• Title/Summary/Keyword: 임 프린팅

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나노 임프린팅 장비 기술

  • 이재종;최기봉;김기홍
    • Journal of the KSME
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    • v.44 no.12
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    • pp.39-44
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    • 2004
  • 이 글에서는 국내외 나노 임프린팅 장비의 기술개발 동향과 개발되고 있는 대표적인 나노 임프린팅 장비를 소개하고, 향후 선폭 10nm 수준의 다중 임프린팅 장비를 개발하여 나노제품의 스마트, 저비용, 고생산성의 목표로 개발되고 있는 나노 임프린팅 장비의 기술을 소개하고자 한다.

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Replication of Hybrid Micropatterns Using Selective Ultrasonic Imprinting (선택적 초음파 임프린팅을 사용한 복합 미세패턴의 복제기술)

  • Lee, Hyun Joong;Jung, Woosin;Park, Keun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.39 no.1
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    • pp.71-77
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    • 2015
  • Ultrasonic imprinting is a micropattern replication technology for a thermoplastic polymer surface that uses ultrasonic vibration energy; it has the advantages of a short cycle time and low energy consumption. Recently, ultrasonic imprinting has been further developed to extend its functionality: (i) selective ultrasonic imprinting using mask films and (ii) repetitive ultrasonic imprinting for composite pattern development. In this study, selective ultrasonic imprinting was combined with repetitive imprinting in order to replicate versatile micropatterns. For this purpose, a repetitive imprinting technology was further extended to utilize mask films, which enabled versatile micropatterns to be replicated using a single mold with micro-prism patterns. The replicated hybrid micropatterns were optically evaluated through laser light images, which showed that versatile optical diffusion characteristics can be obtained from the hybrid micropatterns.

고굴절률 레진의 임프린팅 기술을 이용한 발광 다이오드의 광추출효율 향상 연구

  • Byeon, Gyeong-Jae;Jo, Jung-Yeon;Jo, Han-Byeol;Kim, Jin-Seung;Lee, -Heon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.63.2-63.2
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    • 2011
  • 본 연구에서는 질화물 계 발광 다이오드의 광추출효율을 향상시키키 위해서 발광 다이오드의 ITO 투명전극 층 상부에 임프린팅 공정을 이용하여 고굴절률 레진 패턴을 형성하였다. 고굴절률 레진은 단량체 기반의 열경화성 임프린트 레진에 ZnO 나노 파티클을 분산시켜 제작하였고 ZnO 나노 파티클의 함량비를 달리하여 레진의 굴절률을 조절하였다. 고굴절률 레진으로 이루어진 패터닝 층은 열경화 임프린팅 공정으로 제작되었고 300 nm 크기의 dot 또는 hole 격자 패턴 및 moth-eye 형상의 저반사 나노 패턴 등으로 형성되었다. 발광 다이오드에 형성된 패터닝 층의 굴절률, 구조에 따른 광추출효율 향상 정도를 분석하기 위하여 electroluminescence 측정을 하였으며 I-V characteristics를 통해서 임프린팅 공정에 의하여 발광 다이오드 소자의 전기적 특성이 저하되지 않았음을 확인하였다.

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Replication Characteristics of Micropatterns According to Mold Temperature in Ultrasonic Imprinting (초음파 임프린팅에서 금형온도에 따른 미세패턴의 전사특성 연구)

  • Min, Kyeong Bin;Park, Jong Han;Park, Chang Yong;Park, Keun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.38 no.1
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    • pp.51-57
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    • 2014
  • Ultrasonic imprinting is a novel process for replicating micropatterns on thermoplastic polymer substrates with low energy consumption and short cycle time. The polymer substrate is softened by the frictional heat and repetitive deformation energy under ultrasonic excitation; thus, a number of micropatterns are replicated on the softened polymer substrate. In the present work, the effect of mold temperature on the replication characteristics of ultrasonic imprinting is investigated. The temperature change in the patterned region is measured by varying the mold temperature. Numerical simulation is then performed for investigating pattern replication characteristics under various mold temperatures. In addition, pattern replication ratio and uniformity are compared through various experimental measurements. Through the results of these comparisons, it is found that the mold temperature has a significant positive effect on the replication characteristics of ultrasonic imprinting.

Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure (UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구)

  • Shin, Dong-Hyuk;Jang, Si-Youl
    • Tribology and Lubricants
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    • v.26 no.5
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.