• The Journal of Advanced Prosthodontics
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• 제3권1호
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• pp.33-36
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• 2011

In process of fabrication of a fixed partial denture, dies are trimmed to expose margins of the preparations. The need for the soft tissue cast is quite evident as the soft tissue emergence profile that surrounds the prepared tooth is destroyed in the process of fabrication. This article describes a modified technique to fabricate the soft tissue cast for the conventional fixed partial denture. The impression made with the polyvinylsiloxane was first poured to prepare the die cast. After retrieval of the cast, the same impression was poured second time with the resin based resilient material to cover the facial and proximal gingival areas. The remaining portion of the impression was poured with the gypsum material. This technique does not require additional clinical appointment, second impression procedure, technique sensitive manipulations with impression, or cumbersome laboratory procedures. The simplicity of this technique facilitates and justifies its routine use in fabrication of the fixed partial denture.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.956-959
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• 2002

In this work, a new non-lithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photo-lithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

• International Journal of Precision Engineering and Manufacturing
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• 제4권5호
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• pp.22-26
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• 2003

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

• 한국정밀공학회지
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• 제19권11호
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• pp.228-233
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• 2002

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

• 반도체디스플레이기술학회지
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• 제18권1호
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• pp.38-41
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• 2019

Proton beam writing is a direct writing lithography technique for semiconductor fabrication process. The advantage of this technique is that the proton beam does not scatter as they travel through the matter and therefore maintain a straight path as they penetrate into the resist. The experiment has been carried out at Accelerator Mass Spectrometry facility. The focused proton beam with the fluence of $100nC/mm^2$ was exposed on the PMMA coated silicon sample to make a pattern on a photo resist. The results show the potential of proton beam writing as an effective way to produce semiconductor fabrication process.

• 한국광학회:학술대회논문집
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• 한국광학회 1989년도 제4회 파동 및 레이저 학술발표회 4th Conference on Waves and lasers 논문집 - 한국광학회
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• pp.193-195
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• 1989

A simple fabrication technique of diffraction gratings with short periods is presented. We can see that the monitoring of diffracted light from photoresist gratings during the development process provides optimum conditions for exposure and development processes. With this technique reproducibility and high quality of diffraction gratings is expected.

• 접착 및 계면
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• 제18권4호
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• pp.171-178
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• 2017

최근 들어, 다층박막법(Layer-by-Layer(LbL) assembly)을 이용한 표면 젖음성 제어 기술이 큰 관심을 받고 있다. 다층박막법은 고분자, 계면활성제, 나노 입자 등과 같은 다양한 재료를 이용하여 수직 구조와 표면 특성을 나노 및 마이크로 스케일로 제어할 수 있는 다기능적이며 친환경적인 제조방법이다. 본 논문에서는 다층박막법을 이용하여 표면 특성을 제어하는 기술의 최근 동향을 살펴보고자 한다. 특히, 초발수, 초친수, 초발유/초친수 LbL 표면의 제조와 응용에 대한 기술 동향과 연구 결과를 기술한다. 또한, omniphobic, 자가-치유, 지능형 및 외부 반응형 표면 등 최근 각광을 받고 있는 분야의 기본적인 원리와 제조 방법 등에 대해 소개하고자 한다.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 제35회 춘계학술대회
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• pp.40-44
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• 2002

The motivation of this work is to use SAM(Self-Assembled Monolayer) for developing a rapid and flexible non-photolithographic nano-structure fabrication technique which can be utilized in micro-machining of metals as well as silicon-based materials. The fabrication technique implemented in this work consists of a two-step process, namely, mechanical scribing followed by chemical etching. From the experimental results, it was found that thiol on copper surface could be removed even under a few nN normal load. The nano-tribological characteristics of thiol-SAM on various metals were largely dependent on the native oxide layer of metals. Based on these findings, nano-patterns with sub-micrometer width and depth on metal surfaces such as Cu, Au and Ag could be obtained using a diamond-coated tip.

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2000년도 제15차 학술회의논문집
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• pp.298-298
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• 2000

This paper presents the optimization technique to analyze the effect of the design parameters of rapid prototyping system for human brain model fabrication. The optimization method considers the functional relationships among the design parameters such as thickness gap, shrink rate, and laser speed that govern the operation of fabrication system. This paper applies a discrete optimization technique as the optimization method to determine the dominant parameter values. Additional study includes manner of complement surface image of ellipse which approximates the brain model using the adaptive slicing and the offset contour. According to the parameters tuning and interaction of effect, more suitable parameter values can be obtained by enhanced 3D brain model fabrication.

• Journal of Radiation Protection and Research
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• 제26권3호
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• pp.275-279
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• 2001

In uranium enrichment plants and nuclear fuel fabrication facilities, exact measurement of fissile isotope enrichment of uranium is required for material accounting in international safeguards inspection as well as process quality control. The purpose of this study was to develop a simple measurement system which can portably be used at nuclear fuel fabrication plants especially dealing with low enriched uranium. For this purpose, a small size CZT (CdZnTe) detector was used, and the detector performance in low uranium gamma/X -rays energy range was investigated by use of various enriched uranium oxide samples. New enrichment measurement technique and analysis method for low enriched uranium oxide, so-called, 'semi-peak ratio technique' was developed. The newly developed method was considered as an alternative technique for the low enrichment and would be useful to account nuclear material in safeguarding activity at nuclear fuel fabrication facility.