• 제목/요약/키워드: D-GaIN

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PCS영 GaAs VCO/Mixer MMIC 설계 및 제작에 관한 연구 (Design and fabrication of GaAs MMIC VCO/Mixer for PCS applications)

  • 강현일;오재응;류기현;서광석
    • 전자공학회논문지D
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    • 제35D권5호
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    • pp.1-10
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    • 1998
  • A GaAs MMIC composed of VCO (voltage controlled oscillator) and mixer for PCS receiver has been developed using 1.mu.m ion implanted GaAs MESFET process. The VCO consists of a colpitts-type oscillator with a dielectric resonator and the circuit configuration of the mixer is a dual-gate type with an asymmetric combination of LO and RF FETs for the improvement of intermodulation characteristics. The common-source self-biasing is used in all circuits including a buffer amplifier and mixer, achieving a single power supply (3V) operation. The total power dissipation is 78mW. The VCO chip shows a phase noise of-99 dBc/Hz at 100KHz offset. The combined VCO/mixer chip shows a flat conversion gain of 2dB, the frequency-tuning factor of 80MHz/volts in the varacter bias ranging from 0.5V to 0.5V , and output IP3 of dBm at varactor bias of 0V. The fabricated chip size is 2.5mm X 1.4mm.

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광경로 시뮬레이션을 이용한 GaN-LED칩의 광추출 효율 분석 (Analysis of the extraction efficiency in GaN-light emitting diodes using ray tracing simulation)

  • 이진복;윤상호;김동운;최창환
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.575-576
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    • 2006
  • It was analyzed qualitatively the light extraction in GaN-on-sapphire LEDs based on a simple model. The light extraction efficiency in the LEDs is simulated numerically by using ray tracing method. In the present study, the extraction efficiency was simulated on three different types of LEDs, which a have a different pattered sapphire substrate. And, the role of the patterned sapphire substrate are analyzed and discussed. Based on the analysis, the improvements of extraction efficiency in the LED structures were discussed and these analyses are helpful in the design of high brightness GaN LEDs.

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6-GHz-to-18-GHz AlGaN/GaN Cascaded Nonuniform Distributed Power Amplifier MMIC Using Load Modulation of Increased Series Gate Capacitance

  • Shin, Dong-Hwan;Yom, In-Bok;Kim, Dong-Wook
    • ETRI Journal
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    • 제39권5호
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    • pp.737-745
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    • 2017
  • A 6-GHz-to-18-GHz monolithic nonuniform distributed power amplifier has been designed using the load modulation of increased series gate capacitance. This amplifier was implemented using a $0.25-{\mu}m$ AlGaN/GaN HEMT process on a SiC substrate. With the proposed load modulation, we enhanced the amplifier's simulated performance by 4.8 dB in output power, and by 13.1% in power-added efficiency (PAE) at the upper limit of the bandwidth, compared with an amplifier with uniform gate coupling capacitors. Under the pulse-mode condition of a $100-{\mu}s$ pulse period and a 10% duty cycle, the fabricated power amplifier showed a saturated output power of 39.5 dBm (9 W) to 40.4 dBm (11 W) with an associated PAE of 17% to 22%, and input/output return losses of more than 10 dB within 6 GHz to 18 GHz.

X-선을 이용한 $Co_{1-x}Ga_x$ 합금계의 화학구조와 전자구조 (Chemical and Electronic structures of $Co_{1-x}Ga_x$ alloys by X-ray Analyses)

  • 유권국;이주열;지현배;이연승
    • 한국진공학회지
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    • 제13권2호
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    • pp.86-91
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    • 2004
  • 전이금속 갈라이드는 고온 응용성이 높은 물질로 관심을 모으고 있다. CsCl구조를 갖는 것으로 알려진 넓은 조성 범위에서 전이금속 갈라이드에 대해 물리적 특성과 전자구조의 상호관계에 대해 체계적인 연구를 하였다. $Co_{l-x}Ga$ $_{x}$ 합금($0.35\leq$x$\leq0.55$)을 arc-melting 방법으로 제작하였으며, 합금 제작 후 시료의 균질성을 높이기 위해 $1000 ^{\circ}C$에서 48시간동안 열처리하였다. 결정 구조를 알아보기 위해 x-ray diffraction을 측정한 결과, 이 조성 범위 안에서 모두 CsCl(B2)구조를 갖는 것으로 밝혀졌다. 화학적 상태와 전자 구조를 알아보기 위해서 x-선 광전자 분광, 그리고 x-선 흡수끝머리 부근 미세구조 (XANES)를 측정하였으며, 조성에 따라 서로 다른 물리적 특성을 보였다. 합금제작 과정에서 시료의 산화가 이루어졌으며 포함된 산소는 Ga과 결합하여 $Ga_2O_3$상을 이루었다. 전자 구조적으로 Co의 d 전자와 Ga의 p 전자사이의 p-d hybridization에 의해 합금이 형성되었다.

GaAs Hyperabrupt Junction 바랙터 다이오드와 리액턴스 정합을 이용한 Ka-Band 아날로그 위상변화기의 설계 (Design and fabrication of Ka-Band Analog Phase Shifter using GaAs Hyperabrupt Junction Varactor Diodes and Reactance Matching)

  • 조성익
    • 한국전자파학회논문지
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    • 제14권5호
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    • pp.521-526
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    • 2003
  • 본 논문에서는 Ka-band에 대한 반사형 아날로그 위상변화기의 설계 및 제작결과를 기술하였다. 큰 위상 변화를 가지기 위해서 병렬의 GaAs hyperabrupt junction 바랙터 다이오드와 리액턴스 정합 방법을 사용하였으며 이론적인 설계공식도 도출하였다. Ka-band에서는 조립과정도 중요하며 조립과정중 발생할 수 있는 기생성분을 최소화하기 위한 조립절차도 포함하였다. 제작결과는 Ka-Band에서 기존 것보다 큰 220$^{\circ}$$\pm$7$^{\circ}$ 가변의 위상변화와 삽입손실이 5 dB$\pm$1 dB를 가진 우수한 성능의 측정된 결과를 얻었다.

며느리배꼽 잎 유래 캘러스의 부정근 형성에 미치는 지베렐린의 작용 (Effect of Gibberellin on the Adventitious Root Formation from the Leaves-derived Calli in Persicaria perfoliata)

  • 김현;차현철
    • 생명과학회지
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    • 제25권4호
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    • pp.390-396
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    • 2015
  • 본 연구는 항산화 기능이 뛰어나다고 알려진 며느리배꼽(Persicaria perfoliata)의 캘러스를 사용하여, 어떤 식물호르몬이 부정근 형성에 영향을 미치는지 알아보기 위한 실험이다. 며느리배꼽의 잎으로부터 캘러스를 유도하고 이로부터 부정근 형성을 관찰하였다. 캘러스 유도의 최적 조건을 구한 결과 1% sucrose, 4.5 μM 2.4-D, 1/2 MS였다. 어떤 식물호르몬이 이 식물의 캘러스에서 부정근 형성 효과를 가지고 있는지 알아보기 위하여 GA3, IAA, 2iP, 2,4-D를 캘러스 조직에 각각 첨가한 결과, GA3와 IAA를 첨가한 배지에서만 부정근이 나타났음을 확인 할 수 있었다. 이를 자세히 조사하기 위해서 GA3와 IAA의 농도별(0.1, 1, 10 mg/l) 부정근 형성, 길이 및 직경을 알아본 결과, 높은 수준의 GA3 또는 낮은 수준의 IAA처리에서 더 많은 부정근 형성을 보였다. 이 두 호르몬 중 어떤 것이 더욱 더 중요한 역할을 하는지 알아보기 위하여 옥신 유입 저해제인 NPA와 지베렐린 생합성 저해제인 PBZ를 처리한 실험을 한 결과, GA3가 IAA 보다 부정근 형성에 더욱 더 중요한 역할이라는 것을 알았다. 하여 지베렐린의 수준을 증가 또는 감소시킨다고 알려진 식물호르몬(IAA, 2iP, kinetin, ABA)들을 GA3와 혼용 처리한 결과, 이 역시 지베렐린이 부정근을 형성하는데 중요한 역할을 한다는 것을 재확인 하였다. 본 연구는 지베렐린이 며느리배꼽의 캘러스에서 부정근 형성을 증진시킨다는 것을 처음으로 밝힌다.

인삼의 출아 및 생육 특성에 대한 생장조절물질의 영향 (Effects of the Growth Regulators on the Emergence and Growth of Panax ginseng C.A. Meyer)

  • 정찬문;안상득;권우생
    • 한국작물학회지
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    • 제30권4호
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    • pp.368-374
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    • 1985
  • 생장조절물질인 GA, Kinetin 및 2,4-D를 농도별로 처리하여 출아 및 생육특성을 조사하므로서 출아에 필요한 장기 저온기간의 단축 가능성을 탐색하였던 바 그 결과를 요약하면 다음과 같다. 1. 신아의 출아는 처리물질중 GA효과가 가장 컸으며 처리농도가 증가할수록 조기출아되어 출아기간이 단축되었고 출아율도 높았다. 2. GA처리는 지상부 생육을 크게 신장시켰으며 특히 경장 엽병장의 신장을 촉진시켰다. 3. GA 50ppm, 100ppm처리구는 근중을 크게 증가시켰다. 4. GA처리농도가 높을수록 조기에 지상부 생육이 완료되었다. 5. 뇌포제거구는 무제거구에 비하여 출아가 다소 빠른 경향이나 생육은 대체로 비슷하였다.

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5MHz-2GHz에서 동작하는 광대역 증폭기의 설계 및 제작

  • 박천석
    • 한국광학회:학술대회논문집
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    • 한국광학회 1990년도 제5회 파동 및 레이저 학술발표회 5th Conference on Waves and lasers 논문집 - 한국광학회
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    • pp.136-140
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    • 1990
  • A hybrid wideband amplifier having bandwidth from 5MHz to 2000MHz with a gain of 10db$\pm$3dB is designed and implemented by using a lossy matched network and GaAs FET. The implemented amplifier circuit operates as a capacitor-resistor(C-R) coupled amplifier circuit in the low frequency range (below 800 MHz) in which {{{{ LEFT $\mid$ S_{21 } RIGHT $\mid$ }} for the GaAs FET is constant. It also operates as a lossless impedance matching circuit in the microwave frequency range in which S21 for the GaAs FET has a slope of approximately -6dB/octave. Using this configuration technique, Two stage GaAs FET amplifier implemented is measured to 10dB gain within a 3dB fluctuation over the frequency band from 5 to 2000MHz.

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Ga/(In+Ga) 함량비에 따른 $Cu(In,Ga)Se_2$ 박막의 국소적 영역에서의 표면 퍼텐셜과 전류-전압 특성 연구 (Local surface potential and current-voltage behaviors of $Cu(In,Ga)Se_2$ thin-films with different Ga/(In+Ga) content)

  • 김지영;정아름;조윌렴;조현준;김대환;성시준;황대규;강진규;이동하
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2012년도 춘계학술발표대회 논문집
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    • pp.149-152
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    • 2012
  • $Cu(In,Ga)Se_2$ (CIGS) is one of the most promising photovoltaic materials because of large conversion efficiency which has been achieved with an optimum Ga/(In+Ga) composition in $CuIn_{1-x}Ga_xSe_2$ (X~0.3). The Ga/(In+Ga) content is important to determine band gap, solar cell performances and carrier behaviors at grain boundary (GB). Effects of Ga/(In+Ga) content on physical properties of the CIGS layers have been extensively studied. In previous research, it is reported that GB is not recombination center of CIGS thin-film solar cells. However, GB recombination and electron-hole pair behavior studies are still lacking, especially influence of with different X on CIGS thin-films. We obtained the GB surface potential, local current and I-V characteristic of different X (00.7 while X~0.3 showed higher potential than 100 mV on GBs. Higher potential on GBs appears positive band bending. It can decrease recombination loss because of carrier separation. Therefore, we suggest recombination and electron-hole behaviors at GBs depending on composition of X.

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Interface structure and anisotropic strain relaxation of nonpolar a-GaN on r-sapphire

  • 공보현;조형균;송근만;윤대호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.31-31
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    • 2010
  • The growth of the high-quality GaN epilayers is of significant technological importance because of their commercializedoptoelectronic applications as high-brightness light-emitting diodes (LEDs) and laser diodes (LDs) in the visible and ultraviolet spectral range. The GaN-based heterostructural epilayers have the polar c-axis of the hexagonal structure perpendicular to the interfaces of the active layers. The Ga and N atoms in the c-GaN are alternatively stacked along the polar [0001] crystallographic direction, which leads to spontaneous polarization. In addition, in the InGaN/GaN MQWs, the stress applied along the same axis contributes topiezoelectric polarization, and thus the total polarization is determined as the sum of spontaneous and piezoelectric polarizations. The total polarization in the c-GaN heterolayers, which can generate internal fields and spatial separation of the electron and hole wave functions and consequently a decrease of efficiency and peak shift. One of the possible solutions to eliminate these undesirable effects is to grow GaN-based epilayers in nonpolar orientations. The polarization effects in the GaN are eliminated by growing the films along the nonpolar [$11\bar{2}0$] ($\alpha$-GaN) or [$1\bar{1}00$] (m-GaN) orientation. Although the use of the nonpolar epilayers in wurtzite structure clearly removes the polarization matters, however, it induces another problem related to the formation of a high density of planar defects. The large lattice mismatch between sapphiresubstrates and GaN layers leads to a high density of defects (dislocations and stacking faults). The dominant defects observed in the GaN epilayers with wurtzite structure are one-dimensional (1D) dislocations and two-dimensional (2D) stacking faults. In particular, the 1D threading dislocations in the c-GaN are generated from the film/substrate interface due to their large lattice and thermal coefficient mismatch. However, because the c-GaN epilayers were grown along the normal direction to the basal slip planes, the generation of basal stacking faults (BSFs) is localized on the c-plane and the generated BSFs did not propagate into the surface during the growth. Thus, the primary defects in the c-GaN epilayers are 1D threading dislocations. Occasionally, the particular planar defects such as prismatic stacking faults (PSFs) and inversion domain boundaries are observed. However, since the basal slip planes in the $\alpha$-GaN are parallel to the growth direction unlike c-GaN, the BSFs with lower formation energy can be easily formed along the growth direction, where the BSFs propagate straightly into the surface. Consequently, the lattice mismatch between film and substrate in $\alpha$-GaN epilayers is mainly relaxed through the formation of BSFs. These 2D planar defects are placed along only one direction in the cross-sectional view. Thus, the nonpolar $\alpha$-GaN films have different atomic arrangements along the two orthogonal directions ($[0001]_{GaN}$ and $[\bar{1}100]_{GaN}$ axes) on the $\alpha$-plane, which are expected to induce anisotropic biaxial strain. In this study, the anisotropic strain relaxation behaviors in the nonpolar $\alpha$-GaN epilayers grown on ($1\bar{1}02$) r-plane sapphire substrates by metalorganic chemical vapor deposition (MOCVO) were investigated, and the formation mechanism of the abnormal zigzag shape PSFs was discussed using high-resolution transmission electron microscope (HRTEM).

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