• Journal of Information Display
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• 제1권1호
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• pp.3-8
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• 2000

We have developed a high performance vertical alignment TFT-LCD (Thin Film Transistor Liquid Crystal Display), that shows a high light transmittance, and wide viewing angle characteristics with an unusually high contrast ratio. In order to optimize the electro-optical properties we have studied the effect of cell parameters, multi-domain structure and retardation film compensation. With the optimized cell parameters and process conditions, we have achieved a 24" wide UXGA TFTLCD monitor (16:10 aspect ratio 1920X1200) showing a contrast ratio of over 500:1, panel transmittance near 4.5%, response time near 25 ms, and viewing angle higher than 80 degree in all directions.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2006년도 하계종합학술대회
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• pp.561-562
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• 2006

This paper presents an SRAM which uses the technique to equalize the internal cell node by adding an NMOS transistor. Accordingly, the write driver operates rapidly in a differential current of bit lines, and the operation speed of SRAM improves. An SRAM was implemented with a memory cell, a sense amplifier and a write driver. The SRAM obtained the performance of 18% power reduction and improvement of 56% operation speed. And Power delay product was reduced with 63%. The proposed SRAM was designed based on a 0.35um 1P4M CMOS technology.

• 대한전자공학회논문지SD
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• 제39권12호
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• pp.1033-1044
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• 2002

본 논문에서는 grounded-plate PMOS 게이트 (GPPG) 강유전체 메모리 셀을 이용한 새로운 FRAM 설계기술을 제안하였다 GPPG 셀은 PMOS와 강유전체 커패시터로 구성되며 셀 plate 는 ground 에 접지 된다. 제안된 FRAM 에서는 비트라인이 V/sub DD/로 precharge 되고, negative 전압 워드라인 기법이 사용되며, negative 펄스 restore 동작을 이용한다 GPPG 셀을 이용한 FRAM 구조는 셀 plate 구동기폭 사용하지 않으므로 메모리 셀 efficiency를 극대화 할 수 있는 장점이 있다. 또한 기존의 common-plate 셀과는 달리 제안된 FRAM 구조는 데이터의 읽기 및 쓰기 동작 시 강유전체 커패시터에 V/sub DD/거 충분한 전압이 가해지므로 저 전압 동작에 제한이 없다. 아울러 제안된 FRAM 구조는 필요한 8 비트 데이터만 선택하는 column-path 회로를 사용하므로 메모리 array 전력소모를 최소화 할 수 있다. 끝으로 0.5-um, triple-well/1-polycide/2-metal 공정을 이용한 4-Mb FRAM 설계를 통해 GPPG 셀 FRAM architecture 실현 가능성을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.427-427
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• 2012

Ferroelectric-gate field effect transistor based memory using a nanowire as a conducting channel offers exceptional advantages over conventional memory devices, like small cell size, low-voltage operation, low power consumption, fast programming/erase speed and non-volatility. We successfully fabricated ferroelectric nonvolatile memory devices using both n-type and p-type Si nanowires coated with organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)] via a low temperature fabrication process. The devices performance was carefully characterized in terms of their electrical transport, retention time and endurance test. Our p-type Si NW ferroelectric memory devices exhibit excellent memory characteristics with a large modulation in channel conductance between ON and OFF states exceeding $10^5$; long retention time of over $5{\times}10^4$ sec and high endurance of over 105 programming cycles while maintaining ON/OFF ratio higher $10^3$. This result offers a viable way to fabricate a high performance high-density nonvolatile memory device using a low temperature fabrication processing technique, which makes it suitable for flexible electronics.

• 한국전기전자재료학회논문지
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• 제26권4호
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• pp.284-288
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• 2013

Power MOSFETs(Metal Oxide Semiconductor Field Effect Transistor) operate as energy control semiconductor switches. In order to reduce energy loss of the device during switch-on state, it is essential to increase its conductance. We have experimental results and explanations on the doping profile dependence of the electrical behavior of the vertical MOSFET. The device is fabricated as $8.25{\mu}m$ cell pitch and $4.25{\mu}m$ gate width. The performances of device with various p base doping concentration are compared at Vth from 1.77 V to 4.13 V. Also the effect of the cell structure on the on-resistance and breakdown voltage of the device are analyzed. The simulation results suggest that the device optimized for various applications can be further optimized at power device.

• 한국정보전자통신기술학회논문지
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• 제13권1호
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• pp.64-71
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• 2020

전력 반도체 소자의 게이트 구동 칩의 아날로그 회로를 트리밍하기 위해서는 eFuse OTP IP가 필요하다. 기존의 NMOS 다이오드 형태의 eFuse OTP 셀은 셀 사이즈가 작은 반면 DNW(Deep N-Well) 마스크가 한 장 더 필요로 하는 단점이 있다. 본 논문에서는 CMOS 공정에서 추가 공정이 필요 없으면서 셀 사이즈가 작은 PMOS-다이오드 형태의 eFuse OTP 셀을 제안하였다. 본 논문에서 제안된 PMOS-다이오드 형태의 eFuse OTP 셀은 N-WELL 안에 형성된 PMOS 트랜지스터와 기억소자인 eFuse 링크로 구성되어 있으며, PMOS 트랜지스터에서 기생적으로 만들어지는 pn 접합 다이오드를 이용하였다. 그리고 PMOS-다이오드 형태의 eFuse 셀 어레이를 구동하기 위한 코어 구동회로를 제안하였으며, SPICE 모의실험 결과 제안된 코어 회로를 사용하여 61㏀의 post-program 저항을 센싱하였다. 한편 0.13㎛ BCD 공정을 이용하여 설계된 PMOS-다이오드 형태의 eFuse OTP 셀과 512b eFuse OTP IP의 레이아웃 사이즈는 각각 3.475㎛ × 4.21㎛ (=14.62975㎛2)과 119.315㎛ × 341.95㎛ (=0.0408㎟)이며, 웨이퍼 레벨에서 테스트한 결과 정상적으로 프로그램 되는 것을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.277-277
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• 2012

PCDTBT (Poly[N-9''-hepta-decanyl-2,7-carbazole-alt-5,5-(4',7'-di-2-thienyl-2',1',3'-benzothiadiazole)]) is an attractive material as a semiconducting polymer for organic thin film transistor (OTFT) and organic solar cell (OSC). High power conversion efficiency (~6%) under simulated AM 1.5G solar illumination of bulk-heterojunction solar cell with PCDTBT and [6,6]-phenyl C60 butyric acid methyl ester (PC61BM) blend was reported. In OSC, it is known that the band alignment at the interface between donor and acceptor is critical. Therefore, we studied the interfacial electronic structures of PCDTBT and PC61BM. The polymers are deposited by electro-spray on gold and In-situ x-ray and ultraviolet photoelectron spectroscopy measurements revealed the interfacial electronic structures. We obtained the energy level alignment between two materials and the different interface formation was observed with different deposition order.

• 한국전기전자재료학회논문지
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• 제22권1호
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• pp.7-11
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• 2009

In this study, p-channel silicon-oxide-nitride-oxide-silicon(SONOS) transistors are fabricated and characterized as an unit cell for NAND flash memory. The SONOS transistors are fabricated by $0.13{\mu}m$ low power standard logic process technology. The thicknesses of gate insulators are 2.0 nm for the tunnel oxide, 1.4 nm for the nitride layer, and 4.9 nm for the blocking oxide. The fabricated SONOS transistors show low programming voltage and fast erase speed. However, the retention and endurance of the devices show poor characteristics.

• 대한전자공학회논문지SD
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• 제46권4호
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• pp.72-78
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• 2009

본 논문에서는 $0.13{\mu}m$ CMOS 공정의 이득(Kvco) 제어 지연 단을 이용한 위상동기루프에 사용되는 저 위상잡음 CMOS 링 전압제어발진기를 설계 및 제작한다. 제안하는 지연 단은 출력 단자를 잇는 MOSFET을 이용한 능동저항으로 전압제어발진기의 이득을 감소시킴으로써 위상잡음을 개선한다. 그리고 캐스코드 전류원, 정귀환 래치와 대칭부하 등을 이용한다. 제안한 전압제어 발진기의 위상잡음 측정결과는 1.9GHz가 동작 할 때, 1MHz 오프셋에서 -119dBc/Hz이다. 또한 전압제어발진기의 이득과 전력소모는 각각 440MHz/V와 9mW이다.

• Transactions on Electrical and Electronic Materials
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• 제17권5호
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• pp.302-305
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• 2016

In this paper, a low on-resistance and high current driving capability trench gate power metal-oxide-semiconductor field-effect transistor (MOSFET) incorporating a current sensing feature is proposed and evaluated. In order to realize higher cell density, higher current driving capability, cost-effective production, and higher reliability, self-aligned trench etching and hydrogen annealing techniques are developed. While maintaining low threshold voltage and simultaneously improving gate oxide integrity, the double-layer gate oxide technology was adapted. The trench gate power MOSFET was designed with a 0.6 μm trench width and 3.0 μm cell pitch. The evaluated on-resistance and breakdown voltage of the device were less than 24 mΩ and 105 V, respectively. The measured sensing ratio was approximately 70:1. Sensing ratio variations depending on the gate applied voltage of 4 V ~ 10 V were less than 5.6%.