• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.205-205
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• 2015

최근, 비정질 산화물 반도체를 이용한 TFT는 투명성, 유연성, 저비용, 저온공정이 가능하기 때문에 차세대 flat-panel 디스플레이의 back-plane TFT로써 다양한 방면에서 연구되고 있다. 산화물 반도체 In-Zn-O-시스템에서는 Gallium (Ga)을 suppressor로 사용한 a-In-Ga-Zn-O (a-IGZO) 뿐만 아니라, Magnesium (Mg), Hafnium (Hf), Tin (Sn), Zirconium (Zr) 등의 다양한 물질이 연구되었다. 그 중 Silicon (Si)은 Ga, Hf, Sn, Zr, Mg과 같은 suppressor에 비해 구하기 쉬우며 가격적인 측면에서도 저렴하다는 장점이 있다. solution 공정으로 제작한 산화물 반도체 TFT는 진공 시스템을 사용한 공정보다 공정시간이 짧고, 저비용, 대면적화가 가능하다는 장점이 있다. 하지만, 투명하고 유연한 device를 제작하기 위해서는 저온 공정과 low thermal budget은 필수적이다. 이러한 측면에서 MWI (Microwave Irradiation)는 저온공정이 가능하며, 짧은 공정 시간에도 불구하고 IZO 시스템의 산화물 반도체의 전기적 특성 향상을 기대할 수 있는 효율 적인 열처리 방법이다. 본 연구에서는 In-Zn-O 시스템의 TFT에서 silicon (Si)를 Suppressor로 사용한 a-Si-In-Zn-O (SIZO) TFT를 제작하여 두 가지 열처리 방법을 사용하여 TFT의 전기적 특성을 확인하였다. 첫 번째 방법은 Box Furnace를 사용하여 N2 분위기에서 $600^{\circ}C$의 온도로 30분간 열처리 하였으며, 두 번째는 MWI를 사용하여 1800 W 출력 (약 $100^{\circ}C$)에 2분간 열처리 하였다. MWI 열처리는 Box Furnace 열처리에 비해 저온 공정 및 짧은 시간에도 불구하고 향상된 전기적 특성을 확인 할 수 있었다.

• Korean Journal of Materials Research
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• v.7 no.10
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• pp.919-925
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• 1997

초기 혼합분말을 다르게 사용함으로써 다른 반응경로를 따라 성장된 일방향 집합조직 YB $a_{2}$BaCu $O_{5}$(Y211)형상과 분포가 초기 혼합분말이 달라짐에 따라 상당히 다르게 형성되었다. 여러 반응경로 중에서 $Y_{2}$ $O_{3}$+Y123$\longrightarrow$ $Y_{1.6}$Ba/ sub 2.2/ $O_{y}$와 ( $Y_{2}$ $O_{3}$BaCu $O_{2}$)+Y123$\longrightarrow$ $Y_{1.6}$B $a_{2.3}$C $u_{3.3}$ $O_{y}$반응에 의하여 용융공정된 경우 일방향 집합조직 Y 123 결정 성장이 잘 일어났으며, 특히 Y123의 포정반응 온도 이하의 낮은 온도에서도 결정성장이 일어났다. 또한 Y211입자 미세화가 다른 반응에 의한 용융공정보다 잘 일어났다. 이와같은 서로 다른 반응과정에 의하여 용융공정된 미세구조의 차이점들을 $Y_{2}$ $O_{3}$-BaO-CuO 3원계 상평형도를 이용하여 설명하였다.다.다.다.다.다.다.

• Journal of the Korean Applied Science and Technology
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• v.35 no.1
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• pp.80-88
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• 2018

In this study, we prepared hybrid composites by using low temperature sol-gel process for transparent and hard coating film. The hybrid composites consist of $ZrO_2/TiO_2/organosilane$, of which organosilane was introduced 3-(trimethoxysilyl)propyl methacrylate due to the role of a photocurable ceramic material for low temperature process. The ceramic composites with various composition ratios were coated on a polycarbonate substrate using a sol-gel process of low temperature process, and characterized optical and mechanical properties of coated thin film. The transparencies of coated thin films were 97.5 % or more, and the pencil hardness were 9H or more. In the case of the ZTS-2-1, the nano-indentation hardness was measured at the highest value of 1.14 GPa.

• Korean Chemical Engineering Research
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• v.43 no.4
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• pp.467-473
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• 2005

Liquid phase nitrous oxide ($N_2O$) contains air, carbon monoxide, water, carbon dioxide and NOx as main impurities. It is known to be very dangerous to obtain a very pure $N_2O$ product by using solidification at low temperature. In this study a new method to obtain a high purity of $N_2O$ product based on a continuous distillation process was introduced. For the modeling of the continuous distillation process to obtain a product having a purity over 99.999％ of $N_2O$ stream, Intalox wire gauze packing- No. SCH-80S gauze packing column was used. Peng-Robinson equation of state was used for the modeling of the continuous distillation process and refrigeration system. Computational results performed in this work showed a good agreement with Aspen Plus simulation results.

• Journal of the Korean GEO-environmental Society
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• v.7 no.4
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• pp.5-13
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• 2006

This study was conducted to evaluate the application of $UV/TiO_2/H_2O_2$ process for treating humic acid and heavy metals in surface water. Removal efficiency of $UV/TiO_2/H_2O_2$ process was much more efficient than that of $UV/TiO_2$ process for humic acid and heavy metals removal. The removal rate of humic acid and heavy metals increased with the increase of $TiO_2$ dosage and UV intensity, however decreased with more than 0.3 g/L of $TiO_2$ dosage. The addition of $H_2O_2$ as an oxidant was a positive effect for the removal rate of humic acid and heavy metals especially in the concentration of 50 mg/L $H_2O_2$.

• Korean Chemical Engineering Research
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• v.51 no.6
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• pp.700-708
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• 2013

Pyroprocessing has been developed for the purpose of resolving the current spent nuclear fuel management issue and enhancing the recycle of valuable resources. Pyroprocessing has been developed with the dry technologies which are performed under high temperature conditions excluding any aqueous processes. Pyro-processes which are based on the electrochemical principles require pretreatment processes and a voloxidation process is considered as a pretreatment step for an electrolytic reduction process. Various kinds of gas conditions are applicable to the voloxidation process and the understanding of Cs behavior during the process is of importance for the analyses of waste characteristics and heat load on the overall pyroprocessing. In this study, the changes of chemical compounds with the gas conditions were calculated by analyzing gas-solid reaction behavior based on the chemical equilibria on a Cs-Te-O system. $Cs_2TeO_3$ and $Cs_2TeO_4$ were selected after a Tpp diagram analysis and it was confirmed that they are relatively stable under oxidizing atmospheres while it was shown that Cs and Te would be removed by volatilization under reducing atmosphere at a high temperature. This work provided basic data for predicting Cs behavior during the voloxidation process at which compounds are chemically distributed as the first stage in the pyroprocessing and it is expected that the results would be used for setting up material balances and related purposes.

• Journal of Korean Society of Environmental Engineers
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• v.35 no.12
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• pp.889-896
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• 2013

Advanced Oxidation Processes (AOP) have been interested for removing micropollutants in water. Most of water treatment plants (WTPs) located along the lower part of Nakdong River have adopted the $O_3/BAC$ process and have interesting in peroxone process a kind of AOP. This study evaluated the removal characteristics of residual hydrogen peroxide ($H_2O_2$) combining with the biofiltration process in the next BAC process when the hydrogen peroxide is applied for the WTP operating $O_3/BAC$ process. In the experiment, changing the temperature and the concentration of $H_2O_2$ of influent, the biofiltration process showed rapidly dropped the biodegradability when the $H_2O_2$ concentration was increased and lowered water temperature while BAC process maintained relatively stable efficiency. The influent fixed at $20^{\circ}C$ and the concentration of $H_2O_2$ at 300 mg/L was continuously input for 78 hours. Most of the $H_2O_2$ in the influent did not remove at the biofiltration process controlled 5 to 15 minutes EBCT condition after 24~71 hours operating time while BAC process controlled 5 to 15 minutes EBCT showed 38~91% removal efficiency condition after 78 hours operating time. Besides, after 78 hours continuously input experiment, the biomass and activity of attached bacterial on the biofilter and BAC were $6.0{\times}10^4CFU/g$, $0.54mg{\cdot}C/m^3{\cdot}hr$ and $0.4{\times}10^8CFU/g$, $1.42mg{\cdot}C/m^3{\cdot}hr$ respectively. These biomass and activity values were decreased 99% and 72% in biofilter and 68% and 53% in BAC compared with initial condition. The biodegradation rate constant ($k_{bio}$) and half-life ($t_{1/2}$) in BAC were decreased from $1.173min^{-1}$ to $0.183min^{-1}$ and 0.591 min to 3.787 min respectively according to increasing the $H_2O_2$ concentration from 10 mg/L to 300 mg/L at $5^{\circ}C$ water temperature and the $k_{bio}$ and $t_{1/2}$ were $1.510min^{-1}$ to $0.498min^{-1}$ and 0.459 min to 1.392 min at $25^{\circ}C$ water temperature. By increasing the water temperature from $5^{\circ}C$ to $15^{\circ}C$ or $25^{\circ}C$, the $k_{bio}$ were increased 1.1~2.1 times and 1.3~4.4 times. If a water treatment plant operating $O_3/BAC$ process is considering the hydrogen peroxide for the peroxone process, post BAC could effectively decrease the residual $H_2O_2$, moreover, in case of spilling the $H_2O_2$ into the water process line, these spilled $H_2O_2$ concentration can be able to decrease by increasing the EBCT at the BAC process.

• Journal of the Semiconductor & Display Technology
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• v.23 no.1
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• pp.92-96
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• 2024

The application of the technology for forming Al₂O₃ thin films using ALD(atomic layer deposition) method is rapidly increasing in the semiconductor and display fields. In order to increase the efficiency of the ALD process in a mass production line, metallic by-products generated from the ALD process chamber must be effectively collected. By collecting by-products flowing out of the chamber with a cold trap device before they go to the vacuum pump, damage to the vacuum pump can be prevented and the work room can be maintained stably, resulting in increased process flow rate. In this study, a cold trap was installed between the ALD process chamber and the dry pump to measure and analyze by-products generated during the Al₂O₃ thin film deposition process. As a result, it was confirmed that Al and O elements were discharged, and the collection forms were two types: bulk and powder. And the binding energy peaked at 73.7 ~ 74.3 eV, the binding energy of Al 2p, and 530.7 eV, the binding energy of O 1s, indicating that the binding structure was Al-O.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.12
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• pp.37-42
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• 1999

In this paper, some of main processes for the next generation integrated circuits, such as Cu damascene process using CMP, electron beam lithography, $SiO_2$ CVD and RIE, Ti/Cu-CVD were carried cut and then, two level Cu interconnects were accomplished. In the results of CMP unit processes, a 4,635 ${\AA}$/min of removal rate, a selectivity of Cu : $SiO_2$ of 150:1, a uniformity of 4.0% are obtained under process conditions of a head pressure of 4 PSI, table and head speed of 25rpm, a oscillation distance of 40 mm, and a slurry flow rate of 40 ml/min. Also 0.18 ${\mu}m\;SiO_2$ via-line patterns are fabricated using 1000 ${\mu}C/cm^2$ dose, 6 minute and 30 second development time and 1 minute and 30 second etching time. And finally sub-0.2 ${\mu}$ twolevel metal interconnects using the developed processes were fabricated and the problems of multilevel interconnects are discussed.

• Journal of the Korean Applied Science and Technology
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• v.34 no.2
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• pp.367-375
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• 2017

In this study, NO oxidation process was studied to increase the NO treatment efficiency of pollutant present in exhaust gas. $H_2O_2$ catalytic cracking was introduced as a method of producing dry oxidizing agents with strong oxidizing power. The $K-Mn/Fe_2O_3$ heterogeneous catalysts applicable to the $H_2O_2$ decomposition process were prepared and their physico-chemical properties were investigated. The prepared dry oxidant was applied to the NO oxidation process to treat the simulated exhaust gas containing NO, NO conversion rates close to 100% were confirmed at various flow rates (5, 10, 20 L/min) of the simulated flue gas.