• Title/Summary/Keyword: tunneling

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Tunneling Current Calculation in HgCdTe Photodiode (HgCdTe 광 다이오드의 터널링 전류 계산)

  • 박장우;곽계달
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.56-64
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    • 1992
  • Because of a small bandgap energy, a high doping density, and a low operating temperature, the dark current in HgCdTe photodiode is almost composed of a tunneling current. The tunneling current is devided into an indirect tunneling current via traps and a band-to-band direct tunneling current. The indirect tunneling current dominates the dark current for a relatively high temperature and a low reverse bias and forward bias. For a low temperature and a high reverse bias the direct tunneling current dominates. In this paper, to verify the tunneling currents in HgCdTe photodiode, the new tunneling-recombination equation via trap is introduced and tunneling-recombination current is calculated. The new tunneling-recombination equation via trap have the same form as SRH (Shockley-Read-Hall) generation-recombination equation and the tunneling effect is included in recombination times in this equation. Chakrabory and Biswas's equation being introduced, band to band direct tunneling current are calculated. By using these equations, HgCdTe (mole fraction, 0.29 and 0.222) photodiodes are analyzed. Then the temperature dependence of the tunneling-recombination current via trap and band to band direct tunneling current are shown and it can be known what is dominant current according to the applied bias at athe special temperature.

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Elastic and inelastic electron tunneling characteristics in polyimide LB films (Polyimide LB막내의 탄성 및 비탄성 tunneling 전기전도특성)

  • ;;Mitsumasa Iwamoto
    • Electrical & Electronic Materials
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    • v.7 no.6
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    • pp.473-480
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    • 1994
  • The electron tunnel effect in polvimide LB films sandwiched between metal electrodes has been investigated in the present work by a study of both the elastic and inelastic tunneling components. By the results of elastic tunneling experiments in Au/Pl/Au tunneling junction, we can judge the height and thickness of tunnel barrier. The inelastic current in Inelastic Electron Tunneling Spectroscopy(IETS) is due to the interaction of the tunneling electron with the vibrational modes of the molecular species in the barrier. Measurements are done on Au/PI/Pb tunneling junctions. The spectra obtained are the second derivatives of the current-voltage characteristics of these junctions : specifically, d$^{2}$1/dV$^{2}$ as a function of voltage V. Because the energies measured by IETS can be directly compared to those measured by infrared and Raman spectroscopy, IR-RAS spectroscopy also measured for reference.

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Exposure Characteristics to Noise Among Tunnel Construction Workers (터널공사현장 근로자의 소음노출 특성 평가)

  • Kim, Kab Bae;Jang, Jae-Kil
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.23 no.9
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    • pp.831-840
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    • 2013
  • The noise levels of workers in tunnel sites are likely to be high because tunneling work places are confined space. However, research on the noise exposure levels of tunneling workers have not been performed intensively due to restricted accessibility to tunnel construction sites. The aim of this study is to evaluate the noise exposure levels for workers engaged in tunneling work sites. Noise dosimeters were used for monitoring workers' noise exposure level in 5 tunneling work sites in accordance with the Notification of the Ministry of Labor. Among 5 tunneling work sites, 4 of them used NATM tunneling method and 1 work site used shield TBM tunneling method. The average noise exposure levels of NATM tunneling workers was 81.1 dB(A) and 15.4 % of the workers' noise level were exposed more than 90 dB(A) which is the exposure limit value. In Shield TBM tunneling method, 4.3 % of the workers were exposed more than 90 dB(A) of noise level, the average noise exposure levels of TBM tunneling workers was 84.1 dB(A).

Gate Tunneling Current and QuantumEffects in Deep Scaled MOSFETs

  • Choi, Chang-Hoon;Dutton, Robert W.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.1
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    • pp.27-31
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    • 2004
  • Models and simulations of gate tunneling current for thinoxide MOSFETs and Double-Gate SOIs are discussed. A guideline in design of leaky MOS capacitors is proposed and resonant gate tunneling current in DG SOI simulated based on quantum-mechanicalmodels. Gate tunneling current in fully-depleted, double-gate SOI MOSFETs is characterized based on quantum-mechanical principles. The simulated $I_G-V_G$ of double-gate SOI has negative differential resistance like that of the resonant tunnel diodes.

Dependency of Tunneling Field-Effect Transistor(TFET) Characteristics on Operation Regions

  • Lee, Min-Jin;Choi, Woo-Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.11 no.4
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    • pp.287-294
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    • 2011
  • In this paper, two competing mechanisms determining drain current of tunneling field-effect transistors (TFETs) have been investigated such as band-to-band tunneling and drift. Based on the results, the characteristics of TFETs have been discussed in the tunneling-dominant and drift-dominant region.

Investigation of Trap-Assisted-Tunneling Mechanism in L-Shaped Tunneling Field-Effect-Transistor (L형 터널 트랜지스터의 트랩-보조-터널링 현상 조사)

  • Najam, Faraz;Yu, Yun Seop
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2018.10a
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    • pp.512-513
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    • 2018
  • Trap-assisted-tunneling (TAT) degrades subthreshold slope of real-world tunneling field-effect-transistors (TFET) and it should be considered in the simulation. However, its mechanism is not very well understood in line tunneling type L-shaped TFET (LTFET). This study investigates TAT mechanism in LTFETs using dynamic nonlcoal Schenk model. Both phonon assisted and direct band to trap tunneling events are considered in this study.

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Compact Current Model of Single-Gate/Double-Gate Tunneling Field-Effect Transistors

  • Yu, Yun Seop;Najam, Faraz
    • Journal of Electrical Engineering and Technology
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    • v.12 no.5
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    • pp.2014-2020
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    • 2017
  • A compact current model applicable to both single-gate (SG) and double-gate (DG) tunneling field-effect transistors (TFETs) is presented. The model is based on Kane's band-to-band tunneling (BTBT) model. In this model, the well-known and previously-reported quasi-2-D solution of Poisson's equation is used for the surface potential and length of the tunneling path in the tunneling region. An analytical tunneling current expression is derived from expressions of derivatives of local electric field and surface potential with respect to tunneling direction. The previously reported correction factor with three fitting parameters, compensating for superlinear onset and saturation current with drain voltage, is used. Simulation results of the proposed TFET model are compared with those from a technology computer-aided-design (TCAD) simulator, and good agreement in all operational bias is demonstrated. The proposed SG/DG-TFET model is developed with Verilog-A for circuit simulation. A TFET inverter is simulated with the Verilog-A SG/DG-TFET model in the circuit simulator; the model exhibits typical inverter characteristics, thereby confirming its effectiveness.

Effects of Tunneling Current on STM Imaging Mechanism for Alkanethiol Self-assembled Monolayers on Au(111)

  • Mamun, Abdulla Hel Al;Son, Seung-Bae;Hahn, Jae-Ryang
    • Bulletin of the Korean Chemical Society
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    • v.32 no.1
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    • pp.281-285
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    • 2011
  • We investigated the effects of tunneling current on scanning tunneling microscopy (STM) images of 1-octanethiol (OT) and 1-decanethiol (DT) self-assembled monolayers (SAMs). At a low tunneling current, the domain boundaries and ordered alkanethiol molecules were clearly resolved. As the tunneling current was increased at a constant bias voltage, however, the STM images showed disordered structures of the OT and DT SAMs. As the tunneling current was reduced back to low values, the ordered structures of the alkanethiol molecules reappeared. The reversibility of the process suggests that the sulfur head groups did not rearrange under any of the tunneling current conditions. On the basis of our observations, which are inconsistent with the standard model for STM imaging of molecules on metal surfaces, we consider the STM imaging mechanism in terms of a two-region tunneling junction model.

Comparison of Tunneling Characteristics in the MTJs of CoFeB/MgO/CoFeB with Lower and Higher Tunneling Magnetoresistance

  • Choi, G.M.;Shin, K.H.;Seo, S.A.;Lim, W.C.;Lee, T.D.
    • Journal of Magnetics
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    • v.14 no.1
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    • pp.11-14
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    • 2009
  • We investigated the I-V curves and differential tunneling conductance of two, CoFeB/MgO/CoFeB-based, magnetic tunnel junctions (MTJs): one with a low tunneling magnetoresistance (TMR; 22%) and the other with a high TMR (352%). This huge TMR difference was achieved by different MgO sputter conditions rather than by different annealing or deposition temperature. In addition to the TMR difference, the junction resistances were much higher in the low-TMR MTJ than in the high-TMR MTJ. The low-TMR MTJ showed a clear parabolic behavior in the dI/dV-V curve. This high resistance and parabolic behavior were well explained by the Simmons' simple barrier model. However, the tunneling properties of the high-TMR MTJ could not be explained by this model. The characteristic tunneling properties of the high-TMR MTJ were a relatively low junction resistance, a linear relation in the I-V curve, and conduction dips in the differential tunneling conductance. We explained these features by applying the coherent tunneling model.