• The Journal of Natural Sciences
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• v.5 no.1
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• pp.67-75
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• 1992

In the our country, especially in Yeongil and Wolsung area, abundant authigenic zeolites are found from the tuffaceous sediments and volcanic rocks of Miocene age showing wide variation in their mineralogy and abundance from horizon to horizon. The principal zeolite species identified are clinopti-lolite. mordenite. heulandite. ferrierite, and erionite. etc. Zeolite minerals are widely used in many countries in the following applications; (a) in air separation adsorption processes; (b)as desiccants; (c)in inorganic building materials; (d)in papermaking; (e)in fertilizers; (f)as soilconditioners-this application is based upon the ability of the zeolite to ion exchange with soil nutrients; (g)in the treatment of radioactive wastes; and (h)as adsorbents for toxic gases, etc. In the present paper, using natural zeolite mordenite treated with IN hydrochloric acid or IN sodium chloride solution as column packings, separation characteristics of argon, nitrogen, carbon monoxide, and methane gases have been studied by gas chromatography. By the use of mordenite treated with hydrochloric acid solution, the tailing peak of methane showed from untreated mordenite was satisfactorily reduced, although it was difficult to separate it from carbon monoxide with a column activated at $300^{\circ}C$. Using a column activated at $350^{\circ}C$, methane could be separated from carbon monoxide easily but only carbon monoxide eluted as a bad defined peak. Mordenite treated with sodium chloride solution was generally similar to chromatograms obtained by using the untreated mordenite. Both the above chemical treatments of mordenite had little effect on the separations of argon and nitrogen. The separations and the HETP values obtained from natural zeolite mordenite treated with continuously hydrochloric acid and sodium chloride solutions were almost identical with those obtained with synthetic molecular sieve 5A zeolite. On the other hand, the efficiency of column was good in the range 20~3Oml/min of the carrier helium gas rate.

• Bulletin of the Korean Chemical Society
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• v.16 no.12
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• pp.1232-1235
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• 1995

• Applied Chemistry for Engineering
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• v.16 no.6
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• pp.853-856
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• 2005

Inductively coupled plasma reactive ion etching of magnetic tunnel junction (MTJ) stack, which is one of the key elements in magnetic random access memory, was studied. The MTJ stacks were patterned in nanometer size by electron(e)-beam lithography, and TiN thin films were employed as a hard mask. The etch process of TiN hard mask was examined using Ar, $Cl_2/Ar$, and $SF_6/Ar$. The TiN hard mask patterned by e-beam lithography was first etched and then the etching of MTJ stack was performed. The MTJ stacks were etched using Ar, $Cl_2/Ar$, and $BCl_3/Ar$ gases by varying gas concentration and pressure.

• Mass Spectrometry Letters
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• v.6 no.4
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• pp.112-115
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• 2015

In this article, we examine the influences of Ne and He buffer gases under confined Ar⁺ ion cloud in a homemade Paul ion trap in various pressures and confinement times. The trap is of small size (r₀ = 1 cm) operating in a radio frequency (rf) voltage only mode, and has limited accuracy of 13 V. The electron impact and ionization process take place inside the trap and a Faraday cup has been used for the detection. Although the experimental results show that the Ar⁺ ion FWHM with Ne buffer gas is wider than the He buffer gas at the same pressure (1×10^-1 mbar) and confinement time is about 1000 μs, nevertheless, a faster cooling was found with He buffer gas with 500 μs. ultimetly, the obtanied results performed an average cloud tempertures reduced from 1777 K to 448.3 K for Ne (1000 μs) and from 1787.9 K to 469.4 K for He (500 μs)

• Proceedings of the KWS Conference
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• 2010.05a
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• pp.20-20
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• 2010

GTA (Gas Tungsten Arc)용접은 불활성 분위기에서 용접이 이루어지기 때문에 타 아크용접법에 비해 용접부 품질이 우수하여 고품질이 요구되는 산업분야에 널리 이용되고 있다. 하지만 스테인리스강으로 pipe를 제조하기 위해 GTA 용접을 적용할 경우, Laser 및 고주파 용접 (HFIW)에 비해 용접부 품질 및 용접속도가 낮기 때문에 pipe를 제조하는 산업에서 적용에 제한을 받고 있다. 하지만, GTA는 laser 혹은 HFIW에 비해 가격이 1/10수준으로 낮고, 용접부 gap tolerance 및 용접면 관리범위가 넓은 장점이 있기 때문에 GTA의 용접속도 및 용접품질을 향상시키기 위한 연구가 꾸준히 진행되고 있다. 일반적으로 스테인리스강 GTA용접 시 용접속도를 향상시키기 위해, 모재의 성분 제어 (합금성분 최적화-Al, S, Se, O등), Flux 도포 기술 (산화물을 용접전에 도포하여 용접속도 향상) 및 혼합보호가스 적용 등이 있다. 스테인리스강 용접 시 보호가스로는 용접부 품질을 확보하기 위해 Ar을 주로 사용하고 있다. 하지만 용입 특성을 향상시키기 위해 아크의 온도를 높일 수 있는 He, 혹은 $H_2$ gas를 단독 혹은 혼합하여 사용하고 있다. 오스테나이트계 스테인리스의 경우 용입특성을 향상시키기 위해 Ar에 $H_2$를 2~10%정도 혼합하여 사용하고 있다. 페라이트계 스테인리스강은 수소에 대한 고용도가 상대적으로 작아 용접부 수소 취화를 일으킬 수 있기 때문에 적용에 제한을 받고 있어 그 대안으로 산소를 극히 소량을 혼합하여 용입성 향상에 대한 연구가 보고 되고 있다. 따라서 본 연구에서는 페라이트계 스테인리스강의 용입특성을 향상시킬 목적으로 Ar에 산소를 미량 첨가 (1%미만) 하여 용접전류 및 산소 함량에 따른 용입특성의 변화에 대해 연구하였다. 또한 기계적인 물성 및 부식특성을 평가하였고, 최종적으로 실용화 가능성을 파악하기 위해 용접전극의 수명 테스트를 실시하였다. 실시한 결과, 산소가 첨가량 증가 할수록 용입특성은 상승하였으며, 기계적인 물성 또한 산소를 첨가하지 않은 경우에 비해 거의 유사한 값을 얻을 수 있었다, 하지만 산소함량이 증가 할수록 전극의 수명은 감소하여 교체주기가 증가함을 알 수 있다. 본 연구를 통해 얻어진 기술을 상용화시키기에는 극복해야할 문제가 있지만, 소재 합금성분 설계 시 용접생산성 향상위한 산소성분 범위를 제시할 수 있으리라 판단된다.

• Journal of the Korean Vacuum Society
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• v.11 no.2
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• pp.127-134
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• 2002

Recently, Plasma display panel(PDP) has been in the spotlight as one of the next generation flat-panel-display device. The luminance and luminous efficiency improvement is the hot issues for making a plasma display into a large flat panel device. In this paper, We suggest a new penning gas mixture, in order to find the optimum mixture gas in plasma display panel. The optimum gas composition has been found by the partial pressure of inert gases(such as Af and Kr added to matrix of He(70%)-Ne(27%)Xe(3%) and Ne(96%)-Xe(4%)). The influences of Ar or Kr addition to Ne(96%)-Xe(4%) and He(70%)-Ne(27%)-Xe(3%) mixture gases are experimentally investigated for AC Plasma Display Panel. When rare As(0.01%-0.03%) or Kr(0.01%-0.03%) is added Ne-Xe and He-Ne-Xe mixture gases, the luminance increases over 10%-20% and luminous efficiency increases over 10%-20% at 200 Torr. It is sure that luminance and efficiency are improved by Penning effect. Also, This influence of Penning effect is shown by increased wall charge(10%-25%). In addition to the result, firing voltage and minimum sustain voltage was approximately decreased by 2V-3V.

• Transactions on Electrical and Electronic Materials
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• v.11 no.2
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• pp.81-84
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• 2010

Al-doped ZnO (AZO) films were prepared by an Ar:$H_2$ gas radio frequency (RF) magnetron sputtering system with a AZO ($2\;wt{\cdot}%\;Al_2O_3$) ceramic target at the low temperature of $100^{\circ}C$ and annealed in hydrogen ambient at the temperature of $300^{\circ}C$. To investigate the influence of the $H_2$ flow ratio on the properties of the AZO films, the $H_2$ flow ratio was changed from 0.5% to 2%. As a result, the AZO films, deposited with a 1% $H_2$ addition, showed a resistivity of $11.7\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$. When the AZO films were annealed at $300^{\circ}C$ for 1 hour in a hydrogen atmosphere, the resistivity decreased from $11.7\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$ to $5.63\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$. The lowest resistivity of $5.63\;{\times}\;10^{-4}{\Omega}{\cdot}cm$ was obtained by adding 1% hydrogen gas to the deposition and annealing process. The X-ray diffraction patterns of all the films showed a preferable growth orientation in the (002) plane. The spectrophotometer measurements showed that the transmittance of 85% was obtained by the film deposited with the $H_2$ flow ratio of 1% at 940 nm for GaAs/GaAlAs LEDs.

• Journal of the Korean Vacuum Society
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• v.19 no.3
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• pp.169-176
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• 2010

Cryopumps can provide economical profits with a relatively high pumping speed per size. However, it is somewhat doubtful that pumping performance of cryopums, which is very sensitive to the temperature of the adsorption panel, can be maintained or recovered fast for large continuous or impulsive gas loads. The official evaluation items indicating cryopump performance for gas loads are the maximum throughput and the crossover value. There are two other, unofficial but widely used, items, the Ar recovery time and gulp characteristics. Although these evaluation items look absolutely different with each other, there are close relations and even duplications in their test schemes. Therefore, it is necessary to study how to improve practically each test procedure, and combine or unify some procedures.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.9
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• pp.423-429
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• 2002

RuOx thin films were fabricated by the method of liquid delivery MOCVD using Ru(C$_{8}$ $H_{13}$ $O_2$)$_3$ as the precursor and their thermal effects and conductivity were investigated. Ru films deposited at 25$0^{\circ}C$ were annealed at $650^{\circ}C$ for 1min with Ar, $N_2$ or N $H_3$ ambient. The changes of the micro-structure, the surface morphology and the electrical resistivity of the Ru films after annealing were studied. Ar gas was more effective than $N_2$ and N $H_3$ gases as an ambient gas for the post annealing of the Ru films, because of smaller resistivity and denser grains. The X-ray diffraction and X-ray photoelectron spectroscopy results indicate that the Ru $O_2$ phase and the silicidation are not observed regardless of the ambient gases. The minimum resistivity of the Ru film is found to have the value of 26.35 $\mu$Ω-cm in Ar ambient. Voids were formed at Ru/TiN interface of the Ru layer after annea1ing in $N_2$ ambient. The $N_2$ gas generated due to the oxidation of the TiN layer accumulated at the Ru/TiN interface, forming bubbles; consequently, the stacked film may peel off the Ru/TiN interface.e.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.521-522
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• 2006

In this paper, hybrid air-water discharges were used to develop an optimal condition for providing a high level of water decomposition for hydrogen yield. Electrical and optical phenomena accompanying the discharges were investigated along with feeding gases, flow rates, and point-to-plane electrode gap distance. The primary focus of this experiment was put on the optical emission of the near UV range, with the energy threshold sufficient for water dissociation and excitation. The $OH(A^{2+},'=0\;X^2,"=0$) band's optical emission intensity indicated the presence of plasma chemical reactions involving hydrogen formation. In the gaseous atmosphere saturated with water vapor the OH(A-X) band intensity was relatively high compared to the liquid and transient phases although the optical emission strongly depended on the flow rate and type of feeding gas. In the gaseous phase discharge phenomenon for Ar carrier gas transformed into a gliding arc via the flow rate growth. OH(A-X) band's intensity increased according to the flow rate or residence time of He feeding gas. Reciprocal tendency was acquired for $N_2$ and Ar carrier gases. The peak value of OH(A-X) intensity was observed in the proximity of the water surface, however in the cases of Ar and $N_2$ with 0.5 SLM flow rate peaks shifted to the region below the water surface. Rotational temperature ($T_{rot}$) was estimated to be in the range of 900-3600 K, according to the carrier gas and flow rate, which corresponds to the arc-like-streamer discharge.