• Title/Summary/Keyword: ultrasonic spray pyrolysis deposition

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Improvement of Deposition Performance of Ultrasonic Spray Pyrolysis Deposition System through Atomizer Shape Modification (분무장치 형상 변경을 통한 초음파 열분해 증착 시스템의 증착 성능 개선)

  • Kim, Kyu-Eon;Lee, Jae-Hoo;Jeon, Jae-Keon;Park, Sung-Hwan;Lee, Chibum
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.4
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    • pp.469-474
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    • 2015
  • In ultrasonic spray pyrolysis deposition, a precursor solution is evaporated by an ultrasonic atomizer, then gas-carried into a furnace where the solute is separated from the water vapor. After condensation, polymerization, and nucleation, the solute oxide forms a thin film. To improve the deposition efficiency, the ultrasonic atomizer was studied to optimize the evaporated gas flow. The vat cover was redesigned, using three versions with different inlet factors being tested through a computational fluid dynamic analysis as well as a water evaporation experiment. The atomization rate with a hemispherical cover with a $30^{\circ}$ inlet was found to be 2.4 times higher than that with the original. This improvement was verified with fluorine-doped tin oxide spray pyrolysis deposition. The film obtained with the modified vat cover was 2.4 times thicker than that obtained with the original vat cover.

Development of Control System for Ultrasonic Spray Pyrolysis Deposition (초음파 분무 열분해 증착 제어 시스템 개발)

  • Kim, Kyu-Eon;Kim, Yeong-Heum;Lee, Chibum
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.23 no.4
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    • pp.385-391
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    • 2014
  • A control system for ultrasonic spray pyrolysis deposition was developed that can coat a large size glass panel with a transparent conductive oxide. It consists of several ultrasonic atomizer devices to cover a large area and a host computer for individually controlling the devices. The sub-controller in an ultrasonic atomizer device can adjust the flow rate of the atomized conductive oxide gas by setting the flow rate of the solution and regulating the level of the solution in the tank. To construct a feedback control loop for level regulation, a level sensor that utilized an infrared distance sensor and an electric circuit for adjusting the ultrasonic oscillator were developed. The host program was also developed, which can monitor and control the sub-controllers. A proportional-integral controller was developed for a simplified model, and its operation was verified through an experiment.

UV emission of ZnO:Er films prepared by ultrasonic spray pyrolysis (초음파분무법으로 제조한 ZnO:Er막의 UV 발광 특성)

  • Choi, Mu-Hee;Ma, Tae-Young
    • Journal of Sensor Science and Technology
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    • v.16 no.4
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    • pp.307-312
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    • 2007
  • The films of Er-doped ZnO (ZnO:Er) were prepared onto MgO wafers by ultrasonic spray pyrolysis at $550^{\circ}C$. The concentration of Er in the deposition source varied from 0.5 wt% to 3.0 wt%. The crystallographic properties and surface morphologies of the films were investigated by X-ray diffraction (XRD) and scanning electron microscope (SEM), respectively. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the Er concentration in the films. The films were grown as polycrystalline with a dominant direction of [002]. The grain size of the films were reduced by Er-doping. Er-doping enhanced the ultraviolet emission of ZnO:Er films. The ZnO:Er films prepared with the deposition source of 2.0 wt% Er showed the strongest ultraviolet light emission peak among the films in this study.

Preparation of Transparent and Conducting Tin Oxide Films by the Ultrasonic Spray Pyrolysis (초음파분무열분해에 의한 투명전도성 산화주석막의 제조)

  • Kim, Sang-Kil;Yoon, Cheonho
    • Applied Chemistry for Engineering
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    • v.9 no.2
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    • pp.214-219
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    • 1998
  • The transparent conducting tin oxide films were deposited on g1ass substrates by the ultrasonic spray pyrolysis. Examined were effects of deposition parameters on the electrical resistance, optical transmittance, crystal structure, and thickness of tin oxide films. As both the deposition time and concentration of tin(IV) chloride increase, the deposited tin oxide films exhibited the decrease of electrical resistance and optical transmittance in the visible and near infrared region. With increasing heat-treatment temperature in air, the deposited tin oxide films showed the enhanced electrical resistance and optical transmittance. This study suggests that the ultrasonic spray pyrolysis may be a promising deposition technique effectively to prepare transparent conducting films of good quality in a single step.

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Deposition of YBCO Thin Film by Aerosol Assisted Spray Pyrolysis Method using Nitrate Precursors (질산염 전구체 원료로 분무 열분해 방법에 의한 YBCO 박막 증착)

  • Kim, Byeong-Joo;Hong, Seok-Kwan;Kim, Jae-Geun;Lee, Jong-Beom;Lee, Hee-Gyoun;Hong, Gye-Won
    • Progress in Superconductivity
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    • v.12 no.1
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    • pp.68-73
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    • 2010
  • Y123 films have been deposited on $LaAlO_3$ (100) single-crystal and IBAD substrates by spray pyrolysis method using nitrate precursors. Ultrasonic atomization was adopted to decrease the droplet size, spraying angle and its moving velocity toward substrate for introducing the preheating tube furnace in appropriate location. A small preheating tube furnace was installed between spraying nozzle and substrate for fast drying and enhanced decomposition of precursors. C-axis oriented films were obtained on both LAO and IBAD substrates at deposition temperature of around $710{\sim}750^{\circ}C$ and working pressures of 10~15 torr. Thick c-axis epitaxial film with the thickness of $0.3{\sim}0.6\;{\mu}m$ was obtained on LAO single-crystal by 10 min deposition. But the XRD results of the film deposited on IBAD template at same deposition condition showed that the buffer layers of the IBAD metal substrate was affected by long residence of metal substrate at high temperature for YBCO deposition.

Preparation of Iron Oxide-mixed ZnO films by Ultrasonic Spray Pyrolysis (초음파분무법을 이용한 산화철이 혼합된 ZnO막의 제조)

  • Choi Mu-Hee;Ma Tae-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.1
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    • pp.58-63
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    • 2006
  • In this Paper, ZnO films mixed with iron oxide were prepared by an ultrasonic spray pyrolysis method. The chemical composition and structural properties as a function of the Fe atomic ratio in the deposition solution were studied. Zinc acetate and ferrous chloride were used as precursors of Zn and Fe, respectively. Fe atomic ratio to Zn varied from 0.15 to 10.0. Substrate temperature was fixed at $250^{\circ}C$. The crystallographic properties and surface morphologies of the films were studied by X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. Electron probe X-ray microanalysis (EPMA) and X-ray photoelectron spectroscopy (XPS) were carried out to analyse the chemical composition and state of Zn and Fe atoms.

Growth Mechanism Evolution of ZnO Nanostructures by Leidenfrost Effect in Ultrasonic Spray Pyrolysis Deposition (초음파 분무 열분해법에 의한 ZnO 나노구조 성장시 Leidenfrost 효과에 의한 성장 거동 변화)

  • Han, In Sub;Park, Il-Kyu
    • Korean Journal of Materials Research
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    • v.27 no.11
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    • pp.609-616
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    • 2017
  • We investigated a Leidenfrost effect in the growth of ZnO nanostructures on silicon substrates by ultrasonic-assisted spray pyrolysis deposition(SPD). Structural and optical properties of the ZnO nanostructures grown by varying the growth parameters, such as substrate temperature, source concentration, and suction rate of the mist in the chambers, were investigated using field-emission scanning electron microscopy, X-ray diffraction, and photoluminescence spectrum analysis. Structural investigations of the ZnO nanostructures showed abnormal evolution of the morphologies with variation of the substrate temperatures. The shape of the ZnO nanostructures transformed from nanoplate, nanorod, nanopencil, and nanoprism shapes with increasing of the substrate temperature from 250 to $450^{\circ}C$; these shapes were significantly different from those seen for the conventional growth mechanisms in SPD. The observed growth behavior showed that a Leidenfrost effect dominantly affected the growth mechanism of the ZnO nanostructures.

Effect of Li-Incorporation on the Properties of ZnO Thin Films Deposited by Ultrasonic-Assisted Spray Pyrolysis Deposition Method (초음파 분무 열분해법에 의해 성장된 ZnO 박막의 특성에 미치는 Li 첨가의 영향)

  • Han, In Sub;Park, Il-Kyu
    • Korean Journal of Materials Research
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    • v.28 no.2
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    • pp.101-107
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    • 2018
  • Li-incorporated ZnO thin films were deposited by using ultrasonic-assisted spray pyrolysis deposition (SPD) system. To investigate the effect of Li-incorporation on the performance of ZnO thin films, the structural, electrical, and optical properites of the ZnO thin films were analyzed by means of X-ray diffraction (XRD), field-emssion scanning electron microscopy (FE-SEM), Hall effect measurement, and UV-Vis spectrophotometry with variation of the Li concentraion in the ZnO sources. Without incorporation of Li element, the ZnO surface showed large spiral domains. As the Li content increases, the size of spiral domains decreased gradually, and finally formed mixed small grain and one-dimensional nanorod-like structures on the surface. This morphological evolution was explained based on an anti-surfactant effect of Li atoms on the ZnO growth surface. In addition, the Li-incorporation changed the optical and electrical properties of the ZnO thin films by modifying the crystalline defect structures by doping effects.

Growth of Copper Oxide Thin Films Deposited by Ultrasonic-Assisted Spray Pyrolysis Deposition Method (초음파 분무 열분해법을 이용한 구리산화물 박막 성장)

  • Han, In Sub;Park, Il-Kyu
    • Korean Journal of Materials Research
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    • v.28 no.9
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    • pp.516-521
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    • 2018
  • Copper oxide thin films are deposited using an ultrasonic-assisted spray pyrolysis deposition (SPD) system. To investigate the effect of substrate temperature and incorporation of a chelating agent on the growth of copper oxide thin films, the structural and optical properites of the copper oxide thin films are analyzed by X-ray diffraction (XRD), field-emssion scanning electron microscopy (FE-SEM), and UV-Vis spectrophotometry. At a temperature of less than $350^{\circ}C$, three-dimensional structures consisting of cube-shaped $Cu_2O$ are formed, while spherical small particles of the CuO phase are formed at a temperature higher than $400^{\circ}C$ due to a Volmer-Weber growth mode on the silicon substrate. As a chelating agent was added to the source solutions, two-dimensional $Cu_2O$ thin films are preferentially deposited at a temperature less than $300^{\circ}C$, and the CuO thin film is formed even at a temperature less than $350^{\circ}C$. Therefore the structure and crystalline phase of the copper oxide is shown to be controllable.