Preparation of Al2O3 Thin Films by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide and Water and Their Reaction Mechanisms
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An, Ki-Seok
(Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology)
Cho, Won-Tae (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) Sung, Ki-Whan (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) Lee, Sun-Sook (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) Kim, Yun-Soo (Thin Film Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) |
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