• Title/Summary/Keyword: Bismuth(Bi)

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Effects of Annealing Conditions on the Properties of Bi1-xLaxTi3O12 Thin Films (열처리 조건이 Bi1-xLaxTi3O12 (x=0.75) 박막의 특성에 미치는 효과)

  • Park Moon Heum;Kim Sang Su;Gang Min Ju;Ha Tae Gon
    • Korean Journal of Materials Research
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    • v.14 no.10
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    • pp.701-706
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    • 2004
  • Bismuth layered structure ferroelectric thin films, La-substituted $Bi_{4}Ti_{3}O_{12}$ ($Bi_{1-x}La_{x}Ti_{3}O_{12}$, x=0.75, BLT) were prepared on the $Pt(111)/Ti/SiO_2/Si(100)$ substrates by a sol-gel spin coating process. The thin films were annealed in various conditions, i.e., oxygen, nitrogen and vacuum atmospheres for various annealing time. We investigated the annealing condition effects on the grain orientation and ferroelectric properties. The measured XRD patterns revealed that the BLT thin films showed only $Bi_{4}Ti_{3}O_{12}$-type phase with random orientation. $La^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of $Bi_{4}Ti_{3}O_{12}$ decreased the degree of c-axis orientation and increased the remanent polarization ($2P_{r}$). The remanent polarization ($2P_{r}$) and the coercive field ($2E_{c}$) of the BLT thin film annealed at $650^{\circ}C$ for 5 min in oxygen atmosphere were $87{\mu}C/cm^2$ and 182 kV/cm, respectively, at an applied electric field of 240 kV/cm. For all of the BLT thin films annealed in various conditions, the fatigue resistance was shown. The improvement of ferroelectric properties with La substitution in $Bi_{4}Ti_{3}O_{12}$ could be attributed to the changes in space charge densities and grain orientation in the thin film.

Characteristic of ferroelectric properties of $(Bi,Ce)_4Ti_3O_{12}$ thin films deposited by pulsed laser deposition (Pulsed laser deposition 방법으로 증착된 $(Bi,Ce)_4Ti_3O_{12}$ 박막의 강유전 특성)

  • Oh, Young-Nam;Seong, Nak-Jin;Yoon, Soon-Gil;Jeon, Min-Gu;Woo, Seong-Ihl;Kim, Chang-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.168-171
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    • 2003
  • Bismuth layered structure, Cerium-substituted $Bi_4Ti_3O_{12}$ ($(Bi,Ce)_4Ti_3O_{12}$) thin films were prepared on the $Pt/TiO_2/SiO_2/Si$ substrates by the pulsed laser deposition method. We investigated the Ce-subsitituted effect on the grain orientation and ferroelectric properties. $Ce^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of BTO decreased the deeree of c-axis orientation and increased the remanent polariation (2Pr). The structure and morphology of the films were characterized using X-ray diffraction and atomic force microscopy. The $(Bi,Ce)_4Ti_3O_{12}$ (BCT) thin films, which were annealed $700^{\circ}C\;and\;800^{\circ}C$ for 10min and 30min, showed a perovskite phase and dense microstructure. As the thickness of the BCT film was decresed that the ferroelectric properties of the BCT thin films were good.

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Joining Characteristics of Plasma Sprayed BSCCO Superconducting Coatings (플라즈마 용사 BSCCO(Bismuth Strontium Calcium Copper Oxide) 초전도 피막의 접합 특성)

  • Park, Jung-Sik;Cho, Chang-Eun;Ko, Young-Bong;Park, Kwang-Soon;Park, Kyeung-Chae
    • Journal of Surface Science and Engineering
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    • v.46 no.5
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    • pp.181-186
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    • 2013
  • We performed plasma spraying for 2001 (Bi:Cu = 2:1), 0212 (Sr:Ca:Cu = 2:1:2) oxide powders. $Bi_2Sr_2CaCu_2Ox$ (2212) superconductor has been prepared by PMP-AT (partial melting process-annealing treatment). The 2212 phase is synthesized between Sr-Ca-Cu oxide coating layer (0212) and Bi-Cu oxide coating layer (2001) by movement of partial melted Bi on 2001 layer and the diffusion reaction (Cu, Sr, Ca) after PMP-AT. There are two different coating layers on joining process. The one is ABAB coating layers and the other is BAAB coating layers by arrangement of 2001 (A), 0212 (B) layers. We performed heat treatment these two different coating layers processes under same PMP-AT conditions. We obtained Bi-2212 superconducting layers at each experimental condition, and the result of MPMS, the critical temperature was showed about 78 K. But the microstructure images and result of EDS as each experimental variable were showed about the qualitatively different Bi-2212 superconducting phases. We also deduced the generation mechanism of Bi-2212 superconducting layer as a result of these experimental data, microstruc ture images, EDS data and phase diagram.

Design of Double Layer Shielding Structure using Eco-friendly Shielding Materials (친환경 차폐물질을 이용한 이중구조 차폐체의 설계)

  • Park, Ji Koon;Choi, Il Hong;Park, Hyung Hoo;Yang, Sung Woo;Kim, Kyo Tae;Kang, Sang Sik
    • Journal of the Korean Society of Radiology
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    • v.10 no.8
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    • pp.559-563
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    • 2016
  • Recently, a barium(Ba) and an iodine(I) being studied as a conventional lead(Pb) alternatives of shielding material has excellent shieding rate, but the characteristic x-ray photons in the energy range near 30 keV line is released. In this study, with bismuth oxide(BiO) coupled barium sulfate($BaSO_4$) double layer, transmitted spectra, shieding rates and relative weighting rates were evaluated to validate the applicability of eco-friendly double layer shieding structure using monte carlo simulations as a prior study. From the evaluation results, in 0.4mm and 0.5mm thickness of BiO layers coupled with top 0.1mm-$BaSO_4$ layer, the shieding rate showed 1.9% and 3.9% higher than 0.6mm thickness of Pb single layer, respectively. In addition, the relative weight also 28% and 34.5% lower than 0.6mm-Pb in 0.4mm and 0.5mm thickness of BiO layers coupled with top 0.1mm-$BaSO_4$ layer.

Characteristics of Ferroelectric SrBi2Ta2O9 Thin Films deposited by Plasma-Enhanced Atomic Layer Deposition (플라즈마 원자층증착법에 의해 제조된 강유전체 SrBi2Ta2O9박막의 특성)

  • 신웅철;류상욱;유인규;윤성민;조성목;이남열;유병곤;이원재;최규정
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.35-35
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    • 2003
  • Recent progress in the integration of the ferroelectric random access memories (FRAM) has attracted much interest. Strontium bismuth tantalate(SBT) is one of the most attractive materials for use in nonvolatile-memory applications due to low-voltage operations, low leakage current, and its excellent fatigue-free property. High-density FRAMs operated at a low voltage below 1.5V are applicable to mobile devices operated by battery. SBT films thinner than 0.1 #m can be operated at a low voltage, because the coercive voltage (Vc) decreases as the film thickness is reduced. In addition, the thickness of the SBT film will have to be reduced so it can fit between adjacent storage nodes in a pedestal type capacitor in future FRAMs.

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Stabilization and Characteristics of An Electro-optical BGO Voltage Sensor (BGO광전압 센서의 안정화 및 동작특성)

  • Lee, Kyung-Shik
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.12
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    • pp.1894-1899
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    • 1990
  • We present an electro-optical voltage sensor. Crystalline bismuth germanate(BI4Ge3O12) used as the electro-opticla crystal exhibited linear birefringences of 1.7x10**-5 to 5.4x10**-4. And these birefringences were observed to be strongly temperature dependent. In order to improve the stability of the electro-opticlal voltage sensor, crystals (Bi4Ge3=12) were annealed and a compensation method was used. After applying this compensation method to the voltage sensor, the temperature stability, pressure stability, and vibration stability of the sensor were highly improved, Noise Equivalent Voltage of this sensor was a few mV/\ulcornerz.

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Mannich-type Reactions of in Situ Generated N-Acyliminium Ions from α-Amido p-Tolylsulfones with Silyl Enolates

  • Lee, Sang-Hyeup;Kadam, Santosh T.
    • Bulletin of the Korean Chemical Society
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    • v.32 no.10
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    • pp.3738-3742
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    • 2011
  • Bismuth tribromide ($BiBr_3$) catalyzed Mannich-type reactions of N-acyliminium ions which generated in situ from N-benzyloxycarbonylamino p-tolylsulfones have been developed. In the presence of catalytic amount of $BiBr_3$, N-benzyloxycarbonylamino p-tolylsulfones prepared from aromatic and aliphatic aldehydes reacted with silyl enol ether and silyl enol ester under mild reaction conditions to afford N-Cbz-protected ${\beta}$-amino ketones and N-Cbz-protected ${\beta}$-amino esters in moderate to good yield, respectively.

Thermodynamic interaction parameter between Zn and Cu, Ag, In, Bi, Pb, Sn in Dilute cadmium alloy by Touch Instant electro-motive force method (순간접전기전력법에 의한 용융 Cd중의 Zn과 Cu, Ag, In, Bi, Pb 및 Sn와의 상위작용 파라미터)

  • 김대룡;윤겸하
    • Journal of Surface Science and Engineering
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    • v.15 no.4
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    • pp.192-207
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    • 1982
  • A study has been made of the interaction parameters of Zn other elements in dilute solutesd solution of molten cadmium alloys over the temperature range of 450 to 570$^{\circ}C$. The experi-mental measurementss were made in a touch instant cell using a fusedd Licl-KCl electrolyte. The activity of zinc in binary and ternary solutions sexhibiteds a strong positive deviation from Raoult's law. The addition of silver, indium or lead increased the activity of zinc whereas addition of copper, bismuth or tin decreased the zinc activity slightly. The results for all the metallic solutions showed a linear dependence of reciprocal of ab-solute temperature over the experimental range. The interaction parameters obtained are as follows.

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Lower Temperature Soldering of Capacitor Using Sn-Bi Coated $Sn-3.5\%Ag$ Solder (Sn-Bi도금 $Sn-3.5\%Ag$ 솔더를 이용한 Capacitor의 저온 솔더링)

  • Kim Mi-Jin;Cho Sun-Yun;Kim Sook-Hwan;Jung Jae-Pil
    • Journal of Welding and Joining
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    • v.23 no.3
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    • pp.61-67
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    • 2005
  • Since lead (Pb)-free solders for electronics have higher melting points than that of eutectic Sn-Pb solder, they need higher soldering temperatures. In order to decrease the soldering temperature we tried to coat Sn-Bi layer on $Sn-3.5\%Ag$ solder by electroplating, which applies the mechanism of transient liquid phase bonding to soldering. During heating Bi will diffuse into the $Sn-3.5\%Ag$ solder and this results in decreasing soldering temperature. As bonding samples, the 1608 capacitor electroplated with Sn, and PCB, its surface was finished with electroless-plated Ni/Au, were selected. The $Sn-95.7\%Bi$ coated Sn-3.5Ag was supplied as a solder between the capacitor and PCB land. The samples were reflowed at $220^{\circ}C$, which was lower than that of normal reflow temperature, $240\~250^{\circ}C$, for the Pb-free. As experimental result, the joint of $Sn-95.7\%Bi$ coated Sn-3.5Ag showed high shear strength. In the as-reflowed state, the shear strength of the coated solder showed 58.8N, whereas those of commercial ones were 37.2N (Sn-37Pb), 31.4N (Sn-3Ag-0.5Cu), and 40.2N (Sn-8Zn-3Bi). After thermal shock of 1000 cycles between $-40^{\circ}C$ and $+125^{\circ}C$, shear strength of the coated solder showed 56.8N, whereas the previous commercial solders were in the range of 32.3N and 45.1N. As the microstructures, in the solder $Ag_3Sn$ intermetallic compound (IMC), and along the bonded interface $Ni_3Sn_4$ IMC were observed.

Structural Characterization of Bismuth Zinc Oxide Thin Films Grown by Plasma-Assisted Molecular Beam Epitaxy (플라즈마분자선에피탁시법으로 성장한 산화비스무스아연 박막의 구조특성)

  • Lim, Dong-Seok;Shin, Eun-Jung;Lim, Se-Hwan;Han, Seok-Kyu;Lee, Hyo-Sung;Hong, Soon-Ku;Joeng, Myoung-Ho;Lee, Jeong-Yong;Cho, Hyung-Koun;Yao, Takafumi
    • Korean Journal of Materials Research
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    • v.21 no.10
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    • pp.563-567
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    • 2011
  • We report the structural characterization of $Bi_xZn_{1-x}O$ thin films grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy. By increasing the Bi flux during the growth process, $Bi_xZn_{1-x}O$ thin films with various Bi contents (x = 0~13.17 atomic %) were prepared. X-ray diffraction (XRD) measurements revealed the formation of Bi-oxide phase in (Bi)ZnO after increasing the Bi content. However, it was impossible to determine whether the formed Bi-oxide phase was the monoclinic structure ${\alpha}-Bi_2O_3$ or the tetragonal structure ${\beta}-Bi_2O_3$ by means of XRD ${\theta}-2{\theta}$ measurements, as the observed diffraction peaks of the $2{\theta}$ value at ~28 were very close to reflection of the (012) plane for the monoclinic structure ${\alpha}-Bi_2O_3$ at 28.064 and the reflection of the (201) plane for the tetragonal structure ${\beta}-Bi_2O_3$ at 27.946. By means of transmission electron microscopy (TEM) using a diffraction pattern analysis and a high-resolution lattice image, it was finally determined as the monoclinic structure ${\alpha}-Bi_2O_3$ phase. To investigate the distribution of the Bi and Bi-oxide phases in BiZnO films, elemental mapping using energy dispersive spectroscopy equipped with TEM was performed. Considering both the XRD and the elemental mapping results, it was concluded that hexagonal-structure wurtzite $Bi_xZn_{1-x}O$ thin films were grown at a low Bi content (x = ~2.37 atomic %) without the formation of ${\alpha}-Bi_2O_3$. However, the increased Bi content (x = 4.63~13.17 atomic %) resulted in the formation of the ${\alpha}-Bi_2O_3$ phase in the wurtzite (Bi)ZnO matrix.