• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.636-639
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• 2004

We have synthesized a $Eu^{2{\cdot}}$ -activated $Sr_3MgSi_2O_8$ blue phosphor and $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$ yellow phosphor investigated an attempt to develop white LEDs by combining it with a GaN blue LED chip. Three distinct emission bands from the GaN-based LED and the ($Sr_3MgSi_2O_8$:Eu + $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$:Eu) phosphor are clearly observed at 405nm, 455 nm and at around 540 nm, respectively. These three emission bands combine to give a spectrum that appears white to the naked eye. Our results show that GaN (405 nm chip)-based ($Sr_3MgSi_2O_8$:Eu + $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$:Eu) exhibits a better luminous efficiency than that of the industrially available product InGaN (460 nm chip)-based YAG:Ce.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.285-285
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• 2007

Friction material in a piezoelectric system is a important part to affect to moving performance. In this paper, alumina ceramics $(AlO_2)$, silicon carbide (SiC), high speed steel and super-hard alloy (WC, Tungsten Carbide) having a hardness knoop of 1000 to 2000 $kg/mm^2$ were tested as a friction material of AF module. Even though $AlO_2$, SiC and high speed steel were a high-hardness material, $AlO_2$ and SiC were worn by a rough surface, and SiC is rusted in humidity condition. AF module using super-hard alloy has showed a stable moving performance in life time test.

• Korean Journal of Materials Research
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• v.7 no.1
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• pp.69-75
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• 1997

Thin films of $Si0_2(1000{\AA})/CoNiCr(400{\AA})/Cr$ were fabricated as a function of Cr thickness by KF magnetron sputtering. The saturation magnetization, coercive force and squareness with annealing temperature for these films were investigated. The values of saturation magnetization of $SiO_2/CoNiCr/Cr$ thin films decreased as the thickness of Cr underlayer increased, whereas coercive force increased as the thickness of Cr underlayer increased. The value of Ms was 600 emu/cc and the maximum value of Hc was 550 Oe. Especially, the value of saturation magnetization was rapidly decreased $SiO_2/CoNiCr/Cr(1700{\AA})$ thin films as the annealing temperature increased And the coercive force increased as the annealing temperature increased When annealing temperature was $650^{\circ}C$, the Ms was reduced to 90 % of the as-deposited film. And the Hc was showed maximum 1600 Oe. It was thought that Cr diffusion into CoNiCr layer reduced the magnetic moment of CoKiCr layer. In addition. Hc might he increased due to grain growth perpendicular to the film plane.

• Korean Journal of Materials Research
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• v.8 no.6
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• pp.484-492
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• 1998

The formation mechanism of the epitaxial cobalt silicide from Co/Ti/OOO) Si structure has been investigated. The transition temperature of CoSi to CoSi, was found to increase with increasing the Ti interlayer thickness, which may be owing to the occupation of the tetrahedral sites by Ti atoms in the CoSi crystal structure as well as the blocking effect of the Ti interlayer on the diffusion of Co. Also, the Co- Ti-O ternary compound formed at the metal! Si interface at the begining of silicidation, which seems to play an important role in epitaxial growth of Co silicide. The final layer structures obtained after a rapid thermal annealing of the Cot Ti/( 100) Si bi-layer structure turned out to be Ti oxide/Co- Ti-Si/epi-$CoSi_2$/OOO)

• Journal of the Korean Ceramic Society
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• v.39 no.2
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• pp.210-215
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• 2002

Optical Band-pass Filter(BPF) for the selected wavelength of 4300 nm was designed and fabricated on Si wager by alternately depositing Ge and $SiO_2$ thin layers by an electron beam evaporation technique. The fabricated BPF showed the optical transmittance characteristics of 58.2% with FWHM(Full Width at Half Maximum) of 204 nm at 4300 nm, but showed the transmittance less than 5% due to the reflectance over all the wavelength ranges except 4300 nm band. The $CO_2$ sensitivity of BPF was investigated with the transmittance as a function of $CO_2$ gas concentration using a sensing cell attached to FT-IR instrument. The transmittance of BPF was almost linearly decreased with increasing of $CO_2$ concentration in the range of from 500 to 5000 ppm. The sensing structure using double BPFs showed higher slop of transmittance vs $CO_2$ concentration, and thus higher gas sensitivity than that using a single BPF, even though the former had relatively lower transmittance.

• Journal of Ceramic Processing Research
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• v.13 no.spc1
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• pp.37-41
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• 2012

A lithium ion conducting borosilicate glass was fabricated by a conventional melt quenching technique from a mixture of Li2CO3, B2O3 and SiO2 powders. The Li ion conductivity of the lithium borosilicate glasses was evaluated in terms of the SiO2/B2O3 ratio. In the Li2O-B2O3-SiO2 ternary glass, the glass forming region decreases with an increasing Li2O content. At the same Li2O, the crystallization tendency of the glass samples increases with the SiO2/B2O3 ratio, resulting in a reduced glass forming region in the Li2O-B2O3-SiO2 ternary glass. The electrical conductivity moderately depends on the SiO2/B2O3 ratio in the Li2O-B2O3-SiO2 ternary glass. The conductivity of the glasses slightly increases with the SiO2/B2O3 ratio. The observed phenomenon can be explained by the modification of the glass structure as a function of the SiO2 content.

• Corrosion Science and Technology
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• v.12 no.3
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• pp.119-124
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• 2013

Nano-multilayered, crystalline AlTiSiN thin films were deposited on WC-TiC-Co substrates by the cathodic arc plasma deposition. The deposited film consisted of wurtzite-type AlN, NaCl-type TiN, and tetragonal $Ti_2N$ phases. Their oxidation characteristics were studied at 800 and $900^{\circ}C$ for up to 20 h in air. The WC-TiC-Co oxidized fast with large weight gains. By contrast, the AlTiSiN film displayed superior oxidation resistance, due mainly to formation of the ${\alpha}-Al_2O_3$-rich surface oxide layer, below which an ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale existed. Their oxidation progressed primarily by the outward diffusion of nitrogen, combined with the inward transport of oxygen that gradually reacted with Al, Ti, and Si in the film.

• Proceedings of the Materials Research Society of Korea Conference
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• 2001.11a
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• pp.181-181
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• 2001

• Proceedings of the Korean Magnestics Society Conference
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• 1992.10a
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• pp.80-81
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• 1992

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.63.2-63.2
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• 2010

삼중접합 태양전지에 상부전지로 이용되는 a-SiO:H 태양전지는 PECVD(Plasma Enhanced Chemical Vapour Deposition)을 이용하여 증착하였다. i a-SiO:H는 $CO_2/SiH_4$ 비율을 변화하여 밴드갭을 조절하였다. $CO_2/SiH_4$가 0에서 0.43으로 증가 할수록 밴드갭이 1.74 eV에서 1.94 eV로 증가하는 경향을 보였다. 이는 FTIR에서 나타난 결과인 Si-O-Si 결합의 증가 때문인 것으로 판단한다. 그에 반해서 광 전도도는 감소하는 경향을 보였다.그러나 암전도도와 광전도도의 비율인 광민감도는 $10^5$에서 $10^4$의 값으로 비정질 태양전지에 적용가능한 값을 보였다. 이러한 박막 특성을 가진 i a-SiO:H를 이용하여 비정질 실리콘 태양전지를 제작한 결과 $CO_2/SiH_4$의 비율이 증가함에 따라 태양전지의 $V_{oc}$가 0.8 V에서 0.5 V로 현저하게 감소하였고, $J_{sc}$와 FF 역시 11 $mA/cm^2$에서 4 $mA/cm^2$, 69%에서 50%로 감소하였다. 단위박막 결함을 측정하는 CPM(Constant Photocurrent Method)을 이용하여 i a-SiO:H 내부에 $10^{16}cm^{-3}$ 정도의 내부 결함을 관찰하였고 이는 태양전지의 특성 감소와 관련이 있는 것으로 판단한다.