• Title/Summary/Keyword: varying bias

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Analysis of Fabric Shrinkage in Sewing Machine Embroidery (기계자수 원단의 수축에 관한 연구)

  • 강창희;안춘순
    • Journal of the Korean Society of Clothing and Textiles
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    • v.28 no.8
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    • pp.1057-1064
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    • 2004
  • Silk, polyester, cotton, and wool fabrics were embroidered with varying stitch length of 3mm, 5mm, and 10mm to examine the difference in fabric shrinkage in terms of sewing direction, fabric thickness, cover factor, stitch length, and fiber type. Warp, filling, and bias direction of sewing resulted in no difference in fabric shrinkage. Within the samples with same stitch length, there was less fabric shrinkage in fabrics with higher fabric thickness or higher cover factor. There was larger shrinkage when sewn with longer stitch length. Comparing fabrics with different fiber types but similar fabric thickness, silk and polyester fabrics showed the smallest fabric shrinkage and wool fabrics showed the largest shrinkage. It is shown that similar fabric shrinkage between silk and polyester is due to the similarity in cover factor.

Intelligent fuzzy weighted input estimation method for the input force on the plate structure

  • Lee, Ming-Hui;Chen, Tsung-Chien
    • Structural Engineering and Mechanics
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    • v.34 no.1
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    • pp.1-14
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    • 2010
  • The innovative intelligent fuzzy weighted input estimation method which efficiently and robustly estimates the unknown time-varying input force in on-line is presented in this paper. The algorithm includes the Kalman Filter (KF) and the recursive least square estimator (RLSE), which is weighted by the fuzzy weighting factor proposed based on the fuzzy logic inference system. To directly synthesize the Kalman filter with the estimator, this work presents an efficient robust forgetting zone, which is capable of providing a reasonable compromise between the tracking capability and the flexibility against noises. The capability of this inverse method are demonstrated in the input force estimation cases of the plate structure system. The proposed algorithm is further compared by alternating between the constant and adaptive weighting factors. The results show that this method has the properties of faster convergence in the initial response, better target tracking capability, and more effective noise and measurement bias reduction.

Estimation of the time-dependent AUC for cure rate model with covariate dependent censoring

  • Yang-Jin Kim
    • Communications for Statistical Applications and Methods
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    • v.31 no.4
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    • pp.365-375
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    • 2024
  • Diverse methods to evaluate the prediction model of a time to event have been proposed in the context of right censored data where all subjects are subject to be susceptible. A time-dependent AUC (area under curve) measures the predictive ability of a marker based on case group and control one which are varying over time. When a substantial portion of subjects are event-free, a population consists of a susceptible group and a cured one. An uncertain curability of censored subjects makes it difficult to define both case group and control one. In this paper, our goal is to propose a time-dependent AUC for a cure rate model when a censoring distribution is related with covariates. A class of inverse probability of censoring weighted (IPCW) AUC estimators is proposed to adjust the possible sampling bias. We evaluate the finite sample performance of the suggested methods with diverse simulation schemes and the application to the melanoma dataset is presented to compare with other methods.

The Study of the Etch Characteristics of the HfAlO3 Thin Film in O2/BCl3/Ar Plasma (O2/BCl3/Ar 플라즈마를 이용한 HfAlO3 박막의 식각특성 연구)

  • Ha, Tae-Kyung;Woo, Jong-Chang;Kim, Chang-Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.12
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    • pp.924-928
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    • 2010
  • In this study, $HfAlO_3$ thin films using gate insulator of MOSFET were etched in inductively coupled plasma. The etch characteristics of the $HfAlO_3$ thin films has been investigated by varying $O_2/BCl_3$/Ar gas mixing ratio, a RF power, a DC bias voltage and a process pressure. As the $O_2$ concentration increases further, $HfAlO_3$ was redeposited. As increasing RF power and DC bias voltage, etch rates of the $HfAlO_3$ thin films increased. Whereas, as decreasing of the process pressure, etch rates of the $HfAlO_3$ thin films increased. The chemical reaction on the surface of the etched the $HfAlO_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS). These peaks moved a binding energy. This chemical shift indicates that there are chemical reactions between the $HfAlO_3$ thin films and radicals and the resulting etch by-products remain on the surface.

The Study on the Etching Characteristics of (Ba, Sr)TiO$_3$ Film by Inductively Coupled Plasma (유도결합 플라즈마에 의한(Ba, Sr)TiO$_3$ 박막의 식각 특성 연구)

  • 김승범;이영준;염근영;김창일
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.4
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    • pp.56-62
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    • 1999
  • In this study, (Ba, Sr)$TiO_3$ thin films were etched with $Cl_2$/Ar gas mixing ratio in an inductively coupled plasma (ICP) by varying the etching parameter such as rf power, dc bias voltage, and chamber pressure. The etch rate was 56 nm/min under $Cl_2$/($Cl_2$+Ar) gas mixing ratio of 0.2, rf power of 600 W, dc bias voltage of 250 V, and chamber pressure of 5 mTorr. At this time, the selectivity of BST to Pt, $SiO_2$ was respectively 0.52, 0.43. The surface reaction of the etched (Ba, Sr)$TiO_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS). Ba is removed by chemical reaction between Sr and Cl to remove Sr. Ti is removed by chemical reaction such as $TiCl_4$ with ease. The results of secondary ion mass spectrometer (SIMS) analysis compared with the results of XPS analysis and the results were the same.

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Anti-corrosion Properties of CrN Thin Films Deposited by Inductively Coupled Plasma Assisted Sputter Sublimation for PEMFC Bipolar Plates (유도 결합 플라즈마-스퍼터 승화법을 이용한 고분자 전해질 연료전지 분리판용 CrN 박막의 내식성연구)

  • You, Younggoon;Joo, Junghoon
    • Journal of the Korean institute of surface engineering
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    • v.46 no.4
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    • pp.168-174
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    • 2013
  • In this study, low-cost, high-speed deposition, excellent processability, high mechanical strength and electrical conductivity, chemical stability and corrosion resistance of stainless steel to meet the obsessive-compulsive (0.1 mm or less) were selected CrN thin film. new price reduction to sputter deposition causes - the possibility of sublimation source for inductively coupled plasma Cr rods were attempts by DC bias. 0.6 Pa Ar inductively coupled plasmas of 2.4 MHz, 500 W, keeping Cr Rod DC bias power 30 W (900 V, 0.02 A) is applied, $N_2$ flow rate of 0.5, 1.0, 1.5 sccm by varying the characteristics of were analyzed. $N_2$ flow rate increases, decreases and $Cr_2N$, CrN was found to increase. In addition to corrosion resistance and contact resistance, corrosion resistance, electrical conductivity was evaluated. corrosion current density than $N_2$ 0 sccm was sure to rise in all, $N_2$ 1 sccm at $4.390{\times}10^{-7}$ (at 0.6 V) $A{\cdot}cm^{-2}$, respectively. electrical conductivity process results when $N_2$ 1 sccm 28.8 $m{\Omega}/cm^2$ with the lowest value of the contact resistance was confirmed that came out. The OES (SQ-2000) and QMS (CPM-300) using a reactive deposition process to add $N_2$ to maintain a uniform deposition rate was confirmed that.

Study on the Electrical Characteristics of Solution-processed ZrInZnO Thin-film Transistors (액상공정으로 제작된 ZrInZnO 박막 트랜지스터의 전기적 특성에 관한 연구)

  • Jeong, Tae-Hoon;Kim, Si-Joon;Yoon, Doo-Hyun;Jeong, Woong-Hee;Kim, Dong-Lim;Lim, Hyun-Soo;Kim, Hyun-Jae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.6
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    • pp.458-462
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    • 2011
  • Soution-processed ZrInZnO (ZIZO) thin-film transistors (TFTs) with varying Zr content were fabricated. The ZIZO TFT (Zr=20 at. %/Zn) has an optimal performance with the saturation field effect mobility of 0.77 $cm^2/Vs$, the threshold voltage (Vth) of 2.1 V, the on/off ratio of $4.95{\times}10^6$, and subthreshold swing (S.S) of 0.73 V/decade. Using this optimized ZIZO TFT, the positive and negative gate bias stress according to annealing temperature was also investigated. While the Vth shifts dramatically after 1,000 s of both gate bias stresses, variations in the S.S are negligible. It suggests that electrons or holes are tem porarily trapped in the gate insulator, the semiconductor, or the interface between both layers.

Comparison of field- and satellite-based vegetation cover estimation methods

  • Ko, Dongwook W.;Kim, Dasom;Narantsetseg, Amartuvshin;Kang, Sinkyu
    • Journal of Ecology and Environment
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    • v.41 no.2
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    • pp.34-44
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    • 2017
  • Background: Monitoring terrestrial vegetation cover condition is important to evaluate its current condition and to identify potential vulnerabilities. Due to simplicity and low cost, point intercept method has been widely used in evaluating grassland surface and quantifying cover conditions. Field-based digital photography method is gaining popularity for the purpose of cover estimate, as it can reduce field time and enable additional analysis in the future. However, the caveats and uncertainty among field-based vegetation cover estimation methods is not well known, especially across a wide range of cover conditions. We compared cover estimates from point intercept and digital photography methods with varying sampling intensities (25, 49, and 100 points within an image), across 61 transects in typical steppe, forest steppe, and desert steppe in central Mongolia. We classified three photosynthetic groups of cover important to grassland ecosystem functioning: photosynthetic vegetation, non-photosynthetic vegetation, and bare soil. We also acquired normalized difference vegetation index from satellite image comparison with the field-based cover. Results: Photosynthetic vegetation estimates by point intercept method were correlated with normalized difference vegetation index, with improvement when non-photosynthetic vegetation was combined. For digital photography method, photosynthetic and non-photosynthetic vegetation estimates showed no correlation with normalized difference vegetation index, but combining of both showed moderate and significant correlation, which slightly increased with greater sampling intensity. Conclusions: Results imply that varying greenness is playing an important role in classification accuracy confusion. We suggest adopting measures to reduce observer bias and better distinguishing greenness levels in combination with multispectral indices to improve estimates on dry matter.

Transferring Calibrations Between on Farm Whole Grain NIR Analysers

  • Clancy, Phillip J.
    • Proceedings of the Korean Society of Near Infrared Spectroscopy Conference
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    • 2001.06a
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    • pp.1210-1210
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    • 2001
  • On farm analysis of protein, moisture and oil in cereals and oil seeds is quickly being adopted by Australian farmers. The benefits of being able to measure protein and oil in grains and oil seeds are several : $\square$ Optimize crop payments $\square$ Monitor effects of fertilization $\square$ Blend on farm to meet market requirements $\square$ Off farm marketing - sell crop with load by load analysis However farmers are not NIR spectroscopists and the process of calibrating instruments has to the duty of the supplier. With the potential number of On Farm analyser being in the thousands, then the task of calibrating each instrument would be impossible, let alone the problems encountered with updating calibrations from season to season. As such, NIR technology Australia has developed a mechanism for \ulcorner\ulcorner\ulcorner their range of Cropscan 2000G NIR analysers so that a single calibration can be transferred from the master instrument to every slave instrument. Whole grain analysis has been developed over the last 10 years using Near Infrared Transmission through a sample of grain with a pathlength varying from 5-30mm. A continuous spectrum from 800-1100nm is the optimal wavelength coverage fro these applications and a grating based spectrophotometer has proven to provide the best means of producing this spectrum. The most important aspect of standardizing NIB instruments is to duplicate the spectral information. The task is to align spectrum from the slave instruments to the master instrument in terms of wavelength positioning and then to adjust the spectral response at each wavelength in order that the slave instruments mimic the master instrument. The Cropscan 2000G and 2000B Whole Grain Analyser use flat field spectrographs to produce a spectrum from 720-1100nm and a silicon photodiode array detector to collect the spectrum at approximately 10nm intervals. The concave holographic gratings used in the flat field spectrographs are produced by a process of photo lithography. As such each grating is an exact replica of the original. To align wavelengths in these instruments, NIR wheat sample scanned on the master and the slave instruments provides three check points in the spectrum to make a more exact alignment. Once the wavelengths are matched then many samples of wheat, approximately 10, exhibiting absorbances from 2 to 4.5 Abu, are scanned on the master and then on each slave. Using a simple linear regression technique, a slope and bias adjustment is made for each pixel of the detector. This process corrects the spectral response at each wavelength so that the slave instruments produce the same spectra as the master instrument. It is important to use as broad a range of absorbances in the samples so that a good slope and bias estimate can be calculated. These Slope and Bias (S'||'&'||'B) factors are then downloaded into the slave instruments. Calibrations developed on the master instrument can then be downloaded onto the slave instruments and perform similarly to the master instrument. The data shown in this paper illustrates the process of calculating these S'||'&'||'B factors and the transfer of calibrations for wheat, barley and sorghum between several instruments.

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A Study on Etching Mechanism of (Ba,Sr)$TiO_3$ in Ar/$CF_4$ High Density Plasma (Ar/$CF_4$ 고밀도 플라즈마에서(Ba,Sr)$TiO_3$ 박막의 식각 메카니즘에 관한 연구)

  • Kim, Seung-Bum;Kim, Chang-Il
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1550-1552
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    • 1999
  • In this study, (Ba,Sr)$TiO_3$ thin films were etched with a magnetically enhanced inductively coupled plasma (MEICP) as a function $CF_4$/Ar gas mixing ratio. Experimental was done by varying the etching parameters such as rf power, dc bias and chamber pressure. The maximum etch rate of the BST films was $1700{\AA}$/min under $CF_4/(CF_4+Ar)$ of 0.1, 600W/350V and 5 mTorr. The selectivity of BST to Pt and PR was 0.6, 0.7, respectively. X-ray photoelectron spectroscopy (XPS) studies shows that there are surface reaction between Ba, Sr, Ti and C, F radicals during the (Ba,Sr)$TiO_3$ etching. To analysis the composition of surface residue remaining after the etching, films etched with different $CF_4$/Ar gas mixing ratio were investigated using XPS.

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