• Title/Summary/Keyword: Drain Noise

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Excess Vibration Phenomena and Soundness of Drain Piping in Moisture Separator Reheat Exchanger (습분 분리 재열기 배수배관의 과도진동과 배관 건전성)

  • Kim, Yeon-Whan;Kim, Hee-Soo;Bae, Yong-Chae;Lee, Hyun;Lee, Young-Shin
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2001.05a
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    • pp.393-398
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    • 2001
  • Pulsations, vibration and stress are the basic dynamic phenomena in power plant piping systems which directly affect system reliability. These phenomena are both acoustical and mechanical in nature and are closely interrelated. It was noticed that thermodynamic parameters were changed after replacing with new type tube bundles of reheat exchanger. It was reported later that the drain piping connecting the new bundle header with the associated drain tank is regularly pulsating at about every 3 second with 13.4㎐ and 7.5mm, p-p in amplitude. This amplitude is about 6 times higher than reference level of sound piping. The results of finite element analysis of the pipeline showed that its dominant natural frequency is 13.4㎐. The soundness is predicted whether the bending dynamic stress evaluated excesses the maximum allowable high cycle fatigue stress or not by the measured amplitude of vibration.

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Extraction and Analysis of Dual Gate FET Noise Parameter for High Frequency Modeling (고주파모델링을 위한 이중게이트 FET의 열잡음 파라미터 추출과 분석)

  • Kim, Gue-Chol
    • The Journal of the Korea institute of electronic communication sciences
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    • v.8 no.11
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    • pp.1633-1640
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    • 2013
  • In this paper, noise parameters for high frequency modeling of dual-gate FET are extracted and analyzed. To extract thermal noise parameter of dual gate, noise characteristics are measured by changing input impedance of noise source using Tuner, and the influence of pad parasitic elements are subtracted using open and short dummy structure. Measured results indicated that the dual-gate FET is improved the noise figure by 0.2dB compared with conventional cascode structure FET at 5GHz, and it confirmed that the noise figure has dropped due to reduction of capacitances between the drain and source, gate and drain by simulation and analysis of small-signal parameters.

Vibration Reducing Method for High Pressure Feedwater Heater Drain Piping System (고압급수가열기 배수계통 배관계 고진동 해소방안 연구)

  • Lee, Wook-Ryun;Lee, Jun-Shin;Kim, Sang-Bok;Hong, Soon-Bup;Shin, Yong-Woo
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2006.05a
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    • pp.1290-1295
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    • 2006
  • The 120 meters high pressure feedwater heater drain piping in nuclear power plant had been suffered by excessive vibration from the beginning of power generation. As time goes by, the piping vibration was beyond the allowable limit and an appropriate countermeasure was required to prevent the fatigue failure of the pipeline from the abnormal vibration. In this study, the vibrational characteristics of high pressure feedwater heater drain piping and the countermeasure for abnormal vibration were investigated. Among the several vibration reduction methods, the piping layout changed by making the smooth pipeline was applied to the high Pressure feedwater heater drain piping in nuclear Power plant. Applying the countermeasure, the vibration level was found to reduce over 54 percents and was satisfied under the allowable velocity at the full-power operation condition.

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Impact of Trap Position on Random Telegraph Noise in a 70-Å Nanowire Field-Effect Transistor

  • Lee, Hyunseul;Cho, Karam;Shin, Changhwan;Shin, Hyungcheol
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.185-190
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    • 2016
  • A 70-${\AA}$ nanowire field-effect transistor (FET) for sub-10-nm CMOS technology is designed and simulated in order to investigate the impact of an oxide trap on random telegraph noise (RTN) in the device. It is observed that the drain current fluctuation (${\Delta}I_D/I_D$) increases up to a maximum of 78 % due to the single electron trapping. In addition, the effect of various trap positions on the RTN in the nanowire FET is thoroughly analyzed at various drain and gate voltages. As the drain voltage increases, the peak point for the ${\Delta}I_D/I_D$ shifts toward the source side. The distortion in the electron carrier density and the conduction band energy when the trap is filled with an electron at various positions in the device supports these results.

Low-frequency Noise Characteristics of Si0.8Ge0.2 pMOSFET Depending upon Channel Structures and Bias Conditions (채널구조와 바이어스 조건에 따른 Si0.8Ge0.2 pMOSFET의 저주파잡음 특성)

  • Choi Sang-Sik;Yang Hun-Duk;Kim Sang-Hoon;Song Young-Joo;Lee Nae-Eung;Song Jong-In;Shim Kyu-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.1
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    • pp.1-6
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    • 2006
  • High performance $Si_{0.8}Ge_{0.2}$ heterostructure metal-oxide-semiconductor field effect transistors (MOSFETs) were fabricated using well-controlled delta-doping of boron and $Si_{0.8}Ge_{0.2}$/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe pMOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^{-1}$ However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}_10^{-2}$ in comparison with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

Low-Frequency Noise Characteristics of SiGe pMOSFET Depending upon Channel Structures and Bias Conditions (SiGe pMOSFET의 채널구조와 바이어스 조건에 따른 잡음 특성)

  • Choi, Sang-Sik;Yang, Hun-Duk;Kim, Sang-Hoon;Song, Young-Joo;Cho, Kyoung-Ik;Kim, Jeonng-Huoon;Song, Jong-In;Shim, Kyu-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.5-6
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    • 2005
  • High performance SiGe heterostructure metal-oxide-semiconductor field effect transistors(MOSFETs) were fabricated using well-controlled delta-doping of boron and SiGe/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe MOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^1$. However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}\sim10^{-2}$ in comparion with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

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Effect of Leakage on the Noise Reduction Characteristics of Helmholtz Resonator (누출이 헬름홀츠 공명기의 소음저감 특성에 미치는 영향)

  • Lee, Il-Jae
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.19 no.6
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    • pp.634-640
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    • 2009
  • Helmholtz resonator has been used, especially in intake and exhaust systems of vehicles, due to its good noise reduction characteristics at low frequencies. Many approaches have been developed to predict the acoustic behavior of the resonator with the assumption that there is no leakage from the resonator. However, its behavior may be affected by leakage which may exist in manufacturing processes or on purpose. This study investigates the effect of leakage on the noise reduction characteristics of Helmholtz resonator with two practical examples. One is a resonator with a gap between baffle and housing of the resonator and the other one is a resonator with two drain holes on the baffle. The measured transmission loss shows that the resonance frequencies are considerably shifted to higher frequency due to the leakage. The Boundary Element Method was applied to predict the transmission loss of the Helmholtz resonator with drain holes. The comparison between the measured and predicted transmission loss shows that the acoustic impedance of the holes is essential for accurate predictions of the transmission loss.

A Gain and NF Dynamic Controllable Wideband Low Noise Amplifier (이득과 잡음 지수의 동적 제어가 가능한 광대역 저 잡음 증폭기)

  • Oh, Tae-Soo;Kim, Seong-Kyun;Huang, Guo-Chi;Kim, Byung-Sung
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.20 no.9
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    • pp.900-905
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    • 2009
  • A common drain feedback CMOS wideband LNA with current bleeding and input inductive series-peaking techniques is presented in this paper. DC coupling is adopted between cascode and feedback amplifiers, so that the gain and NF of the LNA can be dynamically controlled by adjusting the bleeding current. The fabricated LNA shows the bandwidth of 2.5 GHz. The high gain mode shows 17.5 dB gain with $1.7{\sim}2.8\;dB$ NF and consumes 27 mW power and the low gain mode has 14 dB gain with $2.7{\sim}4.0\;dB$ NF and dissipates 1.8 mW from 1.8 V supply.

A Transformer Feedback CMOS LNA for UWB Application

  • Jeon, Ji Yeon;Kim, Sang Gyun;Jung, Seung Hwan;Kim, In Bok;Eo, Yun Seong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.6
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    • pp.754-759
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    • 2016
  • A transformer feedback low-noise amplifier (LNA) is implemented in a standard $0.18{\mu}m$ CMOS process, which exploits drain-to-gate transformer feedback technique for wideband input matching and operates across entire 3~5 GHz ultra-wideband (UWB). The proposed LNA achieves power gain above 9.5 dB, input return loss less than 15.0 dB, and noise figure below 4.8 dB, while consuming 8.1 mW from a 1.8-V supply. To the authors' knowledge, drain-to-gate transformer feedback for wideband input matching cascode LNA is the first adopted technique for UWB application.

1/f Noise Characteristics of N-MOSFETS fabricated by BiCMOS process (BiCMOS공정 N-MOSFET 소자의 1/f 잡음특성)

  • Koo, Hoe-Woo;Lee, Kie-Young
    • Journal of IKEEE
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    • v.3 no.2 s.5
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    • pp.226-235
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    • 1999
  • To investigate SPICE noise model and the behavior of its parameters, 1/f noise of NMOS devices fabricated by BiCMOS process is measured and compared to the various noise models and measured results. For the long channel devices, bias dependence of the drain current noise power spectral density $S_{Id}$ of NMOS is similar to the previous results. Equivalent gate noise power spectral density $S_{Vg}$ shows weak dependence on the gate and drain voltages in long channel NMOS as the previous results. However, it is shown that most of published noise models are difficult to apply to short channel devices. Therefore, in this study, with comparison of our experimental results, we have tried to find the model of 1/f noise, appropriate for our NMOS device fabricated by BiCMOS process.

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