• Title/Summary/Keyword: Ar rate

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Magnetic Properties of Spin Valve Ta Underlayer Depending on N2 Concentration and Annealing Temperature (스핀 밸브 Ta 하지층의 질소함유량 변화와 열처리 온도에 따른 자기적 특성)

  • Choi, Yeon-Bong;Kim, Ji-Won;Jo, Soon-Chul;Lee, Chang-Woo
    • Journal of the Korean Magnetics Society
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    • v.15 no.4
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    • pp.226-230
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    • 2005
  • In this research, magnetic properties and annealing effects of the spin valve structures were investigated, which have Ta underlayer deposited with Ar and $N_2$ gas mixture. Also, TaN underlayer as a diffusion barrier and the substrate were investigated. The structure of the spin valve was Si($SiO_2$)/Ta(TaN)/NiFe/CoFe/Cu/CoFe/FeMn/Ta. Deposition rate was decreased and resistivity and roughness of the TaN films were increased as the $N_2$ gas flow was increased. The XRD results after high temperature annealing showed that Silicides were created in Si/Ta layer, but not in Si/TaN layer. Magnetoresistance ratio (MR) and exchange coupling field ($H_{ex}$) were decreased when the $N_2$ gas flow was increased over 4.0 sccm. The MR of the spin valves with Ta and TaN films deposited with up to 4.0 sccm of $N_2$ gas flow was increased about $0.5\%$ until the annealing temperature of up to $200^{\circ}C$ and then, decreased. TaN film deposited with 8.0 sccm of $N_2$ gas flow showed twice the adhesion of the Ta film. The above results indicate that with 3.0 sccm of $N_2$ gas flow during the Ta underlayer deposition, the magnetic properties of the spin valves are maintained, while the underlayer may be used as a diffusion barrier and the adhesion between the Si substrate and the underlayer is increased.

Magnetoresistance of Bi Nanowires Grown by On-Film Formation of Nanowires for In-situ Self-assembled Interconnection

  • Ham, Jin-Hee;Kang, Joo-Hoon;Noh, Jin-Seo;Lee, Woo-Young
    • Proceedings of the Korean Magnestics Society Conference
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    • 2010.06a
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    • pp.79-79
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    • 2010
  • Semimetallic bismuth (Bi) has been extensively investigated over the last decade since it exhibits very intriguing transport properties due to their highly anisotropic Fermi surface, low carrier concentration, long carrier mean free path l, and small effective carrier mass $m^*$. In particular, the great interest in Bi nanowires lies in the development of nanowire fabrication methods and the opportunity for exploring novel low-dimensional phenomena as well as practical application such as thermoelectricity[1]. In this work, we introduce a self-assembled interconnection of nanostructures produced by an on-film formation of nanowires (OFF-ON) method in order to form a highly ohmic Bi nanobridge. A Bi thin film was first deposited on a thermally oxidized Si (100) substrate at a rate of $40\;{\AA}/s$ by radio frequency (RF) sputtering at 300 K. The sputter system was kept in an ultra high vacuum (UHV) of $10^{-6}$ Torr before deposition, and sputtering was performed under an Ar gas pressure of 2m Torr for 180s. For the lateral growth of Bi nanowires, we sputtered a thin Cr (or $SiO_2$) layer on top of the Bi film. The Bi thin films were subsequently put into a custom-made vacuum furnace for thermal annealing to grow Bi nanowires by the OFF-ON method. After thermal annealing, the Bi nanowires cannot be pushed out from the topside of the Bi films due to the Cr (or $SiO_2$) layer. Instead, Bi nanowires grow laterally as a mean s of releasing the compressive stress. We fabricated a self-assembled Bi nanobridge (d=192 nm) device in-situ using OFF-ON through annealing at $250^{\circ}C$ for 10hours. From I-V measurements taken on the Bi nanobridge device, contacts to the nanobridge were found highly ohmic. The quality of the Bi nanobridge was also proved by the high MR of 123% obtained from transverse MR measurements. These results manifest the possibility of self-assembled nanowire interconnection between various nanostructures for a variety of applications and provide a simple device fabrication method to investigate transport properties on nanowires without complex patterning and etching processes.

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Growth of SiC Oxidation Protective Coating Layers on graphite substrates Using Single Source Precursors

  • Kim, Myung-Chan;Heo, Cheol-Ho;Park, Jin-Hyo;Park, Seung-Jun;Han, Jeon-Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.122-122
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    • 1999
  • Graphite with its advantages of high thermal conductivity, low thermal expansion coefficient, and low elasticity, has been widely used as a structural material for high temperature. However, graphite can easily react with oxygen at even low temperature as 40$0^{\circ}C$, resulting in CO2 formation. In order to apply the graphite to high temperature structural material, therefore, it is necessary to improve its oxidation resistive property. Silicon Carbide (SiC) is a semiconductor material for high-temperature, radiation-resistant, and high power/high frequency electronic devices due to its excellent properties. Conventional chemical vapor deposited SiC films has also been widely used as a coating materials for structural applications because of its outstanding properties such as high thermal conductivity, high microhardness, good chemical resistant for oxidation. Therefore, SiC with similar thermal expansion coefficient as graphite is recently considered to be a g행 candidate material for protective coating operating at high temperature, corrosive, and high-wear environments. Due to large lattice mismatch (~50%), however, it was very difficult to grow thick SiC layer on graphite surface. In theis study, we have deposited thick SiC thin films on graphite substrates at temperature range of 700-85$0^{\circ}C$ using single molecular precursors by both thermal MOCVD and PEMOCVD methods for oxidation protection wear and tribological coating . Two organosilicon compounds such as diethylmethylsilane (EDMS), (Et)2SiH(CH3), and hexamethyldisilane (HMDS),(CH3)Si-Si(CH3)3, were utilized as single source precursors, and hydrogen and Ar were used as a bubbler and carrier gas. Polycrystalline cubic SiC protective layers in [110] direction were successfully grown on graphite substrates at temperature as low as 80$0^{\circ}C$ from HMDS by PEMOCVD. In the case of thermal MOCVD, on the other hand, only amorphous SiC layers were obtained with either HMDS or DMS at 85$0^{\circ}C$. We compared the difference of crystal quality and physical properties of the PEMOCVD was highly effective process in improving the characteristics of the a SiC protective layers grown by thermal MOCVD and PEMOCVD method and confirmed that PEMOCVD was highly effective process in improving the characteristics of the SiC layer properties compared to those grown by thermal MOCVD. The as-grown samples were characterized in situ with OES and RGA and ex situ with XRD, XPS, and SEM. The mechanical and oxidation-resistant properties have been checked. The optimum SiC film was obtained at 85$0^{\circ}C$ and RF power of 200W. The maximum deposition rate and microhardness are 2$mu extrm{m}$/h and 4,336kg/mm2 Hv, respectively. The hardness was strongly influenced with the stoichiometry of SiC protective layers.

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A Study on the High Temp. Tensile Properties of B1914 Ni-base Superalloy According to Crystal Structures of Poly-, Directionally Solidified- and Single Crystal Casts (Ni기 초합금 B1914의 다결정, 방향성 및 단결정 주조구조에 따른 고온 인장 특성 연구)

  • An, Seong-Uk;Jang,Yong-Seok;Yun, Dong-Han;Im, Ok-Dong;Larionov, V.;Grafas, I.;Jin, Yeong-Hun;Lee, Jae-Hun;Seo, Dong-Lee;O, Je-Myeong;Lee, Sang-Jun;Lim, Dae-Soon
    • Korean Journal of Materials Research
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    • v.8 no.9
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    • pp.831-836
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    • 1998
  • The B1914 Ni-base superalloy was manufactured according to crystal structures of poly-, directionally solidified- and single crystals. We observe deformation as type of different crystal structure from room to high temperature. Specimens are controled by cooling rate and thermal gradient and then heat treatment in vacuum and then cooling with Ar gas. Different crystal structure has different stress-strain characteristic. At $600^{\circ}C$, yield strength and ultimate strength is increased single-, directionally solidified- and poly crystals in order.

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Antioxidative and Antihypertensive Effects of Lycii fructus Extracts (구기자(Lycii fructus) 추출물의 항산화와 항고혈압 효과)

  • Cho, Young-Je;Chun, Sung-Sook;Cha, Weon-Seup;Park, Joon-Hee;Lee, Kyoung-Hwan;Kim, Jeung-Hoan;Kwon, Hyo-Jung;Yoon, So-Jung
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.34 no.9
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    • pp.1308-1313
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    • 2005
  • The physiological activity of Lycii fructus extracts were examined. Total phenolic contents in the ethanol extracts (9.5 mg/g) of Lycii fructus were higher than that of water extracts (8.7 mg/g). The chlorogenic acid ($1.7{\mu}g$ in water extracts and $1.3{\mu}g$ in $60\%$ ethanol extract) was the most abundant phenolic compound as analyzed by HPLC. The ABTS [2,2'-azinobis (3-othylbenfothiaznoline-6- sulfornic acid)] radical decolor-ization electron donating ability (DPPH) and antioxidant protection factor (PF) were determined for extracts from Lycii fructus. Water extract ($76.7\%$ on ABTS, $92.6\%$ on DPPH and 1.1 on PF) showed higher inhibition rate than $60\%$ ethanol extracts ($52.8\%,\;88.8\%$ and 1.0). Thiobarbituric acid reactive substance (TBARS) was determined as $1.5{\times}10^{-3}\;{\mu}M$ in $60\%$ ethanol extract. Ethanol extracts was more effective in decreasing TBARS than water extracts. The water extracts from Lycii fructus had higher angiotensin converting enzyme (ACE) inhibition activity than ethanol extracts. The result will be useful for functional foods application and under-standing the physiological activities of Lycii fructus.

Formation and Characteristics of the Fluorocarbonated SiOF Film by $O_2$/FTES-Helicon Plasma CVD Method

  • Kyoung-Suk Oh;Min-Sung Kang;Chi-Kyu Choi;Seok-Min Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.77-77
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    • 1998
  • Present silicon dioxide (SiOz) 떠m as intennetal dielectridIMD) layers will result in high parasitic c capacitance and crosstalk interference in 비gh density devices. Low dielectric materials such as f f1uorina뼈 silicon oxide(SiOF) and f1uoropolymer IMD layers have been tried to s이ve this problem. I In the SiOF ftlm, as fluorine concentration increases the dielectric constant of t뼈 film decreases but i it becomes unstable and wa않r absorptivity increases. The dielectric constant above 3.0 is obtain어 i in these ftlms. Fluoropolymers such as polyte$\sigma$따luoroethylene(PTFE) are known as low dielectric c constant (>2.0) materials. However, their $\alpha$)Or thermal stability and low adhesive fa$\pi$e have h hindered 야1리ru뚱 as IMD ma따"ials. 1 The concept of a plasma processing a찌Jaratus with 비gh density plasma at low pressure has r received much attention for deposition because films made in these plasma reactors have many a advantages such as go여 film quality and gap filling profile. High ion flux with low ion energy in m the high density plasma make the low contamination and go어 $\sigma$'Oss피lked ftlm. Especially the h helicon plasma reactor have attractive features for ftlm deposition 야~au똥 of i앙 high density plasma p production compared with other conventional type plasma soun:es. I In this pa야Jr, we present the results on the low dielectric constant fluorocarbonated-SiOF film d밑JOsited on p-Si(loo) 5 inch silicon substrates with 00% of 0dFTES gas mixture and 20% of Ar g gas in a helicon plasma reactor. High density 띠asma is generated in the conventional helicon p plasma soun:e with Nagoya type ill antenna, 5-15 MHz and 1 kW RF power, 700 Gauss of m magnetic field, and 1.5 mTorr of pressure. The electron density and temperature of the 0dFTES d discharge are measUI벼 by Langmuir probe. The relative density of radicals are measured by optic허 e emission spe따'Oscopy(OES). Chemical bonding structure 3I피 atomic concentration 따'C characterized u using fourier transform infrared(FTIR) s야3띠"Oscopy and X -ray photonelectron spl:’따'Oscopy (XPS). D Dielectric constant is measured using a metal insulator semiconductor (MIS;AVO.4 $\mu$ m thick f fIlmlp-SD s$\sigma$ucture. A chemical stoichiome$\sigma$y of 야Ie fluorocarbina$textsc{k}$영-SiOF film 따~si야영 at room temperature, which t the flow rate of Oz and FTES gas is Isccm and 6sccm, res야~tvely, is form려 야Ie SiouFo.36Co.14. A d dielec$\sigma$ic constant of this fIlm is 2.8, but the s$\alpha$'!Cimen at annealed 5OOt: is obtain려 3.24, and the s stepcoverage in the 0.4 $\mu$ m and 0.5 $\mu$ m pattern 킹'C above 92% and 91% without void, res야~tively. res야~tively.

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Effects of Achyranthes Radix and Electroacupuncture on Type II Collagen-Induced Arthritis (류마티스 관절염에서 우슬과 전침자극의 항관절염 효과)

  • Kim, Gye-Yeop;Seong, Rak-Seon;Kim, Young-Eok;Chang, Mee-Kyung;Yu, Young-Dae;Choi, Ki-Bok;Jeong, Hyun-Woo
    • Journal of Physiology & Pathology in Korean Medicine
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    • v.21 no.2
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    • pp.425-431
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    • 2007
  • The purpose of this study was to observe the effects of Achyranthes Radix(AR) and electroacupuncture(EA) in rats with rheumatoid arthritis induced by type II collagen for 28 days. Control group was daily administered 0.9% NaCl 0.5 $m{\ell}$, Group I was daily administered 0.9% NaCl 0.5 $m{\ell}$ to arthritic rats, Group II was orally administered with Achyranthes Radix 500 mg/kg 0.5 $m{\ell}$ to arthritic rats. Group III was given 2 Hz EA of chok samni acupoint(ST36) in the test group for 30 min/days to arthritic rats. Group IV was daily orally administered with Achyranthes Radix 500 mg/kg 0.5 $m{\ell}$ and 2 Hz EA of chok samni acupoint(ST36) in the test group for 30 min/days to arthritic rats. This studies have been designed to evaluate the hind paw edema, assessment of arthritis indices, analgetic effects by analysis of blood chemistry(WBC, CRP, ALP, AST). In each group, histologic observations, Safranin O-fast green stain were observed and analyzed. The following results were obtained. Group II, III, IV were significantly decreased arthritis indices and the rate of paw edema compared with Group I . Especially group IV was the most significantly decreased. The WBC, CRP, AST, ALT was that Group II, III, IV were significantly decreased compared with Group I . In conclusion, Achyranthes Radix and Ea contribute to the improvement of blood chemistry and change in safranin O-fast green by knee joint of arthritic rats.

Development and spectroscopic characteristics of the high-power wave guide He Plasma (도파관식 고출력 헬륨 플라즈마의 개발과 분광학적 특성 연구)

  • Lee, Jong-Man;Cho, Sung-Il;Woo, Jin-Chun;Pak, Yong-Nam
    • Analytical Science and Technology
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    • v.25 no.5
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    • pp.265-272
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    • 2012
  • Okamoto cavity was modified to generate high power (2.45 GHz, 2 kW) He, N2 and Ar plasmas with WR-340 waveguide. Many factors which influence to the plasma generation were optimized and investigated for the spectroscopic properties of the He plasma generated. Some of the important factors are the diameter of the inner conductor, the distance between the inner and outer conductors and the distance between the tip of the inner conductor and the torch. After optimization for the He, two torches (a commercial mini torch for ICP and a tangential flow torch made locally) were compared and showed similar results for the helium plasma gas flow of 25 L/min~30 L/min. A tall torch (extended) was used to block the air in-flow and reduced the background intensity at 340 nm region (NH band). Emission intensity was measured for determination of halogen element in the aqueous solution with power and carrier gas flow rate. Electron number density and the excitation temperature were on the order of $3.67{\times}10^{11}/cm^3$ and 4,350 K, respectively. These values are similar or a bit smaller than other microwave plasmas. It has been possible to analyze aqueous samples. The detection limit for Cl (479.45 nm) was obtained to be 116 mg/L and needs analytical optimization for the better performance.

The Clinical and Pathologic Features according to Expression of Acyl Protein Thioesterase-1 (APT1) in Stage I Non-small Cell Lung Cancer (제1기 비소세포폐암에서 APT1 발현의 임상적 의미)

  • Shin, Jung-Ar;Lee, Chang-Ryul;Byun, Min-Kwang;Chang, Yoon-Soo;Kim, Se-Kyu;Chang, Joon;Ahn, Chul-Min;Kim, Hyung-Jung
    • Tuberculosis and Respiratory Diseases
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    • v.68 no.4
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    • pp.212-217
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    • 2010
  • Background: Acyl protein thioesterase-1 (APT1) is a cytosolic protein that may function in the depalmitoylation of numerous proteins, including the Ras family. However, the clinical role of depalmitoyl thioesterase in human cancer is not known. We evaluated the APT1 expression in lung cancer tissue and its clinicopathological findings according APT1 expression pattern. Methods: APT1 expression was examined by immunohistochemistry in the tumor tissue from 79 patients, who had undergone curative surgical removal of the primary lesion; all patients had been diagnosed with stage I non-small cell lung cancer between 1993 and 2004, at Gangnam Severance Hospital, Yonsei University College of Medicine, Seoul, Korea. Results: The APT1 expression was seen in 50 out of 79 (63.3%) cases. The positive APT1 expression was significantly related with histologic subtype and T stage, but was not influenced by differentiation. The positive APT1 expression was not significantly related to patient age, gender, or smoking history. The median follow-up duration was 10.0 years; the 5-year survival rate was 71.0%. The positive APT1 expression group showed significantly worse overall survival and worse disease-free survival without statistical significance. Conclusion: We conclude that positive APT1 expression in stage I lung cancer after surgery is closely associated with overall survival. To evaluate APT1 as a prognostic marker in lung cancer, comprehensive studies on advanced stage cases are needed.

Study of the Formation of Eutectic Melt of Uranium and Thermal Analysis for the Salt Distillation of Uranium Deposits (우라늄 전착물의 염증류에 대한 우라늄 공정(共晶) 형성 및 열해석 연구)

  • Park, Sung-Bin;Cho, Dong-Wook;Hwang, Sung-Chan;Kang, Young-Ho;Park, Ki-Min;Jun, Wan-Gi;Kim, Jeong-Guk;Lee, Han-Soo
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.8 no.1
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    • pp.41-48
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    • 2010
  • Uranium deposits from an electrorefining process contain about 30% salt. In order to recover pure uranium and transform it into an ingot, the salts have to be removed from the uranium deposits. Major process variables for the salt distillation process of the uranium deposits are hold temperature and vacuum pressure. Effects of the variables on the salt removal efficiency were studied in the previous study[1]. By applying the Hertz-Langmuir relation to the salt evaporation of the uranium deposits, the evaporation coefficients were obtained at the various conditions. The operational conditions for achieving above 99% salt removal were deduced. The salt distilled uranium deposits tend to form the eutectic melt with iron, nickel, chromium for structural material of salt evaporator. In this study, we investigated the hold temperature limitation in order to prevent the formation of the eutetic melt between urnaium and other metals. The reactions between the uranium metal and stainless steel were tested at various conditions. And for enhancing the evaporation rate of the salt and the efficient recovery of the distilled salt, the thermal analysis of the salt distiller was conducted by using commercial CFX software. From the thermal analysis, the effect of Ar gas flow on the evaporation of the salt was studied.