• Title/Summary/Keyword: Edge Breakdown

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Vortex Interaction Characteristics of a Delta Wing/LEX (삼각날개/LEX에서의 와류 상호작용 특성)

  • 이기영;손명환
    • Journal of the Korea Institute of Military Science and Technology
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    • v.5 no.3
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    • pp.77-86
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    • 2002
  • An experimental study of the vortex interaction characteristics of a delta wing/LEX configuration was conducted in a wind tunnel using the micro water droplet and laser beam sheet visualization technique. The main focus of this study was to analyze the effect of the angle of attack and sideslip angle on the vortex interaction and vortex breakdown. These tests were accomplished at angles of attack between $16^{\circ}$ and $28^{\circ}$ and sideslip angle between $0^{\circ}$ and $-15^{\circ}$ at free-stream velocity of 6.2 m/s. Flow visualization data provide a description of the vortex interaction between LEX and wing vortices, and of the vortex breakdown. The introduction of LEX vortex stabilized the vortical flow, and delayed the vortex breakdown up to higher angle of attack. The vortex interaction and breakdown was promoted on the windward side, whereas they are suppressed on the leeward side.

A Study on Breakdown Voltage Improvement of the Trench IGBT by Extending a Gate Oxide Region beneath the Trench Gate (트렌치 케이트 하단의 게이트 산화막 확장을 통한 트렌치 IGBT의 항복전압 향상에 대한 연구)

  • Lee, Jae-In;Kyoung, Sin-Su;Choi, Jong-Chan;Sung, Man-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.74-75
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    • 2008
  • TIGBT has some merits which are lower on-state voltage drop and smaller cell pitch, but also has a defect which is relatively lower breakdown voltage in comparison with planar IGBT. This lower breakdown voltage is due to the electric field which is concentrated on beneath the vertical gate. Therefore in this paper, new trench IGBT structure is proposed to improve breakdown voltage In the new proposed structure, a narrow oxide beneath the trench gate edge where the electric field is concentrated is extended into rectangular shape to decrease the electric field. As a result, breakdown voltage is improved to 23%.

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Analysis of the relationship between breakdown voltage and defect of thyristor (사이리스터의 결함과 항복전압의 관계 분석)

  • Lee, Y.J.;Seo, K.S.;Kim, H.W.;Kim, K.H.;Kim, S.C.;Kim, N.K.;Kim, B.C.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.149-150
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    • 2005
  • Thyristor breakdown voltage variation acceleration aging test was investigated. The breakdown voltage was deceased after 1000 hours acceleration aging test. It temperature rising caused by electric field concentration at the edge beveling region of the thyristor was confirmed using Silvaco device simulation. The local temperature rising is driving force for the defect propagation. Consequently, propagated defects of the beveling region seems to decrease thyristor's breakdown voltage.

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Diamond Schottky Barrier Diodes With Field Plate (필드 플레이트가 설계된 다이아몬드 쇼트키 장벽 다이오드)

  • Chang, Hae Nyung;Kang, Dong-Won;Ha, Min-Woo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.66 no.4
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    • pp.659-665
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    • 2017
  • Power semiconductor devices required the low on-resistance and high breakdown voltage. Wide band-gap materials opened a new technology of the power devices which promised a thin drift layer at an identical breakdown voltage. The diamond had the wide band-gap of 5.5 eV which induced the low power loss, high breakdown capability, low intrinsic carrier generation, and high operation temperature. We investigated the p-type pseudo-vertical diamond Schottky barrier diodes using a numerical simulation. The impact ionization rate was material to calculating the breakdown voltage. We revised the impact ionization rate of the diamond for adjusting the parallel-plane breakdown field at 10 MV/cm. Effects of the field plate on the breakdown voltage was also analyzed. A conventional diamond Schottky barrier diode without field plate exhibited the high forward current of 0.52 A/mm and low on-resistance of $1.71{\Omega}-mm$ at the forward voltage of 2 V. The simulated breakdown field of the conventional device was 13.3 MV/cm. The breakdown voltage of the conventional device and proposed devices with the $SiO_2$ passivation layer, anode field plate (AFP), and cathode field plate (CFP) was 680, 810, 810, and 1020 V, respectively. The AFP cannot alleviate the concentration of the electric field at the cathode edge. The CFP increased the breakdown voltage with evidences of the electric field and potential. However, we should consider the dielectric breakdown because the ideal breakdown field of the diamond is higher than that of the $SiO_2$, which is widely used as the passivation layer. The real breakdown voltage of the device with CFP decreased from 1020 to 565 V due to the dielectric breakdown.

4H-SiC Curvature VDMOSFET with 3.3kV Breakdown Voltage (3.3kV 항복 전압을 갖는 4H-SiC Curvature VDMOSFET)

  • Kim, Tae-Hong;Jeong, Chung-Bu;Goh, Jin-Young;Kim, Kwang-Soo
    • Journal of IKEEE
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    • v.22 no.4
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    • pp.916-921
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    • 2018
  • In this paper, we analyzed the power MOSFET devices for high voltage and high current operation. 4H-SiC was used instead of Si to improve the static characteristics of the device. Since 4H-SiC has a high critical electric field due to wide band gap, 4H-SiC is more advantageous than Si in high voltage and high current operation. In the conventional VDMOSFET structure using 4H-SiC, the breakdown voltage is limited due to the electric field crowding at the edge of the p-base region. Therefore, in this paper, we propose a Curvature VDMOSFET structure that improves the breakdown voltage and the static characteristics by reducing the electric field crowding by giving curvature to the edge of the p-base region. The static characteristics of conventional VDMOSFET and curvature VDMOSFET are compared and analyzed through TCAD simulation. The Curvature VDMOSFET has a breakdown voltage of 68.6% higher than that of the conventional structure without increasing on-resistance.

The Effect of thin Stepped Oside Structure Along Contact Edge on the Breakdown Voltage of Al-nSi Schottky Diode (Al-nSi 쇼트키 다이오드의 접합면 주위의 얇은 계단형 산화막 구조가 항복 전압에 미치는 영향)

  • 장지근;김봉렬
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.20 no.3
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    • pp.33-39
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    • 1983
  • New Schottky devices with thin stepped oxide layer (about 1000 ${\AA}$) along the edge of metal-semiconductor junction have been designed and fabricated. The breakdown voltages of these diodes have been compared with those of conventional metal overlap and P guard ring Schottky diode structures. Thin stepped oxide layer has been grown by the process of T.C.E. oxidation. In order to compare and demonstrate the improved down phenomena of these devices, conventional metal overlap diode and P guard ring which have the same dimension with new devices have also been integrated in a same New Schottty devices structured with thin stepped oxide layer have shown significant improvement in breakdown phenomena compared with conventional diodes.

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Evaluation of Breakdown Strength on the Locally Dented Power Cable (초고압 XLPE 케이블의 국부적 늘림에 대한 파괴강도 고찰)

  • Kim, Y.H.;Lee, S.J.;Cho, D.H.
    • Proceedings of the KIEE Conference
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    • 2001.11a
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    • pp.251-254
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    • 2001
  • Internal and external forces may be applied on the power cable in the both process of transportation and installation. Even though the EHV power cables have the structure of metal sheath and plastic jacket etc. to minimize these negative influences, the unusual forces result in the unexpected deformation of the cable. Compressing moulded XLPE model cable sheets were prepared and locally dented with round-edge and square-edge tools. All data were analyzed employing Weibull distribution. The breakdown strength of dented molded specimens showed lower values than the normal ones by 10-60%.

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Analytical Calculation for the Breakdown Voltage of the Punchthrough Diode with Cylindrical Junction Edge (원통형 접합경계를 갖는 punchthrough 다이오드의 항복전압에 대한 해석적 계산)

  • Kim, Doo-Young;Kim, Han-Soo;Choi, Yearn-Ik;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1448-1450
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    • 1994
  • The breakdown voltages of punchthrough-mode diodes with cylindrical junction are analytically calculated, The proposed method, which is based on th Gauss's law, estimates the lateral expansion of the depletion region as well as the electric field and the charge distribution. The proposed method is given in terms of epitaxial layer width, the epitaxial layer doping concentration, and curvature radius of the junction edge. The calculation results agree well with the MEDICI simulation results for various device parameters.

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An analysis of new IGBT(Insulator Gate Bipolar Transistor) structure having a additional recessedwith E-field shielding layer

  • Yu, Seung-Woo;Lee, Han-Shin;Kang, Ey-Goo;Sung, Man-Young
    • Journal of IKEEE
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    • v.11 no.4
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    • pp.247-251
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    • 2007
  • The recessed gate IGBT has a lower on-state voltage drop compared with the DMOS IGBT, because there is no JFET resistance. But because of the electric field concentration in the corner of the gate edge, the breakdown voltage decreases. This paper is about the new structure to effectively improve the Vce(sat) voltage without breakdown voltage drop in 1700V NPT type recessed gate IGBT with p floating shielding layer. For the fabrication of the recessed gate IGBT with p floating shielding layer, it is necessary to perform the only one implant step for the shielding layer. Analysis on the Breakdown voltage shows the improved values compared to the conventional recessed gate IGBT structures. The result shows the improvement on Breakdown voltage without worsening other characteristics of the device. The electrical characteristics were studied by MEDICI simulation results.

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The Research of Deep Junction Field Ring using Trench Etch Process for Power Device Edge Termination

  • Kim, Yo-Han;Kang, Ey-Goo;Sung, Man-Young
    • Journal of IKEEE
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    • v.11 no.4
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    • pp.235-238
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    • 2007
  • The planar edge termination techniques of field-ring and deep junction field-ring were investigated and optimized using a two-dimensional device simulator TMA MEDICI. By trenching the field ring site which would be implanted, a better blocking capability can be obtained. The results show that the p-n junction with deep junction field-ring can accomplish near 30% increase of breakdown voltage in comparison with the conventional field-rings. The deep junctionfield-rings are easy to design and fabricate and consume same area but they are relatively sensitive to surface charge. Extensive device simulations as well as qualitative analyses confirm these conclusions.

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