• Title/Summary/Keyword: (110)Si

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The Research on Aluminum and Silcon Nanoparticles as Anode Materials for Lithium Ion Batteries (알루미늄 실리콘 나노분말을 이용한 리튬이온전지 음극재료에 관한 연구)

  • Kim, Hyeong-Jo;Tulugan, Kelimu;Kim, Hyung-Jin;Park, Won-Jo
    • Journal of Power System Engineering
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    • v.17 no.1
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    • pp.110-115
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    • 2013
  • The electrochemical performance and microstructure of Al-Si, Al-Si/C was investigated as anode for lithium ion battery. The Al-Si nano composite with 5 : 1 at% ratio was prepared by arc-discharge nano powder process. However, some of problem is occurred, when Al nano composite was synthesized by this manufacturing. The oxidation film is generated around Al-Si particles for passivating processing in the manufacture. The oxidation film interrupts electrical chemistry reaction during lithium ion insertion/extraction for charge and discharge. Because of the existence the oxidation film, Al-Si first cycle capacity is very lower than other examples. Therefore, carbon synthsized by glucose ($C_6H_{12}O_6$) was conducted to remove the oxidation film covered on the composite. The results showed that the first discharge cycle capacity of Al-Si/C is improved to 113mAh/g comparing with Al-Si (18.6mAh/g). Furthermore, XRD data and TEM images indicate that $Al_4C_3$ crystalline exist in Al-Si/C composite. In addition the Si-Al anode material, in which silicon is more contained was tested by same method as above, it was investigated to check the anode capacity and morphology properties in accordance with changing content of silicon, Si-Al anode has much higher initial discharge capacity(about 500mAh/g) than anode materials based on Aluminum as well as the morphology properties is also very different with the anode based Aluminum.

Dependence of the Electronic Structure Dependence of Si Nanowires on the Diameter

  • Yang, Min-Yeong
    • Proceeding of EDISON Challenge
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    • 2014.03a
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    • pp.501-504
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    • 2014
  • Si nanowire는 트랜지스터, 배터리 등 광범위한 응용이 가능한 물질로서 이의 효율적 활용을 위해서는 그 다양한 구조에 대한 물성 변화의 연구가 중요하다. 이 연구에서는 [110] 방향의 $4{\times}3$, $6{\times}4$, $8{\times}5$ Si nanowire에 대하여 DFT 기반 제일원리적 계산을 수행함으로써, $6{\sim}14{\AA}$ 범위에서 nanowire 지름의 변화에 따른 전자구조 의존성에 대하여 연구하였다. 그 결과, bulk와 비교하여 Si nanowire의 경우 bandwidth 감소 및 bandgap의 증가가 나타나며, 이러한 경향은 nanowire 지름이 커질수록 점진적으로 약화됨을 알 수 있었다.

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Study on electrical properties of BST thin film with substrates (기판에 따른 BST 박막의 전기적 특성에 관한 연구)

  • 이태일;최명률;박인철;김홍배
    • Journal of the Korean Vacuum Society
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    • v.11 no.3
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    • pp.135-140
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    • 2002
  • In this paper, We deposited the BST thin-film on p-type (100)Si, (100)MgO and MgO/Si substrates respectively using RF magnetron sputtering method. After the BST thin-fil m was deposited, we performed RTA(rapid thermal anneal) at $600^{\circ}C$, oxygen atmosphere and 1 min. In the XRD measurement, we observed the (110) $Ba_{0.5}Sr_{0.5}TiO_3$ main peak in all samples and the peak intensity increased after post annealing. Then we manufactured a capacitor using Al Electrode and measured I-V, C-V. In C-V measurement result values for each substrate, dielectric constant was calculated 120 (bare Si), 305(MgO/Si), 310(MgO) respectively. A leakage current density was present less than 1 $\mu\textrm{A/cm}^2$ at applied fields below 0.3 MV/cm. In conclusion we confirmed that MgO/Si substrates give good results for BST thin-film deposition.

Study on Growth of Nanocrystalline SiC Films Using TMS (TMS를 이용한 SiC 나노박막의 성장연구)

  • Yang Jae-Woong
    • Journal of the Korean institute of surface engineering
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    • v.38 no.4
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    • pp.174-178
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    • 2005
  • Chemical vapor deposition technique has been used to grow epitaxial SiC thin films on Si wafers using tetramethylsilane(TMS) precursor. The films were observed to grow along (110) direction of 3C-SiC at $800^{\circ}C$. The quality of the films was significantly influenced by the TMS flow rate and growth temperature. Nanocrystal SiC films were grown at flow rates of TMS 10 sccm with $H_2$ carrier gas of 100 sccm. The temperature and gas pressure in the reactor have a great influence on the crystallinity and morphology of the SiC film grown. The growth mechanism of the SiC film on the Si substrate without the carbonization process was discussed based on the experimental results.

Single crystal growth and structure analysis of superionic conductor ${\beta}-Ag_3SI$ (초이온도전체 ${\beta}-Ag_3SI$의 단결정 육성과 결정구조 해석)

  • Nam Woong Cho;Kwang Soo Yoo;Hyung Jin Jung
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.1
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    • pp.63-70
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    • 1994
  • Single crystals of the superionic conductor ${\beta}-Ag_3SI$ were prepared by thermal treatmentr from the reactant mixture of AgI and $Ag_2S$. The growing single crystals were made to spherical shape of $200{mu}m$ in diameter. The detailed structures analyses revealed that $Ag^+$ in ${\beta}-Ag_3SI$ distribute on 12h site of 4-coordination inpreference to 3c site of 6-coordination. The effective one-particle potential (o.p.p.). of $Ag^+$ along [110] direction was evaluated from the probability density function(p.d.f.) Activation energy calculated from the o.p.p. curve has been found to be 0.012 eV for the diffusion of $Ag^+$ on (001) plane in the ${\beta}-Ag_3SI$ structure.

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Development of the S-band receiver for LEO satellite (저궤도 위성용 S대역 수신기의 개발)

  • Park, In-Yong;Jin, Hyun-Peel;Lee, Soon-Cheon;Sirl, Young-wook
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.44 no.3
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    • pp.212-217
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    • 2016
  • The S-band receiver for Low Earth Orbit satellite is designed and fabricated as engineering model. Demodulator is implemented by using FPGA for extension of demodulator method. The receiver consists of RF Block, Digital demodulator and Power stage and has a Doppler tracking function to compensate a frequency shift that occur on the operation. The measured results of fabricated receiver show BER of less than $1.0{\times}10^{-6}$ at -110dBm RF input power and equipped a frequency tracking of ${\pm}100KHz$ relative to the center frequency. TID test was satisfied with the results of the test criterion is 10krad.

Manufacture and Characterization of Low Firing Temperatur Substrate using Glass Ceramics with Fluorine (Fluorine 함유 Glass Ceramics를 이용한 저온 소결기판 제조 및 기판의 특성 평가)

  • 강원호
    • Journal of the Microelectronics and Packaging Society
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    • v.3 no.2
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    • pp.27-38
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    • 1996
  • Lithium fluorhectorite 결정상을 함유한 glass ceramics 분말의 형성과 제조된 glass ceramics 분말을 이용한 저온 소결기판의 특성평가를 하였다. Li2O-MgO-MgF2-SiO2 계 유 리로 핵형성 및 결정 성장을 실시하여 lithium fluorhectorite 결정상을 지닌 glass ceramics 를 제조하였다. 유리시편의 핵형성 온도는 46$0^{\circ}C$였고 결정성장온도는 600, 640, 110$0^{\circ}C$에서 나타났다. $600^{\circ}C$에서의 결정상으 Li2.4LiSi4O10F2가 나타났다. Li2.4Mg8LiSi4와 Li2.8Mg0.6SiO4은 lithium fluorhectorite 결정상으로 되기 위한 중간상임을 확인할수 있었다. 64$0^{\circ}C$에서 열처리 후 110$0^{\circ}C$에서 재열처리하여 형성된 결정은 lithium fluorhectorite 와 tridymite가 최종 결정 상으로 나타났다. 이것은 수중에서 water swelling 현상에 의하여 분말화할 수 있었다, 기판 제조용 slurry를 제조하기 위해 glass ceramics 분말에 Al2O3분말을 0,25,50wt%로 혼합한것 과 glass ceramics 분말에 potashborosilica-te glass 분말을 15, 30, 45, 60 wt% 로 배합하 여 doctor blade 법으로 green sheet를 제조하였다. green sheet 는 950~150$0^{\circ}C$로소성하여 기판의 특성을 평가하였다. 겉보기 기공율은 3.06~19,14%이었고, 전기적 특성으로 유전상수 는 3~5(100KHz)를 나타내었다.

The Study on Fabrication of LAS System Ceramics for Thermal Shock Resistance from Silicate Minerals: (I) Preparation of Eucryptite Powders with Sillimanite Group, Kaolin Group Minerals (실리케이트 광물을 이용한 내열충격성 LAS계 세라믹스의 제조에 관한 연구: (I) Sillimanite와 Kaolin족 광물을 이용한 Eucryptite 분말합성)

  • 박한수;조경식;문종수
    • Journal of the Korean Ceramic Society
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    • v.31 no.5
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    • pp.572-580
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    • 1994
  • With low thermal expansion coefficients, eucryptite (Li2O.Al2O3.2SiO2) and spodumene (Li2O.Al2O3.4SiO2) in LAS ceramic system show good thermal shock resistance. In this study, sillimanite or kaolin group silicate minerals and Li2CO3 were used as starting materials, and if necessary SiO2 or Al2O3 were added for making stoichiometrically formed specimens. By this process, eucryptite powders were synthesized and characterized. The powder mixtures of lithiumcabonate and silicate minerals calcined at 80$0^{\circ}C$ for 2 hrs were made into powder compacts. $\beta$-Eucryptite single phase was formed via intermediate phases of Li2SiO3 and LiAlO2 et al, by heating at 110$0^{\circ}C$ or 120$0^{\circ}C$ for 10 hrs from those powder compacts. When using the sillimanite group minerals, Virginia kyanite or andalusite was reacted to form eucryptite at 120$0^{\circ}C$and CMK International kyanite were completed at 110$0^{\circ}C$. When kaolin group minerals were used, it was found that the synthesizing temperature (100$0^{\circ}C$) of $\beta$-eucryptite from the mixture of New Zealand white kaolin was lower than that from Hadong pink kaolin (110$0^{\circ}C$). The Microstructure of systhesized powder showed the irregular lump shape such as densed crystallines.

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La0.7Sr0.3MnO3 CMR thin film resistor deposited on SiO2/Si and Si substrates by rf magnetron sputtering for infrared sensor (SiO2/Si 및 Si 기판에 rf magnetron sputtering법으로 증착된 적외선 센서용 La0.7Sr0.3MnO3 CMR 박막 저항체 특성연구)

  • Choi, Sun-Gyu;Reddy, A. Sivasankar;Yu, Byoung-Gon;Ryu, Ho-Jun;Park, Hyung-Ho
    • Journal of the Korean Vacuum Society
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    • v.17 no.2
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    • pp.130-137
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    • 2008
  • $La_{0.7}Sr_{0.3}MnO_3$ films were deposited on $SiO_2$/Si and Si substrates annealed at $350^{\circ}C$ by rf magnetron sputtering. The oxygen gas flow rates were varied as 0, 40, and 80 sccm. Without post annealing process, $La_{0.7}Sr_{0.3}MnO_3$ thin films on $SiO_2$/Si and Si substrates were polycrystalline with (100), (110), and (200) growth planes. The grain size of $La_{0.7}Sr_{0.3}MnO_3$ thin films was increased with increasing oxygen gas flow rate. The sheet resistance of $La_{0.7}Sr_{0.3}MnO_3$ thin films was decreased with oxygen flow rate due to the increased grain size which induced a reduction of grain boundary. TCR (temperature coefficient of resistance) values of $La_{0.7}Sr_{0.3}MnO_3$ thin films were obtained from -2.0% to -2.2%.

Thermal Behavior and Crystallographic Characteristics of an Epitaxial C49-$TiSi_2$ Phase Formed in the Si (001) Substrate by $N_2$Treatment (Si (001) 기판에서 $N_2$처리에 의해 형성된 에피택셜 C49-$TiSi_2$상의 열적 거동과 결정학적 특성에 관한 연구)

  • Yang, Jun-Mo;Lee, Wan-Gyu;Park, Tae-Soo;Lee, Tae-Kwon;Kim, Joong-Jung;Kim, Weon;Kim, Ho-Joung;Park, Ju-Chul;Lee, Soun-Young
    • Korean Journal of Materials Research
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    • v.11 no.2
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    • pp.88-93
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    • 2001
  • The thermal behavior and the crystallographic characteristics of an epitaxial $C49-TiSi_2$ island formed in a Si (001) substrate by $N_2$, treatment were investigated by X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM). It was found from the analyzed results that the epitaxial $C49-TiSi_2$ was thermally stable even at high temperature of $1000^{\circ}C$ therefore did not transform into the C54-stable phase and did not deform morphologically. HRTEM results clearly showed that the epitaxial $TiSi_2$ phase and Si have the orientation relationship of (060)[001]$TiSi_2$//(002)[110]Si, and the lattice strain energy at the interface was mostly relaxed by the formation of misfit dislocations. Furthermore, the mechanism on the formation of the epitaxial $_C49-TiSi2$ in Si and stacking faults lying on the (020) plane of the C49 Phase were discussed through the analysis of the HRTEM image and the atomic modeling.

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