• 제목/요약/키워드: Electroplating method

검색결과 143건 처리시간 0.02초

Fabrication of Electrochemical Sensor with Tunable Electrode Distance

  • Yi, Yu-Heon;Park, Je-Kyun
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제5권1호
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    • pp.30-37
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    • 2005
  • We present an air bridge type electrode system with tunable electrode distance for detecting electroactive biomolecules. It is known that the narrower gap between electrode fingers, the higher sensitivity in IDA (interdigitated array) electrode. In previous researches on IDA electrode, narrower patterning required much precise and expensive equipment as the gap goes down to nanometer scale. In this paper, an improved method is suggested to replace nano gap pattering with downsizing electrode distance and showed that the patterning can be replaced by thickness control using metal deposition methods, such as electroplating or metal sputtering. The air bridge type electrode was completed by the following procedures: gold patterning for lower electrode, copper electroplating, gold deposition for upper electrode, photoresist patterning for gold film support, and copper etching for space formation. The thickness of copper electroplating is the distance between upper and lower electrodes. Because the growth rate of electroplating is $0.5{\mu}m\;min^{-1}$, the distance is tunable up to hundreds of nanometers. Completed electrodes on the same wafer had $5{\mu}m$ electrode distance. The gaps between fingers are 10, 20, 30, and $40{\mu}m$ and the widths of fingers are 10, 20, 30, 40, and $50{\mu}m$. The air bridge type electrode system showed better sensitivity than planar electrode.

APPLICATIONS OF ELECTROPLATING METHOD FOR HEAT TRANSFER STUDIES USING ANALOGY CONCEPT

  • Ko, Sang-Hyuk;Moon, Deok-Won;Chung, Bum-Jin
    • Nuclear Engineering and Technology
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    • 제38권3호
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    • pp.251-258
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    • 2006
  • This study presents an idea of using analogy concept to the heat transfer studies regarding the HTGR development. Theoretical backgrounds regarding the idea were reviewed. In order to investigate the predictability of a mass transfer system for heat transfer system phenomenology, an electroplating system coupled with a limiting current technique was adopted. Test facilities for laminar forced convection and natural convections under laminar and turbulent conditions were constructed, for which heat transfer correlations are known. The test results showed a close agreement between mass transfer and heat transfer systems, which is an encouraging indication of the validity of the analogy theory and the experimental methodology adopted. This paper shows the potential of the experimental method that validates the little-understood heat transfer phenomena, even in complex geometries such as HTGR.

실리콘 실험실에 구리 오염을 방지 할 수 있는 고밀도/고균일의 Solder Bump 형성방법 (Fabrication Method of High-density and High-uniformity Solder Bump without Copper Cross-contamination in Si-LSI Laboratory)

  • 김성진;주철원;박성수;백규하;이희태;송민규
    • 마이크로전자및패키징학회지
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    • 제7권4호
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    • pp.23-29
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    • 2000
  • 사용되는 metal구분 없이 반도체 공정장비들을 사용함으로써 cross-contamination을 유발시킬 수 있다. 특히, copper(Cu)는 확산이 쉽게 되어 cross-contamination에 의해 수 ppm정도가 wafer에 오염되더라도 트랜지스터의 leakage current발생 요인으로 작용할 수 있기 때문에 Si-IC성능에 치명적인 영향을 미칠 수 있는데, Si-LSI 실험실에서 할 수 있는 공정과 Si-LSI 실험실을 나와 할 수 있는 공정으로 구분하여 최대한 Si-LSI 장비를 공유함으로써 최소한의 장비로 Cu cross-contamination문제를 해결할 수 있다. 즉, 전기도금을 할 때 전극으로 사용되어지는 TiW/Al sputtering, photoresist (PR) coating, solder bump형성을 위한 via형성까지는 Si-LSI 실험실에서 하고, 독립적인 다른 실험실에서 Cu-seed sputtering, solder 전기도금, 전극 etching, reflow공정을 하면 된다. 두꺼운 PR을 얻기 위하여 PR을 수회 도포(multiple coaling) 하고, 유기산 주석과 유기산 연의 비를 정확히 액 조성함으로서 Sn:Pb의 조성비가 6 : 4인 solder bump를 얻을 수 있었다. solder를 도금하기 전에 저속 도금으로 Cu를 도금하여, PR 표면의 Cu/Ti seed층을 via와 PR표면과의 저항 차를 이용하여 PR표면의 Cu-seed를 Cu도금 중에 etching 시킬 수 있다. 이러한 현상을 이용하여 선택적으로 via만 Cu를 도금하고 Ti층을 etching한 후, solder를 도금함으로써 저 비용으로 folder bump 높이가 60 $\mu\textrm{m}$ 이상 높고, 고 균일/고 밀도의 solder bump를 형성시킬 수 있었다.

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선택적으로 성장 시킨 다중 전극판을 갖는 다자유 IPMC 작동기 (MDOF Ionic-Polymer-Metal-Composite Actuators with Selectively Grown Multiple Electrodes)

  • 전진한;오일권
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2008년도 춘계학술대회논문집
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    • pp.294-298
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    • 2008
  • The ionic polymer-metal composite actuators with selectively grown multiple electrodes were developed to mimic the swimming locomotion of a fish. The developed method is based on combining electroplating with the electroless chemical reduction using the patterned mask. The advantages of this fabrication method are that the initial compositing between the polymer and platinum particles can be assured by the chemical reduction method, and the thickness of each electrode can be controlled easily and rapidly by electroplating. By using the fabricated actuator with a multiple degree of freedom, the oscillatory wave of the flexible membrane actuator was generated and a twisting motion was also realized to verify the possibility of mimicking the fish-like locomotion. The frequency response function was analyzed to investigate the natural frequency and the damping factor by a mechanical shaker and direct electrical excitation through the swept-sine method. Present results show that this novel method can be a promising technique to easily pattern each of multiple electrodes and to implement the biomimetic motion of the polymer actuators with good mechanical bending performance.

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Electrodeposition of Ni-W/Al2O3 Nano-Composites and the Influence of Al2O3 Incorporation on Mechanical and Corrosion Resistance Behaviours

  • M. Ramaprakash;R. Nivethida;A. Muthukrishnan;A. Jerom Samraj;M. G. Neelavannan;N. Rajasekaran
    • Journal of Electrochemical Science and Technology
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    • 제14권4호
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    • pp.377-387
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    • 2023
  • Ni-W/Al2O3 nano-composites were electrodeposited on mild steel substrate for mechanical and corrosion resistance applications. This study focused on the preparation of Ni-W/Al2O3 nano-composite coating with various quantity of Al2O3 incorporations. The addition of Al2O3 in the electrolytes were varied from 1-10 g/L in electrolytes and the Al2O3 incorporation in Ni-W/Al2O3 nano-composite coatings were obtained from 1.82 to 13.86 wt.%. The incorporation of Al2O3 in Ni-W alloy matrix influenced the grain size, surface morphology and structural properties were observed. The distributions of Al2O3 particle in alloy matrix were confirmed using electron microscopy (FESEM and TEM) and EDAX mapping analysis. The crystal structure informations were studied using X-ray diffraction method and it confirms that the deposits having cubic crystal structure. The better corrosion rate (0.87 mpy) and microhardness (965 HV) properties were obtained for the Ni-W/Al2O3 nano-composite coating with 13.86 wt.% of Al2O3 incorporations.

실리콘 태양전지 투명전극용 스크린 프린팅을 이용한 구리 도금 전극 패터닝 형성 (Formation of Copper Electroplated Electrode Patterning Using Screen Printing for Silicon Solar Cell Transparent Electrode)

  • 김경민;조영준;장효식
    • 한국재료학회지
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    • 제29권4호
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    • pp.228-232
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    • 2019
  • Copper electroplating and electrode patterning using a screen printer are applied instead of lithography for heterostructure with intrinsic thin layer(HIT) silicon solar cells. Samples are patterned on an indium tin oxide(ITO) layer using polymer resist printing. After polymer resist patterning, a Ni seed layer is deposited by sputtering. A Cu electrode is electroplated in a Cu bath consisting of $Cu_2SO_4$ and $H_2SO_4$ at a current density of $10mA/cm^2$. Copper electroplating electrodes using a screen printer are successfully implemented to a line width of about $80{\mu}m$. The contact resistance of the copper electrode is $0.89m{\Omega}{\cdot}cm^2$, measured using the transmission line method(TLM), and the sheet resistance of the copper electrode and ITO are $1{\Omega}/{\square}$ and $40{\Omega}/{\square}$, respectively. In this paper, a screen printer is used to form a solar cell electrode pattern, and a copper electrode is formed by electroplating instead of using a silver electrode to fabricate an efficient solar cell electrode at low cost.

도금폐수의 공동처리를 위한 공정개선에 관한 연구 (A Study of Improvement on Collaboration Treatment Method of Electroplating Wastewater)

  • 이내우;최재욱;안병환
    • 한국안전학회지
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    • 제12권4호
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    • pp.93-101
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    • 1997
  • A modified procedure for electroplating wastewater treatment using formaldehyde and hydrogen peroxide can destroy free cyanide. The representative diagram which is quite sensitive on reaction temperature is showed for this kinds of treatment. Principally free cyanide and some kinds of cyanide complex should be treated first, and then toxic heavy metals can be removed because cyanide component will be inhibited to remove other pollutants, if it is not destroyed perfectly. Formaldehyde and hydrogen peroxide are added in controlled amounts to cyanide treatment tank. Reasonable amounts of these chemicals are (HCHO/CN)=0.9 and ($H_2O_2/CN$)=1.1 in molar ratios, it is also variable on reaction temperature. Of course, actual treatment processes depending on plating material and chemical are good applicable, also to systematize operation manual for treating electroplating wastewater process, further works are desirable.

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Cr-C합금 도금층 제조 및 특성 연구 (The study on Cr-C alloy electroplating and its characteristics)

  • 김동수;김만;박상언;남기석;장도연;권식철;신동수
    • 한국표면공학회지
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    • 제34권1호
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    • pp.49-55
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    • 2001
  • The addition of organic compound containing -COOH, X$800_2$, -CHO group such as formic acid, formamide, formaldehyde or diethyleneamine to a chromium electroplating bath results in a chromium deposit in which carbon is incorporated. Such deposits have fewer defects than chromium layers produced by a conventional method. It was found that the as-deposited layers were amorphous and auger electron spectroscopy (AES) showed that carbon is distributed uniformly in the deposit. During heat treatment, Cr-C deposits began to crystallize at $400^{\circ}C$, and at $800^{\circ}C$ they were crystallized into chromium carbides and oxides. The effects of current density, amount of additives, applied current waveform on Cr-C alloy electroplating were examined.

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펄스도금법을 이용한 고내마모성 로듐 도금층 형성에 관한 연구 (Electroplating of High Wear Resistant Rhodium using Pulse Current Plating Method)

  • 이서향;이재호
    • 마이크로전자및패키징학회지
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    • 제26권2호
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    • pp.51-54
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    • 2019
  • 실리콘 기판상에 여러 조건의 전류밀도에서 로듐 도금을 실시하였다. 직류전원의 경우 전류밀도가 증가하면 로듐 표면에 균열이 발생하였다. 잔류응력을 낮추기 위하여 펄스전류를 인가하였다. 펄스전류의 off 시간이 도금층의 잔류응력을 낮추는데 영향을 주었다. 펄스전류의 인가 주기를 5:5로 하였을 경우 균열 없는 로듐 도금층을 얻었다.

오존에 의한 폐수처리에 관한 연구 -도금폐액의 CN이온 분해와 사진 폐수의 COD 처리- (Studies on the Decomposition of CN ion in the electroplating waste Water and COD Variation of photodeveloping Waste-water)

  • 김덕묵;이치종
    • 기술사
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    • 제14권1호
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    • pp.22-29
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    • 1981
  • This study concernes the decomposition of cyanide ion in electroplating plant wastewater and COD variation of photodeveloping wastewater under various conditions. Determinations of CN- concentration were carried out by AgNO$_3$ titration method. The sample solutions were pretreated by passing ozone and decompositions were checked as a function of time for ozone treatment. Analysis of film developing wastewater was carried out by KMnO$_4$ method. Electroplating plant wastewater was also examined at various pH; decomposition rate of cyanide ion was found to increase at higher pH. Time required for the decomposition could be shortened by removing the heavy metal ions under alkaline condition. The effect of temperature on decomposition was studied at 40$^{\circ}$ and 60$^{\circ}C$. The result was better at 40$^{\circ}C$ although time for decomposition was almost same at both temperatures. Analysis of film developing wastewater revealed that COD decrease was faster during the first 1 to 2 hours. However, further decrease could not be effected. The existence of unknown special organics resistant to the decomposition was believed to be the reason.

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