• 제목/요약/키워드: Composite silicide

검색결과 31건 처리시간 0.028초

Composite target으로 증착된 Ti-silicide의 형성에 관한 연구(I) (The Study of Formation of Ti-silicide deposited with composite target(I))

  • 최진석;강성건;황유상;백수현;김영남;정재경;문환구;심태언;이종길
    • 한국재료학회지
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    • 제1권3호
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    • pp.168-174
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    • 1991
  • Ti-Silicides를 single-Si wafer와 그 위에 oxide를 성장시킨 기판위에 composite target($TiSi_{2.6}$)을 sputtering함으로써 증착시켰다. 증착된 비정질 상태의 Ti-silicide는 급속 열처리(RTA)방법으로 $600^{\circ}C$에서 $850^{\circ}C$가지 20초간 처리하였다. RTA온도가 $800^{\circ}C$가 되어서야 비로소 안정한 $TiSi_2$가 형성되었으며, 그 때의 비저항 값은 $27~29{\mu}\Omega-cm$로 Ti-metal reactive방법에 의한 $TiSi_2$보다 약간 높은 값으로 드러났다. X-ray로 상천이를 조사한 결과 역시 $750^{\circ}C$가지 C49 $TiSi_2$가 형성되고, $800^{\circ}C$가 되어서야 안정한 C54 $TiSi_2$로의 상천이가 일어남을 나타내고 있다. 또한 완전히 형성된 Ti-silicide의 조성비는 x-ray photoelectron spectroscopy(XPS)결과에서 Ti : Si이 1 : 2로 드러났으며, 그 동안 reactive 시켰을 때 $TiSi_2$의 단점으로 지적되어 왔던 형성 완료된 $TiSi_2$의 surface roughness는 $17{\pm}1mm$이내로 매우 우수한 값으로 판명되어, device에 대한 응용 가능성을 높이고 있다.

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Fabrication and thermal conductivity of CeO2-Ce3Si2 composite

  • Ahn, Jungsu;Kim, Gyeonghun;Jung, Yunsong;Ahn, Sangjoon
    • Nuclear Engineering and Technology
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    • 제53권2호
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    • pp.583-591
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    • 2021
  • Various compositions of CeO2-Ce3Si2 (0, 10, 30, 50, and 100 wt%Ce3Si2) composites were fabricated using conventional sintering and spark plasma sintering. Lower relative density, enhanced interdiffusion of oxygen and silicon, and silicide agglomerations from the congruent melting of Ce3Si2 at 1390 ℃ were only observed from conventionally-sintered pellets. Thermal conductivity of spark plasma sintered CeO2-Ce3Si2 composites was calculated from the measured thermal diffusivity, specific heat, and density, which exhibited dense (>90 %TD) and homogeneous microstructure. The composite with 50 wt%Ce3Si2 exhibited 55% higher thermal conductivity than CeO2 at 500 ℃, and 81% higher at 1000 ℃.

코발트/니켈 적층구조 박막으로부터 형성된 복합실리사이드 (Characterizatics of Composite Silicides from Co/Ni Structure)

  • 송오성;정성희;김득중;최용윤
    • 한국재료학회지
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    • 제14권11호
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    • pp.769-774
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    • 2004
  • 15 nm-Co/15 nm-Ni/P-Si(100)[Type I] and 15 nm-Ni/15 nm-Co/P-Si(100)(Type II) bilayer structures were annealed using a rapid thermal annealer for 40sec at $700/sim1100^{\circ}C$. The annealed bilayer structures developed into composite NiCo silicides and resulting changes in sheet resistance, composition and microstructure were investigated using Auger electron spectroscopy and transmission electron microscopy. Prepared NiCoSix films were further treated in a sequential annealing set up from $900\sim1100^{\circ}C$ with 30 minutes. The sheet resistances of NiCoSix from Type I maintained less than $7\;{\Omega}/sq$. even at the temperature of $1100{\circ}C$, while those of Type II showed about $5\;{\Omega}/sq$. with the thinner and more uniform thickness. With the additive post annealing, the sheet resistance for all the composite silicides remained small up to $900^{\circ}C$. The proposed NiCoSix films were superior over the conventional single-phased silicides and may be easily incorporated into the sub-0.1 ${\mu}m$ process.

코발트/니켈 복합실리사이드의 실리사이드온도에 따른 면저항과 미세구조 변화 (Sheet Resistance and Microstructure Evolution of Cobalt/Nickel Silicides with Annealing Temperature)

  • 정영순;정성희;송오성
    • 한국재료학회지
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    • 제14권6호
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    • pp.389-393
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    • 2004
  • The silicide layer used as a diffusion barrier in microelectronics is typically required to be below 50 nm-thick and, the same time, the silicides also need to have low contact resistance without agglomeration at high processing temperatures. We fabricated Si(100)/15 nm-Ni/15 nm-Co samples with a thermal evaporator, and annealed the samples for 40 seconds at temperatures ranging from $700^{\circ}C$ to $1100^{\circ}C$ using rapid thermal annealing. We investigated microstructural and compositional changes during annealing using transmission electron microscopy and auger electron spectroscopy. Sheet resistance of the annealed sample stack was measured with a four point probe. The sheet resistance measurements for our proposed Co/Ni composite silicide was below 8 $\Omega$/sq. even after annealing $1100^{\circ}C$, while conventional nickel-monosilicide showed abrupt phase transformation at $700^{\circ}C$. Microstructure and auger depth profiling showed that the silicides in our sample consisted of intermixed phases of $CoNiSi_{x}$ and NiSi. It was noticed that NiSi grew rapidly at the silicon interface with increasing annealing temperature without transforming into $NiSi_2$. Our results imply that Co/Ni composite silicide should have excellent high temperature stability even in post-silicidation processes.

Titanium과 Cobalt silicide의 연구 (A Study of Titanium and Cobalt Silicide)

  • 김상용;유석빈;서용진;김태형;김창일;장의구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 추계학술대회 논문집 학회본부
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    • pp.122-126
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    • 1989
  • A composite polycide struoture consisting of refractory metal and noble metal silicide film on top of polysilicon bas been considered as a replacement for polysilicon as a gate electrode and Interconnect line in MOSFET integrated circuits. In this paper presents divice characteristics of NOS with $TiSi_2/n^+$polyoide and $CoSi_2/n^+$polycide gate. Also, evaporated Ti,Co films on polysilicon has been annealed by RTA and furnace annealing in $N_2$ abient at temperature of $400^{\circ}C-1000^{\circ}C$. The Ti-,Co-silioide formation is characterized by 4-point probe, silicide growth rate and Its reproductivity bas been examined by SEM.

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자연산화막 존재에 따른 코발트 니켈 복합실리사이드 공정의 안정성 (Silicidation Reaction Stability with Natural Oxides in Cobalt Nickel Composite Silicide Process)

  • 송오성;김상엽;김종률
    • 한국산학기술학회논문지
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    • 제8권1호
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    • pp.25-32
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    • 2007
  • 코발트 니켈 합금형 실리사이드 공정에서 단결정실리콘과 다결정실리콘 기판에 자연산화막이 있는 경우 나노급 두께의 코발트 니켈 합금 금속을 증착하고 실리사이드화하는 경우의 반응 안정성을 확인하였다. 4인치 P-type(100)Si 기판 전면에 poly silicon을 입힌 기판과 single silicon 상태의 두 종류 기판을 준비하고 두께 4 nm의 자연산화막이 있는 상태에서 10 nm 코발트 니켈 합금을 니켈의 상대조성을 $10{\sim}90%$로 달리하며 열증착하였다. 통상의 600, 700, 800, 900, 1000, $1100^{\circ}C$ 각 온도에서 실리사이드화 열처리를 시행 후 잔류 합금층을 제거하고, XRD(X-ray diffraction)및 FE-SEM(Field emission scanning electron microscopy), AES(Auger electron spectroscopy)를 사용하여 실리사이드가 생겼는지 확인하였다. 마이크로라만 분석기로 실리사이드 반응시의 실리콘 층의 잔류 스트레스도 확인하였다. 자연산화막이 존재하는 경우 실리사이드 반응이 진행되지 않았고, 폴리실리콘 기판과 고온에서는 금속과 산화층의 반응잔류물이 생성되었다. 단결정 기판의 고온열처리에서는 실리사이드 반응이 없더라도 핀홀이 발생할 수 있는 정도의 열스트레스가 존재하였다. 코발트 니켈 복합실리사이드 공정에서는 자연산화막을 제거하는 공정이 필수적이었다.

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Effects of Tungsten Addition on Tensile Properties of a Refractory Nb-l8Si-l0Ti-l0Mo-χW (χ=0, 5, 10 and 15 mot.%) In-situ Composites at 1670 K

  • 김진학;Tatsuo Tabaru;Hisatoshi Hirai
    • 소성∙가공
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    • 제8권3호
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    • pp.233-233
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    • 1999
  • To investigate the effect of tungsten addition on mechanical properties, we prepared refractory (62χ)Nb-18Si-l00Mo-l0Ti-χW (χ=0, 5, 10 and 15 mol.%) in-situ composites by the conventional arc-casting technique, and then explored the microstructure, hardness and elastic modulus at ambient temperature and tensile properties at 1670 K. The microstructure consists of relatively fine (Nb, Mo, W, Ti)/sub 5/Si₃, silicide and a Nb solid solution matrix, and the fine eutectic microstructure becomes predominant at a Si content of around 18 mol.%. The hardness of (Nb, Mo, W, Ti(/sub 5/Si₃, silicide in a W-free sample is 1680 GPa, and goes up to 1980 GPa in a W 15 mol.% sample. The hardness, however, of Nb solid solution does not exhibit a remarkable difference when the nominal W content is increased. The elastic modulus shows a similar tendency to the hardness. The optimum tensile properties of the composites investigated are achieved at W 5 mol.% sample, which exhibits a relatively good ultimate strength of 230 MPa and an excellent balance of yield strength of 215 MPa, and an elongation of 3.7%. The SEM fractography generally indicates a ductile fracture in the W-free sample, and a cleavage rupture in W-impregnated ones.

Pt/Ti/Si 기판에서의 후속열처리에 따른 PZT 박막의 형성 및 특성

  • 백상훈;백수현;황유상;마재평;최진석;조현춘
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 1993년도 춘계학술발표회
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    • pp.64-65
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    • 1993
  • MPB 조성영역인 Zr/Ti=52/48의 composite ceramic target을 사용하여 RF magnetron sputtering 방법으로 기판온도 약 30$0^{\circ}C$에서 RZT 박막을 Pt/Ti/Si 기판위에 증착시켰다. 안정상인 perovskite 구조를 형성시키기 위하여 PbO분위기에서 furnace annealing 과 Repid thermal annealing을 실시하여 열처리 방법에 따른 상형성 및 계면반응과 그에 따른 전기적 특성을 고찰 하였다. Pt 의 두께가 250$\AA$인 경우 furnace annealing 시 $650^{\circ}C$에서 perouskite 상이 형성되었으나 Pt층이 산소의 확산을 방지하지 못하여 상부의 Ti 층이 TiOx로 변태하였으며 하부의 Ti는 Si 과 반응하여 Ti-silicide 롤 변태하였다. 또한 75$0^{\circ}C$,60sec 인 경우 Pt 층의 응집화가 관찰되어 하부전극으로서 적용이 적절하지 못하다. 급속열처리를 실시한 경우에도 마찬가지로 Ti 층이 TiOx 와 silicide 층으로 변태되었다. Pt의 두께가 1000$\AA$인 경우에도 250$\AA$와는 달리 RTA 시 (III)방향으로 Furace annealing 시(001)방향으로 우선 성장하였다. 이는 Ti(001), P(111),PZT(111)면의 lattic mismatch 가 매우 작은데다 RTA 시 계면반응이 거의발생하지 않아 PZT 박막이 (111) 방향으로 우선 성장한 것으로 보인다. Furnace annealing 경우는 심한 계면반응이 발생하여 Pt층에 어느 정도 영향을 주었기 때문에 우선성장 방향이 바뀌었다구 생각한다.

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가압통전 활성연소에 의한 치밀한 NiSi2와 NiSi2-20vol.%Nb 복합재료 제조 (Simultaneous Synthesis and Densification of NiSi2 and NiSi2-20vol.%Nb Composite by Field-Activated and Pressure-Assisted Combustion)

  • 김환철;손인진;박충도
    • 열처리공학회지
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    • 제14권1호
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    • pp.1-7
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    • 2001
  • A method to simultaneously synthesize and consolidate the silicide $NiSi_2$ and the composite $NiSi_2$-20vol.%Nb from powders of Ni, Si, and Nb was investigated. Combustion synthesis was carried out under the combined effect of an electric field and mechanical pressure. The final density of the products increased nearly linearly with the applied pressure. Highly dense $NiSi_2$ and $NiSi_2$-20vol.%Nb with relative densities of up to 97% were produced under the simultaneous application of a 60MPa pressure and a 3000A current on the reactant powders. The respective Vickers microhardness values for these materials were 6.0 and 5.8 GPa. From indentation crack measurements, the fracture toughness values for $NiSi_2$ and $NiSi_2$-20vol.%Nb were calculated to be 3.3 and 4.7 $MPa{\cdot}m^{1/2}$, respectively.

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Evaluations of Si based ternary anode materials by using RF/DC magnetron sputtering for lithium ion batteries

  • 황창묵;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.302-303
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    • 2010
  • Generally, the high energy lithium ion batteries depend intimately on the high capacity of electrode materials. For anode materials, the capacity of commercial graphite is unlike to increase much further due to its lower theoretical capacity of 372 mAhg-1. To improve upon graphite-based negative electrode materials for Li-ion rechargeable batteries, alternative anode materials with higher capacity are needed. Therefore, some metal anodes with high theoretic capacity, such as Si, Sn, Ge, Al, and Sb have been studied extensively. This work focuses on ternary Si-M1-M2 composite system, where M1 is Ge that alloys with Li, which has good cyclability and high specific capacity and M2 is Mo that does not alloy with Li. The Si shows the highest gravimetric capacity (up to 4000mAhg-1 for Li21Si5). Although Si is the most promising of the next generation anodes, it undergoes a large volume change during lithium insertion and extraction. It results in pulverization of the Si and loss of electrical contact between the Si and the current collector during the lithiation and delithiation. Thus, its capacity fades rapidly during cycling. Si thin film is more resistant to fracture than bulk Si because the film is firmly attached to the substrate. Thus, Si film could achieve good cycleability as well as high capacity. To improve the cycle performance of Si, Suzuki et al. prepared two components active (Si)-active(Sn, like Ge) elements film by vacuum deposition, where Sn particles dispersed homogeneously in the Si matrix. This film showed excellent rate capability than pure Si thin film. In this work, second element, Ge shows also high capacity (about 2500mAhg-1 for Li21Ge5) and has good cyclability although it undergoes a large volume change likewise Si. But only Ge does not use the anode due to its costs. Therefore, the electrode should be consisted of moderately Ge contents. Third element, Mo is an element that does not alloys with Li such as Co, Cr, Fe, Mn, Ni, V, Zr. In our previous research work, we have fabricated Si-Mo (active-inactive elements) composite negative electrodes by using RF/DC magnetron sputtering method. The electrodes showed excellent cycle characteristics. The Mo-silicide (inert matrix) dispersed homogeneously in the Si matrix and prevents the active material from aggregating. However, the thicker film than $3\;{\mu}m$ with high Mo contents showed poor cycling performance, which was attributed to the internal stress related to thickness. In order to deal with the large volume expansion of Si anode, great efforts were paid on material design. One of the effective ways is to find suitably three-elements (Si-Ge-Mo) contents. In this study, the Si based composites of 45~65 Si at.% and 23~43 Ge at.%, and 12~32 Mo at.% are evaluated the electrochemical characteristics and cycle performances as an anode. Results from six different compositions of Si-Ge-Mo are presented compared to only the Si and Ge negative electrodes.

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