• 한국재료학회지
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• 제17권5호
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• pp.263-267
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• 2007

Hafnium oxide $(HfO_2)$ films were deposited on Si(100) substrates by remote plasma-enhanced atomic layer deposition (PEALD) method at $250^{\circ}C$ using TEMAH [tetrakis(ethylmethylamino)hafnium] and $O_2$ plasma. $(HfO_2)$ films showed a relatively low carbon contamination of about 3 at %. As-deposited and annealed $(HfO_2)$ films showed amorphous and randomly oriented polycrystalline structure. respectively. The interfacial layer of $(HfO_2)$ films deposited using remote PEALD was Hf silicate and its thickness increased with increasing annealing temperature. The hysteresis of $(HfO_2)$ films became lower and the flat band voltages shifted towards the positive direction after annealing. Post-annealing process significantly changed the physical, chemical, and electrical properties of $(HfO_2)$ films. $(HfO_2)$ films deposited by remote PEALD using TEMAH and $O_2$ plasma showed generally improved film qualities compare to those of the films deposited by conventional ALD.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.175-175
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• 1999

Circumventing problems lying in the conventional lithographic techniques, we devised a new method for the fabrication of nanometer scale metal wires inspired by the unique characteristics of carbon nanotubes (CNTs). Since carbon nanotubes could act as masks when CNT-coated thin Au/Ti layer on a SiO2 surface was physically etched by low energy argon ion bombardment 9ion milling), Au/Ti nano-wires were successfully formed just below the CNTs exactly duplicating their lateral shapes. Cross-sectional analysis by transmission electron microscopy revealed that the edge of the metal wire was very sharply developed indicating the great difference in the milling rates between the CNTs and the metal layer as well as the good directionality of the ion milling. We could easily find a few nanometer-wide Au/Ti wires among the wires of various width. After the formation of nano-wires, the CNTs could be pushed away from the metal nano-wire by atomic force microscopy, The lateral force for the removal of the CNTs are dependent upon the width and shape of the wires. Resistance of the metal nano-wires without the CNTs was also measured through the micro-contacts definted by electron beam lithography. since this CNT-based lithographic technique is, in principle, applicable to any kinds of materials, it can be very useful in exploring the fields of nano-science and technology, especially when it is combines with the CNT manipulation techniques.

• Carbon letters
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• 제16권2호
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• pp.93-100
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• 2015

Surface modified carbon felts were utilized as an electrode for the removal of inorganic ions from seawater. The surfaces of the carbon felts were chemically modified by alkaline and acidic solutions, respectively. The potassium hydroxide (KOH) modified carbon felt exhibited high Brunauer-Emmett-Teller (BET) surface areas and large pore volume, and oxygen-containing functional groups were increased during KOH chemical modification. However, the BET surface area significantly decreased by nitric acid ($HNO_3$) chemical modification due to severe chemical dissolution of the pore structure. The capability of electrosorption by an electrical double-layer and the efficiency of capacitive deionization (CDI) thus showed the greatest enhancement by chemical KOH modification due to the appropriate increase of carboxyl and hydroxyl functional groups and the enlargement of the specific surface area.

• Carbon letters
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• 제28권
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• pp.1-8
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• 2018

Graphene is a single atomic layer of carbon atoms, and has exceptional electrical, mechanical, and optical characteristics. It has been broadly utilized in the fields of material science, physics, chemistry, device fabrication, information, and biology. In this review paper, we briefly investigate the ideas, structure, characteristics, and fabrication techniques for graphene applications in lithium ion batteries (LIBs). In LIBs, a constant three-dimensional (3D) conductive system can adequately enhance the transportation of electrons and ions of the electrode material. The use of 3D graphene and graphene-expansion electrode materials can significantly upgrade LIBs characteristics to give higher electric conductivity, greater capacity, and good stability. This review demonstrates several recent advances in graphene-containing LIB electrode materials, and addresses probable trends into the future.

• 반도체디스플레이기술학회지
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• 제16권1호
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• pp.102-105
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• 2017

Currently, the size of the electronic device is in the nano area. In order to control the movements of these nanoscale devices, one should be able to understand the physical phenomena in the nano area. Recently, due to carbon nanotubes and mechanical outstanding electrical conductivity and mechanical characteristics of the carbon nanotubes and Graphene behaves to apply. Efforts have been active. There are various tubes with a radius of a in a compact mass in the form of a Multi walled carbon nanotubes in different between the radius. Van der Waals force can move smoothly without friction with each other by the nanoscale motor turning, using the properties, making. This is the lightest solids per unit area on the thickness is electrical atomic layer one of the substance and the electrical conductivity, the best material and mechanical characteristics are very much. Many studies because great is the ideal nanoelectromechanical device of material is being considered. In this study, electrical resonator for a new structure proposed and the nature and methodology would like to come up.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.83-87
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• 2003

Thin films of amorphous carbon (a-C) generally combine high wear resistance with low friction coefficients and a-C films have widespread applications as protective coatings and passivation of electrical circuit and insulating layer. In this work we deposited the amorphous carbon (a-C) films on silicon substrate with a high rate DC magnetron sputtering system. It is obtained parameters on the deposition rate and physical properties of a-C films using a wide range of Ar gas pressure and DC power. The physical properties of the films were analyzed by Nanoindenter and AFM (Atomic Force Microscopy), The electrical properties were investigated by electrical conductivity measurement.

• 멤브레인
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• 제30권2호
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• pp.97-110
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• 2020

이산화탄소 포집 및 저장기술(CCS)은 인류발생적 요인에 의한 이산화탄소 배출 증가와 그로 인한 기후변화를 완화시킬 수 있는 기술 중 하나이다. 그 중, 매체 순환식 연소(chemical looping combustion, CLC)와 칼슘루핑(calcium looping) 기술은 현재 아민 스크러빙(amine scrubbing)을 대체할 수 있는 유망한 기술로 주목받고 있다. 두 방법 모두 금속 산화물을 이용한 연속적인 순환 사이클 반응에 의한 것이다. 전체적인 이산화탄소 포집 및 저장 성능의 향상을 위해서는 사이클을 거듭하며 발생하는 소결(sintering)로 인한 안정성 저하 문제를 해결하고 금속 산화물의 구조 또한 최적화해야 한다. 금속 산화물 표면에 얇은 박막을 형성하는 것은 소결로 인한 손상을 막을 수 있는 방법이다. 이러한 박막 제조 기술로 잘 알려진 기술에는 화학기상증착법(chemical vapor deposition)과 원자층증착기술(atomic layer deposition)이 있다. 본 총설에서는 CVD, ALD 기술을 비롯하여 효과적인 반응 안정성 향상을 위한 안정제 첨가 방법, 금속 산화물 구조 개선에 대한 다양한 최근 기술들을 다루었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.490-490
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• 2011

Graphene, hexagonal network of carbon atoms forming a one-atom thick planar sheet, has been emerged as a fascinating material for future nanoelectronics. Huge attention has been captured by its extraordinary electronic properties, such as bipolar conductance, half integer quantum Hall effect at room temperature, ballistic transport over ${\sim}0.4{\mu}m$ length and extremely high carrier mobility at room temperature. Several approaches have been developed to produce graphene, such as micromechanical cleavage of highly ordered pyrolytic graphite using adhesive tape, chemical reduction of exfoliated graphite oxide, epitaxial growth of graphene on SiC and single crystalline metal substrate, and chemical vapor deposition (CVD) synthesis. In particular, direct synthesis of graphene using metal catalytic substrate in CVD process provides a new way to large-scale production of graphene film for realization of graphene-based electronics. In this method, metal catalytic substrates including Ni and Cu have been used for CVD synthesis of graphene. There are two proposed mechanism of graphene synthesis: carbon diffusion and precipitation for graphene synthesized on Ni, and surface adsorption for graphene synthesized on Cu, namely, self-limiting growth mechanism, which can be divided by difference of carbon solubility of the metals. Here we present that large area, uniform, and layer controllable graphene synthesized on Cu catalytic substrate is achieved by acetylene-assisted CVD. The number of graphene layer can be simply controlled by adjusting acetylene injection time, verified by Raman spectroscopy. Structural features and full details of mechanism for the growth of layer controllable graphene on Cu were systematically explored by transmission electron microscopy, atomic force microscopy, and secondary ion mass spectroscopy.

• Bulletin of the Korean Chemical Society
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• 제24권11호
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• pp.1659-1663
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• 2003

$Al_2O_3$ thin films were grown on H-terminated Si(001) substrates using dimethylaluminum isopropoxide [DMAl: $(CH_3)_2AlOCH(CH_3)_2$], as a new Al precursor, and water by atomic layer deposition (ALD). The selflimiting ALD process by alternate surface reactions of DMAI and $H_2O$ was confirmed from measured thicknesses of the aluminum oxide films as functions of the DMAI pulse time and the number of DMAI-$H_2O$ cycles. Under optimal reaction conditions, a growth rate of ~1.06 ${\AA}$ per ALD cycle was achieved at the substrate temperature of $150\;^{\circ}C$. From a mass spectrometric study of the DMAI-$D_2O$ ALD process, it was determined that the overall binary reaction for the deposition of $Al_2O_3\;[2\;(CH_3)_2AlOCH(CH_3)_2\;+\;3\;H_2O\;{\rightarrow}\;Al_2O_3\;+\;4\;CH_4\;+\;2\;HOCH(CH_3)_2]$can be separated into the following two half-reactions: where the asterisks designate the surface species. Growth of stoichiometric $Al_2O_3$ thin films with carbon incorporation less than 1.5 atomic % was confirmed by depth profiling Auger electron spectroscopy. Atomic force microscopy images show atomically flat and uniform surfaces. X-ray photoelectron spectroscopy and cross-sectional high resolution transmission electron microscopy of an $Al_2O_3$ film indicate that there is no distinguishable interfacial Si oxide layer except that a very thin layer of aluminum silicate may have been formed between the $Al_2O_3$ film and the Si substrate. C-V measurements of an $Al_2O_3$ film showed capacitance values comparable to previously reported values.

• 비파괴검사학회지
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• 제26권2호
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• pp.69-76
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• 2006

차세대 원자로로 부각되고 있는 고온가스로에서는 윈자로에서는 고온 안정성 및 핵분열생성물 차단 성능이 우수한 TRISO(tri-isotropic) 핵연료를 사용하고 있다. TRISO 핵연료 입자는 직경이 약 1mm인 구 형태로 입자의 중심에는 직경 0.5mm의 핵연료 커널(kernel)이 포함되며 커널 외곽을 코팅 층이 에워싸고 있다. 이 코팅 층은 완충(buffer) PyC(pyrolytic carbon)층, 내부 PyC층, SiC층, 그리고 외부 PyC층으로 구성되어 있다. 각 코팅 층의 두께는 수십-백${\mu}m$ 범위이고 사양으로 정해져 있으며, 본 연구에서는 각 코팅 층의 두께를 비파괴적으로 측정하기 위하여 마이크로포커스 X-선 발생장치와 고해상도 X-선 평판(flat panel) 검출기초 구성된 정밀한 X-선 래디오그래피 장치를 개발하였다. 개발된 마이크로 X-선 래디오그래피 장치를 이용하여 $UO_2$ 핵물질 $ZrO_2$를 커널로 사용한 모의 TRISO 핵연료 입사에 대한 투과 영상을 획득한 후 디지털 영상처리 기술을 이용하여 코팅 층 사이의 경계선이 구분 가능하도록 영상을 개선하고 디지털 영상처리 알고리듬을 개발하여 코팅 층의 두께를 파동으로 측정하였다.