• Title/Summary/Keyword: tunnel switching

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Electrical Properties of Molecular Electronic Device Using Eicosanoic Acid LB Thin Film (Eicosanoic Acid LB 박막을 이용한 분자 전자 소자의 전기적 특성 연구)

  • Lee, Hol-Shik;Cheon, Min-Woo;Park, Yong-Pil
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2007.06a
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    • pp.556-558
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    • 2007
  • We used an elcosanoic acid material and the material was very famous as an thin film bio and insulating material. Eicosanoic acid monolayer was deposited by Langmuir-Blodgett (LB) technique and a subphase was a $CdCl_2$ solution as a $2\times10^{-4}mol/l$. Also, we used a bottom electrode as an $Al/Al_2O_3$ and a top electrode as a Al. When the positive and negative bias applied to the molecular device, the behavior shows that a tunnel switching characteristics. This results were analyzed regarding various mechanisms.

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Electrical Properties of Molecular Diode Using Eicosanoic Acid Langmuir-Blodgett(LB) Monolayer Film (Eicosanoic Acid Langmuir-Blodgett(LB) 박막을 이용한 분자 다이오드의 전기적 특성)

  • Koo, Ja-Ryong;Lee, Ho-Sik;Kwon, Hyuck-Joo;Sohn, Byoung-Chung
    • Journal of the Korean Applied Science and Technology
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    • v.20 no.2
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    • pp.148-153
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    • 2003
  • Electron transfer through an Langmuir-Blodgett(LB) monolayer film sandwiched between metal electrodes. We used an eicosanoic acid material and the material was very famous as a thin film insulating material. Eicosanoic acid monolayer was deposited by Langmuir-Blodgett(LB) technique and a subphase was a $CdCl_2$ solution as a 2${\times}10^{-4}$ mol/L. Also we used a bottom electrode as an Al/$Al_2O_3$ and a top electrode as a Al and Ti/Al. Here, the $Al_2O_3$ on the bottom electrode was deposited by thermal evaporation method. The $Al_2O_3$ layer was acted on a tunneling barrier and insulating layer in tunnel diode. It was found that the proper transfer surface pressure for film deposition was 25 mN/m and the limiting area per molecule was about 24 ${\AA}^2$/molecule. When the positive and negative bias applied to the molecular device, the behavior shows that a tunnel switching characteristics. This result were analyzed regarding various mechanisms.

Technology Trend of Spin-Transfer-Torque Magnetoresistive Random Access Memory (STT-MRAM) (스핀전달토크형 자기저항메모리(STT-MRAM) 기술개발 동향)

  • Kim, D.K.;Cho, J.U.;Noh, S.J.;Kim, Y.K.
    • Journal of the Korean Magnetics Society
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    • v.19 no.1
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    • pp.22-27
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    • 2009
  • Reduction of the critical current density ($J_c$) for STT magnetization switching is most important issue of magnetic tunnel junctions (MTJs) based MRAM. This report describes how to decrease the Jc and will introduce the recent research progresses of STT-MRAM devices with material engineering and structural improvement, respectively.

Electrical Characteristics of Magnetic Tunnel Junctions with Different Cu-Phthalocyanine Barrier Thicknesses (Cu-Phthalocyanine 유기장벽 두께에 따른 스핀소자의 전기적 특성 변화 양상)

  • Bae, Yu-Jeong;Lee, Nyun-Jong;Kim, Tae-Hee
    • Journal of the Korean Magnetics Society
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    • v.22 no.5
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    • pp.162-166
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    • 2012
  • V-I characteristics of Fe(100)/MgO(100)/Cu-phthalocyanine (CuPc)/Co hybrid magnetic tunnel junctions were investigated at different temperatures. Fe(100) and Co ferromagnetic layers were separated by an organic-inorganic hybrid barrier consisting of different thickness of CuPc thin film grown on a 2 nm thick epitaxial MgO(100) layer. As the CuPc thickness increases from 0 to 10 nm, a bistable switching behavior due to strong charging effects was observed, while a very large magenetoresistance was shown at 77 K for the junctions without the CuPc barrier. This switching behavior decreases with the increase in temperature, and finally disappears beyond 240 K. In this work, high-potential future applications of the MgO(100)/CuPc bilayer were discussed for hybrid spintronic devices as well as polymer random access memories (PoRAMs).

MTJ based MRAM Core Cell

  • Park, Wanjun
    • Journal of Magnetics
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    • v.7 no.3
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    • pp.101-105
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    • 2002
  • MRAM (Magnetoresistive Random Access Memory) is a promising candidate for a universal memory that meets all application needs with non-volatile, fast operational speed, and low power consumption. The simplest architecture of MRAM cell is a series of MTJ (Magnetic Tunnel Junction) as a data storage part and MOS transistor as a data selection part. This paper is for testing the actual electrical parameters to adopt MRAM technology in the semiconductor based memory device. The discussed topics are an actual integration of MRAM core cell and its properties such as electrical tuning of MOS/MTJ for data sensing and control of magnetic switching for data writing. It will be also tested that limits of the MRAM technology for a high density memory.

Tunneling Magnetoresistance: Physics and Applications for Magnetic Random Access Memory

  • Park, Stuart in;M. Samant;D. Monsma;L. Thomas;P. Rice;R. Scheuerlein;D. Abraham;S. Brown;J. Bucchigano
    • Proceedings of the Korean Magnestics Society Conference
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    • 2000.09a
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    • pp.5-32
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    • 2000
  • MRAM, High performance MRAM using MTJS demostrated, fully integrated MTJ MRAM with CMOS circuits, write time ~2.3 nsec; read time ~3 nsec, Thermally stable up to ~350 C, Switching field distibution controlled by size & shape. Magnetic Tunnel Junction Properties, Magnetoresistance: ~50% at room temperature, enhanced by thermal treatment, Negative and Positive MR by interface modification, Spin Polarization: >55% at 0.25K, Insensitive ot FM composition, Resistance $\times$ Area product, ranging from ~20 to 10$^{9}$ $\Omega$(${\mu}{\textrm}{m}$)$^{2}$, Spin valve transistor, Tunnel injected spin polarization for "hot" electrons, Decrease of MTJMR at high bias originates from anode.

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Magnetoresistance Effects of Magnetic Tunnel Junctions with Amorphous CoFeSiB Single and Synthetic Antiferromagnet Free Layers (비정질 CoFeSiB 단일 및 합성형 반강자성 자유층을 갖는 자기터널접합의 자기저항 효과)

  • Hwang, J.Y.;Kim, S.S.;Rhee, J.R.
    • Journal of the Korean Magnetics Society
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    • v.15 no.6
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    • pp.315-319
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    • 2005
  • To obtain low switching field ($H_{SW}$) we introduced amorphous ferromagnetic $Co_{70.5}Fe_{4,5}Si_{15}B_{10}$ single and synthetic antiferromagnet (SAF) free layers in magnetic tunnel junctions (MTJs). The switching characteristics for MTJs with structures $Si/SiO_2/Ta$ 45/Ru 9.5/IrMn 10/CoFe 7/AlOx/CoFeSiB 7 or CoFeSiB (t)/Ru 1.0/CoFeSiB (7-t)/Ru 60 (in nm) were investigated and compared to MTJs with $Co_{75}Fe_{25}$ and $Ni_{80}Fe_{20}$ free layers. CoFeSiB showed a lower saturation magnetization of $560 emu/cm^3$ and a higher anisotropy constant of $2800\;erg/cm^3$ than CoFe and NiFe, respectively. An exchange coupling energy ($J_{ex}$) of $-0.003erg/cm^2$ was observed by inserting a 1.0 nm Ru layer in between CoFeSiB layers. In the CoFeSiB single and SAF free layer MTJs, it was frond that the size dependence of the $H_{SW}$ originated from the lower $J_{ex}$ experimentally and by micromagnetic simulation based on the Landau-Lisfschitz-Gilbert equation. The CoFeSiB SAF structures showed lower $H_{SW}$ than that of NiFe, CoFe and CoFeSiB single structures. The CoFeSiB SAF structures were proved to be beneficial far the switching characteristics such as reducing the coercivity and increasing the sensitivity in micrometer to submicrometer-sized elements.