• Bulletin of the Korean Chemical Society
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• 제33권1호
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• pp.35-38
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• 2012

Room temperature oxidation of organic sulfides with polyvinylpyrrolidone-supported hydrogen peroxide (PVP-$H_2O_2$) in the presence of Mn(III) complexes of meso-tetraphenylporphyrin, Mn(TPP)X (X = OCN, SCN, OAc, Cl) and imidazole (ImH) leads to the highly chemoselective (ca. 90%) oxidation of sulfides to the corresponding sulfoxide. The efficiency of reaction has been shown to be influenced by different reaction parameters such as the nature of counterion (X) and solvent as well as the molar ratio of reactants. Using Mn(TPP)OCN and ImH in 1:15 molar ratio and acetone as the solvent leads to the efficient oxidation of different sulfides.

• 청정기술
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• 제17권1호
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• pp.41-47
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• 2011

순수한 $MnO_2$ 산화물을 과망간산칼륨과 망간아세테이트를 사용하여 침전법으로 제조하였고 소성온도를 달리하여 CO 산화반응을 수행하였다. 촉매의 물리화학적 특성을 알아보기 위하여 XRD, $N_2$ 흡착, $H_2-TPR$, CO-TPD 등의 특성분석을 수행하였다. $MnO_2$-300 촉매는 9nm 크기 근처의 좁은 기공크기 분포로 존재하며 $181m^2/g$의 높은 비표면적을 보였다. XRD와 $H_2-TPR$ 분석으로 $MnO_2$ 촉매는 $Mn^{4+}$와 $Mn^{3+}$의 산화상태임을 확인하였다. CO-TPD 분석으로 소성온도가 높아질수록 탈착되는 $CO_2$의 양이 감소하는 것을 확인하였다. $MnO_2$ 촉매의 소성온도에 따른 최적 활성에서는 $300^{\circ}C$에서 소성한 촉매가 가장 좋은 활성을 나타냈으며, $200^{\circ}C$ 이하에서 100%의 CO 전환율을 보였다. 수분 존재하의 CO 산화반응은 활성점에 $H_2O$와 CO의 경쟁 흡착으로 촉매의 활성을 감소시켰으며 수분제거 시 활성이 건조조건과 동일하게 회복되었다.

• 한국전기전자재료학회논문지
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• 제11권1호
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• pp.33-40
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• 1998

The composite SiO$_2$/Si$_3$N$_4$/SiO$_2$(ONO) film formed by oxidation on nitride film has been widely studied as DRAM stacked capacitor multi-dielectric films. Load lock(L/L) LPCVD system by HF cleaning is used to improve electrical capacitance and to scale down of effective thickness for memory device, but is brings a new problem. Nitride film deposited using HF cleaning shows selective deposition on poly silicon and oxide regions of capacitor. This problem is avoidable by carpeting chemical oxide using $H_2O$$_2$cleaning before nitride deposition. In this paper, we study the limit of nitride thickness for abnormal oxidation and the initial deposition time for nitride deposition dependent on underlayer materials. We proposed an advanced fabrication process for stacked capacitor in order to avoid selective deposition problem and show the usefulness of nitride deposition using L/L LPCVD system by $H_2O$$_2$cleaning. The natural oxide thickness on polysilicon monitor after HF and $H_2O$$_2$cleaning are measured 3~4$\AA$, respectively. Two substrate materials have the different initial nitride deposition times. The initial deposition time for polysilicon is nearly zero, but initial deposition time for oxide is about 60seconds. However the deposition rate is constant after initial deposition time. The limit of nitride thickness for abnormal oxidation under the HF and $H_2O$$_2$cleaning method are 60$\AA$, 48$\AA$, respectively. The results obtained in this study are useful for developing ultra thin nitride fabrication of ONO scaling and for avoiding abnormal oxidation in stacked capacitor application.

• Korean Chemical Engineering Research
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• 제45권3호
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• pp.298-303
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• 2007

오존을 중심으로 한 다양한 조합의 고급산화 공정(advanced oxidation process: AOP)을 이용하여 2,4,6-trinitrotoluene (TNT) 제조 공정에서 발생되는 난분해성 폐수인 red water(RW)의 유기물 및 색도 제거 연구를 수행하였다. 적용된 고급산화 공정은 $O_3$, $UV/O_3$, $UV/O_3/H_2O_2$, $UV/O_3/H_2O_2/Fe^{2+}$ 공정이었으며, 유기물 및 색도 제거 효과는 $O_3 < $UV/O_3/H_2O_2/Fe^{2+}$ 공정의 순서로 나타났다. $UV/O_3/H_2O_2/Fe^{2+}$ 공정에서 최적 분해조건은 오존 유량 0.053 g/min, $H_2O_2$ 주입농도 10 mM, $FeSO_4$ 주입농도 0.1 mM로 나타났으며, 90 min 동안 유기물 및 색도 제거율은 각각 96, 100%로 나타났다. tert-butyl alcohol(t-buOH)을 이용한 수산화 라디칼(hydroxyl radical : ${\cdot}OH$)의 scavenging 실험을 통해 오존에 UV, $H_2O_2$, $FeSO_4$를 산화제로 조합함으로써 수산화 라디칼의 발생량을 더욱 증가시키고 유기물 제거율을 효과적으로 향상시킬 수 있음을 확인하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2013년도 춘계학술대회 논문집
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• pp.112-113
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• 2013

Thin CrAlMgSiN films, whose composition were 30.6Cr-11.1Al-7.3Mg-1.2Si-49.8N (at.%), were deposited on steel substrates in a cathodic arc plasma deposition system. They consisted of alternating crystalline Cr-N and AlMgSiN nanolayers. After oxidation at $800^{\circ}C$ for 200 h in air, a thin oxide layer formed by outward diffusion of Cr, Mg, Al, Fe, and N, and inward diffusion of O ions. Silicon ions were relatively immobile at $800^{\circ}C$. After oxidation at $900^{\circ}C$ for 10 h in air, a thin $Cr_2O_3$ layer containing dissolved ions of Al, Mg, Si, and Fe formed. Silicon ions became mobile at $900^{\circ}C$. After oxidation at $900^{\circ}C$ for 50 h in air, a thin $SiO_2-rich$ layer formed underneath the thin $Cr_2O_3$ layer. The film displayed good oxidation resistance. The main factor that decreased the oxidation resistance of the film was the outward diffusion and subsequent oxidation of Fe at the sample surface, particularly along the coated sample edge.

• 공업화학
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• 제33권4호
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• pp.419-424
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• 2022

The oxidative degradation performance of the Erionyl Navy R dye was studied in this article. The investigation mainly focused on a comparative study between chemical oxidations by sodium hypochlorite (NaClO) and hydrogen peroxide (H₂O₂), and catalytic oxidations including the Fenton (Fe²⁺-H₂O₂) and Fenton-Like (Fe²⁺/ Fe³⁺/Co²⁺/ Mn²⁺-H₂O₂) or modified Fenton-like (Fe²⁺/ Fe³⁺ -NaClO) reactions. A discoloration and degradation of the Erionyl Navy R occurred after 30 minutes, which varies according to the oxidation system involved; 31%, 54%, <20%, 95%, and >96% losses were observed for Co²⁺-H₂O₂, Mn²⁺-H₂O₂, Fe²⁺-NaClO, Fe³⁺-NaClO), and Fe²⁺-H₂O₂ and Fe³⁺-H₂O₂, respectively.

• Environmental Engineering Research
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• 제11권2호
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• pp.84-90
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• 2006

UV-catalytic oxidation technique was applied for the treatment of bio-refractory character of the leachate, which is generally present in the form of adsorbable organic halogens (AOX). Destruction of AOX was likely to be governed by pH adjustment, quantitative measurement of oxidants, and the selection of oxidation model type. Peroxide induced degradation ($UV/H_2O_2$) facilitated the chemical oxidation of organic halides in acidic medium, however, the system showed least AOX removal efficiency than the other two systems. Increased dosage of hydrogen peroxide (from 0.5 time to 1.0 time concentration) even did not contribute to a significant increase in the removal rate of AOX. In ozone induced degradation system ($UV/O_3$), alkaline medium (pH 10) favored the removal of AOX and the removal rate was found 11% higher than the rate at pH 3. Since efficiency of the $UV/O_3$ increases with the increase of pH, therefore, more OH-radicals were available for the destruction of organic halides. UV-light with the combination of both ozone and hydrogen peroxide ($UV/H_2O_2$ 0.5 time/$O_3$ 25 mg/min) showed the highest removal rate of AOX and the removal efficiency was found 26% higher than the removal efficiency of $UV/O_3$. The system $UV/H2O_2/O_3$ got the economic preference over the other two systems since lower dose of hydrogen peroxide and relatively shorter reaction time were found enough to get the highest AOX removal rate.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 추계학술대회 논문집
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• pp.147-148
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• 2007

The compound, Ti3(Al,Si)C2, was synthesized by hot pressing a powder mixture of TiCX, Al and Si. Its oxidation at 900 and 1000 oC in air for up to 50 h resulted in the formation of rutile-TiO2, -Al2O3 and amorphous SiO2. During oxidation, Ti diffused outwards to form the outer TiO2 layer, and oxygen was transported inwards to form the inner mixed layer.

• Environmental Engineering Research
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• 제20권2호
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• pp.181-189
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• 2015

A composite material was tested to eliminate phenol in aqueous solution combining adsorption on activated carbon and photocatalysis with $TiO_2$ in two different ways. A first implementation involved a sequential process with a loop reactor. The aim was to reuse this material as adsorbent several times with in situ photocatalytic regeneration. This process alternated a step of adsorption in the dark and a step of photocatalytic oxidation under UV irradiation with or without $H_2O_2$. Without $H_2O_2$, the composite material was poorly regenerated due to the accumulation of phenol and intermediates in the solution and on $TiO_2$ particles. In presence of $H_2O_2$, the regeneration of the composite material was clearly enhanced. After five consecutive adsorption runs, the amount of eliminated phenol was twice the maximum adsorption capacity. The phenol degradation could be described by a pseudo first-order kinetic model where constants were much higher with $H_2O_2$ (about tenfold) due to additional ${\bullet}OH$ radicals. The second implementation was in a continuous process as with a fixed bed reactor where adsorption and photocatalysis occurred simultaneously. The results were promising as a steady state was reached indicating stabilized behavior for both adsorption and photocatalysis.

• 한국표면공학회지
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• 제52권3호
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• pp.111-116
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• 2019

Chromium was coated on a steel substrate by the Cr(III) electroplating method, and corroded at $500-900^{\circ}C$ for 5 h in $N_2/0.1%H_2S-mixed$ gas to study the high-temperature corrosion behavior of the Cr(III) coating in the highly corrosive $H_2S-environment$. The coating consisted of (C, O)-supersaturated, nodular chromium grains with microcracks. Corrosion was dominated by oxidation owing to thermodynamic stability of oxides compared to sulfides and nitrides. Corrosion initially led to formation of the thin $Cr_2O_3$ layer, below which (S, O)-dissolved, thin, porous region developed. As corrosion progressed, a $Fe_2Cr_2O_4$ layer formed below the $Cr_2O_3$ layer. The coating displayed relatively good corrosion resistance due to formation of the $Cr_2O_3$ scale and progressive sealing of microcracks.