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Fabrication ofMicro/Nano-patterns using MC-SPL (Mechano-Chemical Scanning Probe Lithography) Process  

성인하 (연세대학교 대학원 기계공학과)
김대은 (연세대학교 기계공학부)
Publication Information
Journal of the Korean Society for Precision Engineering / v.19, no.11, 2002 , pp. 228-233 More about this Journal
Abstract
In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.
Keywords
Mechano-chemical process; Abrasive interaction; ; Nano wear; Self-assembled monolayer;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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