• 대한기계학회논문집A
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• 제35권3호
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• pp.267-272
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• 2011

본 연구는 $SiO_2$ 나노 콜로이드 첨가량에 따르는 $Si_3N_4$ 세라믹스의 마멸 특성을 평가하였다. 시험 편은 35 MPa, 2123 K의 질소 가스 분위기 1시간동안 소결하였다. 마멸 시험은 링 블록 시험기를 사용 하였으며, 시험 조건은 직경 35 mm인 링의 회전속도50 rpm, 하중 9.8 N, 실험중의 대기 온도 293 K이 었다. 세라믹스의 마멸계수는 약 1.0, 마멸손실은 약 0.02 mm이었다. 본 연구에 사용된 시험편 중에서 1.3 wt% $SiO_2$ 나노 콜로이드가 첨가된 시험편은 가장 낮은 마멸계수와 마멸 손실을 나타내어, 최상의 마멸 저항성을 나타내었다. 이것은 가장 높은 비커스 경도와 굽힘 강도를 나타내었다. 마멸계수는 경도 와 굽힘 강도에 역비례 관계를 보였다.

• 대한기계학회논문집A
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• 제37권5호
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• pp.625-630
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• 2013

본 연구는 직경 45 nm인 원통형 나노동공을 가진 산화알루미늄(AAO) 박막에 오일을 함침시켰을때 동점도가 마찰 마멸에 미치는 영향을 규명하고자 실시하였다. 양극산화법으로 제조한 AAO 박막을 직경 1 mm의 440C 스테인리스 강구를 상대재로 하여 왕복동 미끄럼 접촉시험을 실시하였다. 마찰면과 마멸입자는 주사전자현미경과 에닥스(Energy-dispersive X-ray)를 이용해 분석하였다. 높은 동점도 오일의 윤활효과가 저점도 오일에 비해 크게 향상되었다. 동점도가 낮은 경우엔 모든 하중조건에서 심한 마찰흔적과 함께 두꺼운 소성변형층이 넓게 형성되었으며 경계윤활막의 손상으로 접촉면에 물질전이와 화학적 반응 현상이 모두 발생하였다. 오일의 점도가 높은 경우 마찰면에 존재하는 경계윤활막이 파괴되지 않아 마찰흔적과 소성변형층의 형성이 매우 적었으며 물질전이와 화학적 반응이 방지되었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.45-45
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• 2003

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.552-555
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• 2004

The reliability issue of the probe tip/recording media interface is one of the most crucial concerns in the Atomic Force Microscope (AFM)-based recording technology. In this work, the tribological characteristics of the probe/media interface were investigated by performing wear tests using an AFM. The ranges of applied normal load and sliding velocity for the wear test were 10 to 50nN and 2 to 20$\mu$m/s respectively. The damage of the probe tip was quantitatively as well as qualitatively characterized by Field Emission Scanning Probe Microscope (FESEM) analysis and calculated based on Archard s wear equation. It was shown that the wear coefficient of the probe tip was in the order of 10$^{-4}$ ~ 10$^{-3}$ , and significant contamination at the end of the probe tip was observed. Thus in order to implement the AFM-based recording technology, tribological optimization of the probe/media interface must be achieved.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2008년도 추계학술대회 초록집
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• pp.54-54
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• 2008

• 한국정밀공학회지
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• 제20권5호
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• pp.189-195
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• 2003

Atomic Force Microscope (AFM) has been widely used in micro/nano-scale studies and applications for. the last few decade. In this work, wear characteristics of silicon-based AFM tip was investigated. AFM tip shape was observed using a high resolution SEM and the wear coefficient was approximately calculated based on Archard's wear equation. It was shown that the wear coefficient of silicon and silicon nitride were in the range of ${10}^{-1}$~${10}^{-3}$ and ${10}^{-3}$~${10}^{-4}$, respectively. Also, the effect of relative humidity and sliding distance on adhesion-induced tip wear was discussed. It was found that the tip wear has more severe for harder test materials. Finally, the probable wear mechanism was analyzed from the adhesive and abrasive interaction point of view.

• Tribology and Lubricants
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• 제35권5호
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• pp.286-293
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• 2019

In friction and wear tests that use friction force microscopy (FFM), the wear debris transfer to the tip apex that changes tip radius is a crucial issue that influences the friction and wear performances of films and coatings with nanoscale thicknesses. In this study, FFM tests are performed for bilayer $MoS_2$ film to obtain a better understanding of how geometrical and chemical changes of tip apex influence the friction and wear properties of nanoscale molecular layers. The critical load can be estimated from the test results based on the clear distinction of the failure area. Scanning electron microscopy and energy-dispersive spectroscopy are employed to measure and observe the geometrical and chemical changes of the tip apex. Under normal loads lower than 1000 nN, the reuse of tips enhances the friction and wear performance at the tip-sample interface as the contact pair changes with the increase of tip radius. Therefore, the reduction of contact pressure due to the increase of tip radius by the transfer of $MoS_2$ or Mo-dominant wear debris and the change of contact pairs from diamond/$MoS_2$ to partial $MoS_2$ or Mo/$MoS_2$ can explain the critical load increase that results from tip reuse. We suggest that the wear debris transfer to the tip apex should be considered when used tips are repeatedly employed to identify the tribological properties of ultra-thin films using FFM.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2001년도 제33회 춘계학술대회 개최
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• pp.354-359
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• 2001

CNTs were added to Ultra-high molecular weight polyethylene (UHMWPE) to improve the tribological properties of UHMWPE. CNTs which have a diameter of about 10-50nm, while their length is about 3-5nm were produced by the catalytic decomposition of tile C$_2$H$_2$ using a tube furnace. UHMWPE/CNTs composites were fabricated by hot pressing method. It is shown that friction coefficient was increased and wear resistance was improved as CNTs were added to UHMWPE because of excellent mechanical properties of CNTs located on UHMWPE surface.

• Tribology and Lubricants
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• 제27권6호
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• pp.344-350
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• 2011

Friction and wear behavior of tungsten oxide nanorods (TONs) was investigated using friction force microscopy(FFM) employing colloidal probes instead of conventional sharp tips. Vertically well-ordered TONs with 40 nm diameter, 130 nm length and 100 nm pitch width were synthesized on an anodic aluminium oxide substrate using two step electrochemical anodizing processes. The colloidal probe (diameter 20 ${\mu}m$) attached at the free end of tipless cantilever was oscillated(scanned) against a stationary surface of vertically aligned TONs with various scan speeds (1.2 ${\mu}m/s$, 3.0 ${\mu}m/s$ and 6.0 ${\mu}m/s$) and sliding cycles (100, 200 and 400) under normal load of 800 nN. The friction force and wear depth decreased with the increase of the scan speed. Plastically deformed thin layers were formed and sparsely deposited on the worn nonorod surface. The lower wear rate of the TONs with the longer oscillating cycles was attributed to the decreased real contact pressure due to the increase of real contact area between the colloidal probe and the TONs.

• 한국정밀공학회지
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• 제19권11호
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• pp.228-233
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• 2002

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.