Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1999.07d
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- Pages.1550-1552
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- 1999
A Study on Etching Mechanism of (Ba,Sr)$TiO_3$ in Ar/$CF_4$ High Density Plasma
Ar/$CF_4$ 고밀도 플라즈마에서(Ba,Sr)$TiO_3$ 박막의 식각 메카니즘에 관한 연구
- Kim, Seung-Bum (Department of Electrical Engineering, Chung-Ang University) ;
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Kim, Chang-Il
(Department of Electrical Engineering, Chung-Ang University)
- Published : 1999.07.19
Abstract
In this study, (Ba,Sr)
Keywords