• Title/Summary/Keyword: total deposition

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Hyperplastic Autotransplanted Parathyroid Tissue Migrating into Fatty Tumor after Total Parathyroidectomy

  • Reza, Joseph Arturo;Wiese, Georg Kristof;Portoghese, Joseph Dominic
    • Journal of Endocrine Surgery
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    • v.18 no.4
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    • pp.236-239
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    • 2018
  • Secondary hyperparathyroidism (SHPTH) occurs commonly in patients with end-stage renal disease (ESRD). Uncontrolled SHPTH is associated with complications of calcium deposition including calciphylaxis and elevated rates of cardiovascular morbidity. Current treatment recommendations for medically refractory disease include total parathyroidectomy, often with autotransplantation (TPTH+AT) of minced parathyroid gland. Surgical intervention is associated with a reduction in cardiovascular mortality. We report a case of a 56-year-old man with ESRD who developed SHPTH and underwent TPTH+AT of parathyroid tissue into the right brachioradialis muscle. Over the course of 7 years he developed a mass at the site of the autotransplanted gland as well as recurrent refractory hyperparathyroidism with increased forearm uptake noted on sestamibi scan. After excision of this mass, pathology demonstrated hyperplasia of the minced gland fragments which were embedded within a mass of fibroadipose tissue rather than the muscle tissue it was originally transplanted in.

Correlation between spin density and Vth instability of IGZO thin-film transistors

  • Park, Jee Ho;Lee, Sohyung;Lee, Hee Sung;Kim, Sung Ki;Park, Kwon-Shik;Yoon, Soo-Young
    • Current Applied Physics
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    • v.18 no.11
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    • pp.1447-1450
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    • 2018
  • The electron spin resonance (ESR) detects point defect of the In-Ga-Zn oxide (IGZO) like singly ionized oxygen vacancies and excess oxygen, and get spin density as a parameter of defect state. So, we demonstrated the spin density measurement of the IGZO film with various deposition conditions and it has linear relationship. Moreover, we matched the spin density with the total BTS and the threshold voltage ($V_{th}$) distribution of the IGZO thin film transistors. The total BTS ${\Delta}V_{th}$ and the $V_{th}$ distribution were degraded due to the spin density increases. The spin density is the useful indicator to predict $V_{th}$ instability of IGZO TFTs.

A Study on the Electrochemical Properties of Water-soluble Waste Cutting Oil using Boron-Doped Diamond Electrodes (붕소도핑 다이아몬드 전극을 이용한 수용성 폐절삭유의 전기화학적 특성연구)

  • J.H., Park;T.G., Kim
    • Journal of the Korean Society for Heat Treatment
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    • v.35 no.6
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    • pp.337-342
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    • 2022
  • In metal cutting, water-soluble cutting oil is used for cooling the surface of the workpiece and improving the surface roughness. However, waste cutting oil contains preservatives and surfactants, and if it is discarded as it is, it has an great influence on environmental pollution. For this reason, regulations on the use of cutting oil are being stricter. Hence, the development of eco-friendly treatment technologies is required. In this study, a diamond electrode doped with boron on a niobium substrate was deposited by thermal filament chemical vapor deposition and waste cutting oil was treated using an electrochemical method. Compared to the total amount of organic carbon contained in the waste cutting oil, it was confirmed that the boron-doped diamonds developed from this study showed much better performance than electrodes that has been widely used before.

Preparation and characterization of$PbTiO_3$ thin films deposited on Si(100) substrate by MOCVD (MOCVD 법에 의해 Si(100) 기판 위에 제조된 $PbTiO_3$ 박막의 증착 특성)

  • 김종국;박병옥
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.1
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    • pp.34-38
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    • 1999
  • $PbTiO_3$(PT)thin films were prepared by simultaneous of $TiO_2$ and PbO on Si(100) substrate using metaloganic chemical vapor deposition (MOCVD). Titanium tetra-isopropoxide (TTIP) and $Pb(TMHD)_2$were used as source materials. As evaporation temperature and flow rate of TTIP were examined the crystal structure of PT thin films using XRD with setting deposition temperature, flow rate of Pb, and total flow rate of $520^{\circ}C$, 30 sccm, and 750 sccm, respectively. PT thin films could be deposited under 48~$50^{\circ}C$ and 18~22sccm of evaporation temperature and flow rate of TTIP, respectively. It was found that lead, oxygen, and silicon diffused at the iaterface between the film and the substrate.

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나노 입자를 이용한 기상 전구체의 흡착거동 분석

  • Kim, Jong-Ho;Gang, Byeong-Su;Lee, Chang-Hui;Sin, Jae-Su;Gang, Sang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.100.2-100.2
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    • 2015
  • 반도체 산업이 성장하고 기술이 향상됨에 따라 소자의 소형화가 이루어지고 있다. 공정법으로는 atomic layer deposition (ALD), chemical vapor deposition (CVD) 등이 있다. 이러한 공정을 이용하여 수십 nm까지 미세화가 진행되고 있으며, 복잡한 구조의 박막을 실현하기 위해 전구체의 개발이 활발히 진행되고 있다. 전구체의 특성을 비실시간으로 분석하는 방법으로는 질량 분석법, 가스크로마토그래피, 적외선 분광법 등이 있다. 전구체의 특성을 실시간으로 분석하기 위해 Fourier transform infrared spectroscopy (FTIR)내에 attenuated total reflectance (ATR)를 거치시켰다. 본 연구는 구조를 개선한 ATR-FTIR을 이용하여 Tris-(dimethylamino) Zirconium (CpZr) 전구체의 흡착 거동을 분석하였다. ATR용 crystal은 Ge crystal을 사용했으며, 온도를 각각 30, 40, $50^{\circ}C$에서 CpZr 전구체의 흡착특성을 연구했다. 흡착성을 증가시키기 위해 Ge crystal 표면에 $ZrO_2$나노입자를 분포시켜 흡착특성을 비교 분석하였다. 또한 CpZr 전구체가 흡착된 Ge crystal 표면에 오존가스를 주입시킨 후 변화를 관찰하였다. Ge crystal표면에 나노입자를 분포시켜 CpZr 전구체를 흡착한 결과 나노입자를 분포시키지 않았을 때 보다 흡착강도가 높게 나타났다. 또한 CpZr 전구체가 흡착된 Ge crystal 표면에 오존가스를 주입한 결과 C-H 결합이 분해됨을 확인했다.

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Spectroscopic Studies on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing Cu(II) Ions

  • Lee, In-Churl;Bae, Sang-Eun;Song, Moon-Bong;Lee, Jong-Soon;Paek, Se-Hwan;J.Lee, Chi-Woo
    • Bulletin of the Korean Chemical Society
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    • v.25 no.2
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    • pp.167-171
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    • 2004
  • The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 $cm^{-1}$ appeared after the H-Si(111) surface was immersed in 40% $NH_4F$ solution containing 10 mM $Cu^{2+}$. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and $Cu^{2+}$ ions in solutions, which are changed into $Si(OH)_x(F)_y$ containing $SiF_6^{2-}$ ions and neutral copper islands.

Concentration Characteristics of PCBs in Pine Needle and Soil at Rural Area (교외지역에서 소나무 잎과 토양 중 PCBs의 농도 특성)

  • Shin Eun-Sang;Yeo Hyun-Gu
    • Journal of environmental and Sanitary engineering
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    • v.21 no.1 s.59
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    • pp.1-11
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    • 2006
  • This study was to investigate concentration characteristics of atmospheric PCBs in soil sample and pine needle at rural area. Profiles of PCB congener detected in pine needle and soil sample have a difference that low molecular PCBs mainly existed in pine needle, whereas high molecular PCBs were mainly existed in soil sample because of their different vapor pressure and octanol-air partitioning coefficient($K_{OA}$) of each congeners. Correlation coefficients(r) of PCB congeners simultaneously detected in soil and pine needle were significant (r>0.71, p<0.01), which showed that PCB congeners patterns of atmosphere could be estimated in using pine needle and soil sample indirectly. The contributions(%) of higher molecular PCBs(>penta-CB) to total PCBs in soil sample were higher than those of pine needle and the contribution of lower molecular PCBs(

A New Method for Deep Trench Isolation Using Selective Polycrystalline Silicon Growth (다결정 실리콘의 선택적 성장을 이용한 깊은 트랜치 격리기술)

  • 박찬우;김상훈;현영철;이승윤;심규환;강진영
    • Journal of the Korean Vacuum Society
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    • v.11 no.4
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    • pp.235-239
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    • 2002
  • A new method for deep trench isolation using selective growth of polycrystalline silicon is proposed. In this method, trench filling is performed by forming polysilicon-inner sidewalls within the trench, and then selectively growing them by reduced chemical vapor deposition using $SiH_2C1_2$gas at $1100^{\circ}C$. The surface profiles of filled trenches are determined mainly by the initial depth of inner sidewalls and the total thickness of selective growth. No chemical mechanical polishing(CMP) process is needed in this new method, which makes the process flow simpler and more reliable in comparison with the conventional method using CMP process.

Characterization of Monocrystalline $\beta-SiC$ Thin Film Grown by Chemical Vapor Deposition

  • Kim H. J.;Davis R. F.
    • Proceedings of the Korean Ceranic Society Conference
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    • 1986.12a
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    • pp.287-304
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    • 1986
  • High quality monocrystalline $\beta$-SiC thin films were grown via two-step process of conversion of the Si(100) surface by reaction with $C_2H_4$ and the subsequent chemical vapor deposition (CVD) at $1360^{\circ}C$ and 1 atm total pressure. Four dopants, B and Al and p-type, and N and P for n-type, were also incorporated into monocrystalline $\beta$-SiC thin films during the CVD growth process. IR and Raman spectroscopies were used to evaluate the quality of the undoped $\beta$-SiC thin films and to investigate the effects of dopants on the structure of the doped $\beta$-SiC thin films. The changes in the shape of IR and Raman spectra of the doped thin films due to dopants were observed. But the XTEM micrographs except for the B-doped and annealed films showed the same density and distribution of stacking faults and dislocations as was seen in the undoped samples, The IR and Raman spectra of the B-doped and annealed films showed the broad and weak bands and one extra peak at the 850 $cm^{-1}$ respectively. The SAD pattern and XTEM micrograph of the B-doped and annealed film provided the evidence for twinning.

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Influence of PECVD SiNx Layer on Multicrystalline Silicon Solar Cell (PECVD SiNx 박막의 다결정 실리콘 태양전지에 미치는 영향)

  • Kim, Jeong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.7
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    • pp.662-666
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    • 2005
  • Silicon nitride $(SiN_x)$ film is a promising material for anti-reflection coating and passivation of multicrystalline silicon (me-Si) solar cells. In this work, a plasma-enhanced chemical vapor deposition (PECVD) system with batch-type reactor tube was used to prepare highly robust $SiN_x$ films for screen-printed mc-Si solar cells. The Gas flow ratio, $R=[SiH_4]/[NH_3]$, in a mixture of silane and ammonia was varied in the range of 0.0910.235 while maintaining the total flow rate of the process gases to 4,200 sccm. The refractive index of the $SiN_x$ film deposited with a gas flow ratio of 0.091 was measured to be 2.03 and increased to 2.37 as the gas flow ratio increased to 0.235. The highest efficiency of the cell was $14.99\%$ when the flow rate of $SiH_4$ was 350 sccm (R=0.091). Generally, we observed that the efficiency of the mc-Si solar cell decreased with increasing R. From the analysis of the reflectance and the quantum efficiency of the cell, the decrease in the efficiency was shown to originate mainly from an increase in the surface reflectance for a high flow rate of $SiH_4$ during the deposition of $SiN_x$ films.