosion Science and Technology
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• v.18 no.2
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• pp.55-60
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• 2019

Corrosion failure in the convection part of peak load boiler (PLB) of the district heating system led to water leakage. Herein, Internal Rotary Inspection System (IRIS) inspection was employed to examine wall thinning and the cause of leakage in the flue tube. The corrosive products of the turbulator and tube were investigated using scanning electron microscope combined with energy dispersive spectroscopy, X-ray diffraction, and inductively coupled plasma (ICP). Majority of the serious corrosion damage was observed near the turbulator located in the upper flue tube. ICP analysis of the boiler water revealed oxide formation of sodium chloride in the lower end part of the flue tube. A cross-sectional view of the turbulator revealed the presence of double-layers of the oxide film, indicating environmental change during operation associated with water leakage. The outer surface of the turbulator consisted of the acid oxides such as $NO_x$ and $SO_x$ along with sodium and chloride ions. Dew-point corrosion is hypothesized as the main cause for the formation of acid oxides in the region of contact of the flue tube and the turbulator.

• Korean Journal of Metals and Materials
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• v.49 no.10
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• pp.811-817
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• 2011

In this study, we have investigated the role of a metal oxide hole injection layer (HIL) between an Indium Tin Oxide (ITO) electrode and an organic hole transporting layer (HTL) in organic light emitting diodes (OLEDs). Nickel Oxide films were deposited at different deposition times of 0 to 60 seconds, thus leading to a thickness from 0 to 15 nm on ITO/glass substrates. To study the influence of NiO film thickness on the properties of OLEDs, the relationships between NiO/ITO morphology and surface properties have been studied by UV-visible spectroscopy measurements and AFM microscopy. The dependences of the I-V-L properties on the thickness of the NiO layers were examined. Comparing these with devices without an NiO buffer layer, turn-on voltage and luminance have been obviously improved by using the NiO buffer layer with a thickness smaller than 10 nm in OLEDs. Moreover, the efficiency of the device ITO/NiO (< 5 nm)/NPB/$Alq_3$/ LiF/Al has increased two times at the same operation voltage (8V). Insertion of a thin NiO layer between the ITO and HTL enhances the hole injection, which can increase the device efficiency and decrease the turn-on voltage, while also decreasing the interface roughness.

• Journal of Powder Materials
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• v.29 no.3
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• pp.240-246
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• 2022

Novel Ni- and Fe-based alloys are developed to impart improved mechanical properties and corrosion resistance. The designed alloys are manufactured as a powder and deposited on a steel substrate using a high-velocity oxygen-fuel process. The coating layer demonstrates good corrosion resistance, and the thus-formed passive film is beneficial because of the Cr contained in the alloy system. Furthermore, during low-temperature heat treatment, factors that deteriorate the properties and which may arise during high-temperature heat treatment, are avoided. For the heattreated coating layers, the hardness increases by up to 32% and the corrosion resistance improves. The influence of the heat treatment is investigated through various methods and is considered to enhance the mechanical properties and corrosion resistance of the coating layer.