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김기현;곽병오;이승엽;이진홍;박병옥
- Journal of the Korean Crystal Growth and Crystal Technology
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- v.13 no.6
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- pp.272-278
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- 2003
$Bi_4Ti_3O_{12}$ (BIT) and $(Bi_{3.25}La_{0.75})(Ti_{2.97}V_{0.03})O_{12}$ (BLTV) thin films were deposited on ITO/glass substrates by metal organic chemical vapor deposition (MOCVD) using ultrasonic spraying. After deposition of the films in oxygen atmosphere for 30 min, the films were heated by rapid thermal annealing (RTA) method, especially direct insertion, at various temperatures. The films were investigated on phase formation temperature, microstructure and electrical properties. From x-ray diffraction (XRD) patterns, the perovskite phase formation temperature of BLTV thin film was about $600^{\circ}C$ which was lower than that of BIT, $650^{\circ}C$. The leakage current of the BLTV thin film was measured to be $1.52\times 10^{-9}$A/$cm^2$ at an applied voltage of 1 V. The remanent polarization (Pr) and coercive field (Ec) values of the BLTV film deposited at $650^{\circ}C$ were $5.6\muC/cm^2$ and 96.5 kV/cm, respectively.
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황선환;장영철;장호정
- Proceedings of the KAIS Fall Conference
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- 2002.05a
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- pp.121-123
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- 2002
졸-겔법(Sol-Gel Method)으로 강유전체 Bi/sub 3.3/La/sub 0.7/Ti/sub 3/O/sub 12/(BLT) 박막을 Pt/Ti/SiO₂/Si 기판위에 스핀 코팅하여 Metal-Ferroelectric-Metal(MFM 구조를 형성하였다. As-coated BLT 박막은 650℃ 이상에서 결정화되었으며, 전형적인 Bi층상의 페롭스카이트 결정구조를 나타내었다. 또한 열처리 온도를 증가시킴에 따라 결정성이 향상되었다. 3V 전압에서 650℃로 열처리된 박막의 경우 누설전류가 약 2.25×10/sup -8/A/㎠ 정도를 보였다. 650℃에서 열처리된 BLT박막은 5V의 인가 전압에서 잔류분극 2Pr(±(P/sup */-P/sup A/)) 값은 약 29.5μC/㎠을 나타내었으며, 1.5×10/sup 10/ 스위칭 cycles까지 분극 스위칭을 반복한 후에도 거의 잔류 분극의 변화가 없었다.

이진한;장건익
- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2001.07a
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- pp.186.1-189
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- 2001
Ferroelectric $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (BLT)thin films with various compositions(x=0.65, 0.70, 0.75) were prepared on Pt//Ti/SiO$_2$/Si(100) substrate by metal-organic deposition. The electrical and structural characteristics of BLT thin films were investigated to develop ferroelectric thin films for capacitor layers of FRAM. After spin coating, thin films were annealed at $650^{\circ}C$ for 1hour in oxygen atomosphere. Scanning electron micrographs showed uniform surfaces composed of rod-like grains. The $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (x=0.70) thin film capacitors with a Pt top electrode showed better ferroelectric properties than other films. At the applied voltage of 5V, the dielectric constant($\varepsilon$$_{r}$), dissipation factor(tan$\delta$),remanent polarization(2Pr), and coercive field(2Ec) of the $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (x=0.70)thin films were about 272.54, 0.059, 32.4 $\mu$C/cm$^2$, 2Ec=119.9kV/cm. Also the capacitor did not show any significant fatigue up to 4.8$\times$10$^{10}$ read/write switching cycles.hing cycles.s.
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이인재;김병호
- Journal of the Korean Ceramic Society
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- v.40 no.12
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- pp.1189-1196
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- 2003
Ferroelectric B $i_{3.25}$L $a_{0.75}$ $Ti_3$ $O_{12}$ (BLT) solution was synthesized by sol-gel process. BLT thin films were deposited on Pt/Ti $O_2$/ $SiO_2$/Si substrates by spin-coating. In this experiments, Bi(TMHD)$_3$, La(III)2-Methoxyethoxide, and Ti(IV) i-propoxide were used as starting materials, which were dissolved in 2-Methoxyethanol. Rapid Thermal Annealing (RTA) was used to promote crystallization of BLT thin films. The thin films with RTA process were compared with those with non-RTA process on electrical properties. After RTA process, the remanent polarization value (2Pr) of BLT thin films annealed at 72$0^{\circ}C$ was 20.46 $\mu$C/$\textrm{cm}^2$ which was approximately 27% higher than that of non-RTA process at 5 V.
https://doi.org/10.4191/KCERS.2003.40.12.1189 인용 PDF KSCI