Microstructural Characterization of MOCVD RuOx Thin Films and Effects of Annealing Gas Ambient
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Kim, Gyeong-Won
(Dept. of Electrical Elecronic Computer Engineering, Chungbuk National University)
Kim, Nam-Su (Dept. of Electrical Elecronic Computer Engineering, Chungbuk National University) Choe, Il-Sang (Hynix Semiconductor) Kim, Ho-Jeong (Hynix Semiconductor) Park, Ju-Cheol (Hynix Semiconductor) |
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A. Tsuzumitani, Y. Okuno, J. Shibata, T. Shimizu, K. Yamamoto and Y. Mori, 'Extendibility of |
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S. E. Park, H. M. Kim, K. B. Kim and S. H. Min, 'Metallorganic Chemical Vapor Deposition of Ru and |
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S. Bhaskar, S. B. Majumder, P. S. Dobal, R. S. Katiyar and S. B. Krupanidhi, 'Structural and electrical characteristics of |
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T. Suzuki, Y. Nishi and M. Fujimoto, 'Effect of Nonstoichiometry on Microstructure of Epitaxially Grown |
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S. Yamamichi, P-Y.Leasaicherre, H. Yamaguchi, K. Takemura;S. Sone, H. Yabuta, K. Sato, T. Tamura, K. Nakajima, S. Ohnishi, K. Tokashiki, Y. Hayashi, Y. Kato, Y. Miyasaka, M. Yoshida and H. One, 'An ECR MOCVD (Ba,Sr) |
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S. Y. Kang, K. H. Choi, S. K. Lee, C. S. Hwang and H. H. Kim, 'Thermodynamic Calculations and Metallorganic Chemical Vapor Deposition of Ruthenium Thin Films Using Bis(ethyl- |
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Y. C. Choi and B. S. Lee, 'Properties of Ru and |
8 | K. W. Kim, N. S. Kim, Y. S. Kim, I. S. Choi, H. J. Kim and J. C. Park, 'Fabrication and Characterization of Ru Thin Films Prepared by Liquid Delivery Metal-Organic Chemical Vapor Deposition', Jpn. J. Appl. Phys., vol. 41, no. 2A, pp. 820-825, February 2002 DOI |
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10 | D. P. Vijay, S. B. Desu and W. Pan, 'Reactive Ion Etching of Lead Zirconate Titanate(PZT) Thin Film Capacitors', J. Electrochem. Soc., vol. 140, no. 9, pp. 2635-2639, September 1993 DOI |
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J. G. Lee, Y. T. Kim, S. K. Min and S. H. Choh, "Effects of excess oxygen on the properties of reactively sputtered |
12 | A. Grill, W. Kane, J. Viggiano, M. Brady and R. Laibowitz, 'Base electrodes for high dielectric constant oxide materials in silicon technology', J. Mater. Res., vol. 7, no. 12, pp. 3260-3265, December 1992 DOI |
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T. Aoyama, M. Kiyotoshi, S. Yamazaki and K. Eguchi, 'Chemical Vapor Deposition of Ru and Its Application in (Ba,Sr) |
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Y. Matsui, M. Hiratani and S. Kimura, 'Thermal Stability of a |
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M. Hiratani, Y. Matsui, K. Imagawa and S. Kimura, 'Hydrogen Reduction Properties of |
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Y. Kaga, Y. Abe, M. Kawamura and K. Sasaki, 'Thermal Stability of |
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J. H. Ahn, W. Y. Choi, W. J. Lee, H. G. Kim, 'Annealing of |
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