• Journal of Photoscience
• /
• v.9 no.2
• /
• pp.466-469
• /
• 2002

An experiment has been conducted to measure the impact of UV radiation sensitivity on dermatophytes (Microsporum boullardii) by different UV radiation exposure time interval (1 min, 2 min 5 min, 10 min and 20 min) in degradation of keratin (Feather) in growth promoting substances of protein, cysteine, cystine and methionine from 7 to 28 days of incubation period. Mutant strain caused maximum weight loss with 1 minutes of UV radiation exposure at 21 day and mutant strain became immune in sensitivity at 14 days for decomposition of feathers. Maximum protein caused at 21st days with 20 minutes U.V radiation exposure and immune sensitivity had deducted with other UV radiation exposure time. On 28 days, mutant strains became immune with all exposure times, Whereas maximum methionine caused at 21st days with 20 minutes UV radiation exposure. Maximum cysteine caused at $14^{th}$ day with 5 minutes UV radiation exposure and mutant strain showed immune response at all time periods. Cystine production was also followed by cysteine at 21 day and also showed complete immune response with 1 and 2 minutes UV radiation exposure at7 and 14 days. Thus mutant strain of Microspornm boullardii can be used as a biotechnological tool for production of growth promoting substances.

• Korea Journal of Cosmetic Science
• /
• v.2 no.1
• /
• pp.1-10
• /
• 2020

Protection mechanisms for skin damage of ultraviolet (UV) absorbers in personal care products for protection against UV are well studied, but not for hair protection. The purpose of this study is to describe and compare the changes of physical property produced in human hair by doses of the UV-B exposure causing protein degradation. To observe the change of physical properties in hair, the experimental intensity of UV-B exposure has been established on the basis of statistical data from official meterological administration as daily one hour sunlight exposure for two weeks. Polysilicone-15, ethylhexyl methoxycinnamate (OMC), and octocrylene were employed for UV-B absorber, and those were treated to hair swatch by rubbing wash through shampoo and conditioner. Bending rigidity displayed kinetically successive reduction at high doses of UV exposure up to the 8,000 s, and exhibited different level at each sample of UV-B absorber. However, the values of Bossa Nova Technologies (BNT) for shinning factor were already saturable at the 2,000 s exposure except that treated with polysilicone-15. The differential scanning calorimetry (DSC) to measure a strength of inner protein produces a successive reduction of enthalpy as like a reduction of bending rigidity upon UV exposure. Surface roughness from lateral force microscope (LFM) acquired immediately after UV exposure show a saturable frictional voltage which has been also found in a saturable BNT data as the time of UV exposure increases. Through researching the DSC and the LFM, shinning of hair was much correlated to the protein damage at the surface, and bending rigidity could be regulated by the protein structural damage inside hair. Therefore, the optimization of efficient strategy for simultaneous prevention of hair protein on the surface and internal hair was required to maintain physical properties against UV.

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.40 no.8
• /
• pp.731-736
• /
• 2016

Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.07b
• /
• pp.1043-1046
• /
• 2003

We investigated the EO performances of the UV aligned twisted nematic liquid crystal display (TN-LCD) with the UV exposure on a-C:H thin film surface. LC alignment using UV exposure on the a-C:H thin film surface was achieved. Monodomain alignment of the UV aligned TN-LCD can be observed. An good EO characteristics of the UV aligned TN-LCD was observed with oblique ion beam exposure on the a-C:H thin film surface. Therefore, the EO property of the UV-aligned TN-LCD with UV exposure on the a-C:H thin film surface is almost the same as that of the rubbing-aligned TN-LCD on a polyimide (PI) surface.

• Journal of Photoscience
• /
• v.9 no.2
• /
• pp.442-444
• /
• 2002

Seedlings of spinach (Spinacia oleracea L. "King of Denmark" and "Minsterland") were grown with or without supplemental UV-B under field conditions for five or nine days when their fifth or sixth leaves were expanding. Except two leaves which were just expanded and expanding, all other leaves of each seedling were removed before tested. One of these two leaves was exposed to UV-B irradiation and the other leaf was covered with lumiror film (no transmission below 320 nm) to prevent it from UV-B exposure. l,l-diphenyl-2-picrylhydrazyl scavenging activities (antioxidative activity) in leaves without covers were increased according to UV-B doses they were exposed to. And removal of UV-B exposure with lumiror decreased foliage antioxidative activities. This increase or decrease of activities in leaves did not dependent on the UV-B doses their paired leaves were exposed to in both two cultivars. The results demonstrated that spinach foliage antioxidants induced by UV-B exposure were not transported into another leaf.

• Journal of Physiology & Pathology in Korean Medicine
• /
• v.28 no.1
• /
• pp.94-101
• /
• 2014

We studied to investigate the erythema reduction effects generated by Gagam-Jawoonaek(GJ) application(appl.) after UV exposure. Twenty women in their twenties to fifties with no skin diseases were recruited. We exposed UV as a 6 subsites on the left upper arm of subjects using multi-port solar simulator. After setting Gagam-Jawoonaek(GJ) application(appl.) subsites and non-appl. subsites, we measured erythema degrees($a^*$ values) of the subsites using spectrophotometer. We measured $a^*$ values four times(before UV exposure, before application of GJ, twenty-four and forty-eight hours after first application of GJ). We analyzed data using student's t-test. After UV exposure, $a^*$ values on the left upper arm increased. Twenty-four hours after first GJ treat., the changes of $a^*$ value on GJ treat. subsites($1.22{\pm}0.13AU$) were bigger than GJ non-treat. subsites($1.04{\pm}0.12AU$), but there was no statistically significance. Forty-eight hours after first GJ treat., the changes of $a^*$ value on GJ treat. subsites($1.95{\pm}0.11AU$) were bigger than GJ non-treat. subsites($1.58{\pm}0.13AU$), a statistically significance. Gagam-Jawoonaek could decrease erythema by UV exposure.

• Magazine of the Korean Society of Agricultural Engineers
• /
• v.45 no.2
• /
• pp.126-137
• /
• 2003

The feasibility study of UV-disinfection system was performed for disinfection of effluent from wastewater treatment plant. Three low-pressure UV lamps of 17, 25, and 41 W were examined with various flow rates. Low-pressure UV lamps of 17W were examined with various turbidity, DOM (dissolved organic matter), and SS (suspended solid). The pilot plant was a flow-through type UV-disinfection system, and the range of exposure time varied from 5 to 40 seconds, turbidity from 0 to 40 NTU, DOM from 0 to 30 mg/L, and SS from 10 to 40 mg/L. The 41W lamp demonstrated complete disinfection showing no survival ratio in all the experimental conditions, and generally 17W and 25W lamps also showed high removal ratio over 97%. For the same UV dose (UV intensity times exposure time), high intensity-short exposure conditions showed better disinfection efficiency than low intensity-long exposure conditions. While the effects of turbidity and DOM were not apparent, the effects of SS was significant on the disinfection efficiency which indicates that SS control before UV-disinfection appears to be necessary to increase removal efficiency. Considering characteristics of effluent from existing wastewater treatment plants, cost-effectiveness, stable performance, and minimum maintenance, the flow-through type UV-disinfection system with high intensity and low-pressure lamps was thought to be a competitive disinfection system for wastewater reclamation.

• Journal of the Korean Recycled Construction Resources Institute
• /
• v.5 no.2
• /
• pp.130-136
• /
• 2017

The present work is for an evaluation of tension behavior and surface deterioration of FRP Hybrid Bar due to UV exposure and freezing/thawing(F/T) actions. For the work, FRP Hybrid Bar is subjected to UV exposure test, then F/T test is performed successively to 180 cycles. In FRP Hybrid Bar, no significant surface deterioration is evaluated after UV exposure. Tension hardening performance, a unique engineering advantage of FRP Hybrid Bar, is still maintained after F/T test. The performance in FRP Hybrid Bar exposed to UV is still effective. FRP Hybrid Bar exposed to UV have almost similar tension behavior of FRP Hybrid Bar without UV exposure. Although F/T cycles increase to 180, steel rebar, FRP Hybrid Bar, and FRP Hybrid Bar exposed to UV show no significant changes in tension behavior. In the work, UV exposure and F/T actions are evaluated to have little negative effect on surface deterioration and tensile performance in FRP Hybrid Bar, however spalling of silica coating due to impact should be considered since it affects bonding strength to outer concrete.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.13 no.7
• /
• pp.625-629
• /
• 2000

We synthesized a new copoly (PM4Ch-ChMA) copoly(poly(4-methacryloyloxy) chalcone-cholesteryl methacrylate) having chalconyl and cholesteryl moiety for homeotropic liquid crystal(LC) alignment. Pretilt angles of nematic(N) LC generated by linearly polarized UV exposure on the copolymer surfaces were investigated. Good thermal stabilities of the synthesized copolymer were obtained by TGA (Thermogravimetric Analysis) measurement. Pretilt angles of the NLC decreased with increasing UV exposure time on the copolymer surfaces. We consider that the pretilt angle of the NLC is attributed to increased chalcone by increased UV exposure time. High pretilt angle of the NLC is attributed to increased chalcone by increased UV exposure time. High pretilt angle of 81$^{\circ}$was observed after the UV exposure for 3 min.

• Ocean and Polar Research
• /
• v.32 no.4
• /
• pp.397-409
• /
• 2010

Herein, we compared the production rate of UV-absorbing compounds (mycosporine-like amino acids) and carotenoids in two phytoplankton species--Phaeocystis pouchetii and Porosira glacialis--which are the dominant species in Polar Regions under artificial UV radiation conditions. P. pouchetii exposed to UVR and PAR evidenced reductions in the carbon fixation rate, and was not significantly influenced by differing light conditions. However, the concentrations of UV-absorbing compounds and photo-protective pigments of P. pouchetii were increased with increasing exposure time, but P. glacialis maintained constant levels during the UVR exposure experiment. The production rates of MAAs showed a reverse phase between the two phytoplankton species. The carbon fixation rate of P. pouchetii cells was inhibited by exposure to UV radiation, but the production rates of MAAs in P. pouchetii were increased under UV radiation exposure. The carbon fixation rate and production rate of MAAs in P. glacialis were simultaneously inhibited under UV radiation exposure conditions. These results provide us with new information regarding the processes involved in the production of UV-absorbing compounds and photoprotective pigments in two phytoplankton species.