• 제목/요약/키워드: Atmospheric pressure micro plasma

검색결과 25건 처리시간 0.03초

서브마이크로 펄스 전압파형을 이용한 대기압 저온 마이크로 플라즈마 소스 개발 (The Development of Non-thermal Micro Plasma Source Under Atmospheric Pressure by Means of Submicrosecond Pulse Voltage Waveforms)

  • 최준영;이호준;김동현;이해준;박정후
    • 전기학회논문지
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    • 제56권10호
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    • pp.1802-1806
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    • 2007
  • Nowadays, many configurations and applications of small atmospheric plasma source have been investigated with growing interest, as it provides the bacteria inactivation, the surface modification and removal of unwanted small regions, and so on. In this paper, the non-thermal micro plasma source under atmospheric pressure by means of submicrosecond pulse voltage waveforms is suggested. Plasma operates in helium is appears as a small (sub-mm) glow at the tip of a plasma gun. Electrical measurements show that the plasma source operates at low voltage (about 500V) and the power consumption is about 1W at 25kHz. Moreover, the emission spectrum shows the relatively higher emission intensity of oxygen particles than those of helium and nitrogen.

마이크로 채널 반응기 내 상압 글로우 플라즈마 생성 및 응용 (Generation and Application of Atmospheric Pressure Glow Plasma in Micro Channel Reactor)

  • 이대훈;박현향;이재옥;이승섭;송영훈
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1869-1873
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    • 2008
  • In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

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Atmospheric Pressure Micro Plasma Sources

  • Brown, Ian
    • 한국표면공학회지
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    • 제34권5호
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    • pp.384-390
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    • 2001
  • The hollow cathode discharge is a kind of plasma formation scheme in which plasma is formed inside a hollow structure, the cathode, with current to a nearby anode of arbitrary shape. In this scheme, electrons reflex radially within the hollow cathode, establishing an efficient ionization mechanism for gas within the cavity. An existence condition for the hollow cathode effect is that the electron mean-free-path for ionization is of the order of the cavity radius. Thus the size of this kind of plasma source must decrease as the gas pressure is increased. In fact, the hollow cathode effect can occur even at atmospheric pressure for cathode diameters of order 10-100 $\mu\textrm{m}$. That is, the "natural" operating pressure regime for a "micro hollow cathode discharge" is atmospheric pressure. This kind of plasma source has been the subject of increasing research activity in recent years. A number of geometric variants have been explored, and operational requirements and typical plasma parameters have been determined. Large arrays of individual tiny sources can be used to form large-area, atmospheric-pressure plasma sources. The simplicity of the method and the capability of operation without the need for the usual vacuum system and its associated limitations, provide a highly attractive option for new approaches to many different kinds of plasma applications, including plasma surface modification technologies. Here we review the background work that has been carried out in this new research field.

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교류 펄스 전압을 이용한 평판형 대기압 유전격벽방전 플라즈마의 특성 분석 (A Study on the Dielectric Barrier Discharges Plasmas of Flat Atmospheric Pressure Using an AC Pulse Voltage)

  • 이종봉;하창승;김동현;이호준;이해준
    • 전기학회논문지
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    • 제61권5호
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    • pp.717-720
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    • 2012
  • Various types of dielectric-barrier-discharge (DBD) devices have been developed for diverse applications for the last decade. In this study, a flat non-thermal DBD micro plasma source under atmospheric pressure has been developed. The flat-panel type plasma is generated by bipolar pulse voltages, and driving gas is air. In this study, the plasma source was investigated with intensified charge coupled device (ICCD) images and Optical Emission Spectroscopy (OES). The micro discharges are generated on the crossed electrodes. For theoretical analysis, 2-dimensional fluid simulation was performed. The plasma source can be driven in air, and thus the operation cost is low and the range of application is wide.

Particle-in-Cell Simulation for the Control of Electron Energy Probability & Electron temperature of Dielectric Barrier Discharges at Atmospheric Pressure

  • Lee, Jung-Yel;Song, In-Cheol;Lee, Ho-Jun;Lee, Hae-June
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.528-528
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    • 2012
  • Recently, atmospheric pressure plasmas attract lots of interests for the useful applications such as surface modification and bio-medical treatment. In this study, a particle-in-cell Monte Carlo collision (PIC-MCC) simulation was adopted to investigate the discharge characteristics of a planar micro dielectric barrier discharge (DBD) with a driving frequency from 13.56 MHz to 162.72 MHz and with a gap distance of 80 micrometers. The variation of frequency, in the change in the electron energy probability function (EEPF). Through the relation between the ion trajectories and the frequency, results in the change of EEPFs is achievable with the turning point of frequency mode. Therefore, it is possible to categorize the efficient operation range of DBDs for its applications by controlling the interactions between plasmas and neutral gas for the generation of preferable radicals.

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바이오-메디컬 응용을 위한 마이크로 플라즈마 분사 소자 (Microplasma-Jet Device for Bio-medical Application)

  • 김강일;홍용철;김근영;양상식
    • 전기학회논문지
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    • 제58권12호
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    • pp.2474-2479
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    • 2009
  • This paper presents an atmospheric microplasma-jet device for bio~medical application. The microplasma-jet device consists of four components; a thin Ni anode, porous alumina insulator, a stainless steel cathode and an aluminum case. The anode has 8 holes, and hole diameter and depth are $200 {\mu}m$ and $60 {\mu}m$, respectively. The discharge test was performed in atmospheric pressure using nitrogen gas and AC voltage at the optimum gas flow rate of 4 Vmin. The plasma-jet is ejected stably for the input voltage ranging from 5.5 to $9.5 kV_{p-p}$. The plasma becomes dense as the input voltage increases, which was verified by the hydrophilicity change of PMMA surface treated by the plasma. The temperature increasement of the aluminum film exposed to plasma-jet illustrates that the micro plasma-jet device is feasible for bio-medical application.

상압 마이크로 글로우 방전 분사 소자 (Atmospheric Micro Glow Plasma-jet Device)

  • 김강일;홍용철;김근영;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1533_1534
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    • 2009
  • This paper presents an atmospheric micro glow plasma-jet device. The device consists of four components; a thin Ni anode, a porous alumina insulater, a stainless steel cathode and an aluminum case. The Ni anode is fabricated using micromachining technology. The anode has 10 holes, of which the hole diameter and the depth are $250{\mu}m$ and $60{\mu}m$, respectively. The discharge test is performed in nitrogen gas at atmospheric pressure for 20 kHz AC bias. The breakdown voltage is 3.5 kV at gas flow rate of 4 L/min and the the plasma-jet is blown out to ambient at 5.5 kV. In order to verify the characteristics of plasma, the current and the voltage of device are measured. The maximum temperature of plasma is $37^{\circ}C$. The plasma is well generated and stable at high voltage.

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치과용 티타늄 임플란트의 골융합 증진을 위한 체어사이드 친수성 표면처리방법 (Chair-side surface treatment method for inducing hydrophilicity in titanium dental implant)

  • 이정환;전수경;이해형
    • 대한치과의사협회지
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    • 제54권12호
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    • pp.985-995
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    • 2016
  • Titanium (Ti) has been widely used for dental implant due to great biocompatibility and bonding ability against natural alveolar bone. A lot of titanium surface modification has been introduced in dentistry and, among them, methods to introduce micro/nano-roughened surface were considered as clinically approved strategy for accelerating osseointegration of Ti dental implant. To have synergetic effect with topography oriented favors in cell attachment, chair-side surface treatment with reproducibility of micro/nano-topography is introduced as next strategy to further enhance cellular functionalities. Extensive research has been investigated to study the potential of micro/nano-topography preserved chair-side surface treatment for Ti dental implant. This review will discuss ultraviolet, low level of laser therapy and non-thermal atmospheric pressure plasma on Ti dental implant with micro/nano-topography as next generation of surface treatment due to its abilities to induce super-hydrophilicity or biofunctionality without change of topographical cues.

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다공성 금속 샤워헤드가 적용된 상압플라즈마 화학기상증착법을 이용한 저온 다결정 실리콘 증착 공정 (Low Temperature Polycrystalline Silicon Deposition by Atmospheric Pressure Plasma Enhanced CVD Using Metal Foam Showerhead)

  • 박형규;송창훈;오훈정;백승재
    • 한국전기전자재료학회논문지
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    • 제33권5호
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    • pp.344-349
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    • 2020
  • Modern thin film deposition processes require high deposition rates, low costs, and high-quality films. Atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) meets these requirements. AP-PECVD causes little damage on thin film deposition surfaces compared to conventional PECVD. Moreover, a higher deposition rate is expected due to the surface heating effect of atomic hydrogens in AP-PECVD. In this study, polycrystalline silicon thin film was deposited at a low temperature of 100℃ and then AP-PECVD experiments were performed with various plasma powers and hydrogen gas flow rates. A deposition rate of 15.2 nm/s was obtained at the VHF power of 400 W. In addition, a metal foam showerhead was employed for uniform gas supply, which provided a significant improvement in the thickness uniformity.

Palm-Size-Integrated Microwave Power Module at 1.35-GHz for an Atmospheric Pressure Plasma for biomedical applications

  • Myung, C.W.;Kwon, H.C.;Kim, H.Y.;Won, I.H.;Kang, S.K.;Lee, J.K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.498-498
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    • 2013
  • Atmospheric Pressure Plasmas have pioneered a new field of plasma for biomedical application bridging plasma physics and biology. Biological and medical applications of plasmas have attracted considerable attention due to promising applications in medicine such as electro-surgery, dentistry, skin care and sterilization of heat-sensitive medical instruments [1]. Traditional approaches using electronic devices have limits in heating, high voltage shock, and high current shock for patients. It is a great demand for plasma medical industrial acceptance that the plasma generation device should be compact, inexpensive, and safe for patients. Microwave-excited micro-plasma has the highest feasibility compared with other types of plasma sources since it has the advantages of low power, low voltage, safety from high-voltage shock, electromagnetic compatibility, and long lifetime due to the low energy of striking ions [2]. Recent experiment [2] shows three-log reduction within 180-s treatment of S. mutans with a low-power palm-size microwave power module for biomedical application. Experiments using microwave plasma are discussed. This low-power palm-size microwave power module board includes a power amplifier (PA) chip, a phase locked loop (PLL) chip, and an impedance matching network. As it has been a success, more compact-size module is needed for the portability of microwave devices and for the various medical applications of microwave plasma source. For the plasma generator, a 1.35-GHz coaxial transmission line resonator (CTLR) [3] is used. The way of reducing the size and enhancing the performances of the module is examined.

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