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http://dx.doi.org/10.4313/JKEM.2002.15.2.147

Mechanical Characteristics of Crystalline Carbon Nitride Films Grown by Reactive Sputtering  

이성필 (경남대학교 전기전자공학부)
강종봉 (신소재공학부)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.2, 2002 , pp. 147-152 More about this Journal
Abstract
Carbon nitride thin films were deposited by reactive sputtering for the hard coating materials on Si wafer and tool steels. When the nitrogen content of carbon nitride film on tool steel is 33.4%, the mean hardness and elastic modulus are 49.34 GPa and 307.2 GPa respectively. The nitrided or carburised surface acts as the diffusion barrier which shows better adhesion of carbon nitride thin film on the steel surface. To prevent nitrogen diffusion from the film, steel substrate can be saturated by nitrogen forming a Fe$_3$N layer. The desirable structure at the surface after carburising is martensite, but sometimes, due to high carbon content an proeutectoid Fe$_3$C structure may form at the grain boundaries, leaving the overall surface brittle and may cause defects.
Keywords
Carbon nitride; Hard coating; Tool steel; Nitridation;
Citations & Related Records
Times Cited By KSCI : 9  (Citation Analysis)
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