Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures |
Park, Sungmin
(Dept. of Mechanical Engineering, Inha Univ.)
Nam, Gyungmok (Dept. of Mechanical Engineering, Inha Univ.) Kim, Jonghun (Dept. of Mechanical Engineering, Inha Univ.) Yoon, Sang-Hee (Dept. of Mechanical Engineering, Inha Univ.) |
1 | Barber, R. L., Ghantasala, M. K., Divan, R., Vora, K. D., Harvey, E. C. and Mancini, D. C., 2005, "Optimisation of SU-8 Processing Parameters for Deep X-ray Lithography," Microsys. Technol., Vol. 11, pp. 303-310. DOI |
2 | Park, J. H., Allen, M. G. and Prausnitz, M. R., 2005, "Biodegradable Polymer Microneedles: Fabrication, Mechanics and Transdermal Drug Delivery," J. Control. Release, Vol. 104, pp. 51-66. DOI |
3 | Behrmann, G. P. and Duignan, M. T., 1997, "Excimer Laser Micromachining for Rapid Fabrication of Diffractive Optical Elements," Appl. Opt., Vol. 36, pp. 4666-4676. DOI |
4 | Yoon, Y. K., Park, J. H. and Allen, M. G., 2006, "Multidirectional UV Lithography for Complex 3-D MEMS Structures," J. Microelectromech. Syst., Vol. 15, pp. 1121-1130. DOI |
5 | Park, J. H. and Prausnitz, M. R., 2010, "Analysis of Mechanical Failure of Polymer Microneedles by Axial Force," J. Korean Phys. Soc., Vol. 56, No. 4, pp. 1223-1227. DOI |
6 | Dill, F. H., Hornberger, W. P., Hauge, P. S. and Shaw, J. M., 1975, "Characterization of Positive Photoresist," IEEE Trans. on Electron Devices, Vol. ED-22, No. 7, pp. 445-452. |
7 | William, J. D. and Wang, W., 2004, "Study on the Postbaking Process and the Effects on UV Lithography of High Aspect Ratio SU-8 Microstructures," J. Microlithogr. Microfabr. Microsyst., Vol. 3, No. 4, pp. 563-568. DOI |
8 | Lin, C.-H., Yeh, W.-T., Chan, C.-H. and Lin, C.-C., 2012, "Influence of Graphene Oxide on Metal-insulator Semiconductor Tunneling Diodes," Nanoscale Res. Lett., Vol. 7, No. 1, p. 343. DOI |
9 | Campo, A. D. and Greiner, C., 2007, "SU-8: a Photoresist for High-aspect-ratio and 3D Submicron Lithography," J. Micromech. Microeng, Vol. 17, pp. R81-R95. DOI |
10 | Liu, G., Tian, Y. and Kan, Y., 2005, "Fabrication of High-aspect-ratio Microstructures Using SU-8 Photoresist," Microsys. Technol., Vol. 11, pp. 343-346. DOI |
11 | Becnel, C., Desta, Y. and Kelly, K., 2005, "Ultradeep X-ray Lithography of Densely Packed SU-8 Features: I. An SU-8 Casting Procedure to Obtain Uniform Solvent Content with Accompanying Experimental Results," J. Micromech. Microeng, Vol. 15, pp. 1242-1248. DOI |
12 | https://www.microchem.com |