• 제목/요약/키워드: Electron emitter

검색결과 142건 처리시간 0.031초

The density control of carbon nanotubes using spin-coated nanoparticle and its application to the electron emitter with triode structure

  • Kim, Do-Yoon;Yoo, Ji-Beom;Berdinski, A.S.;Han, In-Taek;Kim, Ha-Jong;Jin, Yong-Wan;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1455-1458
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    • 2005
  • We studied the density control of carbon nanotubes (CNTs) which were grown on the iron nanoparticles prepared from iron-acetate $[Fe(II)(CH_3COO)_2]$ solution using freeze-dry method. The density of CNTs was controlled for the enhancement of field emission. The patterning process of iron-acetate catalyst-layer for the fabrication of electronic device was simply achieved by using alkaline solution, TMAH (tetramethylammonium hydroxide). We applied this patterning process of catalyst layer to formation of the electron emitter with under-gate type triode structure.

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A simulation study on vertical focusing in micro-tip FED

  • Lee, Chun-Gyioo;Jo, Sung-Ho;Ko, Tae-Young;Moon, Soo-Young;Yunsoo Choe
    • Journal of Korean Vacuum Science & Technology
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    • 제3권1호
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    • pp.30-32
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    • 1999
  • Electron beam trajectory simulation results on the high voltage FED with cone-type field emitters predict that the cross-talk phenomena would be seen due to the divergence of the electron beam. In this study, computer simulations with design of experiment technique and the SNU-FEAT program were carried out for five input parameters of the aperture focusing structure. The results tell that the focusing voltage is a dominant factor. And, the beam divergence index could be reduced to 10.7$\mu\textrm{m}$ with the aperture focusing structure, however, the operating voltage of the field emitter is predicted to increase by 40% maximum.

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Cost effective CNT-BLU

  • Han, In-Taek;Kim, Yong-Cheol;Kim, Ha-Jin;Kim, Young-Whan;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.145-147
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    • 2009
  • The cost effective structures and materials for the carbon nanotube (CNT) back light unit (BLU) are proposed. Simplified device structures and related electron emitter materials are prepared. CNT emitters were screen printed or remotely mounted on the back plate, and this enabled less than two photo patterning steps. Besides the cost benefits, operating voltage was dramatically decreased and higher current density was obtained

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수평 구조의 진공 자기 센서의 제작 및 특성 (Fabrication and Characterization of Lateral Vacuum Magnetic Sensor)

  • 남명우;홍미란;남태철
    • 센서학회지
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    • 제5권2호
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    • pp.9-14
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    • 1996
  • N 형의 실리콘 기판위에 수평형의 전계 방출 배열 구조를 갖는 진공 자기 센서를 제작하고 그의 자기적 특성을 측정하였다. 소자는 수평으로 구성된 팁 사이의 간격이 $10\;{\mu}m$인 100 개의 전계 방출 팁, 게이트 그리고 분리된 양극 구조로 이루어져 있다. 에미터 전극으로부터의 전자 방출 특성은 Fowler-Nordheim 턴널링 이론을 따른다. 제작된 센서는 좋은 직선 특성과 825 %/T 의 높은 감도를 보여주었다.

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자체적으로 진공을 갖는 수평형 전계 방출 트라이오드 (A novel in-situ vacuu encapsulted lateral field emitter triode)

  • 임무섭;박철민;한민구;최연익
    • 전자공학회논문지A
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    • 제33A권12호
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    • pp.65-71
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    • 1996
  • A novel lateral field emitter triode has been designed and fabricated. It has self-vacuum environmets and low turn-on voltage, so that the chief problems of previous field emission devices such as additional vacuum sealing process and high turn-on voltage are settled. An in-situ vaccum encapsulation empolying recessed cavities by isotropic RIE (reactive ion etch) method and an electron beam evaporated molybdenum vacuum seals are implemented to fabricate the new field emitter triode. The device exhibits low turn-on voltage of 7V, stabel current density of 2.mu.A/tip at V$_{AC}$ = 30V, and high transconductance (g$_{m}$) of 1.7$\mu$S at V$_{AC}$ = 22V. The superb device characteristics are probably due to sub-micron dimension device structure and the pencil type lateral cathode tip employing upper and lower LOCOS oxidation.

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탄소나노튜브를 이용한 고휘도 X-선원용 전자빔원 개발 (Development of an electron source using carbon nanotube field emittes for a high-brightness X-ray tube)

  • 김선규;허성환;조성오
    • 한국진공학회지
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    • 제14권4호
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    • pp.252-257
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    • 2005
  • 고휘도 마이크로빔 X-선원에 사용할 고휘도 전자빔원을 탄소나노튜브를 이용하여 설계, 제작하였다. 전자빔원은 탄소나노튜브 팁을 이용한 음극, 전자빔 인출용 그리드, 전자빔 가속용 양극으로 이루어진 삼극관 형태의 구조를 가진다. 설계된 휘도 값을 얻기 위하여 X-선 발생부에서의 전자빔 직경이 5 $\mu$m 이하, 빔전류가 약 30 $\mu$A 이상이 요구된다 이러한 요구조건을 만족시키기 위하여, EGUN Code를 이용하여 전자빔의 궤적 및 공간분포 등을 계산함으로써, 탄소나노튜브 팁 및 전자빔원의 구조 등을 최적화 하였다. 제작된 탄소나노튜브 팁은 직경 200 $\mu$m 의 텅스텐 와이어를 전기화학적으로 에칭하여 그 끝을 뽀족하게 만든 뒤 텅스텐의 끝 부분에 탄소나 노튜브를 화학기상법으로 증착하여 제작하였다. 제작된 탄소나노튜브를 이용하여 전자빔 인출실험을 수행하였다. 개발 중인 탄소나노튜브 팁을 이용한 고휘도 전자빔원의 설계 특성 및 기초 실험결과를 보고한다.

Characteristics of Electron Beam Extraction in Large Area Electron Beam Generator

  • Woo, Sung-Hun;Lee, Hong-Sik
    • KIEE International Transactions on Electrophysics and Applications
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    • 제4C권1호
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    • pp.10-14
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    • 2004
  • A large area electron beam generator has been developed for industrial applications, for example, waste water cleaning, flue gas treatment, and food pasteurization. The operational principle is based on the emission of secondary electrons from the cathode when ions in the plasma contact the cathode, which are accelerated toward the exit window by the gradient of the electric potential. Conventional electron beam generators require an electron beam scanning mechanism because a small area thermal electron emitter is used. The electron beam of the large area electron beam generator does not need to be scanned over target material because the beam area is considerable. We have fabricated a large area electron beam generator with peak energy of 200keV, and a beam diameter of 200mm. The electron beam current has been investigated as a function of accelerating voltage and distance from the extracting window while its radial distribution in front of the extracting window has been also measured.

원추형 금속 기판의 팁 각도에 따른 탄소 나노튜브 이미터의 전계방출 특성 (Field-emission characteristics of carbon nanotube emitters in terms of tip angles of conical-type metal substrates)

  • 김종필;노영록;장한빛;박진석
    • 반도체디스플레이기술학회지
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    • 제10권2호
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    • pp.115-119
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    • 2011
  • A tip-type carbon nanotube(CNT)-based field emitter was studied to consider it as electron source for micro-focused x-ray tube. The CNT was grown directly on a metal (tungsten) substrate by using an inductively coupled plasma-chemical vapor deposition (ICP-CVD) method. Prior to CNT growth, the metal substrate was etched to have various tip angles from $10^{\circ}$ to $180^{\circ}C$ (flat-type). The morphologies and microstructures of all the grown CNTs were analyzed via field-emission SEM. Furthermore, the effects of substrate tip-angles on the emission properties of CNT-based field emitters were characterized to estimate the maximum current density, the turn-on voltage, and the spatial distribution of electron beams. Prolonged long-term stability testing of the CNT emitters was also performed. All the experiment results obtained from this study indicated why a tip-type CNT emitter, compared with a flat-type CNT emitter, would be more desirable for a micro-focused x-ray system, in terms of the emission current level, the focused beam area, and the emission stability.

Pt/Ti 전극을 사용한 산하된 다공질 폴리 실리콘 전계방출소자의 특성 (The field emission characteristics of an oxidized porous polysilicon field emitter using Pt/Ti emitter-electrode)

  • 한상국;박근용;최시영
    • 대한전자공학회논문지SD
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    • 제42권6호
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    • pp.23-30
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    • 2005
  • 본 논문에서는 다양한 에미터 금속 재료를 이용하여 산화된 다공질 폴리실리콘(Oxidized Porous Poly-Silicon) 전계방출 소자를 제조하였으며 에미터 금속의 열처리 효과가 산화된 다공질 폴리실리콘 전계방출소자의 특성에 미치는 영향을 조사하였다. 다양한 에미터 금속 중 구동전극을 가진 Pt/Ti 에미터 전극을 $300^{\circ}C$-1hr 열처리한 경우 전자방출 효율은 $V_{ps}$=12 V에서 최대 $2.98\%$의 효율을 나타내었으며, $350^{\circ}C$-1hr 열처리한 경우 $V_{ps}$=16V에서 $3.37\%$의 가장 높은 효율을 나타내었다. 이는 열처리 공정을 통해 OPPS 전계방출 소자 표면에 다수의 결정립 경계와 무수히 많은 미세한 다공질 간의 흡착성의 개선으로 인한 면 저항 감소에 의한 것을 알 수 있다. OPPS 전계 방출 소자를 디스플레이소자로 적용하기 위해 형광체 발광 특성을 조사해 본 결과, $900^{\circ}C$-50min 산화 후 Pt/Ti(5nm/2nm) 에미터 전극을 사용하여 제조된 OPPS 전계 방출 소자의 경우 15 V에서 3600 cd/$m^2$, 20 V에서 6260 cd/$m^2$의 상대적으로 높은 휘도를 나타내었다. 열처리는 Ti층과 OPPS 간의 흡착성을 개선시키고 에미터 전극에 고른 전계를 가하는 중요한 역할을 한다.

비정질 n형 Si 박막을 이용한 자기터널링 트랜지스터 제작과 특성 (Fabrication and Characteristics of Magnetic Tunneling Transistors using the Amorphous n-Type Si Films)

  • 이상석;이진용;황도근
    • 한국전기전자재료학회논문지
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    • 제18권3호
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    • pp.276-283
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    • 2005
  • Magnetic tunneling transistor (MTT) device using the amorphous n-type Si semiconductor film for base and collector consisting of the [CoFe/NiFe](free layer) and Si(top layer) multilayers was used to study the spin-dependent hot electron magnetocurrent (MC) and tunneling magnetoresistance (TMR) at room temperature. A large MC of 40.2 % was observed at the emitter-base bias voltage ( $V_{EB}$ ) of 0.62 V. The increasing emitter hot current and transfer ratio ( $I_{C}$/ $I_{E}$) as $V_{EB}$ are mainly due to a rapid increase of the number of conduction band states in the Si collector. However, above the $V_{EB}$ of 0.62 V, the rapid decrease of MC was observed in amorphous Si-based MTT because of hot electron spin-dependent elastic scattering across CoFe/Si interfaces.