• Journal of the Korean Society for Precision Engineering
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• v.33 no.12
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• pp.993-998
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• 2016

In today's manufacturing industries, the demand for light non-ferrous materials is considerable due to the need to improve productivity and manufacturability. Since the surface roughness of a material is important for improving the functionality of machined parts, various techniques for surface treatments have been developed to obtain non-ferrous materials with low roughness. A superfinishing method utilizing polishing films is generally applied to the anodized surface of Al7075 in order to improve its roughness. The objective of this research is to determine through experiment the parameters that facilitate the shortest processing time, using a superfinishing method, for reaching a roughness of Ra $0.2{\mu}m$. This objective is met by applying the Taguchi method in the experiments. Through the experiments of superfinishing, the effectiveness of the parameters adopted for the surface treatment is demonstrated.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.18 no.7
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• pp.14-21
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• 2019

Large-diameter hydraulic devices such as the hydraulic reservoir in aircraft that serves to balance the hydraulic pressure in the various hydraulic devices in the cabin and to store hydraulic oil are operated by the internal piston systems. However, since this operates in an environment with high temperature and humidity, it may cause the inner surface to flake during its operation. Therefore, an anodizing surface treatment is applied to improve the corrosion resistance, abrasion resistance, and smooth operation. However, anodizing increases the surface roughness. Accordingly, the polishing process that improves the surface roughness after anodizing is important. However, the existing polishing process is performed manually, which results in an inefficient process. Therefore, in this study, we selected the optimum polishing conditions for effective polishing using the experimental design to improve the polishing process for the $Al_2O_3$ film that forms after anodization. Through experiments, we confirmed that the surface uniformity after polishing was superior as the feed rate was slower when the same polishing time had been applied.

• Nuclear Engineering and Technology
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• v.6 no.1
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• pp.14-22
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• 1974

Effects of anodization voltage on frequency characteristics of anodic oxide films on tantalum were analyzed based on the following impedance equatious : (equation omitted) Here $R_{f}$, $C_{f}$ and tan $\delta$$_{f}$ are equivalent series resistance in ohm, equivalent Belies capacitance in farad and dielectric loss, of anodic oxide films respectively Parameters P, $\tau$$_{ο}$, $\tau$$_{\omega}$, and Co are defined as follows: P=(d-w)/w, $\tau$$_{ο}$=$textsc{k}$$\rho$$_{ο}$, $\tau$$_{\omega}$=$textsc{k}$$\rho$$_{\omega}$, $C_{ο}$=$textsc{k}$A/d where d is the thickness of oxide film, $\omega$ is the diffusion layer thickness. $\rho$$_{ο}$ is the resistivity of oxide film at the interface of metal and the oxide, $\rho$$_{\omega}$ is the resistivity of oxide film at intrinsic region and A is the area of the film and $textsc{k}$=0.0885$\times$10$^{-12}$ $\times$dielectric constant, (in farad/cm). It was shown that dielectric loss and frequency dependence of equivalent series capacitance decrease as anodization voltage increases. This is a consequence of the fact that the thickness of diffusion layer increases a little with increasing anodization voltage whereas the total oxide thickness is proportional to the anodization voltage. The ngative deviation of measured values from tile relation, tan $\delta$$_{f}$=0.682 $\Delta$ $C_{f}$, was also discussed based on the Impedance equations given above. Here $\Delta$ $C_{f}$ is the change in capacitance between 0.1 and 1 KHZ.KHZ.Z.

• Journal of the Korean institute of surface engineering
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• v.20 no.1
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• pp.25-30
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• 1987

미국의 정부규격은 국방규격(Military Specification and Standard) 연방규격(Federal Specification Standard)이 있으며 금속표면처리에 관련된 규격인 전기도금규격, 아노다이징, 화성피막처리, 기타 코팅 규격은 40여종으로 되어있다. 이들 규격서와 표준서는 미국내 정부베이소 구매시의 금속표면처리 제품과 때로는 장비의 구입 계약시에 지침이 되고 있다. 전민간의 산업체와 일반 상품의 가공에 생산과 품질관리에 두루 적용되고 있어 국내 대미주 지역의 수출은 물론 표면처리 제품의 생산 공정에 활용-기여하고자 규격 주요내용의 기술과 구입방법을 소개하고져 한다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.115-115
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• 2012

반도체/디스플레이 산업분야의 발전으로 진공 공정 기술력 또한 증진되고 있다. 반도체소자의 초미세화, 진공부품의 대면적화가 진행 되면서 진공 공정 중에 발생하는 오염입자를 제어하는 것이 이슈가 되고 있다. 오염입자는 플라즈마의 물리적인 부식과 활성이 높은 화학반응에 의해 진공부품에서 부식이 진행되어 발생하며, 이는 반도체 및 디스플레이 부품의 신뢰성측면과 수율저하 등 life time의 근본적인 문제점으로 대두되고 있다. 본 연구에서는 반도체/디스플레이 장비용 코팅부품으로 많이 사용되고 있는 Al2O3 코팅막을 이용하였으며, sealing time에 따른 Anodic Aluminum Oxide (AAO) electrode의 물성특성평가 및 진공평가기술을 이용하여 life time을 예측하는 연구를 수행하였다.

• Journal of the Korean institute of surface engineering
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• v.53 no.5
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• pp.249-256
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• 2020

As the size of manufacturing equipment for LCD and OLED displays increases, replacement of existing heavy stainless steel components with light metals, such as aluminum alloys, is being more important in semiconducting and display manufacturing industries. To use aluminum alloys for components in semiconducting and display industries, it is important to develop a new anodization method for improved performance of anodic oxide films than conventional anodization method based on sulfuric acid. In this work, optimum applied current density and the best sealing methods for anodic oxide films in 3% oxalic acid were explored. Experimental results showed 2.5 A/dm2 is the best applied current density for improved hardness and dielectric breakdown voltage. Sealing of the anodic oxide films further improved their hardness, dielectric breakdown voltage and resistance to HCl, by which application of anodic oxide films become applicable for components in semiconducting and display industries.

• Journal of the Korean Solar Energy Society
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• v.27 no.3
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• pp.175-179
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• 2007

This experimental demonstration has successfully shown that it is possible to use direct sunlight for the illumination of deeper building zones using the material for light path system(light duct). Three kinds of reflectors which were 95% Silver vaporizing fixed, 85% Anodized and 85% Hot melted applied to evaluate and compare their performances each others. Also, these three kind of reflectors were compared in view point of economics. The most high performance was obtained in 95% Silver vaporizing fixed reflector hater than another reflectors of 85% Anodized reflector and 85% Hot melted reflector even though more high production cost in 95% Silver vaporizing fixed reflector. The rest two reflectors of 85% Anodized and 85% Hot melted $10{sim}15%$ less performance than 95% Silver vaporizing fixed reflector but their production cost were low than the production cost of 95% Silver vaporizing fixed reflector which identified very weak and light yellow color in the light.

• Proceedings of the KSME Conference
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• 2004.11a
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• pp.899-903
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• 2004

A limit switch box is used for a indicator of a valve actuator. This device indicates an opening and closing of a valve or throttle in a valve actuator. In ship, equipments are required safe and robust because of a rough environment and a specific condition during a voyage. However, the limit switch box is used in an indoor environment generally. Thus, a new limit switch box must be developed which can be used at an outdoor environment. This study designed the limit switch box. The housing of the limit switch box was made by an aluminium die cast method with surface painting after anodizing or chromate coating. In order to evaluate the endurance of the housing, the endurance tests against salt water have been conducted. Experiment results showed that the proposed device provides a reliable performance against salt water.

• Journal of the Korean Vacuum Society
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• v.16 no.3
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• pp.231-234
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• 2007

During the anodizing and burning anodizing process, appreciable amounts of pores were generated on the surface of magnesium (Mg) alloy which deteriorate the quality of the alloy. However, additional burning process subsequent to the anodizing process reduces the density of pores on the surface. We found that additional burning process can increase the quality of Mg alloy. In addition we found that burning process increases homogeneity of the film thickness as well.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.243-243
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• 2011

현재 식각이나 증착, 이온주입 등에 반도체 공정에 플라즈마를 이용하고 있다. 이런 반도체 공정용 플라즈마 용기의 경우 플라즈마에 의한 용기의 스퍼터 등에 의해 금속 입자가 생성되어 공정중인 반도체 웨이퍼에 오염을 줄 수 있기 때문에 대부분의 공정용 용기는 아노다이징 알루미늄이나 세라믹 등을 사용한 부도체 용기를 사용하게 된다. 단일탐침법은 플라즈마내 금속 도체를 삽입한 후 바이어스 전압을 인가하여 전류-전압 특성 곡선을 해석하여 측정하는 방법이다. 하지만 플라즈마와 측정 시스템의 공통된 기준전압이 있어야만 측정이 가능하다는 단점을 가지고 있다. 따라서 일반적으로 많이 사용하는 부도체 용기내의 플라즈마는 기존의 단일탐침법으로 측정이 어렵다. 또한 높은 플라즈마 전위를 가지고 있는 플라즈마의 경우 높은 전압에서 전류-전압특성의 측정시스템을 구축하기 매우 어려운 단점을 가지고 있다. 따라서 이런 경우에도 측정이 가능하도록 축전기의 과도현상을 이용하여 탐침이 전기적으로 부유된 단일탐침법을 연구하였다. 이 방법의 타당성 확인을 위하여 금속용기에서 플라즈마를 발생시켜 기존의 단일탐침법과 부유형 단일탐침법을 비교하였다. 기존의 단일탐침법과 비교 결과는 공정조건에 관계없이 상당히 유사하였다. 따라서 이 방법으로 기존 단일탐침법을 사용할 수 없는 높은 플라즈마 전위의 플라즈마나 부도체용기내의 플라즈마의 측정에 사용할 수 있을 것으로 기대된다.