Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2013.05a
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- Pages.112-113
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- 2013
Oxidation of CrAlMgSiN thin films between 600 and 900℃ in air
CrAlMgSiN 박막의 600-900℃에서의 대기중 산화
- Published : 2013.05.30
Abstract
Thin CrAlMgSiN films, whose composition were 30.6Cr-11.1Al-7.3Mg-1.2Si-49.8N (at.%), were deposited on steel substrates in a cathodic arc plasma deposition system. They consisted of alternating crystalline Cr-N and AlMgSiN nanolayers. After oxidation at
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