• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
• /
• pp.5-6
• /
• 2005

High performance SiGe heterostructure metal-oxide-semiconductor field effect transistors(MOSFETs) were fabricated using well-controlled delta-doping of boron and SiGe/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe MOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^1$. However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}\sim10^{-2}$ in comparion with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

• 대한전자공학회:학술대회논문집
• /
• 대한전자공학회 1999년도 추계종합학술대회 논문집
• /
• pp.287-290
• /
• 1999

In the transmitter of optical fiber transmission systems, a time-division multiplexer combines several parallel data streams into a single data stream with a high bit rate. In this paper, we design a 2:1 (2-channels) time-division multiplexer using SiGe HBT with emitter size of 2$\times$8${\mu}{\textrm}{m}$$^2$. The operation speed is 10Gbps, the rise and fall times of 20-80% are 34ps and 35ps, respectively and the dissipation of power is 0.86W.

• 한국자기학회지
• /
• 제19권4호
• /
• pp.121-125
• /
• 2009

비정질 $Ge_{1-x}Mn_x$ 박막을 $400^{\circ}C$에서 $700^{\circ}C$까지 온도범위에서 각 3분씩 고진공챔버($10^{-8}$ torr)에서 열처리하였고, as-grown 시료와 열처리한 시료의 전기적 특성과 자기수송특성을 연구하였다. 성분함량은 energy dispersive X-ray spectroscopy(EDS)와 x-ray photoelectron spectroscopy(XPS)로 측정하였으며, 박막의 구조분석은 x-ray diffractometer(XRD)와 transmission electron microscopy(TEM)를 이용하였다. 자성특성은 여러 범위의 자기장에서 Magnetic property measure system(MPMS)를 이용하였다. 박막의 전기적 특성은 standard four-point probe와 Physical property measurement system(PPMS)로 측정하였으며, van der Pauw 방법을 사용하여 Anomalous Hall effect를 측정하였다. X-ray 회절 패턴 분석을 통해 $500^{\circ}C$에서 3분 동안 열처리한 시료는 여전히 비정질 상태인 것을 알 수 있었으며, $600^{\circ}C$의 열처리 온도에서 결정화를 확인할 수 있었다. as-grown $Ge_1$_$_xMn_x$ 박막과 열처리한 $Ge_{1-x}Mn_x$ 박막을 온도에 따른 비저항 값의 변화를 측정하였고, 반도체의 특성을 보이는 것을 확인할 수 있었다. 또한 열처리 온도가 높을수록 비저항도 증가하는 것을 관찰할 수 있었다. $700^{\circ}C$에서 열처리한 $Ge_1$_$_xMn_x$ 박막은 저온에서 negative magnetoresistance(MR)을 확인할 수 있었고, MR ratio는 10 K에서 약 8.5 %를 보였다. 모든 MR 그래프에서 curve의 비대칭을 확인 할 수 있었으며, anomalous Hall Effect는 약하지만 250 K까지 관측이 되었다.

• 한국안광학회지
• /
• 제2권1호
• /
• pp.9-16
• /
• 1997

강유천체 $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정을 x=0.015, 0.021, 0.03의 조성에 대하여 Czochralski법으로 성장시켰으며, 성장시킨 단결정의 색상은 맑고 투명한 연한 노란색이었다. $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정의 유전완화에 관한 연구를 위한 측정은 주파수범위 100 Hz에서 10 MHz까지 온도범위 $20^{\circ}C$에서 $600^{\circ}C$까지 변화 시키면서 하였다. 측정결과 유전을 최대값이 되는 온도는 Ti 성분이 증가함으로 낮은 온도로 이동하였으며, 유전율의 최대값의 크기는 Ti 성분의 증가에 따라 감소하였다. $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정의 유전응답의 주파수 의존성은 완화시간 분포와, Debye 완화형태를 가졌으며, 유전적 거동은 캐리어가 우세한 반응의 특징을 나타내었다.

• 한국분말재료학회지
• /
• 제14권4호
• /
• pp.272-276
• /
• 2007

P-type thermoelectric material $Si_{0.8}Ge_{0.2}$ was sintered by Hot Press process (HP) and the effect of boron ($0.25{\sim}2$ at%) addition on the thermoelectric properties were reported. To enhance the thermoelectric performances, the $Si_{0.8}Ge_{0.2}$, alloys were fabricated by mechanical alloying (MA) and HP. The carrier of p-type SiGe alloy was controlled by B-doping. The effect of sintering condition and thermoelectric properties were investigated. B-doped SiGe alloys exhibited positive seebeck coefficient. The electrical conductivity and thermal conductivity were increased at the small amount of boron content ($0.25{\sim}0.5$ at%). However, they were decreased over 0.5 at% boron content. As a result, the small addition of boron improved the Z value. The Z value of 0.5 at% B doped $Si_{0.8}Ge_{0.2}$ B alloy was $0.9{\times}10{-4}/K$, the highest value among the prepared alloys.

• 한국전기전자재료학회논문지
• /
• 제22권11호
• /
• pp.910-917
• /
• 2009

We have designed a new structures of Junction Field Effect Transistor(JFET) using SILVACO simulation to improve electrical properties and process reliability. The device structure and process conditions of Si control JFET(Si JFET) were determined to set cut off voltage and drain current(at Vg=0 V) to -0.46 V and $300\;{\mu}A$, respectively. Among many design parameters influencing the performance of the device, the drive-in time of p-type gate is presented most predominant effects. Therefore we newly designed SiGe JFET, in which SiGe layers were placed above and underneath of Si-channel. The presence of SiGe layer could lessen Boron into the n-type Si channel, so that it would be able to enhance the structural consistency of p-n-p junction. The influence of SiGe layer could be explained in conjunction with boron diffusion and corresponding I-V characteristics in comparison with Si-control JFET.

• 한국전기전자재료학회논문지
• /
• 제26권9호
• /
• pp.641-645
• /
• 2013

Chalcogenide glass has superior property of optical transmittance in the infrared region. Glass made using Ge-Se how many important optical applications. We have determined the composite formular of $Ge_{0.25}Se_{0.75}$ to be the GeSe chalcogenide glass composition appropriate for IR lenses. Also, the optical, thermal and physical characteristics of chalcogenide glass depended on the composition ratio. GeSe bulk sample is produced using the traditional melt-quenching method. The optical, structural, thermal and physical properties of the compound were measured by using Fourier transform infrared spectroscopy (FT-IR), X-ray diffraction (XRD), Differential scanning calorimeter (DSC), and Scanning electron microscope (SEM) respectively.

• 한국전기전자재료학회논문지
• /
• 제29권7호
• /
• pp.400-403
• /
• 2016

The resistive memory switching characteristics of resistive random access memory (ReRAM) using the amorphous GeSe thin film have been demonstrated at Al/Ti/GeSe/$n^+$ poly Si structure. This ReRAM indicated bipolar resistive memory switching characteristics. The generation and the recombination of chalcogen cations and anions were suitable to explain the bipolar switching operation. Space charge limited current (SCLC) model and Poole-Frenkel emission is applied to explain the formation of conductive filament in the amorphous GeSe thin film. The results showed characteristics of stable switching and excellent reliability. Through the annealing condition of $400^{\circ}C$, the possibility of low temperature process was established. Very low operation current level (set current: ~ ${\mu}A$, reset current: ~ nA) was showed the possibility of low power consumption. Particularly, $n^+$ poly Si based GeSe ReRAM could be applied directly to thin film transistor (TFT).

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2010년도 제39회 하계학술대회 초록집
• /
• pp.78-78
• /
• 2010

The Adsorption structures of phenylalanine on Ge(100) surface have been investigated as a function of coverage using high-resolution photoemission spectroscopy (HRPES) and density functional (DFT) calculation. To converge these experimental and theoretical conclusion, we systematically performed HRCLPES measurements and DFT calculation for various coverage in the adsorption structures of phenylalanine molecules on the Ge(100) surface. In this study, we found two different adsorption structure as a function of coverage in phenylalanine on Ge(100), monitoring three core level spectra (Ge 3d, C 1s, N 1s, and O 1s) using HRPES Through analysis of the binding energies, we confirmed that O-H dissociated and N dative-bonded structure emerges at low coverage (0.10 ML), which is the same to the result of glycine and alanine on Ge(100) system, whereas O-H dissociation structure also appears at higher coverage. Moreover, we observed the shape of phenyl group being included in phenylalanine is changed from flat to tilting structure at final state using DFT calculation. Through the spectral analysis for phenylalanine, we will demonstrate variation of coverage dependent structural change for phenylalanine on Ge(100) surface using experimental (HRPES) and theoretical studies (DFT calculation).

• 한국자기학회지
• /
• 제19권4호
• /
• pp.133-137
• /
• 2009

GaAs 기판 위에 증착된 $MnGeP_2$ 박막이 상온에서 강자성을 보임을 자기화 및 자기저항 측정을 통해 확인하였다. 강자성-상자성 전이 온도는 320 K 정도였고, 항자력장은 5, 250, 300 K에서 각각 3870, 1380, 155 Oe 정도였다. 전하 운반자가 스핀 편극되어 있음을 암시하는 비정상 홀 효과를 관측하였다. 자기장에 따른 자기저항과 홀 저항을 측정할 때 이력곡선이 나타남을 확인하였다. $MnGeP_2$ 박막과 n-형 GaAs 기판 사이에 I-V 측정을 통해 전형적인 p-n 다이오드 특성을 보임을 확인하였다.