• Korean Journal of Optics and Photonics
• /
• v.23 no.2
• /
• pp.64-70
• /
• 2012

We analyzed the changes in electrical and optical characteristics of 1 $mm^2$ multiple-quantum-well (MQW) blue LEDs grown on a c-plane sapphire substrate after a stress test. Experiments were performed by injecting 50 mA current for 200 hours to TO-CAN packaged sample chips. We selected the value of injection current for stress through the junction-temperature measurement by using the forward-voltage characteristics of a diode to maintain a sufficiently low junction temperature during the test. The junction temperature at the selected injection current of 50 mA was 308 K. Experiments were performed under the assumption that the average junction temperature of 308 K did not affect the characteristics of the ohmic contact and the GaN-based materials. Before and after the stress test, we measured and analyzed current-voltage, light-current, light distribution on the LED surface, wavelength spectrum and relative external quantum efficiency (EQE). After the stress test, it was observed experimentally that the optical power and the relative EQE decreased. We theoretically investigated and experimentally proved that these phenomena are due to the increased nonradiative recombination rate caused by the increased defect density.

• Journal of the Institute of Electronics and Information Engineers
• /
• v.50 no.1
• /
• pp.137-147
• /
• 2013

In this paper, an 1.2V 8b 1GS/s A/D Converter(ADC) based on a folding architecture with a resistive interpolation technique is described. In order to overcome the asymmetrical boundary-condition error of conventional folding ADCs, a novel scheme with an odd number of folding blocks and a fractional folding rate are proposed. Further, a new digital encoding technique with an arithmetic adder is described to implement the proposed fractional folding technique. The proposed ADC employs an iterating offset self-calibration technique and a digital error correction circuit to minimize device mismatch and external noise The chip has been fabricated with a 1.2V 0.13um 1-poly 6-metal CMOS technology. The effective chip area is $2.1mm^2$ (ADC core : $1.4mm^2$, calibration engine : $0.7mm^2$) and the power dissipation is about 350mW including calibration engine at 1.2V power supply. The measured result of SNDR is 46.22dB, when Fin = 10MHz at Fs = 1GHz. Both the INL and DNL are within 1LSB with the self-calibration circuit.

• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.38 no.10
• /
• pp.712-720
• /
• 2001

Algorithms from the research of the layout migration were proposed in the paper. These are automatic recognition algorithm for the VLSI devices from it, graph based construction algorithm to maintain the constraints, dependencies, and design rule between the devices, and high speed compaction algorithm to reduce size of the VLSI area and reuse the design with compacted size for the new technology. Also, this paper describes that why proposed algorithms are essential for the era of the SoC (System on a Chip), design reuse, and IP DB, which are the big concerns in these days. In addition to introduce our algorithms, the benchmark showed that our performance is superior by 27 times faster than that of the commercial one, and has better efficiency by 3 times in disk usage.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
• /
• v.22 no.7
• /
• pp.683-693
• /
• 2011

In this paper, a design of high current and broad-band microwave bias-tee was presented for a stable bias of a high power amplifier. An input impedance of bias-tee should be shown to 50 ohm with the wideband in order to be stably-biased the amplifier. For this design of the bias-tee, a capacitor of bias-tee for a DC block was designed with a high wide-band admittance by a parallel sum of capacitors, and a inductor for a RF choke and a DC feeding was designed with a high wide-band impedance by a series sum of inductors. As this inductor and capacitor for the sum has each SRF, band-limitation of lumped element was driven from SRF. This limitation was overcome by control of a resonance's quality factor with adding a resistor. 1608 SMD chips for design's element was mounted on the this pattern for the designed bias-tee. The fabricated bias-tee presented 10 dB of return loss and wide-band about 50 ohm input impedance at 10 MHz~10 GHz.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.108-108
• /
• 2011

최근 에너지 위기와 환경 규제 강화 및 친환경, 녹색성장 등의 이슈가 대두되면서 에너지 절감과 환경보호 분야에 그린 전력반도체 수요가 날로 증가되고 있다. 이러한 그린 전력반도체는 휴대용컴퓨터, 이동통신기기, 휴대폰, 조명, 자동차, 전동자전거, LED조명 등 다양한 종류의 전력소자들이 사용되고 있으며, 전력소자의 수요증가는 IT, NT, BT 등의 융복합기술의 발달로 새로운 분야에 전력소자의 수요로 창출되고 있다. 특히 환경오염을 줄이기 위한 고전압 대전류 전력소자의 에너지 효율을 높이는 연구 개발이 활발히 진행되고 있다. 종래의 전력소자는 평면형의 LDMOS나 VDMOS 기술을 이용한 소전류 주로 제작되어 수십 암페어의 필요한 대전류용으로 사용이 불가능하다. 반면 수직형 전력소자인 트렌치를 이용한 power 소자는 집적도를 증가 시킬 수 있을 뿐만 아니라 대전류 고전압 소자 제작에 유리하다. 특히 평면형 소자에 비해 약 30%이상 칩 면적을 줄일 수 있을 뿐만 아니라 평면형에 비해 on-저항을 낮출 수 있기 때문에 수요가 날로 증가하고 있다. 트렌치 게이트 power MOS의 중요한 게이트 산화막 형성 기술은 트렌치 내부에 균일한 두께의 산화막 형성과 높은 신뢰성을 갖는 게이트 산화막 형성이 매우 중요하다. 본 연구에서는 전력소자를 제조하기 위해 트렌치 기술을 이용하여 수직형 전력소자를 제작하였다. 트렌치형 전력소자는 게이트 산화막을 균일하게 형성하는 것이 매우 중요한 기술이다. 종래의 수평형 소자 제조시 게이트 산화막 형성 후 산화막 두께가 매우 균일하게 성장되지만, 수직형 트렌치 게이트 산화막은 트렌치 내부벽의 결정구조가 다르기 때문에 $1000^{\circ}C$에서 열산화막 성장시 결정구조와 결정면에 따라 약 35% 이상 열산화막 두께가 차이가 난다. 본 연구는 이러한 문제점을 해결하기 위해 트렌치를 형성한 후 트렌치 내부의 결정구조를 변화 및 산화막의 종류와 산화막 형성 방법을 다르게 하여 균일한 게이트 산화막을 성장시켜 산화막의 두께 균일도를 향상시켰다. 그 결과 고밀도의 트렌치 게이트 셀을 제작하여 제작된 트렌치 내부에 동일한 두께의 게이트 산화막을 여러 종류로 산화막을 성장시킨 후 성장된 트렌치 내벽의 산화막의 두께 균일도와 게이트 산화막의 항복전압을 측정한 결과 약 25% 이상 높은 신뢰성을 갖는 게이트 산화막을 형성 할 수 있었다.

• Journal of the Microelectronics and Packaging Society
• /
• v.19 no.1
• /
• pp.47-53
• /
• 2012

Bonding strength of Sn-3.0Ag-0.5Cu solder joint due to degradation characteristic of OSP surface finish was investigated, compared with SnPb finish. The thickness variation and degradation mechanism of organic solderability preservative(OSP) coating were also analyzed with the number of reflow process. To analyze the degradation degree of solder joint strength, FR-4 PCB coated with OSP and SnPb were experienced preheat treatment as a function of reflow number from 1st to 6th pass, respectively. After 2012 chip resistors were soldered with Sn-3.0Ag-0.5Cu on the pre-heated PCB, the shear strength of solder joints was measured. The thickness of OSP increased with increase of the number of reflow pass by thermal degradation during the reflow process. It was also observed that the preservation effect of OSP decreased due to OSP degradation which led Cu pad oxidation. The mean shear strength of solder joints formed on the Cu pads finished with OSP and SnPb were 58.1 N and 62.2 N, respectively, through the pre-heating of 6 times. Although OSP was degraded with reflow process, the feasibility of its application was proven.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
• /
• v.22 no.3
• /
• pp.399-405
• /
• 2011

In this paper, we present the design of Q-band LC VCO and injection locking buffer for 77 GHz automotive radar sensor using 130 nm RF CMOS process. To improve the phase noise characteristic of LC tank, the transmission line is used. The negative resistance by the active device cross-coupled pair of buffer is used for high output power, with or without oscillation of buffer. The measured phase noise is -102 dBc/Hz at 1 MHz offset frequency and tuning range is 34.53~35.07 GHz. The output power is higher than 4.1 dBm over entire tuning range. The fabricated chip size is $510{\times}130\;um^2$. The power consumption of LC VCO is 10.8 mW and injection locking buffer is 50.4 mW from 1.2 V supply.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
• /
• v.10 no.2
• /
• pp.168-175
• /
• 2017

In this paper, a 5V small-area NMOS-diode eFuse OTP memory cell is proposed. This cell which is used in PMICs consists of a 5V NMOS transistor and an eFuse link as a memory part, based on a BCD process. Also, a regulated voltage of V2V ($=2.0V{\pm}10%$) instead of the conventional VDD is used to the pull-up loads of a VREF circuit and a BL S/A circuit to obtain a wider operational voltage range of the eFuse memory cell. When this proposed cells are used in the simulation, their sensing resistances are found to be $15.9k{\Omega}$ and $32.9k{\Omega}$, in the normal read mode and in the program-verify-read mode, respectively. Furthermore, the read current flowing through a non-blown eFuse is restricted to $97.7{\mu}A$. Thus, the eFuse link of a non-blown eFuse OTP memory cell is kept non-blown. The layout area of the designed 1kb eFuse OTP memory IP based on Dongbu HiTek's BCD process is $168.39{\mu}m{\times}479.45{\mu}m(=0.08mm^2)$.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
• /
• v.13 no.1
• /
• pp.64-71
• /
• 2020

eFuse OTP memory IP is required to trim the analog circuit of the gate driving chip of the power semiconductor device. Conventional NMOS diode-type eFuse OTP memory cells have a small cell size, but require one more deep N-well (DNW) mask. In this paper, we propose a small PMOS-diode type eFuse OTP memory cell without the need for additional processing in the CMOS process. The proposed PMOS-diode type eFuse OTP memory cell is composed of a PMOS transistor formed in the N-WELL and an eFuse link, which is a memory element and uses a pn junction diode parasitic in the PMOS transistor. A core driving circuit for driving the array of PMOS diode-type eFuse memory cells is proposed, and the SPICE simulation results show that the proposed core circuit can be used to sense post-program resistance of 61㏀. The layout sizes of PMOS-diode type eFuse OTP memory cell and 512b eFuse OTP memory IP designed using 0.13㎛ BCD process are 3.475㎛ × 4.21㎛ (= 14.62975㎛2) and 119.315㎛ × 341.95㎛ (= 0.0408mm2), respectively. After testing at the wafer level, it was confirmed that it was normally programmed.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.17 no.9
• /
• pp.21-26
• /
• 2016

This paper presents a step-down DC-DC buck converter with a CCM/DCM dual-mode function for the internal power stage of portable electronic device. The proposed converter that is operated with a high frequency of 1 MHz consists of a power stage and a control block. The power stage has a power MOS transistor, inductor, capacitor, and feedback resistors for the control loop. The control part has a pulse width modulation (PWM) block, error amplifier, ramp generator, and oscillator. In this paper, an external capacitor for compensation has been replaced with a multiplier equivalent CMOS circuit for area reduction of integrated circuits. In addition, the circuit includes protection block, such as over voltage protection (OVP), under voltage lock out (UVLO), and thermal shutdown (TSD) block. The proposed circuit was designed and verified using a $0.18{\mu}m$ CMOS process parameter by Cadence Spectra circuit design program. The SPICE simulation results showed a peak efficiency of 94.8 %, a ripple voltage of 3.29 mV ripple, and a 1.8 V output voltage with supply voltages ranging from 2.7 to 3.3 V.