• Proceedings of the KIEE Conference
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• 1994.11a
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• pp.385-387
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• 1994

Optical interconnections are more attractive than electronic interconnections because of their higher speed, freedom from planar constraints, immunity to electromagnetic interference effects and higher interconnection capacity. Volume hologram is one of the best way to implement optical interconnections. Diffraction efficiency and crosstalk effect are very important things for ensuring independent interconnections. Recently, a general systematic method that can handle a large number of superposed volume gratings in anisotropic host material is presented. In this study for numerical analysis of diffraction, above method is programmed in general form near Bragg angle. Diffraction orders for variation of grating strength are determined by comparing with the coupled-mode method. The effects of parameter variation are considered. Parameters include vertical and azimuthal incident angle, wavelength and interaction length. Diffraction analyses are also performed for intra-mode and inter-mode diffractions.

• Korean Journal of Optics and Photonics
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• v.15 no.1
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• pp.56-62
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• 2004

We present a diffraction grating interferometer of large equivalent wavelength specially designed for flatness testing of rough surfaces. Two transmission diffraction gratings are illuminated on the object under test by use of two measurement beams with different angles of incidence, which yields a large equivalent wavelength. This interferometer design minimizes unnecessary diffraction rays and the systematic error caused by the diffraction gratings, and provides a large working distance and easy alignment. To improve the measurement accuracy, phase shifting technique is applied and the equivalent wavelength error caused by defocus is calibrated. Test results obtained from mirror surfaces and machined rough surfaces are discussed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.1029-1032
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• 2004

This paper investigates that how diffraction efficiency is going to change according to amorphous As-Ge-Se-S. We made films such as $\lambda$, $\lambda/2$, $\lambda/4$, $\lambda/8$ on the basis of 633nm, which is wavelength of recording laser(He-Ne). Among them, $\lambda/4$ has the highest diffraction efficiency value, while $\lambda/8$ has the lowest. The experiment shows that the highest diffraction efficiency value of $\lambda/4$ is about 0.09%, whereas diffraction efficiency of $\lambda/8$ is formed, which is merely close to 0%.

• Laser Solutions
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• v.9 no.3
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• pp.1-5
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• 2006

Diffraction grating is the optical device which has periodic pattern. Decorative logotypes is the one of application of diffraction grating. In this paper diffraction grating for decorative logotype is fabricated by dot pattern in stead of line pattern. A metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps Nd:YVO4 laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate dot patterns. In order to minimize the dot diameter, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application

• Journal of Gifted/Talented Education
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• v.12 no.4
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• pp.120-130
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• 2002

We have analyzed students' reports on a problem for 'adhesive tape' and 'fractal diffraction' among ten assigned problems in the first Korean youth physics tournament (KYPT). There were three high school team' s reports and one middle school team' s report on this problem. However, many students failed to solve the 'fractal diffraction' problem correctly due to having no idea of fractal. This problem was found to be most difficult one for the participated students among ten assigned problems given in the first KYPT.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.7
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• pp.354-358
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• 2006

In this paper, we investigated the selective etching rate of amorphous As-Ge-Se-S thin film due to the photoexpansion effect and fabricated the 2-dimensional embossing type diffraction grating hologram. We measured the thickness change with the etching time among NaOH solution after forming 1-dimension diffraction grating. As a results, we found that the selective etching rate were $2.5\AA/s,\;3.3\AA/s,\;3.9\AA/s$ where NaOH solution concentration were 0.26N, 0.33N, 0.36N, respectively. Also after the formation of 2-dimensional diffraction grating by the $90^{\circ}$ degree of circulation on the formed 1-dimensional diffraction grating, we etched selectively during 60sec, among 0.26N NaOH solution and obtained 2-dimensional embossing diffraction grating. As the results of AFM (Atomic Force Microscopy), we confirmed the formation of distinct embossing type 2-dimensional diffraction grating hologram, successfully.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2006.11a
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• pp.114-117
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• 2006

Diffraction grating is the optical device which has periodic pattern. Decorative logotypes is the one of application of diffraction grating. In this paper diffraction grating for decorative logotype is fabricated by dot pattern in stead of line pattern. A metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps $Nd:YVO_4$ laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate dot patterns. In order to minimize the dot diameter, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.55-56
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• 2006

We investigated the diffraction grating efficiency by the DPSS laser beam wavelength to improve the diffraction efficiency on AsGeSeS & Ag/ AsGeSeS thin film. Diffraction efficiency was obtained from DPSS(532nm)(P:P)polarized laser beam on AsGeSeS, Ag/ AsGeSeS and AsGeSeS/Ag/AsGeSeS thin films. As a result, for the laser beam intensity, 0.24 mW, single AsGeSeS thin film shows the highest value of 0.161% diffraction efficiency at 300 s and for 2.4 mW, it was recorded with the fastest speed of 50 s, which the diffraction grating forming speed is faster than that of 0.24 mW beam. Ag/ AsGeSeS and AsGeSeS/ Ag/ AsGeSeS multi-layered thin film also show the faster grating forming speed at 2.4 mW and higher value of diffraction efficiency at 0.24 mW.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.490-493
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• 2003

We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}/Ag$ double-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under non-polarization state and p-polarization state and we confirm that the diffraction efficiency depend on thickness of Ag. The diffraction efficiency was obtained by first order intensity. We got the maximum diffraction efficiency that thickness of Ag was $600{\AA}$. The maximum diffraction efficiency was 13.5% in (P:P) polarization state.

• Korean Journal of Optics and Photonics
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• v.14 no.6
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• pp.643-648
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• 2003

The phase-shifting diffraction-grating interferometer proposed in the investigation uses a diffraction grating that performs manifold functions of beam splitting, beam recombination, and phase shifting. The reference and measurement waves generated by means of diffraction have different amplitudes depending on their orders of diffraction, so the interference fringe pattern resulting from the two waves tends to yield poor visibility. To cope with this problem, we select a phase grating of reflection type and attempt to improve the interference visibility with optimization of the groove shape of the grating through electromagnetic analysis.