• Title/Summary/Keyword: voltage profile

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Control of DSTATCOM for Line Voltage Regulation (선로 전압 조정을 위한 DSTATCOM 제어)

  • Jung, Soo-Young;Kim, Tae-Hyun;Moon, Seung-Il
    • Journal of IKEEE
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    • v.5 no.2 s.9
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    • pp.146-152
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    • 2001
  • Two control techniques - PI and LQR(Linear Quadratic Regulator) - of DSTATCOM (Distribution Static Synchronous Compensator) for line voltage regulation in distribution system are presented. It is shown that the voltage waveform is improved if the proposed methods are applied in IEEE 13 radial distribution system using PSCAD/EMTDC package in case of single line-to-ground fault. The three cases - without control, with PI control and with LQR control - are compared. The LQR control is shown to be best in respect of response profile and control effort required among them.

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P-type Capacitance Observed in Nitrogen-doped ZnO (ZnO에서 질소 불순물에 의한 p-type Capacitance)

  • Yoo, Hyun-Geun;Kim, Se-Dong;Lee, Dong-Hoon;Kim, Jung-Hwan;Jo, Jung-Yol
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.61 no.6
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    • pp.817-820
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    • 2012
  • We studied p-type capacitance characteristics of ZnO thin-film transistors (TFT's), grown by metal organic chemical vapor deposition (MOCVD). We compared two ZnO TFT's: one grown at $450^{\circ}C$ and the other grown at $350^{\circ}C$. ZnO grown at $450^{\circ}C$ showed smooth capacitance profile with electron density of $1.5{\times}10^{20}cm^{-3}$. In contrast, ZnO grown at $350^{\circ}C$ showed a capacitance jump when gate voltage was changed to negative voltages. Current-voltage characteristics measured in the two samples did not show much difference. We explain that the capacitance jump is related to p-type ZnO layer formed at the $SiO_2$ interface. Current-voltage and capacitance-voltage data support that p-type characteristics are observed only when background electron density is very low.

Pulsed DC Bias Effects on Substrate in TiNx Thin Film Deposition by Reactive RF Magnetron Sputtering at Room Temperature (반응성 RF 마그네트론 스퍼터링에 의한 TiNx 상온 성막에 있어서 기판 상의 펄스상 직류 바이어스 인가 효과)

  • Kim, Seiki
    • Journal of the Korean institute of surface engineering
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    • v.52 no.6
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    • pp.342-349
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    • 2019
  • Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N2/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiNx films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiNx films was decreased with application of the pulsed DC substrate bias voltage. The TiNx films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiNx films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

A 3-Step Speed Control for Minimizing Energy Consumption for Battery-Powered Wheeled Mobile Robots (배터리로 구동되는 이동 로봇의 에너지 소모 최소화를 위한 3-구간 속도 제어)

  • Kim Byung-Kook;Kim Chong-Hui
    • Journal of Institute of Control, Robotics and Systems
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    • v.12 no.3
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    • pp.208-220
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    • 2006
  • Energy of wheeled mobile robot is usually supplied by batteries. In order to extend operation time of mobile robots, it is necessary to minimize the energy consumption. The energy is dissipated mostly in the motors, which strongly depends on the velocity profile. This paper investigates various 3-step (acceleration - cruise - deceleration) speed control methods to minimize a new energy object function which considers the practical energy consumption dissipated in motors related to motor control input, velocity profile, and motor dynamics. We performed an analysis on the energy consumption various velocity profile patterns generated by standard control input such as step input, ramp input, parabolic input, and exponential input. Based on these standard control inputs, we analyzed the six 3-step velocity profile patterns: E-C-E, P-C-P, R-C-R, S-C-S, R-C-S, and S-C-R (S means a step control input, R means a ramp control input, P means a parabolic control input, and E means an exponential control input, C means a constant cruise velocity), and suggested an efficient iterative search algorithm with binary search which can find the numerical solution quickly. We performed various computer simulations to show the performance of the energy-optimal 3-step speed control in comparison with a conventional 3-step speed control with a reasonable constant acceleration as a benchmark. Simulation results show that the E-C-E is the most energy efficient 3-step velocity profile pattern, which enables wheeled mobile robot to extend working time up to 50%.

Buried Channel PMOS에서 이온 주입된 $BF_2$ 열처리 거동

  • Heo, Tae-Hun;No, Jae-Sang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.374-374
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    • 2012
  • 반도체 소자의 크기가 100 nm 이하로 감소되면 통상적인 이온 주입 조건인 이온 에너지, 조사량 및 이온 주입 각도뿐만 아니라 Dose Rate 및 모재 온도가 Dopant Profile을 조절하는 데에 있어서 매우 중요한 인자로 작용한다. 본 연구에서는 Ribbon-beam 및 Spot-beam을 사용하여 활성화 열처리 후 Dopant Profile을 분석하였다. 이온 주입은 모든 시편에서 $BF_2$를 가속 에너지 10 keV 및 조사량 $2{\times}10^{15}/cm^2$로 고정하였다. 이온 주입 후 도펀트 활성화는 100% 질소 분위기 하에서 $850^{\circ}C$-30s 조건으로 RTA 열처리를 수행하였다. Boron 및 Fluorine의 Profile은 SIMS 분석을 통하여 구하였다. Spot-beam은 Ribbon-Beam에 비하여 Dose Rate 및 Cooling Efficiency가 높기 때문에 이온 주입 후 더욱 많은 양의 Primary-defect를 발생시키고 이에 따라 두꺼운 비정질 충을 형성한다. $BF_2$ 이온 주입 된 시편에서 B 및 F의 농도 Peak-height는 a/c 계면에 위치하는 것을 관찰하였다. 또한 B 및 F의 농도 Peak-height는 Silicon 모재의 온도가 증가할수록 증가하는 것을 관찰하였다. Silicon 모재의 온도가 증가함에 따라 Active-area의 면저항이 변화하지 않는 상태에서 Vt (Threshold Voltage)가 급격히 감소함을 관찰 하였다. 비정칠 층의 두께가 증가할수록 a/c 계면 하단에 잔존하는 Residual-defect의 양이 감소하고 이는 측면확산을 감소시키는 역할을 한다는 것이 관찰되었다.

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CoFeB과 IrMn 자성 박막의 고밀도 반응성 이온 식각

  • Kim, Eun-Ho;So, U-Bin;Gong, Seon-Mi;Jeong, Yong-U;Jeong, Ji-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.232-232
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    • 2010
  • 정보화 산업의 발달은 DRAM, flash memory 등을 포함한 기존의 반도체 메모리 소자를 대체할 수 있는 차세대 메모리 소자에 대한 개발을 요구하고 있다. 특히 magnetic random access memory (MRAM)는 SRAM과 대등한 고속화 그리고 DRAM 보다 높은 기록 밀도가 가능하고 낮은 동작 전압과 소비전력 때문에 대표적인 차세대 비휘발성 메모리로 주목받고 있다. 또한 MRAM소자의 고집적화를 위해서 우수한 프로파일을 갖고 재증착이 없는 나노미터 크기의 magnetic tunnel junction (MTJ) stack의 건식 식각에 대한 연구가 선행되어야 한다. 본 연구에서는 고밀도 반응성 이온 식각법(Inductively coupled plasma reactive ion etching; ICPRIE)을 이용하여 재증착이 없이 우수한 식각 profile을 갖는 CoFeB과 IrMn 박막을 형성하고자 하였다. Photoresist(PR) 및 Ti 박막의 두 가지 마스크를 이용하여 HBr/Ar, HBr/$O_2$/Ar 식각 가스들의 농도를 변화시키면서 CoFeB과 IrMn 박막의 식각 특성들이 조사되었다. 자성 박막과 동일한 조건에 대하여 hard mask로서 Ti가 식각되었다. 좋은 조건을 얻기 위해 HBr/Ar 식각 가스를 이용 식각할 때 pressure, bias voltage, rf power를 변화시켰고 식각조건에서 Ti 하드마스크에 대한 자성 박막들의 selectivity를 조사하고 식각 profile을 관찰하였다. 식각 속도를 구하기 위해 alpha step(Tencor P-1)이 사용되었고 또한 field emission scanning electron microscopy(FESEM)를 이용하여 식각 profile을 관찰함으로써 최적의 식각 가스와 식각 조건을 찾고자 하였다.

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Effect of Hexafluoroisopropanol Addition on Dry Etching of Cu Thin Films Using Organic Material (유기 물질을 사용한 구리박막의 건식 식각에 대한 헥사플루오로이소프로판올 첨가의 영향)

  • Park, Sung Yong;Lim, Eun Teak;Cha, Moon Hwan;Lee, Ji Soo;Chung, Chee Won
    • Korean Journal of Materials Research
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    • v.31 no.3
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    • pp.162-171
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    • 2021
  • Dry etching of copper thin films is performed using high density plasma of ethylenediamine (EDA)/hexafluoroisopropanol (HFIP)/Ar gas mixture. The etch rates, etch selectivities and etch profiles of the copper thin films are improved by adding HFIP to EDA/Ar gas. As the EDA/HFIP concentration in EDA/HFIP/Ar increases, the etch rate of copper thin films decreases, whereas the etch profile is improved. In the EDA/HFIP/Ar gas mixture, the optimal ratio of EDA to HFIP is investigated. In addition, the etch parameters including ICP source power, dc-bias voltage, process pressure are varied to examine the etch characteristics. Optical emission spectroscopy results show that among all species, [CH], [CN] and [H] are the main species in the EDA/HFIP/Ar plasma. The X-ray photoelectron spectroscopy results indicate the formation of CuCN compound and C-N-H-containing polymers during the etching process, leading to a good etch profile. Finally, anisotropic etch profiles of the copper thin films patterned with 150 nm scale are obtained in EDA/HFIP/Ar gas mixture.

Driving of Switched Reluctance Motor to Reduce Torque Ripple (맥동 토오크 저감을 위한 스위치드 리럭턴스 전동기 구동에 관한 연구)

  • 오인석;성세진
    • The Transactions of the Korean Institute of Power Electronics
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    • v.2 no.2
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    • pp.49-56
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    • 1997
  • Switched Reluctance Motors(SRMs) have a considerable inherent torque ripple due to the driving characteristics of pulse current waveform and the nonlinear variation inductance profile. This paper describes a current shape characteristics to effect a torque ripple reduction, and one pulse mode switching control method is proposed to minimize torque ripple of a switched reluctance motor regardless of speed and load condition by regulating tow parameters, such as, advance angle and exciting voltage. The experiments are performed to verify the capability of proposed switching method on 6/4 salient type SRM.

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Evaluation of Thin-Film Photodevices and Development of Artificial Retina

  • Kimura, Mutsumi;Shima, Takehiro;Yamashita, Takehiko;Nishizaki, Yoshitaka;Hara, Hiroyuki
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1745-1748
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    • 2007
  • First, thin-film photodevices are evaluated, and a p/i/n thin-film phototransistor (TFPT) is recommended because the photo-induced current is relatively high and independent of the applied voltage. Next, an artificial retina is developed using the p/i/n TFPTs, and it is found that it can detect photo illuminance profile with sensitivity control.

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A design of a low power mobile multimedia system architecture (저전력 모바일 멀티미디어 시스템 구조 설계에 관한 연구)

  • Lee, Eun-Seo;Lee, Jae-Sik;Kim, Byung-Il;Chang, Tae-Gyu
    • Proceedings of the KIEE Conference
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    • 2005.10b
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    • pp.231-233
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    • 2005
  • For the low-power design of the mobile multimedia system architecture, this paper modeling the mobile multimedia system and analysis the power consumption profile about the whole communication environment. The mobile system model consist of air interface, RIP front-end, base-band processing module and human interface. For the result of power consumption profile analysis, the power consumption of multimedia processing is above 60% compare to the whole power consumption in mobile multimedia system. To minimize the power consumption in processing module which consumes the large power, this paper proposed the Microscopic DVS technique which applies the optimum voltage for the each multimedia frame. For the simulation result, proposed power minimization technique reduce the power consumption about 30%.

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