• 제목/요약/키워드: Carbon film

검색결과 1,327건 처리시간 0.028초

스프레이코팅 방식으로 제작된 단일벽 탄소나노튜브막 스트레인센서 (Spray-coated single-wall carbon nanotube film strain sensor)

  • 박찬원
    • 산업기술연구
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    • 제32권A호
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    • pp.29-33
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    • 2012
  • We demonstrated the viability of fully microfabricating SWCNT(single-wall carbon nanotube) film strain sensors for force and weight sensing. Our spray-deposited SWCNT film strain sensors showed good linearity over a range from 0 to 400 microstrain, and much higher sensitivity compared to commercial metal foil-type gauges. The number of grids and the thickness of the SWCNT film were found to have a significant effect on the strain sensing properties of the SWCNT film gauges. A strain sensing methode for the CNT-based strain gauges was also investigated using a binocular type beam load cells. Preliminary results indicate that the microfabrication method shown here is promising for developing a commercial strain gauge using a spray-coated SWCNT thin film. In the near future, various studies will be performed to further enhance the properties of the spray-coated SWCNT film strain sensors.

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Vertically Aligned Carbon Film Synthesized from Magnetically Oriented Polyacetylene using Morphology Retaining Carbonization

  • Goh, Munju;Choi, Yong Mun
    • Carbon letters
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    • 제13권4호
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    • pp.226-229
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    • 2012
  • Polyacetylene (PA) films with vertically aligned fibril morphology were synthesized in homeotropic nematic liquid crystal (N-LC) solvent by using a magnetic field of 5 Tesla as an external perturbation. Scanning electron microscope (SEM) photographs indicated that the lengths of fibrils from the substrate were $5-35{\mu}m$, depending on polymerization time. Carbonization was carried out using iodine-doped PA film and a morphology-retaining carbonization method. From the SEM results, we confirmed that the vertical morphology of the PA remains unchanged even after carbonization at $800^{\circ}C$. The weight loss of the films due to carbonization at $800^{\circ}C$ is about 20% of the weight of the film before iodine doping. It is expected that vertically aligned carbon might be a precursor for preparing vertical graphite materials, which materials could be useful for electrochemical energy storage and cell electrodes.

Deposition of Diamond Film by Hydrogen-oxyacetylen Combustion Flame

  • Ko, Chan-Kyoo;Park, Dong-Wha
    • The Korean Journal of Ceramics
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    • 제4권1호
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    • pp.1-4
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    • 1998
  • Diamond film was deposited on Mo substrate at atmospheric pressure using combustion flame apparatus with the addition of H2. At a temperature above 100$0^{\circ}C$, parts of the film were converted into graphites and these were etched by hydrogen atoms. With increasing $C_2H_2/O_2$ ratio, the nucleation density of the film increased. But the greater part of the film was formed with cauliflower-shaped amorphous carbon. These amorphous carbn were crystallized etching amorphous carbon.

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신 재생 에너지 활용을 위한 Carbon 박막의 특성 (Properties of Carbon Films Formed for Renewed Electric Power Energy by Electro-deposition)

  • 이상헌
    • 전기학회논문지
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    • 제56권1호
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    • pp.147-150
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    • 2007
  • Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.

저주파수(450 KHz) PECVD에 의한 Diamondlike Carbon박막의 특성 (Characteristics of Diamondike Carbon thin Films by Low Discharging Frequency(450KHz) PECVD)

  • 김한주;주승기
    • 한국재료학회지
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    • 제4권2호
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    • pp.227-232
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    • 1994
  • 450KHz 저주파수로 플라즈마 화학증착법을 이용하여 Diamondlike carbon박막을 제작하고 optical band gap, 미소경도, 내부응력 등의 물성에 대하여 13.56MHz의 전원을 사용했을 때보다 optical band gap이 감소하였으며 FT-IR및 CHN분석결과 박막 내의 C-H결합농도와 총 수소의 함량이 크게 감소하는 것으로 밝혀졌다. 또한 저주파수로 DLC 박막을 형성하는 경우 미소경도의 희생없이 내부응력을 크게 줄일 수 있어 기판과의 접착성이 향상될 것으로 기대되었다.

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PECVD로 제조된 비정질 질화탄소 박막의 특성에 미치는 증착변수의 영향 (Effects of Deposition Conditions on the Properties of Amorphous Carbon Nitride Thin Films by PECVD)

  • 문형모;김상섭
    • 한국재료학회지
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    • 제13권3호
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    • pp.150-154
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    • 2003
  • Amorphous carbon nitride films were deposited on Si(001) substrates by a plasma enhanced chemical vapor deposition technique (PECVD) using $CH_4$and $N_2$as reaction gases. The growth and film properties were investigated while the gas ratio and the working pressure were changed systematically. At 1 Torr working pressure, an increase in the $N_2$partial pressure results in a significant increase of the deposition rate as well as an apparent presence of C ≡N bonding, while little affecting the microstructure and amorphus nature of the films. In the case of changing the working pressure at a fixed $N_2$partial pressure of 98%, a film grown at a medium pressure of $1${\times}$10^{-2}$ Torr shows the most prominent C=N bonding nature and photoluminescent property.

Effect of Carbon Dioxide Adsorption on LDPE/Zeolite 4A Composite Film

  • Jung, Bich Nam;Shim, Jin Kie;Hwang, Sung Wook
    • 한국포장학회지
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    • 제24권3호
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    • pp.149-157
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    • 2018
  • Low density polyethylene (LDPE) has been researched in many industrial applications, and LDPE/zeolite 4A composites has been extensively studied for many applications such as microporous, breathable film and so on. LDPE/zeolite composite have a great potential for carbon dioxide adsorption film due to its high adsorption ability. In this study, LDPE/zeolite 4A composites with various contents were prepared by melt mixing process, and co-extrusion process was applied to develop a $CO_2$ adsorption conventional film and foamed film. The thermal, rheological, mechanical, physical and morphological properties of composite films has been characterized, and $CO_2$ adsorption of the composite films evaluated by thermogravimetric analysis (TGA) and the performance was found to be about 18 cc/g at 30.9 wt% of the zeolite content.

반응성 스퍼터링으로 성장된 결정성 질화탄소막의 기계적 특성 (Mechanical Characteristics of Crystalline Carbon Nitride Films Grown by Reactive Sputtering)

  • 이성필;강종봉
    • 한국전기전자재료학회논문지
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    • 제15권2호
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    • pp.147-152
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    • 2002
  • Carbon nitride thin films were deposited by reactive sputtering for the hard coating materials on Si wafer and tool steels. When the nitrogen content of carbon nitride film on tool steel is 33.4%, the mean hardness and elastic modulus are 49.34 GPa and 307.2 GPa respectively. The nitrided or carburised surface acts as the diffusion barrier which shows better adhesion of carbon nitride thin film on the steel surface. To prevent nitrogen diffusion from the film, steel substrate can be saturated by nitrogen forming a Fe$_3$N layer. The desirable structure at the surface after carburising is martensite, but sometimes, due to high carbon content an proeutectoid Fe$_3$C structure may form at the grain boundaries, leaving the overall surface brittle and may cause defects.

Application of Taguchi Methodology for Optimization of Parameters of CVD Influencing Formation of a Desired Optical Band Gap of Carbon Film

  • Mishra, D.K.;Bejoy, N.;Sharon, Maheshwar.
    • Carbon letters
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    • 제6권2호
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    • pp.96-100
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    • 2005
  • Taguchi methodology has been applied to get an idea about the parameters related to the chemical vapour deposition technique, which influences the formation of semiconducting carbon thin film of a desired band gap. L9 orthogonal array was used for this purpose. The analysis based on Taguchi methodology suggests that amongst the parameters selected, the temperature of pyrolysis significantly controls the magnitude of band gap (46%). Sintering time has a small influence (30%) on the band gap formation and other factors have almost no influence on the band gap formation. Moreover this analysis suggests that lower temperature of pyrolysis (${\leq}$ $750^{\circ}C$) and lower time of sintering (${\leq}$ 1 h) should be preferred to get carbon thin film with the desired band gap of 1.2eV.

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스퍼터링 질화탄소 박막의 트라이볼로지 및 전기적 특성의 기판 온도 영향 (The Effect of Substrate Temperature on Tribological and Electrical Properties of Sputtered Carbon Nitride Thin Film)

  • 박찬일
    • 한국전기전자재료학회논문지
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    • 제34권1호
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    • pp.33-38
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    • 2021
  • Using facing target magnetron sputtering (FTMS) with a graphite target source, carbon nitride thin films were deposited on silicon and glass substrates at different substrate temperatures to confirm the tribological, electrical, and structural properties of thin films. The substrate temperatures were room temperature, 150℃, and 300℃. The tribology and electrical properties of the carbon nitride thin films were measured as the substrate temperature increased, and a study on the relation between these results and structural properties was conducted. The results show that the increase in the substrate temperature during the fabrication of the carbon nitride thin films increased the hardness and elastic modulus values, the critical load value was increased, and the residual stress value was reduced. Moreover, the increase in the substrate temperature during thin-film deposition was attributed to the improvement in the electrical properties of carbon nitride thin film.