Abstract
This study concernes the decomposition of cyanide ion in electroplating plant wastewater and COD variation of photodeveloping wastewater under various conditions. Determinations of CN- concentration were carried out by AgNO$_3$ titration method. The sample solutions were pretreated by passing ozone and decompositions were checked as a function of time for ozone treatment. Analysis of film developing wastewater was carried out by KMnO$_4$ method. Electroplating plant wastewater was also examined at various pH; decomposition rate of cyanide ion was found to increase at higher pH. Time required for the decomposition could be shortened by removing the heavy metal ions under alkaline condition. The effect of temperature on decomposition was studied at 40$^{\circ}$ and 60$^{\circ}C$. The result was better at 40$^{\circ}C$ although time for decomposition was almost same at both temperatures. Analysis of film developing wastewater revealed that COD decrease was faster during the first 1 to 2 hours. However, further decrease could not be effected. The existence of unknown special organics resistant to the decomposition was believed to be the reason.