• 제목/요약/키워드: trapping material mechanism

검색결과 10건 처리시간 0.02초

Impact of carbon dioxide on the stability of the small-scale structures by trapping the material properties

  • Zhou, Yunlong;Wang, Jian
    • Advances in nano research
    • /
    • 제13권1호
    • /
    • pp.1-12
    • /
    • 2022
  • The existence of active material in the environment causes the small-scale systems to be sensitive to the actual environment. Carbon dioxide is one of the active materials that exists a lot in the air conditions of the living environment. However, in some applications, the carbon dioxide-coated is used to improve the performance of systems against the destructive factors such as the corrosion; nevertheless, in the current research, the stability analysis of a carbon dioxide capture mechanism-coated beam is investigated according to the mathematical simulation of a rectangular composite beam utilizing the modified couple stress theory. The composite mechanism of carbon dioxide trapping is made of a polyacrylonitrile substrate that supports a cross-link polydimethylsiloxane gutter layer as the carbon dioxide mechanism trapping. Three novel types of carbon dioxide trapping mechanism involving methacrylate, poly (ethylene glycol) methyl ether methacrylate, and three pedant methacrylates are considered, which were introduced by Fu et al. (2016). Finally, according to introducing the methodology of carbon dioxide (CO2) trapping, the impact of various effective parameters on the stability of composite beams will be analyzed in detail.

Charge Trapping Mechanism in Amorphous Si-In-Zn-O Thin-Film Transistors During Positive Bias Stress

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
    • /
    • 제17권6호
    • /
    • pp.380-382
    • /
    • 2016
  • The mechanism for instability under PBS (positive bias stress) in amorphous SIZO (Si-In-Zn-O) thin-film transistors was investigated by analyzing the charge trapping mechanism. It was found that the bulk traps in the SIZO channel layer and the channel/dielectric interfacial traps are not created during the PBS duration. This result suggests that charge trapping in gate dielectric, and/or in oxide semiconductor bulk, and/or at the channel/dielectric interface is a more dominant mechanism than the creation of defects in the SIZO-TFTs.

광 포획 향상을 위한 다중 아키텍처 식각 기술을 적용한 박막 실리콘 태양전지에 관한 연구 (A Study on Thin-Film Silicon Solar Cells with Multi-Architecture Etching Technique to Improve Light Trapping)

  • 박형기;이준신
    • 한국전기전자재료학회논문지
    • /
    • 제37권3호
    • /
    • pp.337-344
    • /
    • 2024
  • This work focuses on improving the light-harvesting efficiency of thin-film silicon solar cells through innovative multi-architecture surface modifications. To create a regular optical structure, a lithographic process was performed to form it on a glass substrate through various etching processes, from Etch-1 to Etch-3. AZO was deposited on top of the structures and re-etched to create a multi-architectural surface. These surface-modified structures improved the light absorption and overall performance of the solar cell through changes in optical and physical properties, which we will analyze. In addition, we investigated the effect of post-cleaning on the etched glass structures through EDX analysis to understand the mechanism of the etching action. The results of this study are expected to provide important guidelines for the design and fabrication of solar cells and other photovoltaic devices.

고전압 SiO2 절연층 nMOSFET n+ 및 p+ poly Si 게이트에서의 Positive Bias Temperature Instability 열화 메커니즘 분석 (Analysis of Positive Bias Temperature Instability Degradation Mechanism in n+ and p+ poly-Si Gates of High-Voltage SiO2 Dielectric nMOSFETs)

  • 윤여혁
    • 한국정보전자통신기술학회논문지
    • /
    • 제16권4호
    • /
    • pp.180-186
    • /
    • 2023
  • 본 논문은 4세대 VNAND 공정으로 만들어진 고전압 SiO2 절연층 nMOSFET의 n+ 및 p+ poly-Si 게이트에서의 positive bias temperature instability(PBTI) 열화에 대해 비교하고 각각의 메커니즘에 대해 분석한다. 게이트 전극 물질의 차이로 인한 절연층의 전계 차이 때문에 n+/nMOSFET의 열화가 p+/nMOSFET의 열화보다 더 클 것이라는 예상과 다르게 오히려 p+/nMOSFET의 열화가 더 크게 측정되었다. 원인을 분석하기 위해 각각의 경우에 대해 interface state와 oxide charge를 각각 추출하였고, 캐리어 분리 기법으로 전하의 주입과 포획 메커니즘을 분석하였다. 그 결과, p+ poly-Si 게이트에 의한 정공 주입 및 포획이 p+/nMOSFET의 열화를 가속시킴을 확인하였다.

Observation of nano powders and fly ash usage effects on the fluidity features of grouts

  • Celik, Fatih;Yildiz, Oguzhan;Bozkir, Samet M.
    • Advances in nano research
    • /
    • 제13권1호
    • /
    • pp.13-28
    • /
    • 2022
  • The pumpability of the grouts is significant issue in concept of the rheological and workability properties during penetrating to voids and cracks. To improve the fluidity features of the grout mixes, the usage of Colloidal Nano Particular Powders (CNPPs) with mineral additives such as fly ash (FA) can contribute. Therefore, the main purpose of this study can be explained as investigating the usage effects of four types of Colloidal Nano Particular Powders (n-TiO2, n-ZnO, n-Al2O3 and n-SiO2) as nano additives on the rheological, workability and bleeding properties of cement-based grout incorporated with fly as. Test results showed that the usage of FA in the grout samples positively contribute to increase on the fluidity of the grout samples as expected. The dilatant behavior was observed from the results for all mixes. Observing the effect of nano-sized additives in such cement-based grout mixtures with high fluidity has presented remarkable effects in this study.

BiPbSrCaCuO 초전도체의 전자기특성 (Electromagnetic Properties of BiPbSrCaCuO Superconductor)

  • 이상헌
    • 한국전기전자재료학회논문지
    • /
    • 제17권7호
    • /
    • pp.788-792
    • /
    • 2004
  • The Electromagnetic properties in BiPbSrCaCuO superconductor was studied. In the measurement of current-voltage characteristics, a voltage across the superconducting sample was observed on applying an external magnetic field. The voltage continues to appear the removal of the magnetic field. The appearance of the voltage is ascribed to the trapping of magnetic flux. Depanding on the direction of appied magnetic flux less than $2.5\times{10}^-5$ T, the voltage in the magnetized sample increases or decreases. It is considered that mechanism of voltage occurrence can be explained by applying filament model.

분석 조건에 따른 p-MOSFET의 게이트에 유기된 드레인 누설전류의 열화 (Degradation of Gate Induced Drain Leakage(GIDL) Current of p-MOSFET along to Analysis Condition)

  • 배지철;이용재
    • E2M - 전기 전자와 첨단 소재
    • /
    • 제10권1호
    • /
    • pp.26-32
    • /
    • 1997
  • The gate induced drain leakage(GIDL) current under the stress of worse case in -MOSFET's with ultrathin gate oxides has been measured and characterized. The GIDL current was shown that P-MOSFET's of the thicker gate oxide is smaller than that of the thinner gate oxide. It was the results that the this cur-rent is decreased with the increamental stress time at the same devices.It is analyzed that the formation components of GIDL current are both energy band to band tunneling at high gate-drain voltage and energy band to defect tunneling at low drain-gate voltage. The degradations of GIDL current was analyzed the mechanism of major role in the hot carriers trapping in gate oxide by on-state stress.

  • PDF

서로 다른 소스/드레인 전극물질을 이용한 비정질 In-Ga-Zn-O 박막트랜지스터 성능향상 (Performance Improvement of Amorphous In-Ga-Zn-O Thin-film Transistors Using Different Source/drain Electrode Materials)

  • 김승태;조원주
    • 한국전기전자재료학회논문지
    • /
    • 제29권2호
    • /
    • pp.69-74
    • /
    • 2016
  • In this study, we proposed an a-IGZO (amorphous In-Ga-Zn-O) TFT (thin-film transistor) with off-planed source/drain structure. Furthermore, two different electrode materials (ITO and Ti) were applied to the source and drain contacts for performance improvement of a-IGZO TFTs. When the ITO with a large work-function and the Ti with a small work-function are applied to drain electrode and source contact, respectively, the electrical performances of a-IGZO TFTs were improved; an increased driving current, a decreased leakage current, a high on-off current ratio, and a reduced subthreshold swing. As a result of gate bias stress test at various temperatures, the off-planed S/D a-IGZO TFTs showed a degradation mechanism due to electron trapping and both devices with ITO-drain or Ti-drain electrode revealed an equivalent instability.

Progress of High-k Dielectrics Applicable to SONOS-Type Nonvolatile Semiconductor Memories

  • Tang, Zhenjie;Liu, Zhiguo;Zhu, Xinhua
    • Transactions on Electrical and Electronic Materials
    • /
    • 제11권4호
    • /
    • pp.155-165
    • /
    • 2010
  • As a promising candidate to replace the conventional floating gate flash memories, polysilicon-oxide-nitride-oxidesilicon (SONOS)-type nonvolatile semiconductor memories have been investigated widely in the past several years. SONOS-type memories have some advantages over the conventional floating gate flash memories, such as lower operating voltage, excellent endurance and compatibility with standard complementary metal-oxide-semiconductor (CMOS) technology. However, their operating speed and date retention characteristics are still the bottlenecks to limit the applications of SONOS-type memories. Recently, various approaches have been used to make a trade-off between the operating speed and the date retention characteristics. Application of high-k dielectrics to SONOS-type memories is a predominant route. This article provides the state-of-the-art research progress of high-k dielectrics applicable to SONOS-type nonvolatile semiconductor memories. It begins with a short description of working mechanism of SONOS-type memories, and then deals with the materials' requirements of high-k dielectrics used for SONOS-type memories. In the following section, the microstructures of high-k dielectrics used as tunneling layers, charge trapping layers and blocking layers in SONOS-type memories, and their impacts on the memory behaviors are critically reviewed. The improvement of the memory characteristics by using multilayered structures, including multilayered tunneling layer or multilayered charge trapping layer are also discussed. Finally, this review is concluded with our perspectives towards the future researches on the high-k dielectrics applicable to SONOS-type nonvolatile semiconductor memories.

Preparation of AgCl/Ag3PO4/Diatomite Composite by Microemulsion Method for Rapid Photo-Degradation of Rhodamine B with Stability under Visible Light

  • Zhu, Hai-Tao;Ren, Qi-Fang;Jin, Zhen;Ding, Yi;Liu, Xin-Yu;Ni, Xi-Hui;Han, Meng-Li;Ma, Shi-Yu;Ye, Qing;Oh, Won-Chun
    • 한국재료학회지
    • /
    • 제30권8호
    • /
    • pp.383-392
    • /
    • 2020
  • In this paper, AgCl/Ag3PO4/diatomite photocatalyst is successfully synthesized by microemulsion method and anion in situ substitution method. X-ray diffraction (XRD), photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM), and ultraviolet-visible spectroscopy (UV-Vis) are used to study the structural and physicochemical characteristics of the AgCl/Ag3PO4/diatomite composite. Using rhodamine B (RhB) as a simulated pollutant, the photocatalytic activity and stability of the AgCl/Ag3PO4/diatomite composite under visible light are evaluated. In the AgCl/Ag3PO4/diatomite visible light system, RhB is nearly 100 % degraded within 15 minutes. And, after five cycles of operation, the photocatalytic activity of AgCl/Ag3PO4/diatomite remains at 95 % of the original level, much higher than that of pure Ag3PO4 (40 %). In addition, the mechanism of enhanced catalytic performance is discussed. The high photocatalytic performance of AgCl/Ag3PO4/diatomite composites can be attributed to the synergistic effect of Ag3PO4, diatomite and AgCl nanoparticles. Free radical trapping experiments are used to show that holes and oxygen are the main active species. This material can quickly react with dye molecules adsorbed on the surface of diatomite to degrade RhB dye to CO2 and H2O. Even more remarkably, AgCl/Ag3PO4/diatomite can maintain above 95 % photo-degradation activity after five cycles.