The Journal of Korea Institute of Information, Electronics, and Communication Technology (한국정보전자통신기술학회논문지)

Korea Information Electronic Communication Technology (한국정보전자통신기술학회)
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Design of 5V NMOS-Diode eFuse OTP IP for PMICs

PMIC용 5V NMOS-Diode eFuse OTP IP 설계

  • Received : 2017.04.01
  • Accepted : 2017.04.13
  • Published : 2017.04.30
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Abstract

In this paper, a 5V small-area NMOS-diode eFuse OTP memory cell is proposed. This cell which is used in PMICs consists of a 5V NMOS transistor and an eFuse link as a memory part, based on a BCD process. Also, a regulated voltage of V2V ($=2.0V{\pm}10%$) instead of the conventional VDD is used to the pull-up loads of a VREF circuit and a BL S/A circuit to obtain a wider operational voltage range of the eFuse memory cell. When this proposed cells are used in the simulation, their sensing resistances are found to be $15.9k{\Omega}$ and $32.9k{\Omega}$, in the normal read mode and in the program-verify-read mode, respectively. Furthermore, the read current flowing through a non-blown eFuse is restricted to $97.7{\mu}A$. Thus, the eFuse link of a non-blown eFuse OTP memory cell is kept non-blown. The layout area of the designed 1kb eFuse OTP memory IP based on Dongbu HiTek's BCD process is $168.39{\mu}m{\times}479.45{\mu}m(=0.08mm^2)$.

본 논문에서는 PMIC 칩에 사용되는 BCD 공정기반에서 5V NMOS 트랜지스터와 기억소자인 eFuse 링크로 구성된 저면적의 5V NMOS-Diode eFuse OTP 셀을 제안하였다. 그리고 eFuse OTP 메모리 IP가 넓은 동작전압 영역을 갖도록 하기 위해서 VREF 회로와 BL S/A 회로의 풀-업 부하 회로에 기존의 VDD 파워 대신 voltage regulation된 V2V ($=2.0V{\pm}10%$)의 전압을 사용하였다. 제안된 VREF 회로와 BL S/A회로를 사용하므로 eFuse OTP IP의 normal read 모드와 program-verify-read 모드에서 프로그램 된 eFuse 센싱 저항은 각각 $15.9k{\Omega}$, $32.9k{\Omega}$으로 모의실험 되었다. 그리고 eFuse OTP 셀에서 blowing되지 않은 eFuse를 통해 흐르는 읽기 전류를 $97.7{\mu}A$로 억제하였다. 그래서 eFuse OTP 셀의 unblown된 eFuse 링크가 unblown 상태를 그대로 유지되도록 하였다. 동부하이텍 130nm BCD 공정을 이용하여 설계된 1kb eFuse OTP 메모리 IP의 레이아웃 면적은 $168.39{\mu}m{\times}479.45{\mu}m(=0.08mm^2)$이다.

Keywords

References

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